Patents by Inventor Hye Won Jeong

Hye Won Jeong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150210048
    Abstract: The present invention relates to a laminate and a device fabricated using the laminate. The laminate includes a first polyimide resin layer between a carrier substrate and a second polyimide resin layer, wherein the first polyimide resin layer has a coefficient of thermal expansion (CTE) equal to or lower than the CTE of the second polyimide-based resin layer at a temperature of 100 to 200° C., and the adhesive strength of the first resin layer to the second resin layer decreases when a physical stimulus causing no chemical changes in the first resin layer is applied to the laminate. According to the present invention, the flexible substrate can be easily separated from the carrier substrate without the need for further processing such as laser or light irradiation. Therefore, the use of the laminate facilitates the fabrication of the device having the flexible substrate. The device may be, for example, a flexible display device.
    Type: Application
    Filed: April 8, 2014
    Publication date: July 30, 2015
    Applicant: LG CHEM, LTD.
    Inventors: Hye Won Jeong, Kyungjun Kim, Kyoung Hoon Kim, Chan Hyo Park, BoRa Shin, Seung Yup Lee, HangAh Park, JinHo Lee, MiRa Im
  • Patent number: 9012595
    Abstract: The present invention provides polyimide applied to the buffer coating of semiconductors and a photosensitive resin composition including the same. The polyimide is a polyimide polymer represented by Chemical Formula 1 below. Further, the present invention provides a photosensitive resin composition, including 1) BDA-series soluble polyimide having an i-ray permeability of 70% or more; 2) a polyamic acid having elongation of 40% or more; 3) a novolak resin, and 4) diazonaphthoquinone-series photosensitive substance and having a high resolution, high sensitivity, an excellent film characteristic, and mechanical physical properties which are the requirements of semiconductor buffer coating.
    Type: Grant
    Filed: November 5, 2010
    Date of Patent: April 21, 2015
    Assignee: LG Chem, Ltd.
    Inventors: Sang Woo Kim, Chanhyo Park, Kyungjun Kim, Hyeran Seong, Sejin Shin, Hye Won Jeong, Jung Ho Jo
  • Publication number: 20140285751
    Abstract: The present application relates to a liquid crystal cell, a method for preparing a liquid crystal cell and a display device. An exemplary liquid crystal cell may be applied to various types of display devices so as to control a viewing angle or light transmittance of the display device.
    Type: Application
    Filed: June 6, 2014
    Publication date: September 25, 2014
    Applicant: LG CHEM, LTD.
    Inventors: Sung Joon MIN, Dong Hyun OH, Jun Won CHANG, Kyung Jun KIM, Hye Won JEONG, Moon Soo PARK
  • Publication number: 20140285752
    Abstract: The present application relates to a liquid crystal cell, a method for preparing a liquid crystal cell and a display device. An exemplary liquid crystal cell may be applied to various types of display devices so as to control a viewing angle or light transmittance of the display device.
    Type: Application
    Filed: June 6, 2014
    Publication date: September 25, 2014
    Applicant: LG CHEM, LTD.
    Inventors: Sung Joon MIN, Dong Hyun OH, Jun Won CHANG, Kyung Jun KIM, Hye Won JEONG, Moon Soo PARK
  • Patent number: 8470914
    Abstract: The present invention relates to polyimide or precursor thereof represented by Chemical Formula 1 or 2 and a photosensitive resin composition including the same. The polyimide or precursor thereof are fabricated using diamine comprising polyalkyleneoxide. The photosensitive resin composition of the present invention has excellent light transmissivity, an excellent resolution, and excellent photo sensitivity and image forming performance. Further, the photosensitive resin composition has high adhesiveness with substrates, such as a silicon film, a silicon oxide film, and a metal film. In particular, an excellent film without failure, such as crack, can be formed.
    Type: Grant
    Filed: August 23, 2010
    Date of Patent: June 25, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Jung Ho Jo, Kyung Jun Kim, Hye Ran Seong, Hye Won Jeong, Chan Hyo Park, Yu Na Kim, Sang Woo Kim, Se Jin Shin, Kyoung Ho Ahn
  • Publication number: 20110223538
    Abstract: Polyimide or a precursor thereof represented by Chemical Formula 1 or 2 and a photosensitive organic insulator composition having the same are disclosed. The polyimide or the precursor thereof is prepared from diamine including polyalkyleneoxide. The use of the photosensitive organic insulator composition can allow for low temperature curing and shorten a curing time, form a low taper angle, and implement a high sensitivity and high residual film. Also, since the photosensitive organic insulator composition, as a positive photosensitive composition, has excellent solubility with respect to an alkali solution of an exposed portion, the generation of impurity can be minimized.
    Type: Application
    Filed: March 11, 2011
    Publication date: September 15, 2011
    Applicant: LG CHEM. LTD.
    Inventors: Sang Woo KIM, Kyoung Ho AHN, Kyung Jun KIM, Se Jin SHIN, Hye Won JEONG, Chan Hyo PARK, Jung Ho JO, Yu Na KIM
  • Patent number: 7959989
    Abstract: The present invention relates to a novel cyclic olefin compound, a polymer including the cyclic olefin compound, a liquid crystal alignment film including the polymer, and a liquid crystal display device including the liquid crystal alignment film. Since the polymer includes the cyclic olefin compound as a main chain, the thermal stability is excellent and the photoreactive speed is high. Accordingly, the production time can be reduced, the production cost can be reduced, and the anchoring force of the liquid crystal can be increased because the alignment property is stabilized due to the curing.
    Type: Grant
    Filed: March 6, 2008
    Date of Patent: June 14, 2011
    Assignee: LG Chem, Ltd.
    Inventors: Heon Kim, Sung-Ho Chun, Hee-Jin Lee, Dmitry Kravchuk, Kyung-Jun Kim, Sang-Kook Kim, Sung-Joon Oh, Hye-Ran Seong, Byung-Hyun Lee, Hye-Won Jeong, Jung-Ho Jo, Yun-Jeong Lee, Dong-Hyun Oh
  • Publication number: 20110111341
    Abstract: The present invention provides polyimide applied to the buffer coating of semiconductors and a photosensitive resin composition including the same. The polyimide is a polyimide polymer represented by Chemical Formula 1 below. Further, the present invention provides a photosensitive resin composition, including 1) BDA-series soluble polyimide having an i-ray permeability of 70% or more; 2) a polyamic acid having elongation of 40% or more; 3) a novolak resin, and 4) diazonaphthoquinone-series photosensitive substance and having a high resolution, high sensitivity, an excellent film characteristic, and mechanical physical properties which are the requirements of semiconductor buffer coating.
    Type: Application
    Filed: November 5, 2010
    Publication date: May 12, 2011
    Applicant: LG CHEM, LTD.
    Inventors: Sang Woo KIM, Chanhyo PARK, Kyungjun KIM, Hyeran SEONG, Sejin SHIN, Hye Won JEONG, Jung Ho JO
  • Publication number: 20110046277
    Abstract: The present invention relates to polyimide or precursor thereof represented by Chemical Formula 1 or 2 and a photosensitive resin composition including the same. The polyimide or precursor thereof are fabricated using diamine comprising polyalkyleneoxide. The photosensitive resin composition of the present invention has excellent light transmissivity, an excellent resolution, and excellent photo sensitivity and image forming performance. Further, the photosensitive resin composition has high adhesiveness with substrates, such as a silicon film, a silicon oxide film, and a metal film. In particular, an excellent film without failure, such as crack, can be formed.
    Type: Application
    Filed: August 23, 2010
    Publication date: February 24, 2011
    Applicant: LG CHEM. LTD.
    Inventors: Jung Ho JO, Kyung Jun KIM, Hye Ran SEONG, Hye Won JEONG, Chan Hyo PARK, Yu Na KIM, Sang Woo KIM, Se Jin SHIN, Kyoung Ho AHN
  • Patent number: 7795361
    Abstract: Provided are a photoreactive polymer that includes a multi-cyclicmulticyclic compound at as its main chain and a method of preparing the same. The photoreactive polymer exhibits excellent thermal stability since it includes a multi-cyclicmulticyclic compound having a high glass transition temperature at as its main chain. In addition, the photoreactive polymer has a relatively large vacancy so that a photoreactive group can move relatively freely in the main chain therein. As a result, a slow photoreaction rate, which is a disadvantage of a conventional polymer material used to form an alignment layer for a liquid crystal display device, can be overcome.
    Type: Grant
    Filed: January 5, 2006
    Date of Patent: September 14, 2010
    Assignee: LG Chem, Ltd.
    Inventors: Heon Kim, Sung Ho Chun, Keon Woo Lee, Sung Joon Oh, Kyungjun Kim, Jungho Jo, Byung Hyun Lee, Min Young Lim, Hye Won Jeong
  • Publication number: 20100076166
    Abstract: The present invention relates to a novel cyclic olefin compound, a polymer including the cyclic olefin compound, a liquid crystal alignment film including the polymer, and a liquid crystal display device including the liquid crystal alignment film. Since the polymer includes the cyclic olefin compound as a main chain, the thermal stability is excellent and the photoreactive speed is high. Accordingly, the production time can be reduced, the production cost can be reduced, and the anchoring force of the liquid crystal can be increased because the alignment property is stabilized due to the curing.
    Type: Application
    Filed: March 6, 2008
    Publication date: March 25, 2010
    Inventors: Heon Kim, Sung-Ho Chun, Hee-Jin Lee, Dmitry Kravchuk, Kyung-Jun Kim, Sang-Kook Kim, Sung-Joon Oh, Hye-Ran Seong, Byung-Hyun Lee, Hye-won Jeong, Jung-Ho Jo, Yun-Jeong Lee, Dong-Hyun Oh
  • Publication number: 20100060834
    Abstract: The present invention relates to a novel polyimide copolymer, a method of preparing the polyimide copolymer, a liquid crystal aligning layer including the polyimide copolymer, a method of producing the liquid crystal aligning layer, and a liquid crystal display including the liquid crystal aligning layer. The liquid crystal aligning layer that includes the polyimide copolymer according to the present invention is advantageous in that when ultraviolet rays are radiated on movable chains of the polyamic acid copolymer to perform alignment before a polyimide copolymer is imidized and heat treatment is then performed to conduct imidization, thermal stability is excellent, residual images are not formed, and alignment of liquid crystals is excellent.
    Type: Application
    Filed: January 7, 2008
    Publication date: March 11, 2010
    Inventors: Xing-Zhong Fang, Kyung-Jun Kim, Byung-Hyun Lee, Jung-Ho Jo, Dong-Hyun Oh, Wan-Hee Goh, Sang-Kook Kim, Hye-Ran Seong, Hye-Won Jeong, Yun-Jeong Lee
  • Patent number: 7655284
    Abstract: Disclosed is a multi-functional monomer including a heat-curable functional group as well as a typical photoreactive group. In the multi-functional monomer, the photoreactive group is not chained to a main chain of a polymer. Thus, since it is possible to perform desirable alignment treatment even though polarized UV is radiated for a short time, the production time and the production cost are reduced and alignment regulating force of liquid crystals is increased, thereby increasing a dichroic ratio.
    Type: Grant
    Filed: September 22, 2006
    Date of Patent: February 2, 2010
    Assignee: LG Chem, Ltd.
    Inventors: Kyung Jun Kim, Keon Woo Lee, Byung Hyun Lee, Min Young Lim, Hye Won Jeong, Jung Ho Jo, Heon Kim, Sung Joon Oh, Sung Ho Chun
  • Patent number: 7541073
    Abstract: The present invention provides a composition for forming a liquid crystal alignment film, which comprises a photoreactive polymer including a multicyclic compound having a photoreactive group on a main chain thereof. The present invention also provides a liquid crystal alignment film produced using the composition, and a liquid crystal display including the liquid crystal alignment film. The photoreactive polymer including the multicyclic compound on the main chain thereof has a high glass transition temperature, thus thermal stability is excellent. Since lattice vacancy is relatively large, the photoreactive group is capable of moving relatively freely in the main chain of the polymer, thus it is possible to improve a slow photoreaction rate, which is considered a disadvantage of a conventional polymer material.
    Type: Grant
    Filed: January 19, 2006
    Date of Patent: June 2, 2009
    Assignee: LG Chem, Ltd.
    Inventors: Kyung Jun Kim, Keon Woo Lee, Byung Hyun Lee, Min Young Lim, Hye Won Jeong, Sung Ho Chun, Heon Kim, Sung Joon Oh
  • Patent number: 7422778
    Abstract: Provided are a photoreactive compound represented by formula (1), a liquid crystal alignment layer using the compound, a method of manufacturing the alignment layer, and a liquid crystal display device including the alignment layer: where n is an integer of 20-1000; m is an integer of 1-5; and R is a hydrogen atom, CN, a C1-C5 alkyloxy group, a halogen atom, or a maleimide group.
    Type: Grant
    Filed: December 2, 2005
    Date of Patent: September 9, 2008
    Assignee: LG Chem, Ltd.
    Inventors: Byung Hyun Lee, Min Young Lim, Kyungjun Kim, Sung Ho Chun, Sung Joon Oh, Keon Woo Lee, Heon Kim, Hye Won Jeong
  • Publication number: 20070161775
    Abstract: Disclosed is polyimide of the following Formula 1, a polyamic acid which is a precursor of the polyimide, and a method for preparing thereof. In Formula 1, R is a tetravalent organic group, and n is an integer of 1 to 1000. A liquid crystal alignment layer which contains the polyimide according to the present invention has excellent thermal stability, no residual images, and excellent alignment of liquid crystals.
    Type: Application
    Filed: November 30, 2006
    Publication date: July 12, 2007
    Inventors: Xing-Zhong Fang, Byung-Hyun Lee, Kyung-Jun Kim, Hye-Won Jeong, Yun-Jeong Lee
  • Publication number: 20070128378
    Abstract: Disclosed is a method of producing a liquid crystal aligning layer, a liquid crystal aligning layer produced using the same, and a liquid crystal display including the liquid crystal aligning layer. In the liquid crystal aligning layer that is produced using the method, ultraviolet rays are radiated on movable chains of a polyamic acid polymer while the polyamic acid polymer is not imidized to perform alignment, and heat treatment is then performed to conduct imidization. Thus, thermal stability is excellent, residual images are not formed, and alignment of liquid crystals is excellent.
    Type: Application
    Filed: November 30, 2006
    Publication date: June 7, 2007
    Inventors: Kyung-Jun Kim, Byung-Hyun Lee, Hye-Won Jeong, Yun-Jeong Lee
  • Patent number: RE45219
    Abstract: Provided are a photoreactive polymer that includes a multi-cyclicmulticyclic compound at as its main chain and a method of preparing the same. The photoreactive polymer exhibits excellent thermal stability since it includes a multi-cyclicmulticyclic compound having a high glass transition temperature at as its main chain. In addition, the photoreactive polymer has a relatively large vacancy so that a photoreactive group can move relatively freely in the main chain therein. As a result, a slow photoreaction rate, which is a disadvantage of a conventional polymer material used to form an alignment layer for a liquid crystal display device, can be overcome.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: October 28, 2014
    Assignee: LG Chem, Ltd.
    Inventors: Heon Kim, Sung Ho Chun, Keon Woo Lee, Sung Joon Oh, Kyungjun Kim, Jungho Jo, Byung Hyun Lee, Min Young Lim, Hye Won Jeong