Patents by Inventor Hyeon Shin

Hyeon Shin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050038220
    Abstract: A multi-functional cyclic siloxane compound (A), a siloxane-based (co)polymer prepared from the compound (A), or compound (A) and at least one of a Si monomer having organic bridges(B), an acyclic alkoxy silane monomer(C), and a linear siloxane monomer (D); and a process for preparing a dielectric film using the polymer. The siloxane compound of the present invention is highly reactive, so the polymer prepared from the compound is excellent in mechanical properties, thermal stability and crack resistance, and has a low dielectric constant resulting from compatibility with conventional pore-generating materials. Furthermore, a low content of carbon and high content of SiO2 enhance its applicability to the process of producing a semiconductor, wherein it finds great use as a dielectric film.
    Type: Application
    Filed: June 29, 2004
    Publication date: February 17, 2005
    Inventors: Hyeon Shin, Hyun Jeong, Jong Seon, Sang Mah, Jin Yim, Jae Lee, Kwang Lee, Jung Kim
  • Patent number: 6687626
    Abstract: A flux distribution measuring apparatus measures distribution of flow rates of a flowable medium. The measuring apparatus includes thin metal wire(s) for scanning a flowable medium and lead wires connected to the thin metal wire(s), wherein a voltage difference is detected between adjacent lead wires while the measuring apparatus scans the flowable medium in the direction perpendicular to a flow path of the flowable medium. The voltage differences are generated due to temperature changes in the thin metal wire(s) while scanning the flowable medium having different flow rates. The measuring apparatus visualizes the distribution of flow rates of a flowable medium using a computer which receives and processes the voltage differences detected.
    Type: Grant
    Filed: February 19, 2002
    Date of Patent: February 3, 2004
    Assignee: Korea Research Institute of Standars and Science
    Inventors: Dae Jin Seong, Yong Hyeon Shin, Jung Hyung Kim, Jong Yeon Lim, Kwang Hwa Jung
  • Publication number: 20020134170
    Abstract: A flux distribution measuring apparatus measures distribution of flow rates of a flowable medium. The measuring apparatus includes thin metal wire(s) for scanning a flowable medium and lead wires connected to the thin metal wire(s), wherein a voltage difference is detected between adjacent lead wires while the measuring apparatus scans the flowable medium in the direction perpendicular to a flow path of the flowable medium. The voltage differences are generated due to temperature changes in the thin metal wire(s) while scanning the flowable medium having different flow rates. The measuring apparatus visualizes the distribution of flow rates of a flowable medium using a computer which receives and processes the voltage differences detected.
    Type: Application
    Filed: February 19, 2002
    Publication date: September 26, 2002
    Inventors: Dae Jin Seong, Yong Hyeon Shin, Jung Hyung Kim, Jong Yeon Lim, Kwang Hwa Jung