Patents by Inventor Hyun Joo Lee

Hyun Joo Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9493478
    Abstract: The present invention provides a fused ring compound containing furan or a pharmaceutically acceptable salt thereof, a method for preparing same, a pharmaceutical composition comprising same, and a use thereof. The fused ring compound containing furan or a pharmaceutically acceptable salt thereof inhibits the activity of phosphatidylinositol 3-kinase (PI3K) and can therefore be used in a pharmaceutical composition for treating and preventing respiratory diseases, inflammatory diseases, proliferative diseases, cardiovascular diseases, or central nervous system diseases which occur due to the over-activation of PI3K.
    Type: Grant
    Filed: July 23, 2013
    Date of Patent: November 15, 2016
    Assignee: YUHAN CORPORATION
    Inventors: Hyoung Sig Seo, Tae Kyun Kim, Hyun Joo Lee, Dong Hoon Kim, Gyu Jin Lee, Jun Chul Park, Ji Yeong Gal, Tae-hoon Kim, Kwan Hoon Hyun, Kyoung Kyu Ahn, Kaapjoo Park, Su Youn Nam, Ge Hyeong Lee, Hee Jong Lim
  • Patent number: 9475861
    Abstract: The present invention relates to a binding molecule having influenza A virus-neutralizing activity derived from a human B cell, and the binding molecule having the influenza A virus-neutralizing activity, according to the present invention, is a binding molecule that is derived from a B cell that is selected from the blood of a patient infected with an influenza A virus, and has neutralizing activity against influenza A viruses, and thus is useful in preventing and treating disease derived from the influenza A virus, and can be useful in diagnosing the influenza A virus by using the binding molecule according to the present invention.
    Type: Grant
    Filed: September 27, 2012
    Date of Patent: October 25, 2016
    Assignee: Celltrion Inc.
    Inventors: Shin Jae Chang, Ki Sung Kwon, Kye Sook Yi, Hyun Joo Lee, Jae Won Jeon, Hwang Keun Jun, Min Seok Chang
  • Patent number: 9436091
    Abstract: A method for forming a fine pattern includes forming an etching target material layer on a substrate, forming a first photoresist layer on the etching target material layer, forming a metal pattern on the first photoresist layer, the metal pattern having a plurality of lines and thin film lines alternately arranged, the lines having predetermined linewidth and thickness and are spaced apart from each other by a predetermined distance, exciting surface plasmons in the metal pattern by light irradiation to produce a surface plasmon resonance that exposes a fine first pattern shape in the first photoresist layer, forming a first photoresist pattern by removing the metal pattern and developing the first photoresist layer, and etching the etching target material layer by using the first photoresist pattern as a mask.
    Type: Grant
    Filed: July 28, 2014
    Date of Patent: September 6, 2016
    Assignee: Samsung Display Co., Ltd.
    Inventors: Yong Son, Min Kang, Bong-Yeon Kim, Dong-Eon Lee, Hyun-joo Lee
  • Publication number: 20160244419
    Abstract: A method for preparing glycidol using glycerol includes mixing glycerol with urea in the presence of at least one zinc-based catalyst selected from the group consisting of Zn(NO3)2, ZnCl2, ZnO and Zn(OAc)2 under a pressure of 0.5-10 kPa at a temperature of 100-170° C. to obtain glycerol carbonate; filtering the glycerol carbonate mixed with the zinc-based catalyst through an adsorbent including a polymer resin coordinated with amine groups to separate the zinc-based catalyst and glycerol carbonate from each other; and carrying out reaction of the glycerol carbonate separated from the zinc-based catalyst in the presence of an anion alkali metal salt catalyst that is Na, K, Rb, Cs or a mixture thereof containing at least one anion selected from the group consisting of Cl?, Br?, I?, NO3?, NO2? and acetate under a pressure of 0.13-6.67 kPa at a temperature of 140-250° C. to obtain glycidol.
    Type: Application
    Filed: February 4, 2016
    Publication date: August 25, 2016
    Inventors: Hyun Joo LEE, Byoung Sung AHN, Sang Deuk LEE, Ji Sik CHOI, Hyejeong LEE, Hye Jin LEE
  • Patent number: 9395619
    Abstract: A phase shift device includes a phase shift mask which includes a transparent substrate, and a phase shift pattern which is provided on the transparent substrate, and includes a first area having a first thickness, a second area having a second thickness which is less than the first thickness, a first opening having a first opening width and defined at the first area, and a second opening having a second opening width and defined at the second area.
    Type: Grant
    Filed: June 18, 2014
    Date of Patent: July 19, 2016
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Yong Son, Min Kang, Bong-Yeon Kim, Dong-Eon Lee, Jun-Hyuk Woo, Hyun-Joo Lee, Sang-Uk Lim, Jin-Ho Ju
  • Publication number: 20160170294
    Abstract: A phase shift mask enables much smaller scale of electronic circuit pattern. A phase shift mask comprises a transparent substrate, a phase shift pattern arranged on the transparent substrate to change a phase of light that penetrates the transparent substrate, and a metal coating layer arranged on at least a part of a surface of the phase shift pattern.
    Type: Application
    Filed: April 20, 2015
    Publication date: June 16, 2016
    Inventors: Yong SON, Min Kang, Bong Yeon Kim, Hyun Joo Lee, Jin Ho Ju
  • Publication number: 20160139668
    Abstract: Disclosed is a haptic actuator integrated with a sensor electrode and a wearable device including the haptic actuator. The haptic actuator integrated with a sensor electrode comprises a case having a skin contact surface made of a conductive material; a vibration generation means installed in the case; a driving signal transmitting means of which the one end is connected electrically to the vibration generation means; and a sensor signal transmitting means of which the one end is connected electrically to the skin contact surface.
    Type: Application
    Filed: November 16, 2015
    Publication date: May 19, 2016
    Inventors: Jae Sun LEE, Jung Young NAM, Hyun Joo LEE, Ki Hyun KIM
  • Publication number: 20160109793
    Abstract: A mask includes a transparent substrate and a light blocking pattern. The light blocking pattern includes a light blocking part and a diffraction pattern. The light blocking part is disposed on the transparent substrate and is configured to block light. The diffraction pattern includes a plurality of protrusion parts and is configured to diffract the light. The plurality of protrusion parts protrudes from a side of the blocking part and is separated from each other.
    Type: Application
    Filed: April 27, 2015
    Publication date: April 21, 2016
    Inventors: YONG SON, MIN KANG, BONG-YEON KIM, HYUN-JOO LEE, JIN-HO JU
  • Publication number: 20160033857
    Abstract: A mask for photolithography includes: a transparent substrate; a phase shift pattern on the transparent substrate and configured to change a phase of light; a dielectric layer on the transparent substrate; and a negative refractive-index meta material layer on the dielectric layer.
    Type: Application
    Filed: June 26, 2015
    Publication date: February 4, 2016
    Inventors: Yong Son, Min Kang, Bong-Yeon Kim, Hyun-Joo Lee, Hyang-Shik Kong, Jin-Ho Ju, Kyoung-Sik Kim, Seung-Hwa Baek
  • Patent number: 9238216
    Abstract: Provided is a palladium on carbon (Pd/C) catalyst obtained by using an ionic liquid, a method for preparing the same, and a method for hydrogenation of hydrofluorocarbon using the same. More particularly, palladium particles are supported on carbon particles by using an ionic liquid, and the resultant Pd/C catalyst is used for hydrogenation of hydrofluorocarbon. The catalyst includes palladium particles having a smaller particle size and a more uniform shape as compared to the existing Pd/C catalysts, and thus shows high catalytic activity.
    Type: Grant
    Filed: October 21, 2013
    Date of Patent: January 19, 2016
    Assignee: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Chang Soo Kim, Kyesang Yoo, Byoung Sung Ahn, Hyun Joo Lee, Jeong Myeong Ha, Hong Gon Kim
  • Patent number: 9199225
    Abstract: Disclosed is a method for preparing a metal fluoride catalyst as a dehydrofluorination catalyst having high activity under a mild condition using a trifluoroacetic acid solution with no use of HF gas having fluidity and corrosive property. Disclosed also is a dehydrofluorination method for preparing HFO-1225ye from HFP-236ea by using the catalyst with high efficiency.
    Type: Grant
    Filed: September 3, 2014
    Date of Patent: December 1, 2015
    Assignee: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Hilman Hutama, Jeong-Myeong Ha, Chang Soo Kim, Hong Gon Kim, Jae Wook Choi, Dong Jin Suh, Hyun Joo Lee, Byoung Sung Ahn
  • Patent number: 9199950
    Abstract: Disclosed is a method for producing glycidol by successive catalytic reactions. The method includes a series of reactions for the preparation of glycerol carbonate from glycerol and the decarboxylation of the glycerol carbonate. Specifically, the method includes i) reacting glycerol with a dialkyl carbonate to prepare glycerol carbonate, and ii) subjecting the glycerol carbonate to decarboxylation wherein a base is added as a catalyst in step i) and is allowed to react with an acid to form a metal salt after step i), and the salt is used as a catalyst in step ii). According to the method, inexpensive and easy-to-purchase acid and base catalysts can be used to produce glycidol from glycerol, a by-product of biodiesel production, as a starting material in high yield with high selectivity in a convenient, simple, and environmentally friendly way. In addition, the method eliminates the need to separate the base catalyst.
    Type: Grant
    Filed: June 24, 2014
    Date of Patent: December 1, 2015
    Assignee: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Hyun Joo Lee, Byoung Sung Ahn, Sang Deuk Lee, Jungho Jae, Ji Sik Choi
  • Patent number: 9188851
    Abstract: A pattern mask for patterning a thin film includes a transparent or translucent substrate with a plurality of grooves formed thereon having a pitch of about 4.6 ?m to about 10.8 ?m.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: November 17, 2015
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Jun Hyuk Woo, Min Kang, Bong-Yeon Kim, Jeong Won Kim, Jin Ho Ju, Tae Gyun Kim, Chul Won Park, Hyun Joo Lee
  • Publication number: 20150274700
    Abstract: The present invention provides a diaminopyrimidine derivative or its pharmaceutically acceptable salt, a process for the preparation thereof, a pharmaceutical composition comprising the same, and a use thereof. The diaminopyrimidine derivative or its pharmaceutically acceptable salt functions as a 5-HT4 receptor agonist, and therefore can be usefully applied for preventing or treating dysfunction in gastrointestinal motility, one of the gastrointestinal diseases, such as gastroesophageal reflux disease (GERD), constipation, irritable bowel syndrome (IBS), dyspepsia, post-operative ileus, delayed gastric emptying, gastroparesis, intestinal pseudo-obstruction, drug-induced delayed transit, or diabetic gastric atony.
    Type: Application
    Filed: February 24, 2012
    Publication date: October 1, 2015
    Applicant: YUHAN CORPORATION
    Inventors: Hyun-Joo LEE, Dong-Hoon KIM, Tae-Kyun KIM, Young-Ae YOON, Jae-Young SIM, Myung-Hun CHA, Eun-Jung JUNG, Kyoung-Kyu AHN, Tai-Au LEE
  • Patent number: 9134603
    Abstract: A photomask for exposure includes: a transparent substrate; a light blocking pattern layer positioned on the transparent substrate; a first dielectric layer positioned on the light blocking pattern layer and including a dielectric material; and a negative refractive index layer positioned on the first dielectric layer and including a metal. A surface plasmon quasi-bound mode of the photomask for exposure overlaps a wavelength range of the light source of the light exposer which irradiates light to the photomask for exposure.
    Type: Grant
    Filed: April 4, 2013
    Date of Patent: September 15, 2015
    Assignees: SAMSUNG DISPLAY CO., LTD., INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY
    Inventors: Min Kang, Bong-Yeon Kim, Jeong Won Kim, Hyang-Shik Kong, Jin Ho Ju, Kyoung Sik Kim, Seung Hwa Baek, Jun Hyuk Woo, Hyun Joo Lee
  • Publication number: 20150239858
    Abstract: Disclosed is a method for producing glycidol by successive catalytic reactions. The method includes a series of reactions for the preparation of glycerol carbonate from glycerol and the decarboxylation of the glycerol carbonate. Specifically, the method includes i) reacting glycerol with a dialkyl carbonate to prepare glycerol carbonate, and ii) subjecting the glycerol carbonate to decarboxylation wherein a base is added as a catalyst in step i) and is allowed to react with an acid to form a metal salt after step i), and the salt is used as a catalyst in step ii). According to the method, inexpensive and easy-to-purchase acid and base catalysts can be used to produce glycidol from glycerol, a by-product of biodiesel production, as a starting material in high yield with high selectivity in a convenient, simple, and environmentally friendly way. In addition, the method eliminates the need to separate the base catalyst.
    Type: Application
    Filed: June 24, 2014
    Publication date: August 27, 2015
    Inventors: Hyun Joo LEE, Byoung Sung AHN, Sang Deuk LEE, Jungho JAE, Ji Sik CHOI
  • Publication number: 20150234286
    Abstract: A method for forming a fine pattern includes forming an etching target material layer on a substrate, forming a first photoresist layer on the etching target material layer, forming a metal pattern on the first photoresist layer, the metal pattern having a plurality of lines and thin film lines alternately arranged, the lines having predetermined linewidth and thickness and are spaced apart from each other by a predetermined distance, exciting surface plasmons in the metal pattern by light irradiation to produce a surface plasmon resonance that exposes a fine first pattern shape in the first photoresist layer, forming a first photoresist pattern by removing the metal pattern and developing the first photoresist layer, and etching the etching target material layer by using the first photoresist pattern as a mask.
    Type: Application
    Filed: July 28, 2014
    Publication date: August 20, 2015
    Inventors: Yong Son, Min Kang, Bong-Yeon Kim, Dong-Eon Lee, Hyun-joo Lee
  • Publication number: 20150198872
    Abstract: A phase shift device includes a phase shift mask which includes a transparent substrate, and a phase shift pattern which is provided on the transparent substrate, and includes a first area having a first thickness, a second area having a second thickness which is less than the first thickness, a first opening having a first opening width and defined at the first area, and a second opening having a second opening width and defined at the second area.
    Type: Application
    Filed: June 18, 2014
    Publication date: July 16, 2015
    Inventors: Yong SON, Min KANG, Bong-Yeon KIM, Dong-Eon LEE, Jun-Hyuk WOO, Hyun-Joo LEE, Sang-Uk LIM, Jin-Ho JU
  • Publication number: 20150191478
    Abstract: The present invention provides a fused ring compound containing furan or a pharmaceutically acceptable salt thereof, a method for preparing same, a pharmaceutical composition comprising same, and a use thereof. The fused ring compound containing furan or a pharmaceutically acceptable salt thereof inhibits the activity of phosphatidylinositol 3-kinase (PI3K) and can therefore be used in a pharmaceutical composition for treating and preventing respiratory diseases, inflammatory diseases, proliferative diseases, cardiovascular diseases, or central nervous system diseases which occur due to the over-activation of PI3K.
    Type: Application
    Filed: July 23, 2013
    Publication date: July 9, 2015
    Applicant: YUHAN CORPORATION
    Inventors: Hyoung Sig Seo, Tae Kyun Kim, Hyun Joo Lee, Dong Hoon Kim, Gyu Jin Lee, Jun Chul Park, Ji Yeong Gal, Tae-hoon Kim, Kwan Hoon Hyun, Kyoung Kyu Ahn, Kaapjoo Park, Su Youn Nam, Ge Hyeong Lee, Hee Jong Lim
  • Patent number: 9069258
    Abstract: A mask may include a circuit area and a pixel area. The circuit area includes a circuit pattern. The pixel area includes a pixel pattern which is extended in a length direction and an assist pattern which is at an end portion of the pixel pattern and adjacent to the circuit area.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: June 30, 2015
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Bong-Yeon Kim, Min Kang, Seung-Bo Shim, Jong-kwang Lee, Jin-Ho Ju, Jeong-Won Kim, Tae-Gyun Kim, Chul-Won Park, Jun-Hyuk Woo, Hyun-Joo Lee