Patents by Inventor Hyun Joo Lee

Hyun Joo Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150080617
    Abstract: Disclosed is a method for preparing a metal fluoride catalyst as a dehydrofluorination catalyst having high activity under a mild condition using a trifluoroacetic acid solution with no use of HF gas having fluidity and corrosive property. Disclosed also is a dehydrofluorination method for preparing HFO-1225ye from HFP-236ea by using the catalyst with high efficiency.
    Type: Application
    Filed: September 3, 2014
    Publication date: March 19, 2015
    Applicant: Korea Institute of Science and Technology
    Inventors: Hilman Hutama, Jeong-Myeong HA, Chang Soo KIM, Hong Gon KIM, Jae Wook CHOI, Dong Jin SUH, Hyun Joo LEE, Byoung Sung AHN
  • Patent number: 8969600
    Abstract: Disclosed is a method for producing glycidol by decarboxylation of glycerol carbonate. In the method, an ionic liquid catalyst is added for the reaction. According to the method glycidol can be produced in high yield and selectivity. The method enables the production of glycidol in an easy, simple and environmentally friendly way.
    Type: Grant
    Filed: February 5, 2013
    Date of Patent: March 3, 2015
    Assignee: Korea Institute of Science and Technology
    Inventors: Hyun Joo Lee, Sang Deuk Lee, Byoung Sung Ahn, Chang Soo Kim, Ji Sik Choi
  • Publication number: 20150045589
    Abstract: Provided is a palladium on carbon (Pd/C) catalyst obtained by using an ionic liquid, a method for preparing the same, and a method for hydrogenation of hydrofluorocarbon using the same. More particularly, palladium particles are supported on carbon particles by using an ionic liquid, and the resultant Pd/C catalyst is used for hydrogenation of hydrofluorocarbon. The catalyst includes palladium particles having a smaller particle size and a more uniform shape as compared to the existing Pd/C catalysts, and thus shows high catalytic activity.
    Type: Application
    Filed: October 21, 2013
    Publication date: February 12, 2015
    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Chang Soo KIM, Kyesang YOO, Byoung Sung AHN, Hyun Joo LEE, Jeong Myeong HA, Hong Gon KIM
  • Publication number: 20140371878
    Abstract: A communication apparatus to interconnect a plurality of devices using multiple protocols includes a protocol layer having a plurality of protocol objects obtained by objectifying the protocols used by the devices, and a control layer to check a protocol used for data transmission if data is transmitted, to convert a protocol object corresponding to the checked protocol into a preset control object, to convert the preset control object into another protocol object, and to transmit the data to a device connected to the converted other protocol object. Since operatively coupled control is allowed between devices using different protocols, extensibility and flexibility may be achieved. Besides, since an abstraction layer is divided into a control layer and a protocol layer, an interface may not be changed even when protocols are added, protocol conversion may be easily performed, and routing between multiple protocols may be performed using, for example, a logic editor.
    Type: Application
    Filed: June 3, 2014
    Publication date: December 18, 2014
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Hyun Joo LEE, Chung Yong EOM, Yang Don LEE, Man Jib HAN
  • Patent number: 8911926
    Abstract: A method of forming a metal pattern is disclosed. In the method, a metal layer is formed on a base substrate. A photoresist composition is coated on the metal layer to form a coating layer. The photoresist composition includes a binder resin, a photo-sensitizer, a mercaptopropionic acid compound and a solvent. The coating layer is exposed to a light. The coating layer is partially removed to form a photoresist pattern. The metal layer is patterned by using the photoresist pattern as a mask.
    Type: Grant
    Filed: April 5, 2013
    Date of Patent: December 16, 2014
    Assignee: Samsung Display Co., Ltd.
    Inventors: Jeong-Won Kim, Min Kang, Bong-Yeon Kim, Jin-Ho Ju, Dong-Min Kim, Tae-Gyun Kim, Joo-Kyoung Park, Chul-Won Park, Jun-Hyuk Woo, Won-Young Lee, Hyun-Joo Lee, Eun Jeagal
  • Patent number: 8895214
    Abstract: An optical mask for forming a pattern is provided. The optical mask includes: a substrate including a light blocking pattern formed on portions of the substrate, wherein the light blocking pattern includes a halftone layer and a light blocking layer formed on the halftone layer, and the halftone layer and the light blocking layer overlap such that at least an edge portion of the halftone layer is exposed. A pitch of the light blocking pattern may about 6 ?m, and a transmission ratio of the halftone layer may range from about 10% to about 50%.
    Type: Grant
    Filed: February 13, 2014
    Date of Patent: November 25, 2014
    Assignee: Samsung Display Co., Ltd.
    Inventors: Bong-Yeon Kim, Min Kang, Jeong Won Kim, Jin Ho Ju, Jun Hyuk Woo, Hyun Joo Lee
  • Patent number: 8894956
    Abstract: Disclosed is an sorbent for removing sulfur dioxide (SO2) contained in combustion flue gases or in the atmosphere by using a diamine-based ionic liquid or a diamine compound supported by a polymer resin. To be specific, the present invention relates to a method of using a tertiary diamine compound immobilized on a polymer surface as a SO2 sorbent and also relates to a novel sorbent for absorbing or adsorbing a sulfur dioxide hydrate (SO2.H2O) formed by a bond between SO2 and water.
    Type: Grant
    Filed: November 22, 2013
    Date of Patent: November 25, 2014
    Assignee: Korea Institute of Science and Technology
    Inventors: Hyun Joo Lee, Seung Rok Lim, Kean Im Lee, Chang Soo Kim, Hoon Sik Kim, Ji Sik Choi, Sang Deuk Lee
  • Publication number: 20140296523
    Abstract: There are provided an ionic liquid having ether group(s) in which a copper(I) compound is included, a method for preparing the same, and a method for removing traces amounts of acetylene-based hydrocarbon compounds included in olefin by absorption or extraction using the same. When the disclosed solution is used, oxidation of Cu(I) to Cu(II) is prevented since CuX is stabilized by the ionic liquid. Thus, selective removal efficiency of acetylenic compounds is improved greatly while the removal performance is retained for a long period of time. Further, since the solution according to the present disclosure is applicable as an extractant as well as an absorbent, the associated operation is simple and apparatus cost can be decreased.
    Type: Application
    Filed: June 19, 2014
    Publication date: October 2, 2014
    Inventors: Hyun Joo Lee, Byoung Sung Ahn, Hoon Sik Kim, Jin-Hyung Kim, Gyeong Taek Gong
  • Publication number: 20140294718
    Abstract: Disclosed is an sorbent for removing sulfur dioxide (SO2) contained in combustion flue gases or in the atmosphere by using a diamine-based ionic liquid or a diamine compound supported by a polymer resin. To be specific, the present invention relates to a method of using a tertiary diamine compound immobilized on a polymer surface as a SO2 sorbent and also relates to a novel sorbent for absorbing or adsorbing a sulfur dioxide hydrate (SO2.H2O) formed by a bond between SO2 and water.
    Type: Application
    Filed: November 22, 2013
    Publication date: October 2, 2014
    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Hyun Joo LEE, Seung Rok LIM, Kean Im LEE, Chang Soo KIM, Hoon Sik KIM, Ji Sik CHOI, Sang Deuk LEE
  • Patent number: 8824229
    Abstract: A semiconductor memory apparatus includes a bit line coupled to a plurality of memory cells, a discharge controller configured to generate a bit line discharge signal to pre-discharge the bit line before the memory cells are activated, and a bit line discharge block coupled to the bit line and configured to discharge the bit line in response to the bit line discharge signal.
    Type: Grant
    Filed: August 27, 2011
    Date of Patent: September 2, 2014
    Assignee: SK Hynix Inc.
    Inventors: Hyun Joo Lee, Hyuck Soo Yoon
  • Patent number: 8824201
    Abstract: A semiconductor memory apparatus includes: a read current supply unit configured to supply a read current; a resistive memory cell configured to pass a current having a magnitude corresponding to a resistance value thereof in a data read mode; a voltage transfer unit coupled between the read current supply unit and the resistive memory cell and configured to transfer the read current to the resistive memory cell, wherein a voltage corresponding to the magnitude of the passed current is formed at a sensing node; and a feedback unit configured to pull-down drive a connection node, which is coupled between the voltage transfer unit and the resistive memory cell, when a voltage level of the sensing node reaches a predefined level.
    Type: Grant
    Filed: December 31, 2010
    Date of Patent: September 2, 2014
    Assignee: SK Hynix Inc.
    Inventors: Hyun Joo Lee, Dong Keun Kim
  • Patent number: 8824220
    Abstract: A semiconductor apparatus includes: a sense amplifier unit enabled for a predetermined time during a read operation in response to a first read enable signal, enabled before a write operation in response to a second read enable signal, and disabled when the write operation is started, and a switch unit configured to connect a write driver and a memory unit during the write operation in response to a first select signal, connect the sense amplifier unit and the memory unit for the predetermined time during the read operation in response to a control signal, and disconnect the sense amplifier and the memory unit when the write operation is started.
    Type: Grant
    Filed: January 8, 2013
    Date of Patent: September 2, 2014
    Assignee: SK Hynix Inc.
    Inventors: Hyun Joo Lee, Dong Keun Kim
  • Publication number: 20140234336
    Abstract: The present invention relates to a binding molecule having influenza A virus-neutralizing activity derived from a human B cell, and the binding molecule having the influenza A virus-neutralizing activity, according to the present invention, is a binding molecule that is derived from a B cell that is selected from the blood of a patient infected with an influenza A virus, and has neutralizing activity against influenza A viruses, and thus is useful in preventing and treating disease derived from the influenza A virus, and can be useful in diagnosing the influenza A virus by using the binding molecule according to the present invention.
    Type: Application
    Filed: September 27, 2012
    Publication date: August 21, 2014
    Inventors: Shin Jae Chang, Ki Sung Kwon, Kye Sook Yi, Hyun Joo Lee, Jae Won Jeon, Hwang Keun Jun, Min Seok Chang
  • Patent number: 8785711
    Abstract: There are provided an ionic liquid having ether group(s) in which a copper(I) compound is included, a method for preparing the same, and a method for removing traces amounts of acetylene-based hydrocarbon compounds included in olefin by absorption or extraction using the same. When the disclosed solution is used, oxidation of Cu(I) to Cu(II) is prevented since CuX is stabilized by the ionic liquid. Thus, selective removal efficiency of acetylenic compounds is improved greatly while the removal performance is retained for a long period of time. Further, since the solution according to the present disclosure is applicable as an extractant as well as an absorbent, the associated operation is simple and apparatus cost can be decreased.
    Type: Grant
    Filed: December 16, 2010
    Date of Patent: July 22, 2014
    Assignee: Kolon Industries, Inc.
    Inventors: Hyun Joo Lee, Byoung Sung Ahn, Hoon Sik Kim, Jin-Hyung Kim, Gyeong Taek Gong
  • Patent number: 8772021
    Abstract: Provided are an expression vector for an animal cell including a promoter, a cloning site or a polynucleotide encoding foreign product, and a transcription terminator, all of which are operably connected each other within the expression vector, in which at least one copy of human ?-globin MAR sequence is attached to the 31 terminal of the transcription terminator, and a method of expressing a foreign gene using the expression vector.
    Type: Grant
    Filed: March 4, 2006
    Date of Patent: July 8, 2014
    Assignee: Celltrion, Inc.
    Inventors: Jong-mook Kim, Hye-jin Hong, Hyun-joo Lee, Moon-kyoung So, Soo-young Lee, Jong-moon Cho, Bok-hwan Chun, Seung-suh Hong, Myung-sam Cho
  • Publication number: 20140162177
    Abstract: An optical mask for forming a pattern is provided. The optical mask includes: a substrate including a light blocking pattern formed on portions of the substrate, wherein the light blocking pattern includes a halftone layer and a light blocking layer formed on the halftone layer, and the halftone layer and the light blocking layer overlap such that at least an edge portion of the halftone layer is exposed. A pitch of the light blocking pattern may about 6 ?m, and a transmission ratio of the halftone layer may range from about 10% to about 50%.
    Type: Application
    Filed: February 13, 2014
    Publication date: June 12, 2014
    Applicant: Samsung Display Co., Ltd.
    Inventors: Bong-Yeon KIM, Min KANG, Jeong Won KIM, Jin Ho JU, Jun Hyuk WOO, Hyun Joo LEE
  • Publication number: 20140135512
    Abstract: Disclosed is a method for producing glycidol by decarboxylation of glycerol carbonate. In the method, an ionic liquid catalyst is added for the reaction. According to the method glycidol can be produced in high yield and selectivity. The method enables the production of glycidol in an easy, simple and environmentally friendly way.
    Type: Application
    Filed: February 5, 2013
    Publication date: May 15, 2014
    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Hyun Joo LEE, Sang Deuk LEE, Byoung Sung AHN, Chang Soo KIM, Ji Sik CHOI
  • Publication number: 20140127612
    Abstract: A photomask for exposure includes: a transparent substrate; a light blocking pattern layer positioned on the transparent substrate; a first dielectric layer positioned on the light blocking pattern layer and including a dielectric material; and a negative refractive index layer positioned on the first dielectric layer and including a metal. A surface plasmon quasi-bound mode of the photomask for exposure overlaps a wavelength range of the light source of the light exposer which irradiates light to the photomask for exposure.
    Type: Application
    Filed: April 4, 2013
    Publication date: May 8, 2014
    Applicants: Industry-Academic Cooperation Foundation, Yonsei University, Samsung Display Co., Ltd.
    Inventors: Min KANG, Bong-Yeon KIM, Jeong Won KIM, Hyang-Shik KONG, Jin Ho JU, Kyoung Sik KIM, Seung Hwa BAEK, Jun Hyuk WOO, Hyun Joo LEE
  • Patent number: 8691479
    Abstract: An optical mask for forming a pattern is provided. The optical mask includes: a substrate including a light blocking pattern formed on portions of the substrate, wherein the light blocking pattern includes a halftone layer and a light blocking layer formed on the halftone layer, and the halftone layer and the light blocking layer overlap such that at least an edge portion of the halftone layer is exposed. A pitch of the light blocking pattern may about 6 ?m, and a transmission ratio of the halftone layer may range from about 10% to about 50%.
    Type: Grant
    Filed: February 27, 2013
    Date of Patent: April 8, 2014
    Assignee: Samsung Display Co., Ltd.
    Inventors: Bong-Yeon Kim, Min Kang, Jeong Won Kim, Jin Ho Ju, Jun Hyuk Woo, Hyun Joo Lee
  • Publication number: 20140076847
    Abstract: A method of forming a metal pattern is disclosed. In the method, a metal layer is formed on a base substrate. A photoresist composition is coated on the metal layer to form a coating layer. The photoresist composition includes a binder resin, a photo-sensitizer, a mercaptopropionic acid compound and a solvent. The coating layer is exposed to a light. The coating layer is partially removed to form a photoresist pattern. The metal layer is patterned by using the photoresist pattern as a mask.
    Type: Application
    Filed: April 5, 2013
    Publication date: March 20, 2014
    Applicant: Samsung Display Co., Ltd.
    Inventors: Jeong-Won Kim, Min Kang, Bong-Yeon Kim, Jin-Ho Ju, Dong-Min Kim, Tae-Gyun Kim, Joo-Kyoung Park, Chul-Won Park, Jun-Hyuk Woo, Won-Young Lee, Hyun-Joo Lee, Eun Jeagal