Patents by Inventor Ichiro Kato

Ichiro Kato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for gas phase treating substrates
    Patent number: 4486461
    Abstract: Despite the short lifetime of excited plasma gas, a very large number of wafers can be uniformly gas phase treated in the plasma state by using a single high frequency power supply coil or capacitor, not only for exciting reaction gas passing near the wafers in a reaction tube but also for heating radiators, surrounding the substrates, which heat the wafers.
    Type: Grant
    Filed: March 16, 1983
    Date of Patent: December 4, 1984
    Assignee: Fujitsu Limited
    Inventors: Takashi Ito, Ichiro Kato