Patents by Inventor Il Ro LEE

Il Ro LEE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180342352
    Abstract: A capacitor includes: a substrate including a plurality of trenches and a capacitance formation portion, and a margin portion disposed around the capacitance formation portion; dielectric layers disposed on one surface of the substrate and filling the trenches; a plurality of first electrode layers each disposed on one surface of the dielectric layer and each including a first lead portion led out from the capacitance formation portion to the margin portion; and a plurality of second electrode layers each disposed on one surface of the dielectric layer to face the first electrode layer with each of the dielectric layers interposed therebetween, and each including a second lead portion led out from the capacitance formation portion to the margin portion, wherein the first and second lead portions of the plurality of first and second electrode layers are stacked in a stepped shape inclined in a direction from the margin portion to the capacitance formation portion.
    Type: Application
    Filed: November 7, 2017
    Publication date: November 29, 2018
    Inventors: No Il PARK, Byeong Cheol MOON, Il Ro LEE, Hyun Ho SHIN, Seung Mo LIM, In Young KANG
  • Publication number: 20180040422
    Abstract: A thin-film ceramic capacitor includes a body in which dielectric layers and first and second electrode layers are alternately disposed on a substrate, and first and second electrode pads disposed on external surfaces of the body. A plurality of vias are disposed in the body. Each of a plurality of first vias connects the first electrode layers and the first electrode pad to each other. Each of a plurality of second vias connects the second electrode layers and the second electrode pad to each other. A separation slit is disposed to penetrate from an upper surface of the body and extend to the substrate, and the pluralities of first and second vias are disposed symmetrically with respect to the separation slit.
    Type: Application
    Filed: June 13, 2017
    Publication date: February 8, 2018
    Inventors: Hyun Ho SHIN, Woong Do JUNG, Young Seok YOON, Dong Sik YOO, No Il PARK, Seung Mo LIM, Il Ro LEE