Abstract: A recyclable flexible package used for foods, non-foods, pharmaceuticals, and other products that would benefit from flexible packaging solutions is provided. The present invention also relates to the methods of forming recyclable flexible packaging using fewer production steps while using EB cured inks & EB laminates, among others.

Abstract: Window tiles for electron beam systems are provided. The window tiles can comprise a first surface and a second surface, and one or more features extending from the first surface to the second surface. The one or more features can have a non-uniform or tapered cross-section between the first surface and the second surface. The first surface can be configured to be exposed to vacuum conditions and can be configured to receive electrons accelerated from an electron beam generator. The second surface can be configured to allow electrons to pass through to a foil. The window tiles can improve electron beam processing systems for example by increasing electron throughput, lowering power consumption, reducing heat absorption to the foil, improving and increasing foil life, and potentially allowing for use of smaller and cheaper machines in electron beam processing.

Abstract: Methods of electron beam (EB) curing of polymeric inks are provided. Surface printed substrates with polyolefinic inks (for example, HP indigo electro inks) are used with EB cured lacquers and/or instant cure EB laminating adhesives. EB treatment of polymeric inks can achieve cross-linking in at least one portion of the polymeric inks and can improve the temperature and pressure resistant properties of the polymeric inks.

Abstract: The present application relates to methods of manufacturing a laminate comprising coating at least a portion of at least a first substrate with a last down energy-curable adhesive ink; applying at least a second substrate to the coated portion of the first substrate to form a laminate; and curing the laminate. The present application further relates to adhesive ink compositions comprising at least one acrylate monomer, at least one pigment, at least one wetting agent, and at least one dispersing agent.

Abstract: Window tiles for electron beam systems are provided. The window tiles can comprise a first surface and a second surface, and one or more features extending from the first surface to the second surface. The one or more features can have a non-uniform or tapered cross-section between the first surface and the second surface. The first surface can be configured to be exposed to vacuum conditions and can be configured to receive electrons accelerated from an electron beam generator. The second surface can be configured to allow electrons to pass through to a foil. The window tiles can improve electron beam processing systems for example by increasing electron throughput, lowering power consumption, reducing heat absorption to the foil, improving and increasing foil life, and potentially allowing for use of smaller and cheaper machines in electron beam processing.

Abstract: The present invention is directed to methods for making materials treatable by electron beam (EB) processing, such as materials for flexible packaging, comprising: providing a substrate; applying an ink formulation on at least a portion of the substrate, the ink formulation comprising ink and at least one monomer selected from acrylates, vinyl ethers, cycloaliphatic diepoxides, and polyols; and applying a lacquer on at least a portion of the ink formulation, the lacquer comprising at least one monomer selected from acrylates, vinyl ethers, cycloaliphatic diepoxides, and polyols. The processing apparatus for EB treating the material operates at a low voltage, such as 110 kVolts or below.

Abstract: The present invention is directed to materials treatable by electron beam (EB) processing, such as materials for flexible packaging. The material comprises a substrate; an ink formulation on at least a portion of the substrate, the ink formulation comprising ink and at least one monomer selected from acrylate esters, vinyl ethers, cycloaliphatic diepoxides, and polyols; and a lacquer on at least a portion of the ink formulation, the lacquer comprising at least one monomer selected from acrylate esters, vinyl ethers, cycloaliphatic diepoxides, and polyols. The processing apparatus for EB treating the material operates at a low voltage, such as 125 kVolts or less.

Abstract: The present invention is directed to materials treatable by electron beam (EB) processing, such as materials for flexible packaging. The material comprises a substrate; an ink formulation on at least a portion of the substrate, the ink formulation comprising ink and at least one monomer selected from acrylate esters, vinyl ethers, cycloaliphatic diepoxides, and polyols; and a lacquer on at least a portion of the ink formulation, the lacquer comprising at least one monomer selected from acrylate esters, vinyl ethers, cycloaliphatic diepoxides, and polyols. The processing apparatus for EB treating the material operates at a low voltage, such as 125 kVolts or less.

Abstract: The present invention is directed to a particle beam processing apparatus that is smaller in size and operates at a higher efficiency, and also directed to an application of such apparatus to treat a coating on a substrate of a treatable material, such as for flexible packaging. The processing apparatus includes a particle beam generating assembly, a foil support assembly, and a processing assembly. In the particle beam generating assembly, electrons are generated and accelerated to pass through the foil support assembly. In the flexible packaging application, the substrate is fed to the processing apparatus operating at a low voltage, such as 110 kVolts or below, and is exposed to the accelerated electrons to treat the coating on the substrate.

Abstract: The present invention is directed to a particle beam processing apparatus that is smaller in size and operates at a higher efficiency, and also directed to an application of such apparatus to treat a coating on a substrate of a treatable material, such as for flexible packaging. The processing apparatus includes a particle beam generating assembly, a foil support assembly, and a processing assembly. In the particle beam generating assembly, electrons are generated and accelerated to pass through the foil support assembly. In the flexible packaging application, the substrate is fed to the processing apparatus operating at a low voltage, such as 110 kVolts or below, and is exposed to the accelerated electrons to treat the coating on the substrate.

Abstract: Methods, and materials made by the methods, are provided herein for treating materials with a particle beam processing device. According to one illustrative embodiment, a method for treating a material with a particle beam processing device is provided that includes: providing a particle beam generating assembly including at least one filament for creating a plurality of particles; applying an operating voltage greater than about 110 kV to the filament to create the plurality of particles; causing the plurality of particles to pass through a thin foil having a thickness of about 10 microns or less; and treating a material with the plurality of particles.

Abstract: The present invention is directed to materials treatable by electron beam (EB) processing, such as materials for flexible packaging. The material comprises a substrate; an ink formulation on at least a portion of the substrate, the ink formulation comprising ink and at least one monomer selected from acrylate esters, vinyl ethers, cycloaliphatic diepoxides, and polyols; and a lacquer on at least a portion of the ink formulation, the lacquer comprising at least one monomer selected from acrylate esters, vinyl ethers, cycloaliphatic diepoxides, and polyols. The processing apparatus for EB treating the material operates at a low voltage, such as 125 kVolts or less.

Abstract: The present invention teaches a composition which provides gas, flavor, and aroma barrier to substrates, where the composition is formed by mixing an ethylenically unsaturated acid and a polyamine, wherein said polyamine optionally has a crosslinker reacted therein, and wherein said polyamine has four or more A, B, or C units, where: A is an —R2—N(R1)2 unit, B is an —R1—N(R2—)2 unit, and C is an (—R2)3N— unit, where: R1 is independently selected from hydrogen, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, and alkylaryl, and R2 is independently selected from the group consisting of: linear or branched alkylene groups or substituted alkylene groups having from 1 to 18 carbon atoms, and arylene groups or substituted arylene groups having from 6 to 18 carbon atoms. The composition is coated on a substrate then optionally treated to initiate a free radical reaction.

Abstract: Methods, and materials made by the methods, are provided herein for treating materials with a particle beam processing device. According to one illustrative embodiment, a method for treating a material with a particle beam processing device is provided that includes: providing a particle beam generating assembly including at least one filament for creating a plurality of particles; applying an operating voltage greater than about 110 kV to the filament to create the plurality of particles; causing the plurality of particles to pass through a thin foil having a thickness of about 10 microns or less; and treating a material with the plurality of particles.

Abstract: The invention is a composition made by mixing a multifunctional acrylate with an aminofunctional silane and an ethylenically unsaturated acid to form a reaction product, optionally dissolved in a solvent, characterized in that the multifunctional acrylate has a molecular weight of from about 100 to about 3000. The composition can be coated on a substrate, then optionally exposed to moisture and treated to initiate a free radical reaction. The invention can be applied to a variety of substrates used in packaging applications. The reaction mixture can further be cured by heating in the presence of moisture. The free radical reaction can be initiated by electron beam irradiation, ultraviolet radiation, gamma radiation, and/or heat and chemical free radical initiators.

Abstract: The present invention is directed to a particle beam processing apparatus that is smaller in size and operates at a higher efficiency. The processing apparatus includes a particle beam generating assembly, a foil support assembly, and a processing assembly. In the particle beam generating assembly, a cloud of particles, for example, electrons, are generated by heating at least one tungsten filament. The electrons are then extracted to travel at a high speed to the foil support assembly which is set at a much lower voltage than the particle beam generating assembly. A substrate is fed to the processing apparatus through the processing zone and is exposed to the electrons exiting the particle beam generating assembly and entering the processing zone. The electrons penetrate and cure the substrate causing a chemical reaction, such as polymerization, cross-linking, or sterilization.

Abstract: The present invention is directed to a particle beam processing apparatus that is smaller in size and operates at a higher efficiency. The processing apparatus includes a particle beam generating assembly, a foil support assembly, and a processing assembly. In the particle beam generating assembly, a cloud of particles, for example, electrons, are generated by heating at least one tungsten filament. The electrons are then extracted to travel at a high speed to the foil support assembly which is set at a much lower voltage than the particle beam generating assembly. A substrate is fed to the processing apparatus through the processing zone and is exposed to the electrons exiting the particle beam generating assembly and entering the processing zone. The electrons penetrate and cure the substrate causing a chemical reaction, such as polymerization, cross-linking, or sterilization.

Abstract: The invention is a laminate structure made by coating at least one side of a substrate with a laminating adhesive, bringing a coated side of said substrate into contact with a second substrate to form a multi-layer film, and treating said multi-layer film with a free radical initiator, wherein said laminating adhesive is the reaction product of a multifunctional acrylate, an aminofunctional silane, and an ethylenically unsaturated acid, optionally dissolved in a solvent, wherein the multifunctional acrylate has a molecular weight of from 100 to 3000.

Abstract: The present invention is directed to a particle beam processing apparatus that is smaller in size and operates at a higher efficiency, and also directed to an application of such apparatus to treat a coating on a substrate of a treatable material, such as for flexible packaging. The processing apparatus includes a particle beam generating assembly, a foil support assembly, and a processing assembly. In the particle beam generating assembly, electrons are generated and accelerated to pass through the foil support assembly. In the flexible packaging application, the substrate is fed to the processing apparatus operating at a low voltage, such as 110 kVolts or below, and is exposed to the accelerated electrons to treat the coating on the substrate.

Abstract: The present invention is directed to a particle beam processing apparatus that is smaller in size and operates at a higher efficiency. The processing apparatus includes a particle beam generating assembly, a foil support assembly, and a processing assembly. In the particle beam generating assembly, a cloud of particles, for example, electrons, are generated by heating at least one tungsten filament. The electrons are then extracted to travel at a high speed to the foil support assembly which is set at a much lower voltage than the particle beam generating assembly. A substrate is fed to the processing apparatus through the processing zone and is exposed to the electrons exiting the particle beam generating assembly and entering the processing zone. The electrons penetrate and cure the substrate causing a chemical reaction, such as polymerization, cross-linking, or sterilization.