Patents by Inventor Imtiaz Rangwalla

Imtiaz Rangwalla has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20030001108
    Abstract: The present invention is directed to a particle beam processing apparatus that is smaller in size and operates at a higher efficiency, and also directed to an application of such apparatus to treat a coating on a substrate of a treatable material, such as for flexible packaging. The processing apparatus includes a particle beam generating assembly, a foil support assembly, and a processing assembly. In the particle beam generating assembly, electrons are generated and accelerated to pass through the foil support assembly. In the flexible packaging application, the substrate is fed to the processing apparatus operating at a low voltage, such as 110 kVolts or below, and is exposed to the accelerated electrons to treat the coating on the substrate.
    Type: Application
    Filed: May 24, 2002
    Publication date: January 2, 2003
    Applicant: Energy Sciences, Inc.
    Inventors: Imtiaz Rangwalla, Harvey Clough, George Hannafin
  • Patent number: 6426507
    Abstract: The present invention is directed to a particle beam processing apparatus that is smaller in size and operates at a higher efficiency. The processing apparatus includes a particle beam generating assembly, a foil support assembly, and a processing assembly. In the particle beam generating assembly, a cloud of particles, for example, electrons, are generated by heating at least one tungsten filament. The electrons are then extracted to travel at a high speed to the foil support assembly which is set at a much lower voltage than the particle beam generating assembly. A substrate is fed to the processing apparatus through the processing zone and is exposed to the electrons exiting the particle beam generating assembly and entering the processing zone. The electrons penetrate and cure the substrate causing a chemical reaction, such as polymerization, cross-linking, or sterilization.
    Type: Grant
    Filed: November 5, 1999
    Date of Patent: July 30, 2002
    Assignee: Energy Sciences, Inc.
    Inventors: Imtiaz Rangwalla, Harvey Clough, George Hannafin
  • Patent number: 6399171
    Abstract: The invention relates to a method of laminating two substrates by coating at least one side of a substrate with a laminating adhesive, bringing a coated side of said substrate into contact with a second substrate to form a three layer film, and treating said three layer film with a free radical initiator, wherein said laminating adhesive is formed by mixing an ethylenically unsaturated acid and a polyamine.
    Type: Grant
    Filed: July 15, 1999
    Date of Patent: June 4, 2002
    Assignees: Dow Corning Corporation, EG Technology Partners, L.P., UCB Films PLC, Star House
    Inventors: Patrick J. Merlin, Daniel Futter, John E. Wyman, Imtiaz Rangwalla, Gary Power, Karen Branch
  • Patent number: 5215822
    Abstract: This invention embraces a method of controlling the impermeability of an organic polymer film to gases such as oxygen, aroma, flavor and fragrance and the like to produce gas impermeable organic polymer films by coating with a mixture of a siloxane monomer with carboxylic acid in an alcohol solvent and evaporating the solvent to complete the formation of Si--O--Si bonds; and then polymerizing and grafting the coating, preferably by electron beam radiation, to the polymer film. Improved coated polymer films and formulation products therefor are also provided.
    Type: Grant
    Filed: March 1, 1991
    Date of Patent: June 1, 1993
    Assignees: Energy Sciences, Inc., Marjorie T. Wyman
    Inventors: John E. Wyman, Imtiaz Rangwalla