Patents by Inventor In Chun HWANG

In Chun HWANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11972941
    Abstract: Proposed is a precursor composition for forming a metal film including a zirconium compound represented by any one of Chemical Formulas 1 to 3 and a hafnium compound represented by any one of Chemical Formulas 4 to 6.
    Type: Grant
    Filed: December 6, 2019
    Date of Patent: April 30, 2024
    Assignee: SK TRICHEM
    Inventors: Chang Sung Hong, Yong Joo Park, Tae Hoon Oh, In Chun Hwang, Sang Kyung Lee, Dong Hyun Kim
  • Publication number: 20240118196
    Abstract: In the case of a gas in which several gases are mixed, a type and concentration of the gas may be incorrectly measured when measured using only an optical band-pass filter. The invention of the present application is directed to providing a technology in which a plurality of broadband band-pass filters having overlapping regions are provided to calculate a magnitude of absorption for each wavelength band for light passing through each broadband band-pass filter, thereby identifying the presence of a gas of interest and the presence of a gas other than the gas of interest.
    Type: Application
    Filed: September 8, 2023
    Publication date: April 11, 2024
    Inventors: Cheol Woo NAM, Byung Yul MOON, Eung Yul KIM, Jae Hwan KIM, Chun Ho SHIN, Kwang Hun PARK, Myun Gu CHOI, Chang Hwang CHOI, Yong Geol KIM, Jae Min JEON
  • Patent number: 11941930
    Abstract: Provided is a door lock. The door lock includes a door lock body installed on a door and having an opening/closing device; a memory to store a door lock identifier including a door recognition code and a door lock ID corresponding to the door recognition code; an antenna to sequentially receive a first RF signal and a second RF signal from a reader; and a control unit configured to transmit the door recognition code to the reader and configured to determine whether the door lock ID provided from the door lock management server through the reader matches the previously assigned door lock ID of the door lock identifier to control the opening/closing device.
    Type: Grant
    Filed: August 27, 2021
    Date of Patent: March 26, 2024
    Assignee: PSDL
    Inventors: Sungwoo Chun, Deok Soo Hwang
  • Publication number: 20240084069
    Abstract: A resin matrix composition is provided in the present invention. The resin matrix composition includes an epoxy resin, a polysulfone engineering plastic, a modified polyetherimide and an amine curing agent. The modified polyetherimide is formed from a nucleophilic compound and polyetherimide. The nucleophilic compound has a nucleophile such as hydroxyl group, sulfhydryl group, carboxyl group and/or amine group. Therefore, a resin matrix with two phase separation of island phase and co-continuous phase is formed. The resin matrix can have both great flexural strength and toughness. Moreover, the resin matrix has suitable viscosity, such that it is appropriate for impregnating carbon fiber to produce prepreg and carbon fiber composites.
    Type: Application
    Filed: August 21, 2023
    Publication date: March 14, 2024
    Inventors: Yu-Cheng HSU, Tang-Chun KAO, Hsuan-Yin CHEN, Long-Tyan HWANG
  • Patent number: 11929126
    Abstract: A memory device, and a method of operating the memory device, includes a memory block in which a plurality of cell pages are coupled to each of word lines. The memory device also includes a peripheral circuit configured to adjust a time point at which a verify voltage is applied to a selected word line among the word lines according to an order of performing a program operation during a verify operation of a selected cell page. The memory device further includes a control logic circuit configured to transmit, to the peripheral circuit, an operation code for adjusting a time point at which the verify voltage is output.
    Type: Grant
    Filed: February 18, 2022
    Date of Patent: March 12, 2024
    Assignee: SK hynix Inc.
    Inventors: Sung Hyun Hwang, Jae Yeop Jung, Se Chun Park
  • Publication number: 20210327708
    Abstract: Proposed is a precursor composition for forming a metal film including a zirconium compound represented by any one of Chemical Formulas 1 to 3 and a hafnium compound represented by any one of Chemical Formulas 4 to 6.
    Type: Application
    Filed: December 6, 2019
    Publication date: October 21, 2021
    Inventors: Chang Sung HONG, Yong Joo PARK, Tae Hoon OH, In Chun HWANG, Sang Kyung LEE, Dong Hyun KIM
  • Publication number: 20210301401
    Abstract: A precursor solution for thin-film deposition including a functional solvent selected from among liquid alkene and liquid alkyne capable of dissolving a metal halide at room temperature and a metal halide dissolved in the functional solvent and existing as a liquid at room temperature, thereby solving problems caused by halogen gas generated in a chamber during a deposition process and improving the uniformity of the thickness of a thin film.
    Type: Application
    Filed: May 25, 2021
    Publication date: September 30, 2021
    Inventors: Yong Joo PARK, Han Sol OH, In Chun HWANG, Sang Ho KIM, Chang Sung HONG, Sang Kyung LEE
  • Publication number: 20200270750
    Abstract: A precursor solution for thin-film deposition including a functional solvent selected from among liquid alkene and liquid alkyne capable of dissolving a metal halide at room temperature and a metal halide dissolved in the functional solvent and existing as a liquid at room temperature, thereby solving problems caused by halogen gas generated in a chamber during a deposition process and improving the uniformity of the thickness of a thin film.
    Type: Application
    Filed: November 13, 2018
    Publication date: August 27, 2020
    Inventors: Yong Joo PARK, Han Sol OH, In Chun HWANG, Sang Ho KIM, Chang Sung HONG, Sang Kyung LEE
  • Publication number: 20100134114
    Abstract: Disclosed herein is an apparatus and method for measuring a specific soil resistance for distribution grounding by a three-electrode method. The apparatus uses three electrodes to measure a specific soil resistance as well as an earth resistance based on a three-electrode method in specific soil resistance measurement that is the most basic but likely to be overlooked in a practical distribution work.
    Type: Application
    Filed: December 3, 2008
    Publication date: June 3, 2010
    Applicant: Korea Electric Power Corporation
    Inventor: Soo Chun Hwang
  • Patent number: 7517454
    Abstract: A method includes: disposing a filter into a body of wastewater containing active sludge, the filter including a supporting member having an outlet, and a filter media enclosing the supporting member and supported by the supporting member so as to have a predetermined firm shape, the filter media including a non-woven substrate and a fibrous filtering layer attached to the non-woven substrate and having a pore diameter ranging from 0.001 to 15 ?m and a layer thickness ranging from 10 to 200 ?m, the fibrous filtering layer being made from fibers having a fiber diameter ranging from 20 to 1000 nm; and driving the wastewater to pass through the filter using a pump connected to the outlet of the supporting member of the filter.
    Type: Grant
    Filed: July 19, 2007
    Date of Patent: April 14, 2009
    Assignee: Kang Na Hsuing Enterprise Co., Ltd.
    Inventors: Yen-Jung Hu, Hsi-Yu Chen, Wen-Chun Hwang
  • Patent number: 7501060
    Abstract: A wastewater treating system includes: a vessel defining a vessel space therein, the vessel space being partitioned into an activated sludge zone that is adapted to receive waste water and a body of an activated sludge therein, and a coarse filtering zone that is disposed downstream of and that is in fluid communication with the activated sludge zone for receiving bio-treated wastewater from the activated sludge zone; and a bed of biomass carriers colonized with microorganisms and disposed in the coarse filtering zone for further bio-treating the bio-treated wastewater from the activated sludge zone and for separating coarse suspended solids from the bio-treated wastewater in the coarse filtering zone.
    Type: Grant
    Filed: March 7, 2007
    Date of Patent: March 10, 2009
    Assignee: Kang Na Hsiung Enterprise Co., Ltd.
    Inventors: Yen-Jung Hu, Hsi-Yu Chen, Wen-Chun Hwang
  • Publication number: 20080290751
    Abstract: A brushless permanent magnet motor with unequal-width slots and its manufacturing method completes a design of a regular motor with equal-width slots, employs a single-layer centralized winding, increasing the width equally on left and right sides of a first type of teeth wound with a coil until a width Wt3 of a tooth tip equals to a width Wp of a magnetic pole, such that the stator slot opening shifts towards a second type of teeth with no coil, increasing a width of a first type of teeth with a coil equally on left and right sides until a coil pitch equals to a width Wp of a magnetic pole or a motor angle equals to 180°, and decreasing a width Wt2 of a second type of teeth with no coil equally on both left and right sides until a slot area Sa2 is greater than the original slot area Sa1 of a regular motor with equal-width slots to improve the motor efficiency and reliability for a variable speed operation.
    Type: Application
    Filed: May 16, 2008
    Publication date: November 27, 2008
    Inventors: Chang-Chun Hwang, Shih-Ping Cheng, Ping-Lun Li, Wen-Yen Shen
  • Publication number: 20080157807
    Abstract: Provided is a picker for use in a handler, including at least one picker base, a row of nozzles provided to each of the picker base, and a detecting unit, provided to one side of each of the nozzle, for detecting if a packaged chip exists in a carrying hole on a user tray. The picker is capable of detecting if the packaged chip exists in a first row of the carrying holes on the user tray. And the picker is capable of placing the packaged chips into the first row of the carrying holes on the user tray and at the same time detecting if the packaged chip exists in a second row of the carrying holes on the user tray, when existence of the packaged chip is not detected on the first row of the carrying holes on the user tray.
    Type: Application
    Filed: December 21, 2007
    Publication date: July 3, 2008
    Inventors: Heung-bok KIM, Kwang-chun HWANG, Beom-ho SHIN
  • Publication number: 20080099398
    Abstract: A method includes: disposing a filter into a body of wastewater containing active sludge, the filter including a supporting member having an outlet, and a filter media enclosing the supporting member and supported by the supporting member so as to have a predetermined firm shape, the filter media including a non-woven substrate and a fibrous filtering layer attached to the non-woven substrate and having a pore diameter ranging from 0.001 to 15 ?m and a layer thickness ranging from 10 to 200 ?m, the fibrous filtering layer being made from fibers having a fiber diameter ranging from 20 to 1000 nm; and driving the wastewater to pass through the filter using a pump connected to the outlet of the supporting member of the filter.
    Type: Application
    Filed: July 19, 2007
    Publication date: May 1, 2008
    Inventors: Yen-Jung Hu, Hsi-Yu Chen, Wen-Chun Hwang
  • Publication number: 20080011677
    Abstract: A wastewater treating system includes: a vessel defining a vessel space therein, the vessel space being partitioned into an activated sludge zone that is adapted to receive waste water and a body of an activated sludge therein, and a coarse filtering zone that is disposed downstream of and that is in fluid communication with the activated sludge zone for receiving bio-treated wastewater from the activated sludge zone; and a bed of biomass carriers colonized with microorganisms and disposed in the coarse filtering zone for further bio-treating the bio-treated wastewater from the activated sludge zone and for separating coarse suspended solids from the bio-treated wastewater in the coarse filtering zone.
    Type: Application
    Filed: March 7, 2007
    Publication date: January 17, 2008
    Inventors: Yen-Jung Hu, Hsi-Yu Chen, Wen-Chun Hwang
  • Patent number: 6638841
    Abstract: A method for reducing a gate length bias is disclosed. The method utilizes an additional blanket ion implantation process to adjust the etching property of the undoped conductive layer. According to the present invention, a polysilicon layer is used to form NMOS and PMOS gate electrodes so that the gate length bias between the NMOS gate electrodes and the PMOS gate electrodes can be effectively reduced.
    Type: Grant
    Filed: April 8, 2002
    Date of Patent: October 28, 2003
    Assignee: United Microelectronics Corp.
    Inventors: Kai-Jen Ko, Yuan-Li Tsai, Ming-Hui Wu, Steven Huang, Ching-Chun Hwang
  • Patent number: 6624079
    Abstract: The method for forming high voltage device combined with a mixed mode process use an un-doped polysilicon layer instead of the conventional polysilicon layer. In the high resistance area, the ion implant is not used until the source region and the drain region are formed. A resistor is formed by etching oxide-nitride-oxide layer and performing ion implant process by using BF2 radical to the un-doped polysilicon layer to control the resistance. Then multitudes of contact are formed, wherein the high dosage of BF2 implant would reduce resistance between contacts and resistor.
    Type: Grant
    Filed: August 20, 2001
    Date of Patent: September 23, 2003
    Assignee: United Microelectronics Corp.
    Inventors: Yuan-Li Tsai, Marcus Yang, Ralph Chen, Heng-Chun Kao, Ching-Chun Hwang
  • Publication number: 20030036276
    Abstract: A method for forming a high resistance resistor with an integrated high voltage device process is disclosed. First and second field oxide areas are formed on a substrate and an undoped first polysilicon layer is deposited. A first photoresist layer having a resistor pattern is formed on the first field oxide area and a first ion implant process is performed with the first photoresist layer as a mask which is then removed and an oxide nitride oxide (ONO) layer is formed on the first polysilicon layer. The ONO layer and the first polysilicon layer are etched to form a resistor on the first field oxide area and a first electrode of a capacitor on the second field oxide area. A second polysilicon layer is formed on the capacitor ONO layer as a second electrode of the capacitor. A second photoresist layer is formed on the substrate, the resistor and the capacitor and has an opening pattern to expose the resistor. The ONO layer is removed from the resistor.
    Type: Application
    Filed: August 20, 2001
    Publication date: February 20, 2003
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Yuan-Li Tsai, Marcus Yang, Ralph Chen, Heng-Chun Kao, Ching-Chun Hwang
  • Patent number: 6410377
    Abstract: The present invention provides a method for integrating the fabrication of a sensor and a high voltage devices. The N conductive type sensor has a P conductive type doped region in the substrate of the sensor active region to effectively reduce the leakage at edges of the field oxide. Furthermore, there are the P conductive type field and the P conductive type well used as isolations for the sensor and these isolations can prevent blooming. Between these isolations, high voltage devices can be simultaneously formed thereon.
    Type: Grant
    Filed: November 6, 2000
    Date of Patent: June 25, 2002
    Inventors: Ching-Chun Hwang, Sheng-Hsiung Yang
  • Patent number: 6268266
    Abstract: A method for forming enhanced field oxide (FOX) region of low voltage devices in a high voltage process is disclosed. The method includes providing a semiconductor structure comprising a substrate, two field oxide regions on the substrate, a well between the two field oxide regions in the substrate and a silicon nitride layer between the two field oxide regions above the well. As a key step, nitrogen is implanted into the semiconductor structure, and the silicon nitride layer is then removed. Then, a gate oxide layer on the well and silicon oxynitride layer on the field oxide regions are all formed in-situ.
    Type: Grant
    Filed: October 22, 1999
    Date of Patent: July 31, 2001
    Assignee: United Microelectronics Corp.
    Inventors: Ching-Chun Hwang, Fei-Hung Chen, Meng-Jin Tsai, Wei-Chung Chen