Patents by Inventor IN YEAL LEE

IN YEAL LEE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140031364
    Abstract: Disclosed are a phenyl-isoxazol derivative compound, which is useful as a treatment material for virus infection, especially, infection of an influenza virus, or its pharmaceutically acceptable derivative, a preparation method thereof, and an illness treatment pharmaceutical composition including the compound as an active ingredient.
    Type: Application
    Filed: March 30, 2012
    Publication date: January 30, 2014
    Applicant: IL-YANG PHARM. CO., LTD.
    Inventors: Dong Yeon Kim, Dae Jin Cho, Gong Yeal Lee, Hong Youb Kim, Seok Hun Woo, Hae Un Lee, Sung Moo Kim, Choong Am Ahn, Seung Bin Yoon
  • Publication number: 20130093093
    Abstract: A semiconductor device includes a substrate having a plurality of contact surfaces, an interlayer dielectric layer formed over the substrate and having a first open portion which exposes a part of the contact surfaces and a second open portion which exposes the other contact surfaces, a storage node contact (SNC) plug filling the first open portion, and a damascene structure filing the second open portion and including a bit line, a spacer formed on both sidewalls of the bit line, a capping layer formed over the bit line and the spacer, and an air gap formed between the bit line and the spacer. The bit line includes a conductive material of which the volume is contracted by a heat treatment to form the air gap.
    Type: Application
    Filed: December 28, 2011
    Publication date: April 18, 2013
    Inventor: Nam-Yeal LEE
  • Patent number: 8314021
    Abstract: A method for fabricating a semiconductor device includes: forming a thin film over trenches by using a first source gas and a first reaction gas; performing a first post-treatment on the thin film by using a second reaction gas; and performing a second post-treatment on the thin film by using a second source gas.
    Type: Grant
    Filed: November 3, 2010
    Date of Patent: November 20, 2012
    Assignee: Hynix Semiconductor Inc.
    Inventors: Jik-Ho Cho, Seung-Jin Yeom, Seung-Hee Hong, Nam-Yeal Lee
  • Patent number: 8278218
    Abstract: An electrical conductor having a multilayer diffusion barrier of use in a resultant semiconductor device is presented. The electrical conductor line includes an insulation layer, a diffusion barrier, and a metal line. The insulation layer is formed on a semiconductor substrate and having a metal line forming region. The diffusion barrier is formed on a surface of the metal line forming region of the insulation layer and has a multi-layered structure made of TaN layer, an MoxOy layer and an Mo layer. The metal line is formed on the diffusion barrier to fill the metal line forming region of the insulation layer.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: October 2, 2012
    Assignee: Hynix Semiconductor Inc.
    Inventors: Joon Seok Oh, Seung Jin Yeom, Baek Mann Kim, Dong Ha Jung, Jeong Tae Kim, Nam Yeal Lee, Jae Hong Kim
  • Publication number: 20120165224
    Abstract: Disclosed herein is a cell chip including: an upper substrate having a plurality of biometrics spaced therefrom by fillers, the biometrics fixing a biomaterial thereinto; a first hydrophobic coating layer formed on the upper substrate; and a lower substrate combined with the upper substrate and having a plurality of wells formed therein, the well storing fluid provided to the biometrics therein. The cell chip includes two substrates functionally separated from each other to implement a three dimensional cell chip, solves a cross contamination problem, and provides a similar environment to a bio environment, thereby making it possible to increase the accuracy of a test.
    Type: Application
    Filed: December 22, 2011
    Publication date: June 28, 2012
    Inventors: Suk Ho SONG, Bo Sung Ku, Se Hoon Jeong, Moo Yeal Lee, Dong Woo Lee
  • Publication number: 20120088489
    Abstract: Provided is an apparatus and method for controlling a portable terminal. The apparatus includes a contact sensing unit which senses an area of an external surface of the portable terminal contacted by a user as the user holds the portable terminal, a recognizing unit which recognizes a function mode of the portable terminal based on information about the contacted area sensed by the contact sensing unit, and a control unit which changes the portable terminal to a function mode recognized by the recognizing unit. Since a function mode of the portable terminal is controlled according to the way a user holds the portable terminal, convenience of changing a function mode of the portable terminal is provided through a single manipulation.
    Type: Application
    Filed: December 15, 2011
    Publication date: April 12, 2012
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Jung-hyun SHIM, Kee-eung KIM, Hyun-jin KIM, Joon-ah PARK, Ho-yeal LEE, Hyun-jeon LEE, Wook CHANG, Seung-nyang CHUNG, Sung-jung CHO
  • Publication number: 20120088693
    Abstract: Disclosed herein is a microarray cell chip. The microarray cell chip includes an upper substrate that has biomatrices encapsulating biomaterials formed on one surface thereof and through holes penetrating from one surface to the other surface thereof and a lower substrate that is coupled with the upper substrate and is provided with wells storing reagents supplied to the biomatrices. The microarray cell chip according to the present invention can smoothly transfer the culture media and the reagents to the biomaterials embedded in the biomatrices through the diffusion and simply separate the upper substrate from the lower substrate, thereby improving the easiness of washing. Therefore, the present invention provides an environment similar to the bio environment, thereby making it possible to increase accuracy of an experiment.
    Type: Application
    Filed: September 9, 2011
    Publication date: April 12, 2012
    Inventors: Moo-Yeal Lee, Dong Woo Lee, Se Hoon Jeong, Jeong Suong Yang, Bo Sung Ku
  • Patent number: 8103263
    Abstract: Provided is an apparatus and method for controlling a portable terminal. The apparatus includes a contact sensing unit which senses an area of an external surface of the portable terminal contacted by a user as the user holds the portable terminal, a recognizing unit which recognizes a function mode of the portable terminal based on information about the contacted area sensed by the contact sensing unit, and a control unit which changes the portable terminal to a function mode recognized by the recognizing unit. Since a function mode of the portable terminal is controlled according to the way a user holds the portable terminal, convenience of changing a function mode of the portable terminal is provided through a single manipulation.
    Type: Grant
    Filed: November 8, 2005
    Date of Patent: January 24, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung-hyun Shim, Kee-eung Kim, Hyun-jin Kim, Joon-ah Park, Ho-yeal Lee, Hyun-jeong Lee, Wook Chang, Seung-nyang Chung, Sung-jung Cho
  • Publication number: 20120015516
    Abstract: An electrical conductor having a multilayer diffusion barrier of use in a resultant semiconductor device is presented. The electrical conductor line includes an insulation layer, a diffusion barrier, and a metal line. The insulation layer is formed on a semiconductor substrate and having a metal line forming region. The diffusion barrier is formed on a surface of the metal line forming region of the insulation layer and has a multi-layered structure made of TaN layer, an MoxOy layer and an Mo layer. The metal line is formed on the diffusion barrier to fill the metal line forming region of the insulation layer.
    Type: Application
    Filed: September 23, 2011
    Publication date: January 19, 2012
    Applicant: HYNIX SEMICONDUCTOR INC.
    Inventors: Joon Seok OH, Seung Jin YEOM, Baek Man KIM, Dong Ha JUNG, Jeong Tae KIM, Nam Yeal LEE, Jae Hong KIM
  • Patent number: 8080472
    Abstract: A metal line having a MoxSiy/Mo diffusion barrier of a semiconductor device and corresponding methods of fabricating the same are presented. The metal line includes an insulation layer, a diffusion barrier, and a metal layer. The insulation layer is formed on a semiconductor substrate and has a metal line forming region. The diffusion barrier is formed on a surface of the metal line forming region of the insulation layer and has a stack structure composed of a MoxSiy layer and a Mo layer. The metal layer is formed on the diffusion barrier which fills in the metal line forming region of the insulation layer.
    Type: Grant
    Filed: May 27, 2009
    Date of Patent: December 20, 2011
    Assignee: Hynix Semiconductor Inc.
    Inventors: Joon Seok Oh, Seung Jin Yeom, Baek Mann Kim, Dong Ha Jung, Nam Yeal Lee, Jae Hong Kim
  • Patent number: 8071396
    Abstract: An embedded memory required for a high performance, multifunction SOC, and a method of fabricating the same are provided. The memory includes a bipolar transistor, a phase-change memory device and a MOS transistor, adjacent and electrically connected, on a substrate. The bipolar transistor includes a base composed of SiGe disposed on a collector. The phase-change memory device has a phase-change material layer which is changed from an amorphous state to a crystalline state by a current, and a heating layer composed of SiGe that contacts the lower surface of the phase-change material layer.
    Type: Grant
    Filed: November 9, 2010
    Date of Patent: December 6, 2011
    Assignee: Electronics and Telecommunications Research Institute
    Inventors: Seung-Yun Lee, Sangouk Ryu, Sung Min Yoon, Young Sam Park, Kyu-Jeong Choi, Nam-Yeal Lee, Byoung-Gon Yu
  • Patent number: 8053895
    Abstract: A metal line of a semiconductor device includes an insulation layer formed on a semiconductor substrate. The insulation layer has a metal line forming region. A diffusion barrier is formed on a surface of the metal line forming region of the insulation layer. The diffusion barrier includes a multi-layered structure that includes an MoB2 layer, an MoxByNz layer and an Mo layer. A metal layer is formed on the diffusion barrier to fill the metal line forming region of the insulation layer.
    Type: Grant
    Filed: June 17, 2009
    Date of Patent: November 8, 2011
    Assignee: Hynix Semiconductor Inc.
    Inventors: Dong Ha Jung, Seung Jin Yeom, Baek Mann Kim, Nam Yeal Lee
  • Publication number: 20110244673
    Abstract: A method for fabricating a semiconductor device includes: forming a thin film over trenches by using a first source gas and a first reaction gas; performing a first post-treatment on the thin film by using a second reaction gas; and performing a second post-treatment on the thin film by using a second source gas.
    Type: Application
    Filed: November 3, 2010
    Publication date: October 6, 2011
    Inventors: Jik-Ho CHO, Seung-jin Yeom, Seung-Hee Hong, Nam-Yeal Lee
  • Patent number: 8008708
    Abstract: An insulation layer is formed on a semiconductor substrate so as to define a metal line forming region. A diffusion barrier having a multi-layered structure of an Mox1Si1-x1 layer, an Mox2Siy2Nz2 layer, and an Moy3N1-y3 layer is formed on a surface of the metal line forming region. A metal layer is formed on the diffusion barrier so as to fill the metal line forming region of the insulation layer.
    Type: Grant
    Filed: June 17, 2009
    Date of Patent: August 30, 2011
    Assignee: Hynix Semiconductor Inc.
    Inventors: Nam Yeal Lee, Seung Jin Yeom, Baek Mann Kim, Dong Ha Jung, Joon Seok Oh
  • Publication number: 20110190162
    Abstract: The invention is directed to a three-dimensional cell culture array comprising spatially-separated matrices attached to a solid support, wherein a plurality of said matrices encapsulate cells transfected with nucleic acids, method for the preparation of the array and methods reducing the expression of a target gene.
    Type: Application
    Filed: November 12, 2010
    Publication date: August 4, 2011
    Inventors: Moo-Yeal Lee, Seok Joon Kwon, Jonathan S. Dordick, Douglas S. Clark, Jessica R. McKinley
  • Patent number: 7977674
    Abstract: A phase change memory device and a method of fabricating the same are provided. A phase change material layer of the phase change memory device is formed of germanium (Ge)-antimony (Sb)-Tellurium (Te)-based Ge2Sb2+xTe5 (0.12?x?0.32), so that the crystalline state is determined as a stable single phase, not a mixed phase of a metastable phase and a stable phase, in phase transition between crystalline and amorphous states of a phase change material, and the phase transition according to increasing temperature directly transitions to the single stable phase from the amorphous state. As a result, set operation stability and distribution characteristics of set state resistances of the phase change memory device can be significantly enhanced, and an amorphous resistance can be maintained for a long time at a high temperature, i.e., around crystallization temperature, and thus reset operation stability and rewrite operation stability of the phase change memory device can be significantly enhanced.
    Type: Grant
    Filed: September 29, 2008
    Date of Patent: July 12, 2011
    Assignee: Electronics and Telecommunications Research Institute
    Inventors: Sung Min Yoon, Byoung Gon Yu, Seung Yun Lee, Young Sam Park, Kyu Jeong Choi, Nam Yeal Lee
  • Patent number: 7920413
    Abstract: Provided are an apparatus and method for writing data to a phase-change random access memory (PRAM) by using writing power calculation and data inversion functions, and more particularly, an apparatus and method for writing data which can minimize power consumption by calculating the power consumed while input original data or inverted data is written to a PRAM and storing the data consuming less power. A PRAM consumes a significant amount of power in order to store data in a memory cell since a large electric current is required to flow for a long period of time.
    Type: Grant
    Filed: February 29, 2008
    Date of Patent: April 5, 2011
    Assignees: Electronics & Telecommunications Research Institute, Cungbuk Nat'l Univ. Industry Academic Cooperation Foundation
    Inventors: Byoung-Gon Yu, Byung-Do Yang, Seung-Yun Lee, Sung-Min Yoon, Young Sam Park, Nam Yeal Lee
  • Publication number: 20110065246
    Abstract: An embedded memory required for a high performance, multifunction SOC, and a method of fabricating the same are provided. The memory includes a bipolar transistor, a phase-change memory device and a MOS transistor, adjacent and electrically connected, on a substrate. The bipolar transistor includes a base composed of SiGe disposed on a collector. The phase-change memory device has a phase-change material layer which is changed from an amorphous state to a crystalline state by a current, and a heating layer composed of SiGe that contacts the lower surface of the phase-change material layer.
    Type: Application
    Filed: November 9, 2010
    Publication date: March 17, 2011
    Applicant: Electronics and Telecommunications Research Institute
    Inventors: Seung-Yun LEE, Sang ouk RYU, Sung Min YOON, Young Sam PARK, Kyu-Jeong CHOI, Nam-Yeal LEE, Byoung-Gon YU
  • Patent number: 7875978
    Abstract: A metal line having a multi-layered diffusion layer in a resultant semiconductor device is presented along with corresponding methods of forming the same. The metal line includes an insulation layer, a multi-layered diffusion barrier, and a metal layer. The insulation layer is formed on a semiconductor substrate and has a metal line forming region. The multi-layered diffusion barrier is formed on a surface of the metal line forming region defined in the insulation layer. The diffusion barrier includes a VB2 layer, a CrV layer and a Cr layer. The metal layer is formed on the diffusion barrier which substantially fills in the metal line forming region of the insulation layer to eventually form the metal line.
    Type: Grant
    Filed: June 16, 2009
    Date of Patent: January 25, 2011
    Assignee: Hynix Semiconductor Inc.
    Inventors: Dong Ha Jung, Seung Jin Yeom, Baek Mann Kim, Joon Seok Oh, Nam Yeal Lee
  • Patent number: 7855421
    Abstract: An embedded memory required for a high performance, multifunction SOC, and a method of fabricating the same are provided. The memory includes a bipolar transistor, a phase-change memory device and a MOS transistor, adjacent and electrically connected, on a substrate. The bipolar transistor includes a base composed of SiGe disposed on a collector. The phase-change memory device has a phase-change material layer which is changed from an amorphous state to a crystalline state by a current, and a heating layer composed of SiGe that contacts the lower surface of the phase-change material layer.
    Type: Grant
    Filed: December 4, 2006
    Date of Patent: December 21, 2010
    Assignee: Electronics and Telecommunications Research Institute
    Inventors: Seung-Yun Lee, Sangouk Ryu, Sung Min Yoon, Young Sam Park, Kyu-Jeong Choi, Nam-Yeal Lee, Byoung-Gon Yu