Abstract: A method for manufacturing an optical device with a defined total device stress, birefringence and optical polarization dependence is disclosed. The method comprises first providing a tower cladding layer of an amorphous material with a first refractive index and then providing above the lower cladding layer an upper cladding layer of an amorphous material with a second refractive index. An optical waveguide core comprising an amorphous material having a third refractive index (larger than the first refractive index and the second refractive index) is provided between the lower and the upper cladding layers. The upper cladding layer is thermally annealed by keeping the upper cladding layer at a first temperature, then raising the temperature to a second temperature, maintaining the second temperature for an annealing time period, and lowering the temperature to a third temperature, after which the temperature is lowered to a fourth temperature.

Abstract: A ferromagnetic pinned layer (1) kept at a fixed magnetic orientation by a pinning layer (4) is separated from a ferromagnetic free layer (3) by a Mott insulator coupling layer (2). A controllable voltage source (5) is connected between the pinned layer (1) and the free layer (3). A sublayer of the coupling layer (2) whose width (d) increases with the voltage is converted to an electrically conducting and magnetically coupling metallic state. The magnetic exchange field acting on the free layer (3) which is controlled by the applied voltage via the width (d) of the electrically conducting sublayer of the coupling layer (2) can be used to switch the free layer (3) between states of parallel and antiparallel orientations with respect to the magnetic orientation of the pinned layer (1). This is used in memory cells and in a write head.

Abstract: A method for manufacturing an optical device with a defined total device stress and a there-from resulting defined birefringence and a therefrom resulting defined optical polarization dependence is disclosed. The method comprises a first step of providing a lower cladding layer of an amorphous material, preferably based on SiO2, that may be doped with elements like Boron and/or Phosphorous with a first refractive index and a second step of providing above the lower cladding layer an upper cladding layer of an amorphous material, preferably based on SiO2, that may be doped with elements like Boron and/or Phosphorous with a second refractive index, and being manufactured from a material which is tunable in its stress.

Abstract: A method for manufacturing an optical device with a defined total device stress and a therefrom resulting defined birefringence and a therefrom resulting defined optical polarization dependence is disclosed. In a preferred embodiment, a lower cladding layer of an amorphous material with a first refractive index is provided and above that an upper cladding layer of an amorphous material with a second refractive index, which latter is manufactured from a material which is tunable in its stress. Between the lower and upper cladding layer an optical waveguide core is manufactured comprising an amorphous material having a third refractive index which is larger than the first and second refractive index. The optical waveguide core is thermally annealed, after which it has a defined waveguide core stress. The upper cladding layer is manufactured to have a cladding layer stress that together with the waveguide core stress results in the total device stress.