Abstract: Disclosed is a process stop loss reduction system, in which in case that pressure in a trapping apparatus and pressure in a process chamber are increased because of space clogging or the like caused by reaction by-products while the trapping apparatus for trapping of a reaction by-product contained in exhaust gas discharged from the process chamber operates over a long period of time during a semiconductor process, only the trapping apparatus, in which an exhaust gas supply flow path is blocked, may be quickly replaced while inert gas, instead of the exhaust gas, is received in an idle state and continuously supplied to the vacuum pump through a bypass pipe without stopping an operation of (shutting down) a semiconductor manufacturing process chamber facility, and then the trapping apparatus may be supplied with the exhaust gas again as the flow path is changed.

Abstract: The present disclosure relates to an apparatus for trapping a reaction by-product created by an etching process, the apparatus being configured to trap a reaction by-product contained in an unreacted gas discharged after a process is performed in an etching process chamber during a semiconductor manufacturing process, trap and stack the reaction by-product in the form of powder at a position between a vacuum pump and a scrubber through multiple flow path switching structures, multiple trapping structures, and multiple stacking structures, and discharge only a gaseous unreacted gas to the scrubber.

Abstract: Disclosed is a process stop loss reduction system, in which in case that pressure in a trapping apparatus and pressure in a process chamber are increased because of space clogging or the like caused by reaction by-products while the trapping apparatus for trapping of a reaction by-product contained in exhaust gas discharged from the process chamber operates over a long period of time during a semiconductor process, only the trapping apparatus, in which an exhaust gas supply flow path is blocked, may be quickly replaced while inert gas, instead of the exhaust gas, is received in an idle state and continuously supplied to the vacuum pump through a bypass pipe without stopping an operation of (shutting down) a semiconductor manufacturing process chamber facility, and then the trapping apparatus may be supplied with the exhaust gas again as the flow path is changed.

Abstract: Disclosed is a process stop loss reduction system, in which in case that pressure in a trapping apparatus and pressure in a process chamber are increased because of space clogging or the like caused by reaction by-products while the trapping apparatus for trapping of a reaction by-product contained in exhaust gas discharged from the process chamber operates over a long period of time during a semiconductor process, only the trapping apparatus, to which a supply of exhaust gas is cut off, may be quickly replaced while inert gas is received in an idle state and continuously supplied to a vacuum pump through a bypass pipe of the trapping apparatus without stopping an operation of (shutting down) a semiconductor manufacturing process chamber facility, and then the trapping apparatus may be supplied with the exhaust gas again.

Abstract: The present disclosure relates to an apparatus for trapping of a reaction by-product capable of expanding the area for collection by inducing a gas flow, in which an internal trapping tower of the apparatus for trapping of a reaction by-product, which traps a reaction by-product contained in gas discharged from a process chamber during a semiconductor manufacturing process, is divided into multiple stages, the introduced gas is guided to a lower side of an inner region of an intermediate trapping unit provided as a space portion and discharged to an outer region while a trapping reaction occurs according to the reaction by-product trapping amount during a former part of a use duration time.

Abstract: The present disclosure relates to an apparatus for trapping of a reaction by-product capable of expanding the area for collection by inducing a gas flow, in which an internal trapping tower of the apparatus for trapping of a reaction by-product, which traps a reaction by-product contained in gas discharged from a process chamber during a semiconductor manufacturing process, is divided into multiple stages, the introduced gas is guided to a lower side of an inner region of an intermediate trapping unit provided as a space portion and discharged to an outer region while a trapping reaction occurs according to the reaction by-product trapping amount during a former part of a use duration time.

Abstract: The present disclosure provides an apparatus for trapping of a reaction by-product having a self regenerating function for a used inner collecting tower, and an object of the present disclosure is to provide the reaction by-product trapping apparatus configured such that the trapping apparatus positioned between a process chamber and a vacuum pump or between the vacuum pump and a scrubber stops operating during a semiconductor manufacturing process when a trapping reaction of trapping a reaction by-product reaches a saturated state during a trapping operation, and the trapping apparatus removes the reaction by-product produced in an inner collecting tower through a heating reaction, such that the inner collecting tower is regenerated to enable an additional trapping reaction to be performed.

Abstract: The present disclosure relates to an apparatus for trapping a reaction by-product created by an etching process, the apparatus being configured to trap a reaction by-product contained in an unreacted gas discharged after a process is performed in an etching process chamber during a semiconductor manufacturing process, trap and stack the reaction by-product in the form of powder at a position between a vacuum pump and a scrubber through multiple flow path switching structures, multiple trapping structures, and multiple stacking structures, and discharge only a gaseous unreacted gas to the scrubber.

Abstract: A stain compensating apparatus includes a camera, an input signal processing part, an edge compensating part and a stain compensating value generating part. The camera captures a display image from the display panel. The input signal processing part generates a luminance profile based on the display image captured by the camera. The edge compensating part compensates the luminance profile of a curved portion of the display panel. The stain compensating value generating part generates a stain compensating value for a pixel of the display panel using the compensated luminance profile.

Abstract: An interposer includes a substrate having a mounting area and a test area, first conductive plugs separate from each other, the first conductive plugs being disposed along a first direction and into the test area of the substrate, a first line pattern group including first non-conductive patterns disposed on first centers of the first conductive plugs, and first conductive patterns disposed to bridge first peripheries of a first adjacent pair of the first conductive plugs, and first pads connected to the first conductive patterns at both first ends of the first line pattern group.

Abstract: A wafer cutting apparatus includes a stage to support a wafer, a cutter, and a sensor. The cutter irradiates the wafer with a beam in a first direction to cut the wafer. The sensor is spaced apart from the cutter in a second direction different from the first direction, and measures a spaced distance between the wafer and the cutter. The sensor measures the spaced distance between the wafer and the cutter along a second cutting line parallel to a first cutting line while the cutter cuts the wafer along the first cutting line on the wafer.

Abstract: A display device includes a display panel that includes a pixel, a current sensor that measures a driving current provided to the display panel, and a timing controller that calculates a reference driving current and a degradation ratio of the pixel based on first image data provided to the display panel and compensates second image data based on the driving current, the reference driving current, and the degradation ratio of the pixel.

Abstract: An electronic apparatus, an image compression method thereof, and a non-transitory computer readable medium are provided. The electronic apparatus includes an image inputter configured to receive image data, a memory configured to store data, and a processor configured to convert a pixel value of a frame constituting the image data received by the image inputter to a first data value using a preset algorithm, to determine offset for reducing the number of bits of the first data value based on a range of the converted first data value, to add the determined offset to the first data value to generate a second data value, and to store compressed data formed by compressing the generated second data value in the memory, wherein a header of the compressed data includes information on the number of bits of the second data value and the determined offset.

Abstract: A luminance correction system includes an image pickup device configured to pick up a test image and generate pickup data, a parameter calculation device configured to calculate a first target luminance that is a maximum luminance of a reference area in a display panel and a detected maximum luminance that is a luminance of a correction target sub-pixel based on the pickup data with respect to a maximum grayscale, determine a second target luminance by correcting the first target luminance, and calculate correction parameters, and a display device including the display panel, the display device configured to compensate the input grayscale of the correction target sub-pixel to a target grayscale based on the correction parameters and generate a data voltage by adjusting upward a gamma voltage corresponding to the target grayscale.

Abstract: An interposer includes a substrate having a mounting area and a test area, first conductive plugs separate from each other, the first conductive plugs being disposed along a first direction and into the test area of the substrate, a first line pattern group including first non-conductive patterns disposed on first centers of the first conductive plugs, and first conductive patterns disposed to bridge first peripheries of a first adjacent pair of the first conductive plugs, and first pads connected to the first conductive patterns at both first ends of the first line pattern group.

Abstract: An optical compensation method for a display device including a pixel is provided. The method includes: providing test data having a first grayscale value to the display device; measuring a luminance of the pixel which emits light based on the test data; and calculating a compensation grayscale value based on a second target luminance and the measured luminance of the pixel. The second target luminance is lower than a first target luminance which is set based on the first grayscale value.

Abstract: A luminance correction system includes: a display device that displays an image of a first grayscale value; an image capturing device that generates a first image and a second image by capturing the displayed image; and an image separator that generates a first high-frequency image by extracting a high-frequency image from the first image, and generates a second low-frequency image by extracting a low-frequency image from the second image, wherein the display device includes: an image corrector that generates a corrected image data by analyzing the first high-frequency image and the second low-frequency image to provide an analyzation result and by correcting an image data with respect to the displayed image in accordance with the analyzation result to generate the corrected image data; and a display unit including a plurality of pixels that emit light with luminance corresponding to the corrected image data.

Abstract: A stain compensating apparatus includes a camera, an input signal processing part, an edge compensating part and a stain compensating value generating part. The camera captures a display image from the display panel. The input signal processing part generates a luminance profile based on the display image captured by the camera. The edge compensating part compensates the luminance profile of a curved portion of the display panel. The stain compensating value generating part generates a stain compensating value for a pixel of the display panel using the compensated luminance profile.

Abstract: A stain compensating apparatus includes a camera, an input signal processing part, an edge compensating part and a stain compensating value generating part. The camera captures a display image from the display panel. The input signal processing part generates a luminance profile based on the display image captured by the camera. The edge compensating part compensates the luminance profile of a curved portion of the display panel. The stain compensating value generating part generates a stain compensating value for a pixel of the display panel using the compensated luminance profile.

Abstract: A method for driving an organic light emitting display device includes measuring a characteristic of a panel and storing a measured loading correction value in a first look-up table. The measured loading correction value includes loading information of pixels that correspond to predetermined gray scale values based on the characteristic of the panel The method further includes storing gamma values of the pixels corresponding to the characteristic of the panel in a second lookup table, and obtaining a calculated loading correction value based on pre-stored equations, the first lookup table, and the second lookup table. The calculated loading correction value includes loading information corresponding to gray scale values different from the predetermined gray scale values.