Patents by Inventor Isamu Kaneko

Isamu Kaneko has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8353505
    Abstract: An apparatus for making a booklet-like product comprises a paper feeding part; a superposing part for superposing a plurality of continuous webs of paper fed to travel from the paper feeding part, whereby a layered continuous sheet of paper is prepared; a cutting part for cutting the layered continuous sheet into successive separate layered sheets of paper; a conveyance passage; and a stacking and ejection part for causing the separate layered sheets traveling along the conveyance passage to be piled every predetermined number thereof and to be ejected in the form of piles of sheets, each to form the booklet-like product. The superposing part is provided with a paste nozzle for applying paste to one of two adjacent such continuous webs of paper on its one side and a further paste nozzle for applying paste to the upper surface of the layered continuous sheet.
    Type: Grant
    Filed: November 23, 2010
    Date of Patent: January 15, 2013
    Assignee: Miyakoshi Printing Machinery Co., Ltd.
    Inventors: Isamu Kaneko, Hiroshi Yasuzawa, Tetsu Ohno, Kou Kusume
  • Patent number: 8097383
    Abstract: To provide a polymer electrolyte material for polymer electrolyte fuel cells, which is an electrolyte material having a high ion exchange capacity and a low resistance, and which has a higher softening temperature than a conventional electrolyte material.
    Type: Grant
    Filed: January 28, 2008
    Date of Patent: January 17, 2012
    Assignee: Asahi Glass Company, Limited
    Inventors: Isamu Kaneko, Tetsuji Shimohira, Atsushi Watakabe, Seigo Kotera, Satoru Hommura, Koichi Murata, Jyunichi Tayanagi, Susumu Saito
  • Publication number: 20110129319
    Abstract: An apparatus for making a booklet-like product comprises a paper feeding part; a superposing part for superposing a plurality of continuous webs of paper fed to travel from the paper feeding part, whereby a layered continuous sheet of paper is prepared; a cutting part for cutting the layered continuous sheet into successive separate layered sheets of paper; a conveyance passage; and a stacking and ejection part for causing the separate layered sheets traveling along the conveyance passage to be piled every predetermined number thereof and to be ejected in the form of piles of sheets, each to form the booklet-like product. The superposing part is provided with a paste nozzle for applying paste to one of two adjacent such continuous webs of paper on its one side and a further paste nozzle for applying paste to the upper surface of the layered continuous sheet.
    Type: Application
    Filed: November 23, 2010
    Publication date: June 2, 2011
    Applicant: MIYAKOSHI PRINTING MACHINERY CO., LTD.
    Inventors: Isamu Kaneko, Hiroshi Yasuzawa, Tetsu Ohno, Kou Kusume
  • Patent number: 7667083
    Abstract: A compound containing two fluorosulfonyl groups which are groups convertible to sulfonic acid groups, an intermediate therefor, and methods for their production with high productivity, are provided. Also provided are a fluorosulfonyl group-containing polymer obtained by polymerizing such a compound, and a sulfonic acid group-containing polymer obtained from such a polymer. A method for producing a compound of the following formula (m0), such a compound, a fluorosulfonyl group-containing polymer obtained by polymerizing such a compound, and a sulfonic acid group-containing polymer obtained from such a polymer, provided that RF01 is a single bond or a C1-6 bivalent perfluoro organic group, RF02 is a C1-6 bivalent perfluoro organic group, and n is 0 or 1.
    Type: Grant
    Filed: March 25, 2009
    Date of Patent: February 23, 2010
    Assignee: Asahi Glass Company, Limited
    Inventors: Isamu Kaneko, Atsushi Watakabe, Jyunichi Tayanagi, Susumu Saito
  • Publication number: 20090221845
    Abstract: To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength region, and a resist composition comprising the fluoropolymer. A fluoropolymer (A) having monomer units formed by polymerization of a fluorinated diene represented by the following formula (1): CF2?CFCH2CH-Q-CH2CH?CH2??(1) wherein Q is (CH2)aC(CF3)2OR4 (wherein a is an integer of from 0 to 3, R4 is an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms which may have an etheric oxygen atom, an alkoxycarbonyl group having at most 6 carbon atoms, or CH2R5 (wherein R5 is an alkoxycarbonyl group having at most 6 carbon atoms)), or (CH2)dCOOR6 (wherein d is 0 or 1, and R6 is a hydrogen atom, or an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms), a process for its production and a resist composition having the fluoropolymer (A) as a base.
    Type: Application
    Filed: April 17, 2009
    Publication date: September 3, 2009
    Applicant: Asahi Glass Company, Limited
    Inventors: Yoko Takebe, Isamu Kaneko
  • Publication number: 20090187044
    Abstract: A compound containing two fluorosulfonyl groups which are groups convertible to sulfonic acid groups, an intermediate therefor, and methods for their production with high productivity, are provided. Also provided are a fluorosulfonyl group-containing polymer obtained by polymerizing such a compound, and a sulfonic acid group-containing polymer obtained from such a polymer.
    Type: Application
    Filed: March 25, 2009
    Publication date: July 23, 2009
    Applicant: Asahi Glass Company, Limited
    Inventors: Isamu Kaneko, Atsushi Watakabe, Jyunichi Tayanagi, Susumu Saito
  • Patent number: 7550545
    Abstract: To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength region, and a resist composition comprising the fluoropolymer. A fluoropolymer (A) having monomer units formed by polymerization of a fluorinated diene represented by the following formula (1): CF2?CFCH2CH-Q-CH2CH?CH2??(1) wherein Q is (CH2)aC(CF3)2OR4 (wherein a is an integer of from 0 to 3, R4 is an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms which may have an etheric oxygen atom, an alkoxycarbonyl group having at most 6 carbon atoms, or CH2R5 (wherein R5 is an alkoxycarbonyl group having at most 6 carbon atoms)), or (CH2)dCOOR6 (wherein d is 0 or 1, and R6 is a hydrogen atom, or an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms), a process for its production and a resist composition having the fluoropolymer (A) as a base.
    Type: Grant
    Filed: May 9, 2007
    Date of Patent: June 23, 2009
    Assignee: Asahi Glass Company, Limited
    Inventors: Yoko Takebe, Isamu Kaneko
  • Patent number: 7531610
    Abstract: A compound containing two fluorosulfonyl groups which are groups convertible to sulfonic acid groups, an intermediate therefor, and methods for their production with high productivity, are provided. Also provided are a fluorosulfonyl group-containing polymer obtained by polymerizing such a compound, and a sulfonic acid group-containing polymer obtained from such a polymer.
    Type: Grant
    Filed: January 28, 2008
    Date of Patent: May 12, 2009
    Assignee: Asahi Glass Company, Limited
    Inventors: Isamu Kaneko, Atsushi Watakabe, Jyunichi Tayanagi, Susumu Saito
  • Publication number: 20080146841
    Abstract: A compound containing two fluorosulfonyl groups which are groups convertible to sulfonic acid groups, an intermediate therefor, and methods for their production with high productivity, are provided. Also provided are a fluorosulfonyl group-containing polymer obtained by polymerizing such a compound, and a sulfonic acid group-containing polymer obtained from such a polymer.
    Type: Application
    Filed: January 28, 2008
    Publication date: June 19, 2008
    Applicant: Asahi Glass Company, Limited
    Inventors: Isamu Kaneko, Atsushi Watakabe, Jyunichi Tayanagi, Susumu Saito
  • Publication number: 20080138685
    Abstract: To provide a polymer electrolyte material for polymer electrolyte fuel cells, which is an electrolyte material having a high ion exchange capacity and a low resistance, and which has a higher softening temperature than a conventional electrolyte material.
    Type: Application
    Filed: January 28, 2008
    Publication date: June 12, 2008
    Applicant: Asahi Glass Company, Limited
    Inventors: Isamu Kaneko, Tetsuji Shimohira, Atsushi Watakabe, Seigo Kotera, Satoru Hommura, Koichi Murata, Jyunichi Tayanagi, Susumu Saito
  • Publication number: 20070207409
    Abstract: To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength region, and a resist composition comprising the fluoropolymer. A fluoropolymer (A) having monomer units formed by polymerization of a fluorinated diene represented by the following formula (1): CF2?CFCH2CH-Q-CH2CH?CH2??(1) wherein Q is (CH2)aC(CF3)2OR4 (wherein a is an integer of from 0 to 3, R4 is an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms which may have an etheric oxygen atom, an alkoxycarbonyl group having at most 6 carbon atoms, or CH2R5 (wherein R5 is an alkoxycarbonyl group having at most 6 carbon atoms)), or (CH2)dCOOR6 (wherein d is 0 or 1, and R6 is a hydrogen atom, or an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms), a process for its production and a resist composition having the fluoropolymer (A) as a base.
    Type: Application
    Filed: May 9, 2007
    Publication date: September 6, 2007
    Applicant: Asahi Glass Company, Limited
    Inventors: Yoko TAKEBE, Isamu Kaneko
  • Patent number: 7105697
    Abstract: The present invention provides a process whereby fluorine atom-containing sulfonyl fluoride compound(s) useful as e.g. materials for ion-exchange membranes, can be produced efficiently and at low cost without structural limitations while solving the difficulties in production. Namely, the present invention provides a process which comprises reacting XSO2RA-E1 (1) with RB-E2 (2) to form XSO2RA-E-RB (3), then reacting (3) with fluorine in a liquid phase to form FSO2RAF-EF-RBF (4), and further, decomposing the compound to obtain FSO2RAF-EF1 (5), wherein RA is a bivalent organic group, E1 is a monovalent reactive group, RB is a monovalent organic group, E2 is a monovalent reactive group which is reactive with E1, E is a bivalent connecting group formed by the reaction of E1 with E2, RAF is a bivalent organic group formed by the fluorination of RA, etc., RBF is the same group as RB, etc., EF is a bivalent connecting group formed by the fluorination of E, etc.
    Type: Grant
    Filed: March 25, 2004
    Date of Patent: September 12, 2006
    Assignee: Asahi Glass Company, Limited
    Inventors: Masahiro Ito, Kunio Watanabe, Takashi Okazoe, Isamu Kaneko, Daisuke Shirakawa
  • Publication number: 20060122348
    Abstract: To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength region, and a resist composition comprising the fluoropolymer. A fluoropolymer (A) having monomer units formed by polymerization of a fluorinated diene represented by the following formula (1): CF2?CFCH2CH-Q-CH2CH?CH2 ??(1) wherein Q is (CH2)aC(CF3)2OR4 (wherein a is an integer of from 0 to 3, R4 is an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms which may have an etheric oxygen atom, an alkoxycarbonyl group having at most 6 carbon atoms, or CH2R5 (wherein R5 is an alkoxycarbonyl group having at most 6 carbon atoms)), or (CH2)dCOOR6 (wherein d is 0 or 1, and R6 is a hydrogen atom, or an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms), a process for its production and a resist composition having the fluoropolymer (A) as a base.
    Type: Application
    Filed: January 23, 2006
    Publication date: June 8, 2006
    Applicant: Asahi Glass Company, Limited
    Inventors: Yoko Takebe, Isamu Kaneko
  • Patent number: 7026416
    Abstract: To provide a fluoropolymer suitable for use as a base polymer for resist materials for excimer lasers having a wavelength of 250 nm or shorter. A fluoropolymer having a monomer unit formed by cyclopolymerization of a fluorinated diene compound represented by the following formula (3), CF2?CFCF2—C(CF3)(R5)—CH2CH?CH2??(3) wherein R5 is either a hydroxyl group blocked by —CHR7—O—R8 or an organic group having the hydroxyl group, and R8 is a cyclic saturated hydrocarbon such as a cycloalkyl group which may have a substituent, or an organic group having the cyclic saturated hydrocarbon.
    Type: Grant
    Filed: May 9, 2005
    Date of Patent: April 11, 2006
    Assignee: Asahi Glass Company, Limited
    Inventors: Yasuhide Kawaguchi, Shinji Okada, Yoko Takebe, Osamu Yokokoji, Isamu Kaneko
  • Patent number: 7027379
    Abstract: An optical pickup objective lens system for collecting a laser beam emitted from a light source onto a recording surface of an optical recording medium includes three lenses having negative, positive and negative powers sequentially, or positive, negative and positive powers sequentially in the order from the side of the light source toward the optical recording medium. The three lenses are bonded to one another through two joint faces, and each of the two joint faces is formed into an aspherical shape. Thus, the chromatic aberration can be corrected satisfactorily. Especially, even when a laser beam having a short wavelength is used, the recording and replaying of information can be carried out reliably and stably.
    Type: Grant
    Filed: June 4, 2003
    Date of Patent: April 11, 2006
    Assignee: Enplas Corporation
    Inventor: Isamu Kaneko
  • Patent number: 7015366
    Abstract: To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg. A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1): CFR1?CR2—Q—CR3?CHR4 ??(1) wherein each of R1 to R4 which are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.
    Type: Grant
    Filed: September 6, 2005
    Date of Patent: March 21, 2006
    Assignee: Asahi Glass Company, Limited
    Inventors: Shun-ichi Kodama, Isamu Kaneko, Osamu Yokokoji, Shinji Okada, Yoko Takebe, Yasuhide Kawaguchi
  • Patent number: 6992841
    Abstract: An imaging lens system includes a first lens 2 which is a meniscus lens with its convex face turned toward the object side and having a positive power, a diaphragm 3, and a second lens 4 which is a meniscus lens with its concave face turned toward the object side. The first lens 2, the diaphragm 3 and the second lens 4 are disposed sequentially in the named order from the side of the object toward an image surface. In the imaging lens system, the following conditional expressions are satisfied: 1.25×fl?L?0.8×fl; 1.26×fl?f1?0.85×fl; 0.8×d1?d2?0.35×d1; L?6.25 mm; d1?0.225×fl; and d3?0.225×fl, wherein L is a distance of the entire length of the lens system; fl is a focal length of the entire lens system; f1 is a focal length of the first lens; d1 is a thickness of the center of the first lens; d2 is a distance between the first and second lenses; and d3 is a thickness of the center of the second lens.
    Type: Grant
    Filed: December 4, 2003
    Date of Patent: January 31, 2006
    Assignee: Enplas Corporation
    Inventors: Tomohiro Saito, Isamu Kaneko
  • Patent number: RE41184
    Abstract: The present invention provides a process whereby fluorine atom-containing sulfonyl fluoride compound(s) useful as e.g. materials for ion-exchange membranes, can be produced efficiently and at low cost without structural limitations while solving the difficulties in production. Namely, the present invention provides a process which comprises reacting XSO2RA-E1 (1) with RB-E2 (2) to form XSO2RA-E-RB (3), then reacting (3) with fluorine in a liquid phase to form FSO2RAF-EF-RBF (4), and further, decomposing the compound to obtain FSO2RAF-EF1 (5), wherein RA is a bivalent organic group, E1 is a monovalent reactive group, RB is a monovalent organic group, E2 is a monovalent reactive group which is reactive with E1, E is a bivalent connecting group formed by the reaction of E1 with E2, RAF is a bivalent organic group formed by the fluorination of RA, etc., RBF is the same group as RB, etc., EF is a bivalent connecting group formed by the fluorination of E, etc.
    Type: Grant
    Filed: September 19, 2008
    Date of Patent: March 30, 2010
    Assignee: Asahi Glass Company, Limited
    Inventors: Masahiro Ito, Kunio Watanabe, Takashi Okazoe, Isamu Kaneko, Daisuke Shirakawa
  • Patent number: RE41357
    Abstract: The present invention provides a process whereby fluorine atom-containing sulfonyl fluoride compound(s) useful as e.g. materials for ion-exchange membranes, can be produced efficiently and at low cost without structural limitations while solving the difficulties in production. Namely, the present invention provides a process which comprises reacting XSO2RA-E1 (1) with RB-E2 (2) to form XSO2RA-E-RB (3), then reacting (3) with fluorine in a liquid phase to form FSO2RAF-EF-RBF (4), and further, decomposing the compound to obtain FSO2RAF-EF1 (5), wherein RA is a bivalent organic group, E1 is a monovalent reactive group, RB is a monovalent organic group, E2 is a monovalent reactive group which is reactive with E1, E is a bivalent connecting group formed by the reaction of E1 with E2, RAF is a bivalent organic group formed by the fluorination of RA, etc., RBF is the same group as RB, etc., EF is a bivalent connecting group formed by the fluorination of E, etc.
    Type: Grant
    Filed: September 19, 2008
    Date of Patent: May 25, 2010
    Assignee: Asahi Glass Company, Limited
    Inventors: Masahiro Ito, Kunio Watanabe, Takashi Okazoe, Isamu Kaneko, Daisuke Shirakawa
  • Patent number: RE41806
    Abstract: The present invention provides a process whereby fluorine atom-containing sulfonyl fluoride compound(s) useful as e.g. materials for ion-exchange membranes, can be produced efficiently and at low cost without structural limitations while solving the difficulties in production. Namely, the present invention provides a process which comprises reacting XSO2RA-E1 (1) with RB-E2 (2) to form XSO2R4-E-RB (3), then reacting (3) with fluorine in a liquid phase to form FSO2RAF-EF-RBF (4), and further, decomposing the compound to obtain FSO2RAF-EFl (5), wherein RA is a bivalent organic group, E1 is a monovalent reactive group, RB is a monovalent organic group, E2 is a monovalent reactive group which is reactive with E1, E is a bivalent connecting group formed by the reaction of E1 with E2, RAF is a bivalent organic group formed by the fluorination of RA, etc., RBF is the same group as RB, etc., EF1 is a bivalent connecting group formed by the fluorination of E, etc.
    Type: Grant
    Filed: June 19, 2007
    Date of Patent: October 5, 2010
    Assignee: Asahi Glass Company, Limited
    Inventors: Masahiro Ito, Kunio Watanabe, Takashi Okazoe, Isamu Kaneko, Daisuke Shirakawa