Abstract: To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg. A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1): CFR1?CR2-Q-CR3?CHR4??(1) wherein each of R1 to R4 which are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.

Abstract: To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg. A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1): CFR1?CR2-Q-CR3?CHR4??(1) wherein each of R1 to R4 which are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.

Abstract: To provide a fluoropolymer suitable for use as a base polymer for resist materials for excimer lasers having a wavelength of 250 nm or shorter. A fluoropolymer having a monomer unit formed by cyclopolymerization of a fluorinated diene compound represented by the following formula (3), CF2?CFCF2—C(CF3)(R5)—CH2CH?CH2 ??(3) wherein R5 is either a hydroxyl group blocked by —CHR7—O—R8 or an organic group having the hydroxyl group, and R8 is a cyclic saturated hydrocarbon such as a cycloalkyl group which may have a substituent, or an organic group having the cyclic saturated hydrocarbon.

Abstract: A resist composition which can easily form a resist pattern excellent in transparency for vacuum ultraviolet rays such as an F2 excimer laser or the like and dry etching characteristics and further excellent in sensitivity, resolution, flatness, thermal resistance and the like, is provided. The resist composition, characterized by comprising (A) a fluorine-containing polymer having an acidic group blocked with a blocking group containing a cycloalkyl group, an organic group having one or more of cycloalkyl groups, a bicycloalkyl group or the like, (B) an acid generating compound capable of generating an acid by irradiation with a light, and (C) an organic solvent.

Abstract: The following resist composition which is excellent particularly in transparency to light beams and dry etching properties and gives a resist pattern excellent in sensitivity, resolution, evenness, heat resistance, etc., as a chemical amplification type resist, is presented. A resist composition which comprises a fluoropolymer (A) having repeating units represented by a structure formed by the cyclopolymerization of one molecule of a fluorinated diene and one molecule of a monoene, in which the monoene unit in each repeating unit has a blocked acid group capable of regenerating the acid group by the action of an acid, an acid-generating compound (B) which generates an acid upon irradiation with light, and an organic solvent (C).

Abstract: To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg. A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1): CFR1?CR2-Q-CR3?CHR4 ??(1) wherein each of R1 to R4 which are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.

Abstract: A fluoropolymer having repeating units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the following formula: CF2?CR1-Q-CR2?CH2??(1) wherein each of R1 and R2 which are independent of each other, is a hydrogen atom, a fluorine atom, an alkyl group having at most 3 carbon atoms, or a fluoroalkyl group having at most 3 carbon atoms, and Q is a bivalent organic group having a functional group bonded thereto, and a production method which comprises subjecting the above diene to radical polymerization. The polymer has a high Tg and a functional group concentration sufficient to exhibit the characteristics thereof.

Abstract: An imaging lens system includes, in the named order from the side of an object toward an image surface, a light amount diaphragm, a first lens having a positive power with a main power on the side closer to the image surface, a meniscus-shaped second lens having a negative power with a strong concave surface turned toward the image surface. Thus, it is possible to provide the imaging lens system in which a sufficiently high resolution can be obtained, while meeting the demand for a reduction in entire length of an optical system to provide the compactness.

Abstract: There is provided a sample inspection casing capable of easily and surely inspecting an object to be inspected. The sample inspection casing 1 includes: a sample mounting table 5 for mounting thereon an object 11 to be inspected; a prism cut portion 14 serving as an optical path changing portion for allowing the object 11 on the sample mounting table 5 to be irradiated with illuminating light; and an image magnifying lens 15 for transmitting light, which is reflected on the object 11 on the sample mounting table 5, to magnify an image of the object 11.

Abstract: To provide a chemical amplification type resist composition which is excellent in transparency to a radiation and in dry etching properties and which gives a resist pattern excellent in sensitivity, resolution, evenness, heat resistance, etc. A resist composition comprising a fluoropolymer (A) which is a fluoropolymer having repeating units formed by cyclopolymerization of a fluorinated diene represented by the formula (1) and which has blocked acidic groups as Q, an acid-generating compound (B) which generates an acid under irradiation with light, and an organic solvent (C): CF2═CR1—Q—CR2═CH2  (1) wherein each of R1 and R2 which are independent of each other, is a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group, and Q is a bivalent organic group having a blocked acidic group capable of forming an acidic group by an acid or a group which can be converted to such a blocked acidic group.

Abstract: A resist composition containing a fluoropolymer, an acid-generating compound and an organic solvent, a resist film, and methods for making thereof.

Abstract: The present invention provides a process whereby fluorine atom-containing sulfonyl fluoride compound(s) useful as e.g. materials for ion-exchange membranes, can be produced efficiently and at low cost without structural limitations while solving the difficulties in production.

Abstract: The present invention provides a process whereby fluorine atom-containing sulfonyl fluoride compound(s) useful as e.g. materials for ion-exchange membranes, can be produced efficiently and at low cost without structural limitations while solving the difficulties in production. The present invention is also directed to a compound of the following formula (I) or a compound of the following formula (II): FSO2CH2CH2OCH2OCOCF(CF3)OCF2CF2CF3  (I) FSO2CF2CF2OCF2CF2OCOCF(CF3)OCF2CF2CF3  (II).

Abstract: An imaging lens system includes a first lens 2 which is a meniscus lens with its convex face turned toward the object side and having a positive power, a diaphragm 3, and a second lens 4 which is a meniscus lens with its concave face turned toward the object side. The first lens 2, the diaphragm 3 and the second lens 4 are disposed sequentially in the named order from the side of the object toward an image surface. In the imaging lens system, the following conditional expressions are satisfied: 1.25×fl≧L≧0.8×fl; 1.26×fl≧f1≧0.85×fl; 0.8×d1≧d2≧0.35×d1; L≦6.25 mm; d1≧0.225×fl; and d3≧0.225×fl, wherein L is a distance of the entire length of the lens system; fl is a focal length of the entire lens system; f1 is a focal length of the first lens; d1 is a thickness of the center of the first lens; d2 is a distance between the first and second lenses; and d3 is a thickness of the center of the second lens.

Abstract: To provide a polymer having a main chain of a fluorinated alicyclic structure, which has a high Tg and which has a functional group concentration sufficient to exhibit the characteristics, and a process for its production.

Abstract: A novel polymer useful as an optical resin material excellent in heat resistance, a novel monomer for obtaining the polymer, etc., are provided. A fluorinated diene represented by CF2═CF(CF2)nC(CF3)ROCF═CF2 (wherein R is a fluorine atom or a trifluoromethyl group, and n is an integer of from 1 to 3), and a polymer thereof.

Abstract: The following resist composition of chemical amplification type, which is excellent in transparency to light beams and dry etching properties and gives a resist pattern excellent in sensitivity, resolution, evenness, heat resistance, etc. A resist composition which comprises a fluoropolymer (A) comprising monomer units (a) of a fluorovinyl monomer having —CF2—OR (wherein R is a C1-10 alkyl group) and monomer units (b) of an alicyclic ethylenic monomer, an acid-generating compound (B) which generates an acid upon irradiation with light, and an organic solvent (C).

Abstract: Provided in the present invention are an image pickup lens and a design method thereof which can achieve miniaturization of the system and capable of remarkably improving the optical characteristic with a simple structure. By forming a second face on the image pickup surface side of a lens body into a Fresnel face and unifying a diffraction element with at least a first face on the object face side or the second face on the image pickup surface side of the lens body, it becomes possible to correct the Petzval sum and reduce the curvature of the field so that an excellent image plane can be obtained. Also, due to the color dispersion characteristic of the diffraction element, chromatic aberration can be well corrected. Thereby, the optical characteristic of the image pickup lens can be remarkably improved.

Abstract: In an image pickup lens including a lens body, at least one of faces of the lens body is formed into an aspherical shape, and at least one of a first face of the lens body adjacent an object and a second face of said lens body adjacent an image pickup surface is a Fresnel face. Thus, the image pickup lens can be reduced in size, and the optical characteristics of the image pickup lens can be enhanced remarkably in a simple structure.

Abstract: An imaging lens system includes, in the named order from the side of an object toward an image surface, a light amount diaphragm, a first lens having a positive power with a main power on the side closer to the image surface, a meniscus-shaped second lens having a negative power with a strong concave surface turned toward the image surface. Thus, it is possible to provide the imaging lens system in which a sufficiently high resolution can be obtained, while meeting the demand for a reduction in entire length of an optical system to provide the compactness.