Abstract: A hybrid driving apparatus is provided which enables a driver to sufficiently enjoy a driving feeling of a vehicle driven by an internal combustion engine. A hybrid driving apparatus includes an internal combustion engine that drive main driving wheels, a motive power transmission mechanism transmitting a driving force to the main driving wheels, a main driving electric motor driving the main driving wheels, an accumulator, sub-driving electric motors transmitting motive power to sub-driving wheels of the vehicle, and a control apparatus executing an electric motor traveling mode and an internal combustion engine traveling mode. The control apparatus causes the internal combustion engine to generate the driving force, the internal combustion engine is a flywheel-less engine, and the control apparatus causes the main driving electric motor to generate a torque for maintaining idling of the internal combustion engine in the internal combustion engine traveling mode.

Abstract: To provide a vehicle drive device capable of effectively driving a vehicle by using in-wheel motors without falling into the vicious cycle between enhancement of driving via the motors and an increase in vehicle weight. The present invention is a vehicle drive device that uses in-wheel motors to drive a vehicle and includes in-wheel motors (20) that are provided in wheels (2b) of a vehicle (1) and drive the wheels, a body side motor (16) that is provided in a body of the vehicle and drives the wheels of the vehicle, and a battery (18) and a capacitor (22) that supply electric power for driving the in-wheel motors and/or the body side motor, in which a voltage of the battery is applied to the body side motor and a voltage of the battery and the capacitor connected in series is applied to the in-wheel motors.

Abstract: Provided are a curable composition curing well and having a good film formation ability with an inkjet coating, a cured product of the curable composition, and a method for forming a cured film using the curable composition. The curable composition contains a polyfunctional vinyl ether compound (A), a polyfunctional thiol compound (B), a curing agent (C), a photosensitizing agent (D), and stabilizing agent (E). In the curable composition, a photoradical initiator (C1) and a photoacid generator (C2) are used as the curing agent (C), a carbazole compound is used as the photosensitizing agent (D), and an imidazole compound is used as the stabilizing agent (E).

Abstract: A film cleaning solution that contains a solvent and a metal removing agent, in which two or more kinds of the solvents are contained, and a distance between a Hansen solubility parameter of the film cleaning solution and a Hansen solubility parameter of dimethylacetamide is 1.0 or less.

Abstract: To provide a radiation sheet that exhibits favorable heat dissipating performance, a heat dissipation plate including the radiation sheet, a heat dissipation device provided with the heat dissipation plate, and a curable paste capable of being suitably used for forming the above-mentioned radiation sheet. A sheet including a cured material of a curable paste that contains a polymerizable monomer (A) having only an ethylenic unsaturated double bond-containing group as a polymerizable group, a radical polymerization initiator (B) and a layered silicate (C) is used as a radiation sheet.

Abstract: A cleaning composition which can remove a layer of interest using a conventional apparatus, such as a coater, a baking furnace and a cleaning chamber, installed in semiconductor manufacturing equipment while preventing the damage or deformation of layers other than the layer of interest, such as a substrate and an interlayer insulation film; a cleaning method using the cleaning composition; and a method for producing a semiconductor employing the cleaning method. A layer of interest formed on a substrate is cleaned with a cleaning composition containing a component capable of decomposing the layer of interest and a film-forming polymer. An example of the layer of interest is a hard mask film. An example of the component is at least one of a basic compound and an acidic compound.

Abstract: A washing method, a washing device, a storage medium, and a washing composition for enabling effective removal of a layer to be processed by decomposing or degenerating the layer to be processed at a higher temperature than conventionally. In a state where a substrate provided with a layer to be processed is heated, the substrate is supplied with vapor of a component that can decompose the layer to be processed, and thereafter the layer to be processed that has reacted with the component is removed from the substrate. As the component, a nitric acid or a sulfonic acid is preferable. As the sulfonic acid, a fluorinated alkyl sulfonic acid is preferable.

Abstract: Provided is a cleaning composition for a component of a semiconductor manufacturing process chamber including: a foaming agent; an oxidizing agent; and an acidic compound, in which a value of (Number of moles of the acidic compound contained in the cleaning composition×acid valence of the acidic compound)/(Number of moles of the foaming agent contained in the cleaning composition×Base valence of the foaming agent) is more than 0.1 and less than 1.5.

Abstract: A method includes contacting an organic cured film with an acidic cleaning liquid including sulfuric acid and a water-soluble organic solvent and does not include a compound capable of generating nitronium ions. An amount of the sulfuric acid in the acidic cleaning liquid is 40% by mass or more, and an amount of water in the acidic cleaning liquid is 5% by mass or less.

Abstract: A cleaning composition which can remove a layer of interest using a conventional apparatus, such as a coater, a baking furnace and a cleaning chamber, installed in semiconductor manufacturing equipment while preventing the damage or deformation of layers other than the layer of interest, such as a substrate and an interlayer insulation film; a cleaning method using the cleaning composition; and a method for producing a semiconductor employing the cleaning method. A layer of interest formed on a substrate is cleaned with a cleaning composition containing a component capable of decomposing the layer of interest and a film-forming polymer. An example of the layer of interest is a hard mask film. An example of the component is at least one of a basic compound and an acidic compound.

Abstract: A hydrogen storage metal is disposed on a base material in a predetermined shape and a predetermined size such that hydrogen is detected based on surface plasmon resonance induced by incident light. The hydrogen storage metal is formed of a film body containing palladium and a noble metal. A spectrum of the light having passed through the hydrogen storage metal in which hydrogen is stored has a peak in a wavelength band separated from an absorption spectrum C1 of carbon dioxide with respect to the light and an absorption spectra H1 to H3 of water with respect to the light.

Abstract: A washing method, a washing device, a storage medium, and a washing composition for enabling effective removal of a layer to be processed by decomposing or degenerating the layer to be processed at a higher temperature than conventionally. In a state where a substrate provided with a layer to be processed is heated, the substrate is supplied with vapor of a component that can decompose the layer to be processed, and thereafter the layer to be processed that has reacted with the component is removed from the substrate. As the component, a nitric acid or a sulfonic acid is preferable. As the sulfonic acid, a fluorinated alkyl sulfonic acid is preferable.

Abstract: A hydrogen storage metal is disposed on a base material in a predetermined shape and a predetermined size such that hydrogen is detected based on surface plasmon resonance induced by incident light. The hydrogen storage metal is formed of a film body containing palladium and a noble metal. A spectrum of the light having passed through the hydrogen storage metal in which hydrogen is stored has a peak in a wavelength band separated from an absorption spectrum C1 of carbon dioxide with respect to the light and an absorption spectra H1 to H3 of water with respect to the light.

Abstract: To provide a method for removing an organic cured film on a substrate, which can satisfactorily remove the organic cured film formed on the substrate while suppressing damage on a wiring material such as copper, and an acidic cleaning liquid which can be preferably used in the method. When removing an organic cured film on a substrate, the organic cured film is contacted with an acidic cleaning liquid, and an acidic cleaning liquid, which includes sulfuric acid and a water-soluble organic solvent and does not include a compound capable of generating nitronium ions, the content of water being 5% by mass or less, is used as the acidic cleaning liquid.

Abstract: A polyimide-based resin film cleaning liquid includes at least one solvent selected from the group consisting of a hydroxy aliphatic carboxylic acid ester, an aliphatic carboxylic acid ester, a chain or cyclic ketone, an alkylene glycol monoalkyl ether, an alkylene glycol monoalkyl ether acetate, and an aprotic polar solvent other than these solvents.

Abstract: A polyimide-based resin film cleaning liquid includes at least one solvent selected from the group consisting of a hydroxy aliphatic carboxylic acid ester, an aliphatic carboxylic acid ester, a chain or cyclic ketone, an alkylene glycol monoalkyl ether, an alkylene glycol monoalkyl ether acetate, and an aprotic polar solvent other than these solvents.

Abstract: A filtration material including a silica base material having a group represented by the following general formula (a0-1) [in formula (a0-1), Ya01 represents a divalent linking group; Ra01 represents a hydrocarbon group which may have a substituent; Ra02 represents a hydroxyl group or a hydrocarbon group having 1 to 6 carbon atoms which may have a substituent; n01 represents an integer of 0 to 5; and the symbol “*” represents a valence bond with respect to the silica base material].

Abstract: A filtering material which is used to filter a liquid chemical for lithography, in which a base material having a group represented by the following Formula (a0-1) is used: (*-Ya01?nW??(a0-1) in which Ya01 represents a divalent linking group; W represents a heteroatom-containing group, here, the group represented by W includes a nitrogen atom bonded to Ya01 and two or more heteroatoms other than the nitrogen atom bonded to Ya01; n represents a natural number; and * represents a valence bond with respect to the base material.

Abstract: A filtering material including a polymerization product of a compound represented by formula (1-0) or a derivative thereof; and a method of producing a phenylimine compound in which a compound having an aromatic ring and a carbonyl group is reacted with a hydrocarbon compound having at least one amino group, thereby obtaining the phenylimine compound represented by the formula (1-0), the aromatic ring having at least one of a hydroxy group, a thiol group, a carboxy group, a sulfo group, a nitro group and a phosphate group; and a method of producing an alkoxyphenylimine compound in which the phenylimine compound is reacted with an alkylation agent. R1 represents a polymerizable group-containing hydrocarbon group; R2 represents a hydrocarbon group; R3 represents a hydroxy group, a thiol group, a carboxy group, a sulfo group, a nitro group or a phosphate group; and n1 represents 1 to 5.

Abstract: A method of producing a metal complex-supporting mesoporous material that can support a metal complex in the pores thereof without causing aggregation of the metal complex. A metal complex-supporting mesoporous material supporting a metal complex in the pores thereof without causing aggregation of the metal complex. A method of producing a mesoporous material supporting metal-containing nanoparticles using the metal complex supported in the pores of the mesoporous material as a template. A solution of a metal complex prepared by a phenyl azomethine dendrimer compound having a specific structure is brought into contact with a mesoporous material so that the metal complex of the phenyl azomethine dendrimer compound is supported by the mesoporous material.