Abstract: A method of producing a metal complex-supporting mesoporous material that can support a metal complex in the pores thereof without causing aggregation of the metal complex. A metal complex-supporting mesoporous material supporting a metal complex in the pores thereof without causing aggregation of the metal complex. A method of producing a mesoporous material supporting metal-containing nanoparticles using the metal complex supported in the pores of the mesoporous material as a template. A solution of a metal complex prepared by a phenyl azomethine dendrimer compound having a specific structure is brought into contact with a mesoporous material so that the metal complex of the phenyl azomethine dendrimer compound is supported by the mesoporous material.

Abstract: A method for producing a substrate having dispersed particles of a dendrimer compound on the surface thereof, the method including: an application step including dissolving a phenyl azomethine dendrimer compound in a solvent to prepare a solution, and applying the solution on the surface of a substrate; and a volatilization step including volatilizing the solvent from the solution applied on the surface of the substrate, the phenyl azomethine dendrimer compound included in the solution having a concentration of no greater than 5 ?mol/L is employed.

Abstract: A method of producing a metal complex-supporting mesoporous material that can support a metal complex in the pores thereof without causing aggregation of the metal complex. A metal complex-supporting mesoporous material supporting a metal complex in the pores thereof without causing aggregation of the metal complex. A method of producing a mesoporous material supporting metal-containing nanoparticles using the metal complex supported in the pores of the mesoporous material as a template. A solution of a metal complex prepared by a phenyl azomethine dendrimer compound having a specific structure is brought into contact with a mesoporous material so that the metal complex of the phenyl azomethine dendrimer compound is supported by the mesoporous material.

Abstract: A surface modifying material for forming a surface modifying layer provided between a substrate and a resist film, the surface modifying material including an epoxy resin having a weight average molecular weight of 1,000 to 50,000; a method of forming a resist pattern, including: forming a surface modifying layer on a substrate using the surface modifying material, forming a resist film on the substrate, on which the surface modified layer has been formed, using a resist composition, conducting exposure of the resist film, and alkali developing the resist film to form a resist pattern; and a method of forming a pattern, including: etching the substrate, on which a resist pattern has been formed by the method of forming a resist pattern.

Abstract: A method for preparing carbon nanotubes including attaching a catalyst consisting of a compound in which a transition metal element of Group 8, 9 or 10 is coordinated to a nitrogen-containing dendrimer compound having at least one nitrogen atom, to which a metal element may be coordinated, on a surface of a substrate, and thermally decomposing a carbon compound in the vicinity of the substrate while supplying the carbon compound on the surface of the substrate to which the catalyst is attached. The catalyst for producing the carbon nanotubes is a compound in which a transition metal element of Group 8, 9 or 10 is coordinated to a nitrogen-containing dendrimer compound having at least one nitrogen atom to which a metal element may be coordinated.

Abstract: A resist pattern formation method that includes a step (1) of forming a resist pattern on a support using a chemically amplified positive-type resist composition, a step (2) of applying a pattern miniaturization agent to the resist pattern, a step (3) of performing a bake treatment of the resist pattern to which the pattern miniaturization agent has been applied, and a step (4) of subjecting the resist pattern that has undergone the bake treatment to alkali developing, wherein the pattern miniaturization agent contains an acid generator component, and an organic solvent that does not dissolve the resist pattern formed in the step (1). Also, a pattern miniaturization agent used in the method.

Abstract: A method for producing a substrate having dispersed particles of a dendrimer compound on the surface thereof, the method including: an application step including dissolving a phenyl azomethine dendrimer compound in a solvent to prepare a solution, and applying the solution on the surface of a substrate; and a volatilization step including volatilizing the solvent from the solution applied on the surface of the substrate, the phenyl azomethine dendrimer compound included in the solution having a concentration of no greater than 5 ?mol/L is employed.

Abstract: A resist composition that includes a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid, an acid generator component (B) that generates acid upon exposure, and an epoxy resin (G). Also, a method of forming a resist pattern that includes using the above resist composition to form a resist film on the substrate, conducting exposure of the resist film, and alkali-developing the resist film to form a resist pattern.

Abstract: A method for preparing carbon nanotubes including attaching a catalyst consisting of a compound in which a transition metal element of Group 8, 9 or 10 is coordinated to a nitrogen-containing dendrimer compound having at least one nitrogen atom, to which a metal element may be coordinated, on a surface of a substrate, and thermally decomposing a carbon compound in the vicinity of the substrate while supplying the carbon compound on the surface of the substrate to which the catalyst is attached. The catalyst for producing the carbon nanotubes is a compound in which a transition metal element of Group 8, 9 or 10 is coordinated to a nitrogen-containing dendrimer compound having at least one nitrogen atom to which a metal element may be coordinated.

Abstract: A surface modifying material for forming a surface modifying layer provided between a substrate and a resist film, the surface modifying material including an epoxy resin having a weight average molecular weight of 1,000 to 50,000; a method of forming a resist pattern, including: forming a surface modifying layer on a substrate using the surface modifying material, forming a resist film on the substrate, on which the surface modified layer has been formed, using a resist composition, conducting exposure of the resist film, and alkali developing the resist film to form a resist pattern; and a method of forming a pattern, including: etching the substrate, on which a resist pattern has been formed by the method of forming a resist pattern

Abstract: A resist composition that includes a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid, an acid generator component (B) that generates acid upon exposure, and an epoxy resin (G). Also, a method of forming a resist pattern that includes using the above resist composition to form a resist film on the substrate, conducting exposure of the resist film, and alkali-developing the resist film to form a resist pattern.

Abstract: A positive resist composition that includes a resin component (A) that exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure to radiation, wherein the component (A) includes a structural unit (a1) represented by a general formula (a1-2) or (a1-4), a structural unit (a2) derived from an acrylate ester that contains a lactone-containing monocyclic or polycyclic group, and a structural unit (a3), which is different from the structural unit (a1) and the structural unit (a2), and is derived from an acrylate ester that contains an aliphatic cyclic group-containing non-acid-dissociable, dissolution-inhibiting group and contains no polar groups, and the component (B) includes an onium salt (B1) having an anion portion represented by a formula: R41—SO3?.

Abstract: A positive resist composition that includes a resin component (A) that exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure to radiation, wherein the component (A) includes a structural unit (a1) represented by a general formula (a1-2) or (a1-4), a structural unit (a2) derived from an acrylate ester that contains a lactone-containing monocyclic or polycyclic group, and a structural unit (a3), which is different from the structural unit (a1) and the structural unit (a2), and is derived from an acrylate ester that contains an aliphatic cyclic group-containing non-acid-dissociable, dissolution-inhibiting group and contains no polar groups, and the component (B) includes an onium salt (B1) having an anion portion represented by a formula: R41—SO3?.

Abstract: A box forming apparatus for folding and securing the upper flaps of a box including a front inner flap folding body, back inner flap folding body, and left and right outer flap folding bodies for moving the respective flaps of a box into its upper opening plane. The novel apparatus further includes a cooperating tape head for securing the flaps in their folded position.

Abstract: A box forming apparatus for folding and securing the bottom flaps of a box including a bottom flap folding mechanism and top pressing mechanism located above the bottom flap folding mechanism for controlling box lifting during a box folding operation. The novel features of the claimed invention allow for controlled guiding of a box frame throughout a folding and sealing operation.

Abstract: An artificial snowfall system comprises a snowfall room (2) in which are properly disposed a snow catching element (4) made of materials excellent in gas permeability and an atomizer unit (8) for ejecting atomized particles of liquid into the room (2). The atomized particles are frozen by heat exchange with ambient air within the room (2). The ambient air is kept at a temperature of below a freezing point of the liquid and forms an air flow passing through the snow catching element (4). The air flow causes the frozen particles to be deposited on one side of the catching element (4) to form a snow layer thereon. A beater element (9) for beating the other side of the catching element (4) is oppositely disposed from the other side to have the snow layer separated from the catching element (4). The thus separated snow layer creates artificial snowfall in the room (2).

Abstract: A novel nonionic compound, a polyoxypropylene polyoxyethylene addition ether of a higher branched primary saturated alcohol is provided. This nonionic compound is suitable for use, as a solubilizing agent, in a high concentration solution of a lower alcohol in water, for example, in cosmetics such as a transparent liquid hair preparation, a hair cologne, an after-shaving lotion, a skin lotion and the like.

Abstract: A ventilation fan (ventilation system) which may be readily installed regardless of the length of a ventilation hole formed through the wall of a building even when the wall is of the double-wall type having an air insulating layer formed between the outer and inner wall members. The members of a duct frame are prefabricated in a factory and assembled at a job site in order to reduce the dimensions of the package, thereby reducing the packing and crating, storage and transportation costs.