Patents by Inventor J. Chen

J. Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Novel method to form a microlens
    Publication number: 20060183027
    Abstract: A method of manufacturing a microlens includes forming a photoresist layer over a substrate having a photo sensor located therein and exposing the photoresist layer in an exposure system having a lower resolution. The exposure uses a photomask having a microlens pattern comprising a plurality of dark regions and clear regions alternately disposed. The photoresist is developed to from the microlens having a curved shape.
    Type: Application
    Filed: February 17, 2005
    Publication date: August 17, 2006
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Hua-Tai Lin, J. Chen, Chih-Kung Chang
  • Optical proximity correction method utilizing phase-edges as sub-resolution assist features
    Publication number: 20050271953
    Abstract: A photolithography mask for optically transferring a pattern formed in the mask onto a substrate and for negating optical proximity effects. The mask includes a plurality of resolvable features to be printed on the substrate, and at least one non-resolvable optical proximity correction feature, where the non-resolvable optical proximity correction feature is a phase-edge.
    Type: Application
    Filed: July 26, 2005
    Publication date: December 8, 2005
    Applicant: ASML MASKTOOLS B.V.
    Inventors: Douglas Broeke, J. Chen