Patents by Inventor J. Gary Eden

J. Gary Eden has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9659737
    Abstract: Microstructured, irregular surfaces pose special challenges but coatings of the invention can uniformly coat irregular and microstructured surfaces with one or more thin layers of phosphor. Preferred embodiment coatings are used in microcavity plasma devices and the substrate is, for example, a device electrode with a patterned and microstructured dielectric surface. A method for forming a thin encapsulated phosphor coating of the invention applies a uniform paste of metal or polymer layer to the substrate. In another embodiment, a low temperature melting point metal is deposited on the substrate. Polymer particles are deposited on a metal layer, or a mixture of a phosphor particles and a solvent are deposited onto the uniform glass, metal or polymer layer.
    Type: Grant
    Filed: July 14, 2011
    Date of Patent: May 23, 2017
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: J. Gary Eden, Sung-Jin Park, JeKwon Yoon, Kwang-Soo Kim
  • Patent number: 9579624
    Abstract: A gas reactor device includes a plurality of microcavities or microchannels defined at least partially within a thick metal oxide layer consisting essentially of defect free oxide. Electrodes are arranged with respect to the microcavities or microchannels to stimulate plasma generation therein upon application of suitable voltage. One or more or all of the electrodes are encapsulated within the thick metal oxide layer. A gas inlet is configured to receive feedstock gas into the plurality of microcavities or microchannels. An outlet is configured to outlet reactor product from the plurality of microcavities or microchannels. In an example preferred device, the feedstock gas is air or O2 and is converted by the plasma into ozone (O3). In another preferred device, the feedstock gas is an unwanted gas to be decomposed into a desired form. Gas reactor devices of the invention can, for example, decompose gases such as CO2, CH4, or NOx.
    Type: Grant
    Filed: January 7, 2015
    Date of Patent: February 28, 2017
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: J. Gary Eden, Sung-Jin Park, Jin Hoon Cho, Seung Hoon Sung, Min Hwan Kim
  • Publication number: 20170025813
    Abstract: An injection-seeded whispering gallery mode optical amplifier. The amplifier includes a micro or nanoscale whispering gallery mode resonator configured to amplify a whispering gallery mode therein via a gain medium separated from the whispering gallery mode resonator but within the evanescent field of the whispering gallery mode resonator. A pump stimulates the whispering gallery mode. A plasmonic surface couples power into the whispering gallery mode resonator.
    Type: Application
    Filed: December 18, 2014
    Publication date: January 26, 2017
    Inventors: J. Gary Eden, Manas Ranjan Gartia, Gang Logan Liu
  • Publication number: 20160327310
    Abstract: The invention provides methods and systems for water dissociation with microplasma generated in microchannel plasma arrays or chips. Preferred methods and systems introduce water vapor into a microchannel plasma array. Electrical power is applied to the microchannel plasma array to create a plasma chemical reaction of the water vapor in the micorchannel plasma array. Dissociated hydrogen and/or oxygen gas is collected at an output of the microchannel plasma array. The water vapor can be entrained in a carrier gas, but is preferably introduced without carrier gas. Direct introduction of water vapor has been demonstrated to provide efficiencies at an above 60%. The use of carrier gas reduces efficiency, but still exceeds efficiencies of prior methods discussed in the background.
    Type: Application
    Filed: May 9, 2016
    Publication date: November 10, 2016
    Inventors: Zhen Dai, Thomas J. Houlahan, J. Gary Eden, Sung-Jin Park
  • Patent number: 9390894
    Abstract: A preferred modular microplasma microchannel reactor device includes a microchannel array arranged with respect to electrodes for generation of plasma and isolated by dielectric from the electrodes. A cover covers a central portion of the microchannel array, while leaving end portions of the microchannel array exposed. A gas inlet and product outlet are arranged to permit flow into, through and out of the microchannel array. Reactor modules of the invention include pluralities of the modular reactor devices. The reactors devices can be arranged by a housing or a frame to be in fluid communication. A system of the invention arranges pluralities of modules. Preferred module housings, frames and reactors include structural features to create alignments and connections. Preferred modules include fans to circulate feedstock and reaction product. Other reactor devices provide plasma actuation for flow.
    Type: Grant
    Filed: September 24, 2014
    Date of Patent: July 12, 2016
    Assignee: THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS
    Inventors: J. Gary Eden, Min Hwan Kim, Jin Hoon Cho, Sung-Jin Park
  • Patent number: 9330877
    Abstract: Logic devices are provided in multiple sub-collector and sub-emitter microplasma devices formed in thin and flexible, or inflexible, semiconductor materials. Logic operations are provided with one of a plurality of microplasmas forming sub-collectors with a common emitter, or a common collector plasma with a plurality of sub-emitter regions in a solid state semi-conductor pn-junction, and generating a logic output from an electrode, based upon electrode inputs to two other electrodes.
    Type: Grant
    Filed: June 1, 2015
    Date of Patent: May 3, 2016
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: J. Gary Eden, Paul A. Tchertchian, Clark J. Wagner, Dane J. Sievers, Thomas J. Houlahan, Benben Li
  • Patent number: 9263558
    Abstract: A hybrid plasma semiconductor device has a thin and flexible semiconductor base layer. An emitter region is diffused into the base layer forming a pn-junction. An insulator layer is upon one side the base layer and emitter region. Base and emitter electrodes are isolated from each other by the insulator layer and electrically contact the base layer and emitter region through the insulator layer. A thin and flexible collector layer is upon an opposite side of the base layer. A microcavity is formed in the collector layer and is aligned with the emitter region. Collector electrodes are arranged to sustain a microplasma within the microcavity with application of voltage to the collector electrodes. A depth of the emitter region and a thickness of the base layer are set to define a predetermined thin portion of the base layer as a base region between the emitter region and the microcavity. Microplasma generated in the microcavity serves as a collector.
    Type: Grant
    Filed: August 5, 2014
    Date of Patent: February 16, 2016
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: J. Gary Eden, Paul A. Tchertchian, Clark J. Wagner, Dane J. Sievers, Thomas J. Houlahan, Benben Li
  • Patent number: 9184341
    Abstract: Preferred embodiment flexible and on wafer hybrid plasma semiconductor devices have at least one active solid state semiconductor region; and a plasma generated in proximity to the active solid state semiconductor region(s). A preferred device is a hybrid plasma semiconductor device having base, emitting and microcavity collector regions formed on a single side of a device layer. Visible or ultraviolet light is emitted during operation by plasma collectors in the array. In preferred embodiments, individual PBJTs in the array serve as sub-pixels of a full-color display.
    Type: Grant
    Filed: July 14, 2014
    Date of Patent: November 10, 2015
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: J. Gary Eden, Paul A. Tchertchian, Clark J. Wagner, Dane J. Sievers, Thomas J. Houlahan, Benben Li
  • Publication number: 20150294831
    Abstract: Logic devices are provided in multiple sub-collector and sub-emitter microplasma devices formed in thin and flexible, or inflexible, semiconductor materials. Logic operations are provided with one of a plurality of microplasmas forming sub-collectors with a common emitter, or a common collector plasma with a plurality of sub-emitter regions in a solid state semi-conductor pn-junction, and generating a logic output from an electrode, based upon electrode inputs to two other electrodes.
    Type: Application
    Filed: June 1, 2015
    Publication date: October 15, 2015
    Inventors: J. Gary Eden, Paul A. Tchertchian, Clark J. Wagner, Dane J. Sievers, Thomas J. Houlahan, Benben Li
  • Publication number: 20150270110
    Abstract: A preferred modular microplasma microchannel reactor device includes a microchannel array arranged with respect to electrodes for generation of plasma and isolated by dielectric from the electrodes. A cover covers a central portion of the microchannel array, while leaving end portions of the microchannel array exposed. A gas inlet and product outlet are arranged to permit flow into, through and out of the microchannel array. Reactor modules of the invention include pluralities of the modular reactor devices. The reactors devices can be arranged by a housing or a frame to be in fluid communication. A system of the invention arranges pluralities of modules. Preferred module housings, frames and reactors include structural features to create alignments and connections. Preferred modules include fans to circulate feedstock and reaction product. Other reactor devices provide plasma actuation for flow.
    Type: Application
    Filed: September 24, 2014
    Publication date: September 24, 2015
    Inventors: J. Gary Eden, Min Hwan Kim, Jin Hoon Cho, Sung-Jin Park
  • Patent number: 9106052
    Abstract: A laser pumping method pumps a primary amount of energy into the near red satellite band of a metal vapor and noble gas mixture laser medium and a lesser amount of energy is pumped into a highly excited level to stimulate laser output. The medium is can be a Rb vapor and Xe gas mixture. The lesser amount of energy is pumped into the laser medium to populate an excited level that lies above the upper laser level and transfers atomic or molecular population to the upper laser level by a nonradiative process. In preferred embodiments, the intermediate level is within a few kT of the upper laser level and the primary amount of energy is a large majority of the total energy. A laser device includes metal vapor and noble gas mixture laser medium to populate an intermediate level near an upper laser level, and pumping a lesser amount of energy into a highly excited level to stimulate laser output. The medium can be an Rb vapor and Xe gas mixture in preferred embodiments.
    Type: Grant
    Filed: January 7, 2014
    Date of Patent: August 11, 2015
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: J. Gary Eden, John Darby Hewitt
  • Publication number: 20150194782
    Abstract: A laser pumping method pumps a primary amount of energy into the near red satellite band of a metal vapor and noble gas mixture laser medium and a lesser amount of energy is pumped into a highly excited level to stimulate laser output. The medium is can be a Rb vapor and Xe gas mixture. The lesser amount of energy is pumped into the laser medium to populate an excited level that lies above the upper laser level and transfers atomic or molecular population to the upper laser level by a nonradiative process. In preferred embodiments, the intermediate level is within a few kT of the upper laser level and the primary amount of energy is a large majority of the total energy. A laser device includes metal vapor and noble gas mixture laser medium to populate an intermediate level near an upper laser level, and pumping a lesser amount of energy into a highly excited level to stimulate laser output. The medium can be an Rb vapor and Xe gas mixture in preferred embodiments.
    Type: Application
    Filed: January 7, 2014
    Publication date: July 9, 2015
    Inventors: J. Gary Eden, John Darby Hewitt
  • Publication number: 20150125357
    Abstract: A gas reactor device includes a plurality of microcavities or microchannels defined at least partially within a thick metal oxide layer consisting essentially of defect free oxide. Electrodes are arranged with respect to the microcavities or microchannels to stimulate plasma generation therein upon application of suitable voltage. One or more or all of the electrodes are encapsulated within the thick metal oxide layer. A gas inlet is configured to receive feedstock gas into the plurality of microcavities or microchannels. An outlet is configured to outlet reactor product from the plurality of microcavities or microchannels. In an example preferred device, the feedstock gas is air or O2 and is converted by the plasma into ozone (O3). In another preferred device, the feedstock gas is an unwanted gas to be decomposed into a desired form. Gas reactor devices of the invention can, for example, decompose gases such as CO2, CH4, or NOR.
    Type: Application
    Filed: January 7, 2015
    Publication date: May 7, 2015
    Inventors: J. Gary Eden, Sung-Jin Park, Jin Hoon Cho, Seung Hoon Sung, Min Hwan Kim
  • Patent number: 8968668
    Abstract: A microplasma device of the invention includes a microcavity or microchannel defined at least partially within a thick metal oxide layer consisting essentially of defect free oxide. Electrodes are arranged with respect to the microcavity or microchannel to stimulate plasma generation in said microcavity or microchannel upon application of suitable voltage and at least one of the electrodes is encapsulated within the thick metal oxide layer. Large arrays can be formed and are highly robust as lack of microcracks in the oxide avoid dielectric breakdown.
    Type: Grant
    Filed: June 20, 2012
    Date of Patent: March 3, 2015
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: J. Gary Eden, Sung-Jin Park, Jin Hoon Cho, Seung Hoon Sung, Min Hwan Kim
  • Patent number: 8957572
    Abstract: Preferred embodiments of the present invention include microplasma jet devices and arrays in various materials, and low temperature microplasma jet devices and arrays. These include preferred embodiment single microplasma jet devices and arrays of devices formed in monolithic polymer blocks with elongated microcavities. The arrays can be densely packed, for example having 100 jets in an area of a few square centimeters. Additional embodiments include metal/metal oxide microplasma jet devices that have micronozzles defined in the metal oxide itself. Methods of fabrication of microplasma jet devices are also provided by the invention, and the methods have been demonstrated as being capable of producing tailored micronozzle contours that are unitary with the material insulating electrodes.
    Type: Grant
    Filed: June 25, 2012
    Date of Patent: February 17, 2015
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: J. Gary Eden, Sung-Jin Park, Jin Hoon Cho, Jeffrey H. Ma
  • Publication number: 20150008825
    Abstract: Preferred embodiments of the present invention include microplasma jet devices and arrays in various materials, and low temperature microplasma jet devices and arrays. These include preferred embodiment single microplasma jet devices and arrays of devices formed in monolithic polymer blocks with elongated microcavities. The arrays can be densely packed, for example having 100 jets in an area of a few square centimeters. Additional embodiments include metal/metal oxide microplasma jet devices that have micronozzles defined in the metal oxide itself. Methods of fabrication of microplasma jet devices are also provided by the invention, and the methods have been demonstrated as being capable of producing tailored micronozzle contours that are unitary with the material insulating electrodes.
    Type: Application
    Filed: June 25, 2012
    Publication date: January 8, 2015
    Applicant: The Board of Trustees of the University of IIlinois
    Inventors: J. Gary Eden, Sung-Jin Park, Jin Hoon Cho, Jeffrey H. Ma
  • Publication number: 20140339677
    Abstract: A hybrid plasma semiconductor device has a thin and flexible semiconductor base layer. An emitter region is diffused into the base layer forming a pn-junction. An insulator layer is upon one side the base layer and emitter region. Base and emitter electrodes are isolated from each other by the insulator layer and electrically contact the base layer and emitter region through the insulator layer. A thin and flexible collector layer is upon an opposite side of the base layer. A microcavity is formed in the collector layer and is aligned with the emitter region. Collector electrodes are arranged to sustain a microplasma within the microcavity with application of voltage to the collector electrodes. A depth of the emitter region and a thickness of the base layer are set to define a predetermined thin portion of the base layer as a base region between the emitter region and the microcavity. Microplasma generated in the microcavity serves as a collector.
    Type: Application
    Filed: August 5, 2014
    Publication date: November 20, 2014
    Inventors: J. Gary Eden, Paul A. Tchertchian, Clark J. Wagner, Dane J. Sievers, Thomas J. Houlahan, Benben Li
  • Patent number: 8890409
    Abstract: An array of microcavity plasma devices is formed in a unitary sheet of oxide with embedded microcavities or microchannels and encapsulated metal driving electrodes isolated by oxide from the microcavities or microchannels and arranged so as to generate sustain a plasma in the embedded microcavities or microchannels upon application of time-varying voltage when a plasma medium is contained in the microcavities or microchannels.
    Type: Grant
    Filed: May 14, 2009
    Date of Patent: November 18, 2014
    Assignee: The Board of Trustees of the University of Illnois
    Inventors: J. Gary Eden, Sung-Jin Park, Taek-Lim Kim, Kwang-Soo Kim
  • Publication number: 20140319654
    Abstract: Preferred embodiment flexible and on wafer hybrid plasma semiconductor devices have at least one active solid state semiconductor region; and a plasma generated in proximity to the active solid state semiconductor region(s). A preferred device is a hybrid plasma semiconductor device having base, emitting and microcavity collector regions formed on a single side of a device layer. Visible or ultraviolet light is emitted during operation by plasma collectors in the array. In preferred embodiments, individual PBJTs in the array serve as sub-pixels of a full-color display.
    Type: Application
    Filed: July 14, 2014
    Publication date: October 30, 2014
    Inventors: J. Gary Eden, Paul A. Tchertchian, Clark J. Wagner, Dane J. Sievers, Thomas J. Houlahan, Benben Li
  • Patent number: 8870618
    Abstract: Methods of the invention can form microtip microplasma devices having the first and second metal microtips and metal oxide in a monolithic, unitary structure. Methods can form arrays that can be flexible, can be arranged in stacks, and can be formed into cylinders, for example, for gas and liquid processing devices, air filters and other applications. A preferred method of forming an array of microtip microplasma devices provides a metal mesh with an array of micro openings therein. Electrode areas of the metal mesh are masked leaving planned connecting metal oxide areas of the metal mesh unmasked. Planned connecting metal oxide areas are electrochemically etched to convert the planned connecting metal oxide areas to metal oxide that encapsulates opposing metal microtips therein. The mask is removed. The electrode areas are electrochemically etched to encapsulate the electrode areas in metal oxide.
    Type: Grant
    Filed: August 20, 2013
    Date of Patent: October 28, 2014
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: J. Gary Eden, Sung-Jin Park, JeKwon Yoon, Brian Chung