Patents by Inventor Jérôme NAPIERALA

Jérôme NAPIERALA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110128984
    Abstract: A semiconductor laser device operable to emit light having a desired wavelength in the green spectral range. The semiconductor laser device may include a pumping source and a laser structure including a substrate, a first cladding layer, and one or more active region layers. The one or more active region layers include a number of quantum wells having a spontaneous emission peak wavelength that is greater than about 520 nm at a reference pumping power density. The pumping source is configured to pump each quantum well at a pumping power density such that a stimulated emission peak of each quantum well is within the green spectral range, and the number of quantum wells within the one or more active region layers is such that a net optical gain of the quantum wells is greater than a net optical loss coefficient at the desired wavelength in the green spectral range.
    Type: Application
    Filed: November 30, 2009
    Publication date: June 2, 2011
    Inventors: Rajaram Bhat, Chad Stephen Gallinat, Jerome Napierala, Dmitry Sizov, Chung-En Zah
  • Publication number: 20110049469
    Abstract: An optoelectronic light emitting semiconductor device is provided comprising an active region, a p-type Group III nitride layer, an n-type Group III nitride layer, a p-side metal contact layer, an n-side metal contact layer, and an undoped tunneling enhancement layer. The p-side metal contact layer is characterized by a work function W satisfying the following relation: W?e?AFF±0.025 eV where e?AFF is the electron affinity of the undoped tunneling enhancement layer. The undoped tunneling enhancement layer and the p-type Group III nitride layer comprise conduction and valence energy bands. The top of the valence band V1 of the undoped tunneling enhancement layer is above the top of the valence band V2 of the p-type Group III nitride layer at the band offset interface to generate a capacity for a relatively high concentration of holes in the undoped tunneling enhancement layer at the band offset interface. Additional embodiments are disclosed and claimed.
    Type: Application
    Filed: September 3, 2009
    Publication date: March 3, 2011
    Inventors: Rajaram Bhat, Jerome Napierala, Dmitry Sizov, Jingqun Xi, Chung-En Zah
  • Publication number: 20100150193
    Abstract: Multi-quantum well laser structures are provided comprising active and/or passive MQW regions. Each of the MQW regions comprises a plurality of quantum wells and intervening barrier layers. Adjacent MQW regions are separated by a spacer layer that is thicker than the intervening barrier layers. The bandgap of the quantum wells is lower than the bandgap of the intervening barrier layers and the spacer layer. The active region may comprise active and passive MQWs and be configured for electrically-pumped stimulated emission of photons or it may comprises active MQW regions configured for optically-pumped stimulated emission of photons.
    Type: Application
    Filed: December 16, 2008
    Publication date: June 17, 2010
    Inventors: Rajaram Bhat, Jerome Napierala, Dmitry Sizov, Chung-En Zah
  • Patent number: 7615389
    Abstract: Ga(In)N-based laser structures and related methods of fabrication are proposed where Ga(In)N-based semiconductor laser structures are formed on AlN or GaN substrates in a manner that addresses the need to avoid undue tensile strain in the semiconductor structure. In accordance with one embodiment of the present invention, a Ga(In)N-based semiconductor laser is provided on an AlN or GaN substrate provided with an AlGaN lattice adjustment layer where the substrate, the lattice adjustment layer, the lower cladding region, the active waveguiding region, the upper cladding region, and the N and P type contact regions of the laser form a compositional continuum in the semiconductor laser. Additional embodiments are disclosed and claimed.
    Type: Grant
    Filed: August 15, 2007
    Date of Patent: November 10, 2009
    Assignee: Corning Incorporated
    Inventors: Rajaram Bhat, Jerome Napierala, Dmitry Sizov, Chung-En Zah
  • Publication number: 20090101924
    Abstract: Methods and apparatus for producing a gallium nitride semiconductor on insulator structure include: bonding a single crystal silicon layer to a transparent substrate; and growing a single crystal gallium nitride layer on the single crystal silicon layer.
    Type: Application
    Filed: October 18, 2007
    Publication date: April 23, 2009
    Inventors: Rajaram Bhat, Kishor Purushottam Gadkaree, Jerome Napierala, Linda Ruth Pinckney, Chung-En Zah
  • Publication number: 20080299691
    Abstract: Ga(In)N-based laser structures and related methods of fabrication are proposed where Ga(In)N-based semiconductor laser structures are formed on AlN or GaN substrates in a manner that addresses the need to avoid undue tensile strain in the semiconductor structure. In accordance with one embodiment of the present invention, a Ga(In)N-based semiconductor laser is provided on an AlN or GaN substrate provided with an AlGaN lattice adjustment layer where the substrate, the lattice adjustment layer, the lower cladding region, the active waveguiding region, the upper cladding region, and the N and P type contact regions of the laser form a compositional continuum in the semiconductor laser. Additional embodiments are disclosed and claimed.
    Type: Application
    Filed: August 15, 2007
    Publication date: December 4, 2008
    Inventors: Rajaram Bhat, Jerome Napierala, Dmitry Sizov, Chung-En Zah