Abstract: A liquid vacuuming device for drawing off and vacuuming up liquids may include a housing (1), an extractor device formed by at least one extracting lip (7) for extracting and collecting the liquid in front of at least one vacuum mouth (5), a vacuuming device that features a motor-driven vacuum subassembly and is able to vacuum an air/liquid flow mixed with the liquid to be vacuumed up along a flow pathway from the vacuum mouth (5) through an intake channel (4) into the housing (1), a separating device (13) for separating the liquid from the air and a tank for receiving the separated liquid. The device may further include an on/off function that turns on the motorized drive or increases the motor power when pressure is exerted upon the extracting lip (7) and turns off the motorized drive or reduces the motor power when the pressure decreases. Similar functionality may be implemented by an orientation switch.

Abstract: The present disclosure relates to an actuator for projection exposure systems that include a magnet. The magnet is encapsulated and/or supported in a magnet holding plate that is produced by microtechnical production methods so that a moving manipulator surface is held in the magnet holding plate via monolithic or bonded connections without additional connecting material so that there is a secure connection.

Abstract: A vessel cover and/or splash guard for cooking or household vessels, which may be formed from a plurality of individual segments that may be supported relative to one another so as to be rotatable about an axis of rotation at different heights, so that they can be fanned out a screen-like manner.

Abstract: A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or an energy transmission device are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly at least during specific operating states of the projection exposure apparatus.

Abstract: A gravitation compensator for mounting optical elements in a projection exposure apparatus and a corresponding projection exposure apparatus are disclosed. The gravitation compensator at least partly compensates for the weight force of a mounted optical element and simultaneously enables a change in the position of the optical element without the compensated weight force being altered in an impermissible manner during the change in position. This applies, in particular, to high weight forces which are to be compensated. Furthermore, the gravitation compensator enables use in different atmospheres and the compensation of corresponding aging effects.

Abstract: A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or an energy transmission device are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly at least during specific operating states of the projection exposure apparatus.

Abstract: The invention relates to arrangements for actuating an element in a microlithographic projection exposure apparatus. In accordance with one aspect, an arrangement for actuating an element in a microlithographic projection exposure apparatus comprises a first number (nR) of degrees of freedom, wherein an adjustable force can be transmitted to the optical element in each of the-degrees of freedom, and a second number (nA) of actuators, which are coupled to the optical element in each case via a mechanical coupling for the purpose of transmitting force to the optical element, wherein the second number (nA) is greater than the first number (nR). In accordance with one aspect, at least one of the actuators is arranged in a node of at least one natural vibration mode of the optical element.

Abstract: A gravitation compensator for mounting optical elements in a projection exposure apparatus and a corresponding projection exposure apparatus are disclosed. The gravitation compensator at least partly compensates for the weight force of a mounted optical element and simultaneously enables a change in the position of the optical element without the compensated weight force being altered in an impermissible manner during the change in position. This applies, in particular, to high weight forces which are to be compensated. Furthermore, the gravitation compensator enables use in different atmospheres and the compensation of corresponding aging effects.

Abstract: A method of controlling an apparatus comprising a plurality of features and adapted to receive messages via a first network interface, wherein said method is implemented in a filter superposed on the top of an existing architecture of the apparatus. The method comprises the following steps: receiving network management message via said first network interface; interrogating said message in order to identify a feature said network management message relates to and filtering the received management message such that said management message is rejected if the identified feature is classified as disabled and said management message is allowed top go through if said feature is classified as enabled.

Abstract: The invention relates to arrangements for actuating an element in a microlithographic projection exposure apparatus. In accordance with one aspect, an arrangement for actuating an element in a microlithographic projection exposure apparatus comprises a first number (nR) of degrees of freedom, wherein an adjustable force can be transmitted to the optical element in each of the degrees of freedom, and a second number (nA) of actuators, which are coupled to the optical element in each case via a mechanical coupling for the purpose of transmitting force to the optical element, wherein the second number (nA) is greater than the first number (nR). In accordance with one aspect, at least one of the actuators is arranged in a node of at least one natural vibration mode of the optical element.

Abstract: The invention relates to arrangements for actuating an element in a microlithographic projection exposure apparatus. In accordance with one aspect, an arrangement for actuating an element in a microlithographic projection exposure apparatus comprises a first number (nR) of degrees of freedom, wherein an adjustable force can be transmitted to the optical element in each of the degrees of freedom, and a second number (nA) of actuators, which are coupled to the optical element in each case via a mechanical coupling for the purpose of transmitting force to the optical element, wherein the second number (nA) is greater than the first number (nR). In accordance with one aspect, at least one of the ac-tuators is arranged in a node of at least one natural vibration mode of the optical element.

Abstract: The invention relates to a vessel cover for vessels in the form of cooking vessels or household vessels, comprising a cover (1), which is formed from a plurality of individual segments (2), which can be placed on the vessel edge, wherein the individual segments (2) are supported relative to one another so as to be rotatable about an axis of rotation at different heights, so that they can be fanned out a screen-like manner for the purpose of forming the cover (1), which at least partially covers the vessel, and can be rotated one on top of the other so as to form a stack in an inoperative position. The known covers have the disadvantage that they require a comparatively large amount of seepage space and/or that they can be attached to a steaming vessel only with the risk of being burnt.

Abstract: An arrangement actuates an element in a microlithographic projection exposure apparatus. The arrangement includes first and second actuators and first and second mechanical couplings. The first and second actuators are coupled to the element via corresponding ones of the first and second mechanical couplings for applying respective forces to the element which is regulatable in at least one degree of freedom. The first and second actuators have first and second actuator masses, respectively, and the first actuator mass and the first mechanical coupling conjointly define a first mass-spring system operating as a first low-pass filter. The second actuator mass and the second mechanical coupling conjointly define a second mass-spring system operating as a second low-pass filter. The first and second mass-spring systems have first and second natural frequencies deviating from each other by a maximum deviation equal to 10% of the largest of the first and second natural frequencies.

Abstract: A method and apparatus for processing underwater beds includes a plurality of polygonal hollow pipes arranged side by side, the upper ends of which form a horizontal, substantially flat working platform. Each hollow pipe has a horizontal projection with a flange extending vertically and a corresponding flange insertion aperture with a slot immediately above it running vertically and extending as far as the upper end of the hollow pipe, the aperture being further away from the upper end of the hollow pipe than the projection with the flange and having a greater horizontal dimension than the slot. Neighboring hollow pipes engage one another via a respective projection with a corresponding slot. The hollow pipes cannot be moved relative to one another horizontally. Individual pipes can only be pulled out individually in an upward direction at the platform outer edge.

Abstract: In a method for operating an internal combustion engine with a plurality of combustion chambers, wherein a discrepancy between an actual operating performance and a target operating performance of at least one of the combustion chambers is detected, the ignition point is shifted in only the combustion chamber that has the discrepancy in order to influence combustion so as to compensate for the discrepancy.

Abstract: A mopping device includes a mopping head having at least one of a mopping cloth, a mopping cover, a mopping bundle, and a mopping pad. The mopping device further includes a handle and a multi-turn actuator.

Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Abstract: An illumination system for illuminating a mask in a microlithographic exposure apparatus has an optical axis and a pupil surface. The system can include an array of reflective or transparent beam deflection elements such as mirrors. Each deflection element can be adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements can be arranged in a first plane. The system can further include an optical raster element, which includes a plurality of microlenses and/or diffractive structures. The beam deflection elements), which can be arranged in a first plane, and the optical raster element, which can be arranged in a second plane, can commonly produce a two-dimensional far field intensity distribution. An optical imaging system can optically conjugate the first plane to the second plane.

Abstract: A foldable wiper plate includes a first plate wing pivotable about a first axis, and a second plate wing pivotable about a second axis differing from the first axis. The first plate wing includes a first lock-in device that releasably interlocks the first plate wing with the second axis.

Abstract: Flame-retardant polymer foams which comprise, as flame retardant, at least one halogenated polymer, for example brominated polystyrene or styrene-butadiene block copolymer having bromine content in the range from 40 to 80% by weight, or tetrabromobisphenol A compounds (TBBPA), processes for producing these, and also flame-retardant expandable styrene polymers.