Abstract: Methods and apparatus to facilitate the measurement of the amount of scattered electrons collected by an anti-fogging baffle arrangement are provided. For some embodiments, by affixing a lead to an electrically isolated (floating) portion of the baffle arrangement, the amount of scattered electrons collected thereby may be read out, for example, as a current signal. Thus, for such embodiments, the baffle arrangement may double as a detector, allowing an image of surface (e.g., a mask or substrate surface) to be generated.

Abstract: The present invention provides a charged particle beam energy width reduction system. The system comprises a first element acting in a focusing and dispersive manner in an x-z-plane; a second element acting in a focusing and dispersive manner in the x-z-plane; a charged particle selection element positioned between the first and the second element acting in a focusing and dispersive manner; and a focusing element positioned between the first and the second element acting in a focusing and dispersive manner.

Abstract: The present invention provides a charged particle beam apparatus with a charged particle beam source including an emitter with an emitter tip; and supporting member for supporting the emitter. Further, the apparatus includes an emitter location-measuring device for repeatedly measuring the location of the emitter; and a deflector system for compensating variations in the location of the emitter.

Abstract: The present invention provides a charged particle beam device. The device comprises a first lens generating a crossover a second lens positioned after the crossover and an element acting in a focusing and dispersive manner in an x-z-plane with a center of the element having essentially same z-position as the crossover. Further, a multipole element, which acts in the x-z-plane and a y-z-plane is provided. A first charged particle selection element and a second charged particle selection element are used for selecting a portion of the charged particles. Thereby, e.g. the energy width of the charged particle beam can be reduced.

Abstract: A multifunction module for an electron beam column comprises upper and lower electrodes, and a central ring electrode. The upper and lower electrodes have multipoles and are capable of deflecting, or correcting an aberration of, an electron beam passing through the electrodes. A voltage can be applied to the central ring electrode independently of the voltages applied to the upper and lower electrodes to focus the electron beam on a substrate.

Abstract: The present invention provides an aberration correction device. The aberration correction device comprises a Wien filter element, a quadrupole element for compensating a focusing property of the Wien filter element, and at least one multipole element for spherical aberration correction. The Wien filter element and said quadrupole element are adapted to generate, in combination, an astigmatic image. Furthermore, the at least one multipole element is adapted to act essentially in a plane of sagittal or meridional focus of the astigmatic image. Thereby, chromatic aberration is reduced as well as spherical aberration can be corrected.

Abstract: A charged particle beam apparatus is provided, which comprises a charged particle beam column for generating a primary charged particle beam; a focusing assembly, such as a charged particle lens, e.g., an electrostatic lens, for focusing the primary charged particle beam on a specimen; a detector for detecting charged signal particles which are emerging from the specimen; and a deflector arrangement for deflecting the primary charged particle beam. The deflector arrangement is arranged downstream of the focusing assembly and is adapted for allowing the charged signal particles passing therethrough. The detector is laterally displaced with respect to the optical axis in a deflection direction defined by the post-focusing deflector arrangement.

Abstract: The present invention relates to an analyzing system with improved detection scheme and a charged particle beam device comprising the same. The analyzing system for analyzing a beam of charged particles has a divider to divide the beam of charged particles according to their energies into a low energy beam and a high energy beam; a front detector for detecting the high energy beam; and at least one reverse detector for detecting the low energy beam. The divider is positioned between the front detector and the at least one reverse detector and the front detector and/or the at least one reverse detector are segmented.

Abstract: The present invention relates to a beam optical component including a charged particle lens for focusing a charged particle beam, the charged particle lens comprising a first element having a first opening for focusing the charged particle beam; a second element having a second opening for focusing the charged particle beam and first driving means connected with at least one of the first element and the second element for aligning the first opening with respect to the second opening. With the first driving means, the first opening and the second opening can be aligned with respect to each other during beam operation to provide a superior alignment of the beam optical component for a better beam focusing. The present invention also relates to a charged particle beam device that uses said beam optical component for focusing the charged particle beam, and a method to align first opening and second opening with respect to each other.

Abstract: An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a plurality of electron beam lenses. In one version, the optical parameters of the electron beam blanker, beam shaping module, and electron beam optics are set to achieve an acceptance semi-angle ? of from about ¼ to about 3 mrads, where the acceptance semi-angle ? is half the angle subtended by the electron beam at the writing plane. The beam-shaping module can also operate as a single lens using upper and lower projection lenses. A multifunction module for an electron beam column is also described.

Abstract: An ion beam device is described. The ion beam device includes an ion beam source for generating an ion beam, the ion beam being emitted along a first axis, an aperture unit adapted to shape the ion beam, and an achromatic deflection unit adapted to deflect ions of the ion beam having a predetermined mass by a deflecting angle. The achromatic deflection unit includes: an electric field generating component for generating an electric field, and a magnetic field generating component for generating a magnetic field substantially perpendicular to the electric field. The device further includes a mass separation aperture adapted for blocking ions with a mass different from the predetermined mass and for allowing ions having the predetermined mass to trespass the mass separator, and an objective lens having a second optical axis, wherein the second optical axis is inclined with regard to the first axis.

Abstract: An apparatus for in-situ specimen preparation is described. The apparatus includes an ion beam column 21 including at least: an liquid metal alloy ion source 56 including a first element for providing a light ion species with a mass of 10 g/mol to 60 g/mol and a second element for providing a heavy ions species with a mass of 150 g/mol or higher, a mass separator 58 for selectively separating the light ion species and the heavy ion species, and a focusing element for focusing the ion beam on a specimen. The apparatus further includes a specimen-beam-tilt unit for tilting the ion beam with respect to the specimen.

Abstract: A focused ion beam device is described. The device includes an ion beam column including an enclosure for housing an emitter with an emitter area for generating ions, a first gas inlet adapted to introduce a first gas to the emitter area, a second gas inlet adapted to introduce a second gas different from the first gas to the emitter area, and a switching unit adapted to switch between introducing the first gas and introducing the second gas.

Abstract: The present invention relates to a charged particle unit for deflecting and energy-selecting charged particles of a charged particle beam. Thereby, a double-focusing sector unit for deflecting and focusing the charged particle beam and an energy-filter forming a potential is provided, whereby charged particles of the charged particles beam are redirected at the potential-saddle depending on the energy of the charged articles.

Abstract: The present invention relates to a focusing lens, a charged particle beam device, and a method for focusing a charged particle beam onto a specimen, wherein the focusing lens comprises an auxiliary electrode having an essentially planar electrode surface for focusing the charged particle beam at a tilted landing angle, wherein the essentially planar electrode surface includes an auxiliary electrode angle with the optical axis of the focusing lens that is smaller than 80 degrees. With such a focusing lens, it is possible to operate a charged particle beam device at a tilted landing angle where focusing field distortions, caused by the tilted landing angle, are reduced.

Abstract: Embodiments of the present invention may be utilized to improve electron beam deflection. One embodiment provides an electrostatic deflection system with electrodes that minimize aberrations and to achieve vertical incidence simultaneously. By using at least two stages of deflection for a deflection direction, the present invention allows the deflected electron beam to pass a back focal plane of an objective lens while deflection capacitors are not disposed across the back focal plane. As a result, deflection electrodes can have an angle of 120° to minimize aberrations and simultaneously achieve vertical incidence of the electron beam on a target to avoid distortions or changes in magnification with height variations of the target or focus variations.

Abstract: The present invention relates to charged particle beam devices. The devices comprise an emitter for emitting charged particles; an aperture arrangement with at least two apertures for separating the emitted charged particles into at least two independent charged particle beams; and an objective lens for focusing the at least two independent charged particle beams, whereby the independent charged particle beams are focused onto the same location within the focal plane.

Abstract: The present invention relates to e.g.

Abstract: The invention provides a charged particle beam device for irradiating a specimen, comprising a particle source for providing a beam of charged particles, an optical device for directing the beam of charged particles onto the specimen and an ozone unit for reducing the charging and/or contamination of the specimen. The ozone unit comprises a supply of ozone and a specimen nozzle unit for directing an ozone gas flow to the specimen. Further, the invention provides a charged particle beam device for irradiating a specimen comprising a particle source for providing a beam of charged particles, an optical device for directing the beam of charged particles onto the specimen, a detector and a gas unit for reducing the charging and/or contamination of the detector. The gas unit comprises a supply of gas and a detector nozzle unit for directing a gas flow to the detector. Further, the present invention provides methods for operating charged particle beam devices according to the present invention.

Abstract: The invention provides an optical system for a charged particle multi-beam system. The optical system comprises an electrostatic lens component and a magnetic lens component. The components are used to focus a plurality of charged particle beams in a separate opening for each of at least a plurality a charged particle beams traveling through the optical system.