Abstract: A massage pin for skin blood circulation promoters has a lower end to/from which a silver conductor having stable electrical resistance is coupled or separated by a user of a skin blood circulation promoter, as needed. The massage pin includes: a coupling portion formed at an upper end of the massage pin and press-fitted into a circuit board disposed between a main body and a cover of a blood circulation promoter, the coupling portion being formed of a conductive rubber. An exposed portion extends from a lower end of the coupling portion and is exposed outside through a massage pin-passage hole formed through the cover. The exposed portion has a downwardly tapered connection portion extending from a lower end thereof and includes a silver conductor detachably coupled to the connection portion. The conductor has a reception portion open at an upper portion thereof.

Abstract: A pellicle transfer apparatus includes; a base including supporting a target plate, a pellicle and a flexible plate sequentially stacked on the base, and a roller unit laterally movable in a first direction across the base and including a lower roller extending in a second direction intersecting the first direction, and an upper roller above the lower roller and extending in the second direction, wherein the lower roller compresses the flexible plate while the roller unit laterally moves in the first direction across the base to bond the pellicle to the target plate, as the pellicle is separated from the flexible plate, and the flexible plate moves upward to wrap around the lower roller, and the upper roller contacts the flexible plate as it wraps around the lower roller.

Abstract: Methods of manufacturing a pellicle assembly may include forming a sublimable support layer on a first surface of a pellicle membrane, attaching a pellicle frame to a second surface of the pellicle membrane while the sublimable support layer is on the first surface of the pellicle membrane, and sublimating the sublimable support layer while the pellicle frame is attached to the pellicle membrane. In order to manufacture a photomask assembly, a photomask is fixed to the pellicle frame such that the photomask faces the pellicle membrane with the pellicle frame therebetween.

Abstract: A method of manufacturing a pellicle includes preparing a pellicle frame having an adhesive layer coated thereon, treating a pellicle membrane with vapor under vapor atmosphere, attaching the pellicle membrane onto the pellicle frame, and drying the pellicle membrane.

Abstract: Plasma enhanced atomic layer deposition (PEALD) processes for simultaneously depositing SiOC on two or more different surfaces of a substrate are provided. For example, SiOC may be deposited simultaneously on a first dielectric surface and a second metal or metallic surface. The PEALD processes can comprise two or more deposition cycles for forming SiOC on the two surfaces. The deposition cycles may comprise alternately and sequentially contacting the substrate with a first precursor comprising silicon and a second plasma reactant, such as an Ar/H2 plasma. In some embodiments, a PEALD process further comprises contacting the substrate with a plasma reactant prior to beginning the deposition cycle. In some embodiments, the deposition cycle is repeated more than 500 times and a uniform SiOC film may be formed on the two different surfaces.

Abstract: Disclosed is a composition for promoting hair growth or preventing hair loss containing an Aster ageratoides alcohol extract or a solvent fraction obtained through fractionation therefrom as an active ingredient. The composition for promoting hair growth or preventing hair loss has excellent effects of inducing hair growth in a growth phase, preventing hair loss in a catagen phase and proliferating skin cells, and is thus capable of effectively overcoming a variety of problems caused by hair-growth promotion agents or hair-loss prevention agents.

Abstract: Disclosed are a Filipendula glaberrima alcoholic extract and solvent fractions fractionated therefrom or novel compounds 1 and 2 purely isolated from a Filipendula glaberrima ethyl acetate fraction that have an excellent inhibitory effect against HMG-CoA reductase activity, an excellent antioxidant effect and a remarkably excellent effect of suppressing the formation of foam cells in macrophages. Also, disclosed is a pharmaceutical composition or health food composition for treating, preventing and ameliorating vascular diseases, hypercholesterolemia, or heart diseases caused by hypercholesterolemia, or lowering blood cholesterol levels, containing, as active ingredients, the Filipendula glaberrima alcoholic extract and the solvent fractions or the novel compounds 1 and 2.

Abstract: An EUV lithography apparatus may include a light source, an EUV mask and a carbon-based optical filter. The light source may generate an EUV light. The EUV mask may be configured to apply the EUV light to a photoresist film on a substrate. The carbon-based optical filter may filter a light having an OoB wavelength in the EUV light. Thus, the EUV light may not include the light having the OoB wavelength to decrease an error of a photoresist pattern formed using the EUV light.

Abstract: A vacuum packaging device according to the present invention comprises: a vacuum packaging unit for vacuum-packaging a packaging sheet; and a cutting unit provided on the vacuum packaging unit so as to form a notch for tearing on the packaging sheet.

Abstract: An EUV lithography apparatus may include a light source, an EUV mask and a carbon-based optical filter. The light source may generate an EUV light. The EUV mask may be configured to apply the EUV light to a photoresist film on a substrate. The carbon-based optical filter may filter a light having an OoB wavelength in the EUV light. Thus, the EUV light may not include the light having the OoB wavelength to decrease an error of a photoresist pattern formed using the EUV light.

Abstract: Methods for controlling the formation of oxygen containing thin films, such as silicon oxycarbide (SiOC) and silicon oxycarbonitride (SiOCN) thin films, on a substrate in a reaction space are provided. The methods can include at least one plasma enhanced atomic layer deposition (PEALD) cycle including alternately and sequentially contacting the substrate with a silicon precursor that comprises oxygen and a second reactant that does not include oxygen. In some embodiments the plasma power can be selected from a range to achieve a desired step coverage or wet etch rate ratio (WERR) for films deposited on three dimensional features.

Abstract: A pellicle for a photomask comprises a pellicle membrane. The pellicle membrane incudes a base layer having a first surface and a second surface facing the first surface, and a first recovery layer covering the first surface of the base layer. A content of SP2 covalent bonds between carbon atoms contained in the first recovery layer is less than or equal to a content of SP2 covalent bonds between carbon atoms contained in the base layer.

Abstract: Methods of manufacturing a pellicle assembly may include forming a sublimable support layer on a first surface of a pellicle membrane, attaching a pellicle frame to a second surface of the pellicle membrane while the sublimable support layer is on the first surface of the pellicle membrane, and sublimating the sublimable support layer while the pellicle frame is attached to the pellicle membrane. In order to manufacture a photomask assembly, a photomask is fixed to the pellicle frame such that the photomask faces the pellicle membrane with the pellicle frame therebetween.

Abstract: A method of manufacturing a pellicle includes preparing a pellicle frame having an adhesive layer coated thereon, treating a pellicle membrane with vapor under vapor atmosphere, attaching the pellicle membrane onto the pellicle frame, and drying the pellicle membrane.

Abstract: A pellicle for a photomask comprises a pellicle membrane. The pellicle membrane includes a base layer having a first surface and a second surface facing the first surface, and a first recovery layer covering the first surface of the base layer. A content of SP2 covalent bonds between carbon atoms contained in the first recovery layer is less than or equal to a content of SP2 covalent bonds between carbon atoms contained in the base layer.

Abstract: A vacuum device according to the present invention may comprise: a vacuum unit for suctioning air from inside a packaging back through a check valve of the packaging back, thereby generating a vacuum therein; and a clamping unit provided on the vacuum unit so as to clamp the packaging back such that the check valve of the packaging back airtightly communicates with an air suction portion of the vacuum unit.

Abstract: The present invention relates to a detoxifying composition containing a new green extract, which is a medicinal herb, as an active ingredient. Thus, toxicities in the human body can be efficiently removed without side effects by activating an enzyme necessary for detoxification.

Abstract: The present disclosure relates to an oxidation-resistant and/or corrosion-resistant hybrid structure including a metal layer (thin film layer) coated on the exterior of a conductive polymer structure, and a preparation method for the hybrid structure.

Abstract: A method of manufacturing a pellicle includes preparing a pellicle frame having an adhesive layer coated thereon, treating a pellicle membrane with vapor under vapor atmosphere, attaching the pellicle membrane onto the pellicle frame, and drying the pellicle membrane.

Abstract: The present invention relates to an apparatus for recycling waste raw material, capable of melting and recycling, according to size, small-particle waste metal transported by a small-particle waste metal conveyer (411), medium-particle waste metal transported by a medium-particle waste metal conveyer (412), and large-particle waste metal transported by a large-particle waste metal conveyer (413), and of recycling slag transported by a slag conveyer (414) into cover material, thereby recycling resources as well as preventing environmental pollution in advance.