Abstract: Disclosed is a clock spring-based rotational force generating device capable of allowing a user to freely adjust rotation speed of an output shaft and preventing the output shaft from rotating slowly or never rotating due to an weakened unwinding force of a spiral spring in the late period of an operation span of the spiral spring. The device includes an input shaft, a main drive gear receiving the rotational force of the input shaft, a spiral spring wound around a main drive gear shaft, a speed gear to increase the rotational force of the main drive gear, a power transmission control gear sliding up and down to control transmission of the rotational force of the main drive gear to the speed gear, an output shaft outputting the rotational force increased by the speed gear, and a rotation speed control means for controlling the rotation speed of the output shaft.

Abstract: A method of processing a substrate by omitting a photolithographic process is disclosed. The method includes forming at least one layer on a stepped structure having an upper surface, a lower surface, and a side surface that connects the upper surface to the lower surface, selectively densifying portions of the at least one layer respectively on the upper surface and the lower surface via asymmetric plasma application, and performing an isotropic etching process on the at least one layer. During the isotropic etching process, the portion of the at least one layer formed on the upper surface is separated from the portion of the at least one layer formed on the lower surface.

Abstract: An electronic device is provided. The electronic device includes a communication circuit configured to perform wireless communication, a memory configured to store an exercise schedule to be divided into a plurality of segments, and a processor configured to electrically connect with the communication circuit and the memory. The processor is configured to send a segment automatically selected based on at least one of a policy defined in the electronic device or attributes of an external device from among the plurality of segments included in the exercise schedule to the external device, if the electronic device connects with the external device through the wireless communication and to receive an exercise record collected by the external device from the external device, if the electronic device connects with the external device again through the wireless communication after the wireless communication is disconnected.

Abstract: A method of processing a substrate by omitting a photolithographic process is disclosed. The method includes forming at least one layer on a stepped structure having an upper surface, a lower surface, and a side surface that connects the upper surface to the lower surface, selectively densifying portions of the at least one layer respectively on the upper surface and the lower surface via asymmetric plasma application, and performing an isotropic etching process on the at least one layer. During the isotropic etching process, the portion of the at least one layer formed on the upper surface is separated from the portion of the at least one layer formed on the lower surface.

Abstract: Methods for selectively depositing oxide thin films on a dielectric surface of a substrate relative to a metal surface are provided. The methods can include at least one plasma enhanced atomic layer deposition (PEALD) cycle including alternately and sequentially contacting the substrate with a first precursor comprising oxygen and a species to be included in the oxide, such as a metal or silicon, and a second plasma reactant. In some embodiments the second plasma reactant comprises a plasma formed in a reactant gas that does not comprise oxygen. In some embodiments the second plasma reactant comprises plasma generated in a gas comprising hydrogen.

Abstract: An adhesive for a pellicle, the adhesive including a phenol compound, the phenol compound having at least two hydroxyl groups, a polymer having a hydroxyl group or an amine group, and water.

Abstract: A pellicle for a photomask comprises a pellicle membrane. The pellicle membrane includes a base layer having a first surface and a second surface facing the first surface, and a first recovery layer covering the first surface of the base layer. A content of SP2 covalent bonds between carbon atoms contained in the first recovery layer is less than or equal to a content of SP2 covalent bonds between carbon atoms contained in the base layer.

Abstract: A method according to various embodiments of the present invention can comprise operations of: receiving a first healthcare program from another electronic device; generating a first schedule including at least one activity on the basis of the received first healthcare program; providing notification to a user on the basis of the first schedule; sensing an activity of the user related to a first activity during the at least one activity; linking, with the first activity, a first item included in an exercise application associated with the first activity; and reflecting, in the first item, user activity information related to the first activity.

Abstract: Disclosed is a centrifugal filtration apparatus including a casing, a shaft, a stand tube, a rotor, and a stereoscopic filter. The shaft is vertically installed in the casing and guides a fluid to an upper end of the casing. The stand tube rotates about the shaft and sprays the fluid to the upper end of the casing. The rotor rotates along with the stand tube and forms a space in the casing to receive and filter the fluid sprayed from the stand tube. The stereoscopic filter includes a plate member and wire members. The plate member is rolled up around the stand tube and is installed in the rotor. The wire member is installed between layers of the plate member to secure a gap between the layers of the plate member and forms a filter layer to filter the fluid that flows between the layers of the plate member.

Abstract: Provided is a pellicle for exposure to extreme ultraviolet light (EUVL) according to an example embodiment, and the pellicle includes a pellicle membrane; and a frame attached to the pellicle membrane, wherein the pellicle membrane includes a carbon-based main layer that has a first surface and a second surface, which are two surfaces opposite to each other; and a boron-based enhancement layer covering at least one surface selected from the first surface and the second surface. The pellicle according to an example embodiment may be used for an extended period of time in an extreme ultraviolet light exposure environment.

Abstract: A pellicle film for extreme ultraviolet (EUV) lithography includes a graphite-containing thin film.

Abstract: A method of processing a substrate to enable selective doping without a photolithography process is provided. The method includes forming a diffusion barrier on the substrate having a patterned structure using plasma deposition method, removing the diffusion barrier except for part of the diffusion barrier using wet etching, forming a diffusion source layer on the patterned structure and the part of the diffusion barrier, and applying energy to the diffusion source layer.

Abstract: A method for fabricating a semiconductor device includes forming a pellicle including an amorphous carbon layer, attaching the pellicle onto a reticle, and forming a photoresist pattern by utilizing EUV light transmitted through the pellicle and reflected by the reticle. The forming the pellicle includes forming a first dielectric layer on a first side of the substrate, forming the amorphous carbon layer on the first dielectric layer, forming a second dielectric layer on a second side of the substrate opposite to the first side of the substrate, etching the second dielectric layer overlapping the first region of the substrate to form a mask pattern, and forming a support including the second region of the substrate and the remaining part of the first dielectric layer. The forming the support includes etching the first region of the substrate and the first dielectric layer on the first region.

Abstract: Plasma enhanced atomic layer deposition (PEALD) processes for simultaneously depositing SiOC on two or more different surfaces of a substrate are provided. For example, SiOC may be deposited simultaneously on a first dielectric surface and a second metal or metallic surface. The PEALD processes can comprise two or more deposition cycles for forming SiOC on the two surfaces. The deposition cycles may comprise alternately and sequentially contacting the substrate with a first precursor comprising silicon and a second plasma reactant, such as an Ar/H2 plasma. In some embodiments, a PEALD process further comprises contacting the substrate with a plasma reactant prior to beginning the deposition cycle. In some embodiments, the deposition cycle is repeated more than 500 times and a uniform SiOC film may be formed on the two different surfaces.

Abstract: The present invention relates to a detoxifying composition containing a new green extract, which is a medicinal herb, as an active ingredient. Thus, toxicities in the human body can be efficiently removed without side effects by activating an enzyme necessary for detoxification.

Abstract: A semiconductor manufacturing method includes depositing a low-k dielectric layer, forming a trench in the low-k dielectric layer, forming a barrier layer in the trench, filling a metal on the barrier layer, planarizing the metal, and forming a capping layer on the planarized metal, wherein the capping layer includes at least two layers.

Abstract: Disclosed is a clock spring-based rotational force generating device capable of allowing a user to freely adjust rotation speed of an output shaft and preventing the output shaft from rotating slowly or never rotating due to an weakened unwinding force of a spiral spring in the late period of an operation span of the spiral spring. The device includes an input shaft, a main drive gear receiving the rotational force of the input shaft, a spiral spring wound around a main drive gear shaft, a speed gear to increase the rotational force of the main drive gear, a power transmission control gear sliding up and down to control transmission of the rotational force of the main drive gear to the speed gear, an output shaft outputting the rotational force increased by the speed gear, and a rotation speed control means for controlling the rotation speed of the output shaft.

Abstract: A method of processing a substrate by omitting a photolithographic process is disclosed. The method includes forming at least one layer on a stepped structure having an upper surface, a lower surface, and a side surface that connects the upper surface to the lower surface, selectively densifying portions of the at least one layer respectively on the upper surface and the lower surface via asymmetric plasma application, and performing an isotropic etching process on the at least one layer. During the isotropic etching process, the portion of the at least one layer formed on the upper surface is separated from the portion of the at least one layer formed on the lower surface.

Abstract: A method of processing a substrate by omitting a photolithographic process is disclosed. The method includes forming at least one layer on a stepped structure having an upper surface, a lower surface, and a side surface that connects the upper surface to the lower surface, selectively densifying portions of the at least one layer respectively on the upper surface and the lower surface via asymmetric plasma application, and performing an isotropic etching process on the at least one layer. During the isotropic etching process, the portion of the at least one layer formed on the upper surface is separated from the portion of the at least one layer formed on the lower surface.