Abstract: A method of operating a tracking circuit of a memory device includes charging a node of the tracking circuit to a first predetermined voltage level, the first node being electrically coupled with a first load device. A first plurality of tracking cell transistors are activated to discharge the first node toward a second predetermined voltage level. A reset signal is generated based on a signal at the first node. The reset signal may correspond to a waiting period for reading a memory cell of the memory device.

Abstract: A method of operating a tracking circuit of a memory device includes charging a node of the tracking circuit to a first predetermined voltage level, the first node being electrically coupled with a first load device. A first plurality of tracking cell transistors are activated to discharge the first node toward a second predetermined voltage level. A reset signal is generated based on a signal at the first node. The reset signal may correspond to a waiting period for reading a memory cell of the memory device.

Abstract: A memory circuit layout design includes first, second, third, and fourth memory cell regions abutting one another and corresponding to respective first, second, third, and fourth memory cells of the memory circuit. A first oxide diffusion (OD) layout pattern corresponds to a first active structure for forming the first and second memory cells, extends along a first direction, and has a shared source portion overlapping the first and second memory cell regions. A second OD layout pattern corresponds to a second active structure for forming the third and fourth memory cells, extends along the first direction, and has a shared source portion overlapping the third and fourth memory cell regions. A first conductive layout pattern corresponds to a first conductive structure under a lowest via plug layer of the memory circuit, extends along a second direction, and overlaps the shared source portions of the first and second OD layout patterns.

Abstract: A memory circuit includes a plurality of memory cells and a tracking circuit. Each memory cell of the plurality of memory cells includes a cell transistor corresponding to a predetermined transistor configuration. The tracking circuit includes a first tracking bit line, a first tracking word line, a reference voltage node, and a first plurality of tracking cells. Each tracking cell of the first plurality of tracking cells includes a cell transistor corresponding to the predetermined transistor configuration. The cell transistors of the first plurality of tracking cells are electrically coupled in series between the first tracking bit line and the reference voltage node, and gate terminals of the cell transistors of the first plurality of tracking cells are electrically coupled with the first tracking word line.

Abstract: A method of fabricating a memory array includes designing first layout sections in a row direction, each first layout section including first and second control lines in a first metal layer, and an upper conductive line in a third metal layer. A lower conductive line in a second metal layer is coupled to the first control line and the first control line is isolated from the second control line. A second layout section is inserted at every N-th first layout section, N being a positive integer equal to or greater than 2. The second layout section includes the first control line, the second control line and a lower conductive line in the second metal layer coupled to the second control line and to an upper conductive line in the third metal layer. The lower conductive lines in the first and second layout sections are isolated from each other.

Abstract: A memory circuit includes a first active structure extending along a first direction, a second active structure extending along the first direction, a first conductive structure extending along a second direction, and a lowest via plug layer over the first conductive structure. The first active structure has a shared source portion corresponding to a source node of a first memory cell of the memory circuit and a source node of a second memory cell of the memory circuit. The second active structure has a shared source portion corresponding to a source node of a third memory cell of the memory circuit and a source node of a fourth memory cell of the memory circuit. The first conductive structure electrically connects the shared source portion of the first active structure with the shared source portion of the second active structure.

Abstract: A method of fabricating a memory includes forming a first portion of a first line in a first metal layer, forming a first portion of a second line in the first metal layer, forming a second portion of the first line in a second metal layer, and forming a second portion of the second line in a third metal layer. The first line is over a plurality of memory cells. The second line is over the plurality of memory cells, the first line is electrically isolated from the second line, and the first line and the second line extend in a same direction. The second metal layer is over the first metal layer. The third metal layer is over the second metal layer and the third metal layer is electrically isolated from the first line.

Abstract: The described embodiments of mechanisms for placing dummy gate structures next to and/or near a number of wide gate structures reduce dishing effect for gate structures during chemical-mechanical polishing of gate layers. The arrangements of dummy gate structures and the ranges of metal pattern density have been described. Wide gate structures, such as analog devices, can greatly benefit from the reduction of dishing effect.

Abstract: A memory circuit includes a plurality of memory cells and a tracking circuit. Each memory cell of the plurality of memory cells includes a cell transistor corresponding to a predetermined transistor configuration. The tracking circuit includes a first tracking bit line, a first tracking word line, a reference voltage node, and a first plurality of tracking cells. Each tracking cell of the first plurality of tracking cells includes a cell transistor corresponding to the predetermined transistor configuration. The cell transistors of the first plurality of tracking cells are electrically coupled in series between the first tracking bit line and the reference voltage node, and gate terminals of the cell transistors of the first plurality of tracking cells are electrically coupled with the first tracking word line.

Abstract: A method of fabricating a memory includes forming a first portion of a first line in a first metal layer, forming a first portion of a second line in the first metal layer, forming a second portion of the first line in a second metal layer, and forming a second portion of the second line in a third metal layer. The first line is over a plurality of memory cells. The second line is over the plurality of memory cells, the first line is electrically isolated from the second line, and the first line and the second line extend in a same direction. The second metal layer is over the first metal layer. The third metal layer is over the second metal layer and the third metal layer is electrically isolated from the first line.

Abstract: A memory circuit includes a first active structure extending along a first direction, a second active structure extending along the first direction, a first conductive structure extending along a second direction, and a lowest via plug layer over the first conductive structure. The first active structure has a shared source portion corresponding to a source node of a first memory cell of the memory circuit and a source node of a second memory cell of the memory circuit. The second active structure has a shared source portion corresponding to a source node of a third memory cell of the memory circuit and a source node of a fourth memory cell of the memory circuit. The first conductive structure electrically connects the shared source portion of the first active structure with the shared source portion of the second active structure.

Abstract: A memory array includes an array of memory cells. The memory array further includes at least two read tracking cells in a read tracking column. The memory array further includes a read tracking circuit coupled to the at least two read tracking cells, wherein the read tracking circuit is configured to generate a global tracking result signal based on outputs from the at least two read tracking cells. The memory array further includes memory control circuitry, wherein the memory control circuitry is configured to reset a memory clock based on the global tracking result signal.

Abstract: A memory includes a plurality of memory cells. A first line is over the plurality of memory cells. The first line in a first layout section includes a first metal layer and a second metal layer. The second metal layer is over the first metal layer. A second line is over the plurality of memory cells. The second line in the first layout section includes the first metal layer and a third metal layer. The third metal layer is over the second metal layer The first line is electrically isolated from the second line. The first line and the second line extend in a same direction.

Abstract: The described embodiments of mechanisms for placing dummy gate structures next to and/or near a number of wide gate structures reduce dishing effect for gate structures during chemical-mechanical polishing of gate layers. The arrangements of dummy gate structures and the ranges of metal pattern density have been described. Wide gate structures, such as analog devices, can greatly benefit from the reduction of dishing effect.

Abstract: A method of designing a content-addressable memory (CAM) includes associating CAM cells with a summary circuit. The summary circuit includes a first level of logic gates and a second level of logic gates. The first level of logic gates have inputs each configured to receive an output of a corresponding one of the plurality of CAM cell. The second level of logic gates have inputs each configured to receive an output of a corresponding one of the first level of logic gates. Logic gates in at least one of the first level of logic gates or the second level of logic gates are selected to have an odd number of input pins so that an input pin and an output pin share a layout sub-slot.

Abstract: The described embodiments of mechanisms for placing dummy gate structures next to and/or near a number of wide gate structures reduce dishing effect for gate structures during chemical-mechanical polishing of gate layers. The arrangements of dummy gate structures and the ranges of metal pattern density have been described. Wide gate structures, such as analog devices, can greatly benefit from the reduction of dishing effect.

Abstract: A memory array includes an array of memory cells. The memory array further includes at least two read tracking cells in a read tracking column. The memory array further includes a read tracking circuit coupled to the at least two read tracking cells, wherein the read tracking circuit is configured to generate a global tracking result signal based on outputs from the at least two read tracking cells. The memory array further includes memory control circuitry, wherein the memory control circuitry is configured to reset a memory clock based on the global tracking result signal.

Abstract: A semiconductor structure includes a first strap cell, a first read port, and a first VSS terminal. The first strap cell has a first strap cell VSS region. The first read port has a first read port VSS region, a first read port read bit line region, and a first read port poly region. The first VSS terminal is configured to electrically couple the first strap cell VSS region and the first read port VSS region.

Abstract: A circuit includes a first transistor and a second transistor of a first type, a first transistor, a second transistor, a third transistor, and a fourth transistor of a second type. The first and second transistors of the first type, and the first transistor and the second transistor of the second type form a cross latch having a first node and a second node. A first terminal of the third transistor of the second type is coupled with the first node. A first terminal of the fourth transistor of the second type is coupled with the second node. At least one of a second terminal of the third transistor of the second type or a second terminal of the fourth transistor of the second type is configured to receive a signal sufficient to turn off the third transistor or the fourth transistor that is not directly from a power source.

Abstract: A method of designing a content-addressable memory (CAM) includes associating CAM cells with a summary circuit. The summary circuit includes a first level of logic gates and a second level of logic gates. The first level of logic gates have inputs each configured to receive an output of a corresponding one of the plurality of CAM cell. The second level of logic gates have inputs each configured to receive an output of a corresponding one of the first level of logic gates. Logic gates in at least one of the first level of logic gates or the second level of logic gates are selected to have an odd number of input pins so that an input pin and an output pin share a layout sub-slot.