Patents by Inventor Jacob A. Abraham

Jacob A. Abraham has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20030158688
    Abstract: A method for testing a system on a chip or a system on a package (““SOPC”) having a plurality of internal modules that are tested to determine whether predetermined performance specifications are satisfied. A first module of the SOPC is selected for testing. A determination is made as to whether the first module is directly accessible or not. If the first module is directly accessible, the module may be tested with automated test equipment external to the SOPC. If the first module is not directly accessible, the module may be tested with a second and third module of the SOPC.
    Type: Application
    Filed: October 24, 2002
    Publication date: August 21, 2003
    Inventors: Abhijit Chatterjee, Dave Majernik, Sasikumar Cherubal, Sudip Chakrabarti, Ramakrishna Voorakaranam, Jacob A. Abraham, Douglas Goodman
  • Patent number: 4948757
    Abstract: A method for preferentially etching phosphosilicate glass to form a micromechanical structure includes forming a layer of phosphosilicate glass on a substrate and opening at least one via in the phosphosilicate glass layer. A layer of material which is patterned to produce a micromechanical structure is formed over the phosphosilicate glass layer which extends through the via and adheres to the substrate. The phosphosilicate glass layer is then removed by immersing the device in an etchant bath containing an aqueous ammoniacal hydrogen peroxide solution. The resulting micromechanical structure has at least one point of attachment to the substrate and is otherwise spaced apart from the substrate by an air gap. A method for attaching an overhanging mass to a miniature cantilever beam using microelectronics fabrication technology is also provided in which the center of gravity is shifted to the endpoint of the free end of the beam.
    Type: Grant
    Filed: February 9, 1989
    Date of Patent: August 14, 1990
    Assignee: General Motors Corporation
    Inventors: Kailash C. Jain, Jacob A. Abraham
  • Patent number: 4918032
    Abstract: A method for preferentially etching phosphosilicate glass to form a micromechanical structure includes forming a layer of phosphosilicate glass on a substrate and opening at least one via in the phosphosilicate glass layer. A layer of material which is patterned to produce a micromechanical structure is formed over the phosphosilicate glass layer which extends through the via and adheres to the substrate. The phosphosilicate glass layer is then removed by immersing the device in an etchant bath containing an aqueous ammoniacal hydrogen peroxide solution. The resulting micromechanical structure has at least one point of attachment to the substrate and is otherwise spaced apart from the substrate by an air gap. A method for attaching an overhanging mass to a miniature cantilever beam using microelectronics fabrication technology is also provided in which the center of gravity is shifted to the endpoint of the free end of the beam.
    Type: Grant
    Filed: July 8, 1988
    Date of Patent: April 17, 1990
    Assignee: General Motors Corporation
    Inventors: Kailash C. Jain, Jacob A. Abraham