Patents by Inventor Jacob T. Williams

Jacob T. Williams has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200363116
    Abstract: An apparatus for cryostorage and manipulation of a plurality of container units includes a cryochamber having a cryo-access port. The cryochamber is electrically cooled at cryogenic temperatures. A unit holder is located inside the cryochamber and is configured to hold a plurality of container units. A user access area is provided for selectively permitting access to a chosen container unit by an authenticated user who has been authenticated by the apparatus. A motive grasper is provided for selectively removing the chosen container unit from the cryochamber through the cryo-access port, and selectively placing the chosen container unit into the user access area.
    Type: Application
    Filed: May 11, 2020
    Publication date: November 19, 2020
    Inventors: Gil Bradford Van Bokkelen, Rakesh Ramachandran, Christopher Robert Bruns, Christopher John Hayes, John A. Corey, Troy M. Coolidge, Bruce E. Frohman, Joseph Gordon, Thomas R. Ruth, Jacob T. Williams, Gregory E. Kramer, Nathan A. Abel, David J. Copeland, Matthew R. Gill, Steven F. Shane
  • Patent number: 10796741
    Abstract: A word line regulator provides a write word line voltage for an asserted word line and includes a write replica circuit, a reference current path, and a regulator circuit. The write replica circuit is a replica of a write path for writing from a low to high resistance value of a resistive memory element of a memory cell. The word line regulator regulates the word line voltage at a value during the write operation of a low to high resistance value such that a select transistor of the memory cell is used as a source follower to regulate a first node of a resistive element of the memory cell being written. The first node is at a higher write voltage than a second node of the resistive element during the write operation, and the first node is located in a write path between the select transistor and the second node.
    Type: Grant
    Filed: October 30, 2019
    Date of Patent: October 6, 2020
    Assignee: NXP USA, Inc.
    Inventors: Jacob T. Williams, Jon Scott Choy, Karthik Ramanan
  • Patent number: 9397201
    Abstract: A method of forming a flash memory cell includes forming a first hard mask and a second hard mask on a substrate. A select gate is formed as a spacer around the first hard mask. A charge storage layer is formed over the first and second hard masks and the select gate. A control gate is formed as a spacer around the second hard mask. A recess in the control gate is filled with a dielectric material. The recess is formed between a curved sidewall of the control gate and a sidewall of the charge storage layer directly adjacent the curved sidewall of the control gate.
    Type: Grant
    Filed: November 17, 2015
    Date of Patent: July 19, 2016
    Assignee: FREESCALE SEMICONDUCTOR, INC.
    Inventors: Jacob T. Williams, Cheong Min Hong, Sung-Taeg Kang, David G. Kolar, Jane A. Yater
  • Publication number: 20160071960
    Abstract: A method of forming a flash memory cell includes forming a first hard mask and a second hard mask on a substrate. A select gate is formed as a spacer around the first hard mask. A charge storage layer is formed over the first and second hard masks and the select gate. A control gate is formed as a spacer around the second hard mask. A recess in the control gate is filled with a dielectric material. The recess is formed between a curved sidewall of the control gate and a sidewall of the charge storage layer directly adjacent the curved sidewall of the control gate.
    Type: Application
    Filed: November 17, 2015
    Publication date: March 10, 2016
    Inventors: JACOB T. WILLIAMS, CHEONG MIN HONG, SUNG-TAEG KANG, DAVID G. KOLAR, JANE A. YATER
  • Patent number: 9219167
    Abstract: A method of forming a flash memory cell includes forming a first hard mask and a second hard mask on a substrate. A select gate is formed as a spacer around the first hard mask. A charge storage layer is formed over the first and second hard masks and the select gate. A control gate is formed as a spacer around the second hard mask. A recess in the control gate is filled with a dielectric material. The recess is formed between a curved sidewall of the control gate and a sidewall of the charge storage layer directly adjacent the curved sidewall of the control gate.
    Type: Grant
    Filed: December 19, 2013
    Date of Patent: December 22, 2015
    Assignee: FREESCALE SEMICONDUCTOR, INC.
    Inventors: Jacob T. Williams, Cheong Min Hong, Sung-Taeg Kang, David G. Kolar, Jane A. Yater
  • Patent number: 9209810
    Abstract: An output circuit, between a first power supply terminal and a second power supply terminal, receives a first logic signal that switches between a first logic state based on a voltage at the first power supply terminal and a second logic state based on a voltage at the second power supply terminal and provides a second logic signal, complementary to the first logic signal. A level translator is in a second power supply domain configured to have a second voltage differential between a third power supply terminal and a fourth power supply terminal, wherein the second voltage differential is greater than the first voltage differential. The level translator is designed so that it may be implemented using a subset of the transistors that have the shortest channel length and narrowest channel width.
    Type: Grant
    Filed: April 16, 2014
    Date of Patent: December 8, 2015
    Assignee: FREESCALE SEMICONDUCTOR, INC.
    Inventors: Jacob T. Williams, Jeffrey C. Cunningham, Karthik Ramanan
  • Publication number: 20150303923
    Abstract: An output circuit, between a first power supply terminal and a second power supply terminal, receives a first logic signal that switches between a first logic state based on a voltage at the first power supply terminal and a second logic state based on a voltage at the second power supply terminal and provides a second logic signal, complementary to the first logic signal. A level translator is in a second power supply domain configured to have a second voltage differential between a third power supply terminal and a fourth power supply terminal, wherein the second voltage differential is greater than the first voltage differential. The level translator is designed so that it may be implemented using a subset of the transistors that have the shortest channel length and narrowest channel width.
    Type: Application
    Filed: April 16, 2014
    Publication date: October 22, 2015
    Inventors: JACOB T. WILLIAMS, JEFFREY C. CUNNINGHAM, KARTHIK RAMANAN
  • Publication number: 20150179816
    Abstract: A method of forming a flash memory cell includes forming a first hard mask and a second hard mask on a substrate. A select gate is formed as a spacer around the first hard mask. A charge storage layer is formed over the first and second hard masks and the select gate. A control gate is formed as a spacer around the second hard mask. A recess in the control gate is filled with a dielectric material. The recess is formed between a curved sidewall of the control gate and a sidewall of the charge storage layer directly adjacent the curved sidewall of the control gate.
    Type: Application
    Filed: December 19, 2013
    Publication date: June 25, 2015
    Inventors: JACOB T. WILLIAMS, Cheong Min Hong, Sung-Taeg Kang, David G. Kolar, Jane A. Yater
  • Publication number: 20140266366
    Abstract: A compensated hysteresis circuit comprises a hysteresis circuit including an output node and a first control transistor. The first control transistor provides feedback to the hysteresis circuit. A temperature and voltage compensation circuit includes a self-biasing threshold control circuit including an input coupled to the output node of the hysteresis circuit, and a first trim transistor coupled between the first control transistor of the hysteresis circuit and the self-biasing threshold control circuit.
    Type: Application
    Filed: March 15, 2013
    Publication date: September 18, 2014
    Applicant: FREESCALE SEMICONDUCTOR, INC.
    Inventors: JACOB T. WILLIAMS, JEFFREY C. CUNNINGHAM, GILLES J. MULLER, KARTHIK RAMANAN
  • Patent number: 8829964
    Abstract: A compensated hysteresis circuit comprises a hysteresis circuit including an output node and a first control transistor. The first control transistor provides feedback to the hysteresis circuit. A temperature and voltage compensation circuit includes a self-biasing threshold control circuit including an input coupled to the output node of the hysteresis circuit, and a first trim transistor coupled between the first control transistor of the hysteresis circuit and the self-biasing threshold control circuit.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: September 9, 2014
    Assignee: Freescale Semiconductor, Inc.
    Inventors: Jacob T. Williams, Jeffrey C. Cunningham, Gilles J. Muller, Karthik Ramanan