Patents by Inventor Jacqueline Lau

Jacqueline Lau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8623964
    Abstract: A room temperature crosslinkable polymer system comprising an anhydride containing polymer and an oxyalkylene amine and a polymer electrolyte derived therefrom are prepared and employed as ion conducting materials for batteries such as lithium ion battery, solar cells and electrochromic devices is disclosed.
    Type: Grant
    Filed: September 19, 2011
    Date of Patent: January 7, 2014
    Assignee: BASF SE
    Inventors: Zhiquang Song, Suruliappa G. Jeganathan, Jacqueline Lau, Rakesh Gupta
  • Publication number: 20120009481
    Abstract: A room temperature crosslinkable polymer system comprising an anhydride containing polymer and an oxyalkylene amine and a polymer electrolyte derived therefrom are prepared and employed as ion conducting materials for batteries such as lithium ion battery, solar cells and electrochromic devices is disclosed.
    Type: Application
    Filed: September 19, 2011
    Publication date: January 12, 2012
    Inventors: Zhiquang Song, Suruliappa G. Jeganathan, Jacqueline Lau, Rakesh Gupta
  • Publication number: 20110244256
    Abstract: Incorporating antimicrobial metals, such as silver salts, into an anticorrosion coating provides both excellent antimicrobial protection and surprisingly improves the anti corrosion activity as well, proving anti corrosion coatings effective as thin films and well suited for coating medical devices. Suitable binder polymers for the coating include but not limited to polyelectrolytes containing charged and/or potentially chargeable groups and polymers containing hydrophilic entities.
    Type: Application
    Filed: March 15, 2011
    Publication date: October 6, 2011
    Inventors: Zhiqiang Song, Ted Deisenroth, Richard Thomas, Jacqueline Lau
  • Publication number: 20090148777
    Abstract: A room temperature crosslinkable polymer system comprising an anhydride containing polymer and an oxyalkylene amine and a polymer electrolyte derived therefrom are prepared and employed as ion conducting materials for batteries such as lithium ion battery, solar cells and electrochromic devices is disclosed.
    Type: Application
    Filed: December 4, 2008
    Publication date: June 11, 2009
    Inventors: Zhiquang Song, Suruliappa G. Jeganathan, Jacqueline Lau, Rakesh Gupta
  • Patent number: 7419513
    Abstract: Compounds which have a benzotriazole and a hindered amine moiety in the same molecule are typified by the formula A wherein at least one of G2, R1 or R2 contains a hindered amine moiety are extremely effective light stabilizers having both the UV absorbing activity of a benzotriazole and the light stabilizing efficacy of a hindered amine in the same molecule. These compounds are effective stabilizers for thermoset resin compositions, thermoplastic resin compositions, for photographic applications, for pigmented or dyed polypropylene, polyamide or polyester fibers, and for white, dyed, dipped, unscented and/or scented candle wax against discoloration and fading when incorporated therein alone or in combination with an antioxidant.
    Type: Grant
    Filed: September 13, 2004
    Date of Patent: September 2, 2008
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Mervin G. Wood, Jacqueline Lau, Ramanathan Ravichandran, Andrea R. Smith, Joseph Suhadolnik, Peter Solera, Joseph S. Puglisi, Carmen Hendricks-Guy, Stephen D. Pastor, Luther A. R. Hall
  • Publication number: 20050043543
    Abstract: Compounds which have a benzotriazole and a hindered amine moiety in the same molecule are typified by the formula A wherein at least one of G2, R1 or R2 contains a hindered amine moiety are extremely effective light stabilizers having both the UV absorbing activity of a benzotriazole and the light stabilizing efficacy of a hindered amine in the same molecule. These compounds are effective stabilizers for thermoset resin compositions, thermoplastic resin compositions, for photographic applications, for pigmented or dyed polypropylene, polyamide or polyester fibers, and for white, dyed, dipped, unscented and/or scented candle wax against discoloration and fading when incorporated therein alone or in combination with an antioxidant.
    Type: Application
    Filed: September 13, 2004
    Publication date: February 24, 2005
    Inventors: Mervin Wood, Jacqueline Lau, Ramanathan Ravichandran, Andrea Smith, Joseph Suhadolnik, Peter Solera, Joseph Puglisi, Carmen Hendricks-Guy, Stephen Pastor, Luther Hall
  • Patent number: 6846929
    Abstract: Compounds which have a benzotriazole and a hindered amine moiety in the same molecule are typified by the formula A wherein at least one of G2, R1 or R2 contains a hindered amine moiety are extremely effective light stabilizers having both the UV absorbing activity of a benzotriazole and the light stabilizing efficacy of a hindered amine in the same molecule. These compounds are effective stabilizers for thermoset resin compositions, thermoplastic resin compositions, for photographic applications, for pigmented or dyed polypropylene, polyamide or polyester fibers, and for white, dyed, dipped, unscented and/or scented candle wax against discoloration and fading when incorporated therein alone or in combination with an antioxidant.
    Type: Grant
    Filed: April 2, 2001
    Date of Patent: January 25, 2005
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Mervin G. Wood, Jacqueline Lau, Ramanathan Ravichandran, Andrea R. Smith, Joseph Suhadolnik, Peter Solera, Joseph S. Puglisi, Carmen Hendricks-Guy, Stephen D. Pastor, Luther A. R. Hall
  • Patent number: 6815550
    Abstract: Provided is a process for preparing 2H-benzotriazole UV absorbers containing a perfluoroalkyl moiety at the 5-position of the benzoic ring, for example a trifluoromethyl group, which involves digitizing the perfluoroalkyl substituted o-nitroaniline using concentrated sulfuric acid plus sodium nitrite or nitrosylsulfuric acid to form the corresponding monoazobenzene intermediate via the diazonium salt intermediate which is reduced to the corresponding 5-perfluoroalkyl substituted 2H-benzotriazole UV absorber compound by conventional reduction means. Also provided is a novel one-pot, multiphase reaction for the preparation of 2(2-nitrophenylazo) substituted phenols, which are precursors for 2H-benzotriazole UV absorbers.
    Type: Grant
    Filed: December 10, 2002
    Date of Patent: November 9, 2004
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Mervin G. Wood, Deborah DeHessa, Joseph Suhadolnik, Andrew B. Naughton, Jerome Sanders, Jacqueline Lau, Rong Xiong, Joseph Babiarz
  • Patent number: 6800676
    Abstract: 2H-Benzotriazole UV absorbers substituted at the 3-position and/or the 5-position of the phenyl ring by a phenyl moiety which is substituted by a heteroatom are particularly photostable in automotive coatings, and are of low color and exhibit low volatility in thermoplastic compositions.
    Type: Grant
    Filed: February 13, 2002
    Date of Patent: October 5, 2004
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Mervin G. Wood, Stephen D. Pastor, Jacqueline Lau, Michael DiFazio, Joseph Suhadolnik
  • Patent number: 6605727
    Abstract: Provided is a process for preparing 2H-benzotriazole UV absorbers containing a perfluoroalkyl moiety at the 5-position of the benzo ring, for example a trifluoromethyl group, which involves diazotizing the perfluoroalkyl substituted o-nitroaniline using concentrated sulfuric acid plus sodium nitrite or nitrosylsulfuric acid to form the corresponding monoazobenzene intermediate via the diazonium salt intermediate which is reduced to the corresponding 5-perfluoroalkyl substituted 2H-benzotriazole UV absorber compound by conventional reduction means. Also provided is a novel one-pot, multiphase reaction for the preparation of 2(2-nitrophenylazo) substituted phenols, which are precursors for 2H-benzotriazole UV absorbers.
    Type: Grant
    Filed: December 10, 2002
    Date of Patent: August 12, 2003
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Mervin G. Wood, Deborah DeHessa, Joseph Suhadolnik, Andrew B. Naughton, Jerome Sanders, Jacqueline Lau, Rong Xiong, Joseph Babiarz
  • Publication number: 20030130524
    Abstract: Provided is a process for preparing 2H-benzotriazole UV absorbers containing a perfluoroalkyl moiety at the 5-position of the benzo ring, for example a trifluoromethyl group, which involves diazotizing the perfluoroalkyl substituted o-nitroaniline using concentrated sulfuric acid plus sodium nitrite or nitrosylsulfuric acid to form the corresponding monoazobenzene intermediate via the diazonium salt intermediate which is reduced to the corresponding 5-perfluoroalkyl substituted 2H-benzotriazole UV absorber compound by conventional reduction means. Also provided is a novel one-pot, multiphase reaction for the preparation of 2(2-nitrophenylazo) substituted phenols, which are precursors for 2H-benzotriazole UV absorbers.
    Type: Application
    Filed: December 10, 2002
    Publication date: July 10, 2003
    Inventors: Mervin G. Wood, Deborah DeHessa, Joseph Suhadolnik, Andrew B. Naughton, Jerome Sanders, Jacqueline Lau, Rong Xiong, Joseph Babiarz
  • Publication number: 20030120083
    Abstract: Provided is a process for preparing 2H-benzotriazole UV absorbers containing a perfluoroalkyl moiety at the 5-position of the benzo ring, for example a trifluoromethyl group, which involves diazotizing the perfluoroalkyl substituted o-nitroaniline using concentrated sulfuric acid plus sodium nitrite or nitrosylsulfuric acid to form the corresponding monoazobenzene intermediate via the diazonium salt intermediate which is reduced to the corresponding 5-perfluoroalkyl substituted 2H-benzotriazole UV absorber compound by conventional reduction means. Also provided is a novel one-pot, multiphase reaction for the preparation of 2(2-nitrophenylazo) substituted phenols, which are precursors for 2H-benzotriazole UV absorbers.
    Type: Application
    Filed: December 10, 2002
    Publication date: June 26, 2003
    Inventors: Mervin G. Wood, Deborah DeHessa, Joseph Suhadolnik, Andrew B. Naughton, Jerome Sanders, Jacqueline Lau, Rong Xiong, Joseph Babiarz
  • Patent number: 6566507
    Abstract: Provided is a process for preparing 2H-benzotriazole UV absorbers containing a perfluoroalkyl moiety at the 5-position of the benzo ring, for example a trifluoromethyl group, which involves diazotizing the perfluoroalkyl substituted o-nitroaniline using concentrated sulfuric acid plus sodium nitrite or nitrosylsulfuric acid to form the corresponding monoazobenzene intermediate via the diazonium salt intermediate which is reduced to the corresponding 5-perfluoroalkyl substituted 2H-benzotriazole UV absorber compound by conventional reduction means. Also provided is a novel one-pot, multiphase reaction for the preparation of 2(2-nitrophenylazo) substituted phenols, which are precursors for 2H-benzotriazole UV absorbers.
    Type: Grant
    Filed: May 31, 2001
    Date of Patent: May 20, 2003
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Mervin G. Wood, Deborah DeHessa, Joseph Suhadolnik, Andrew B. Naughton, Jerome Sanders, Jacqueline Lau, Rong Xiong, Joseph Babiarz
  • Publication number: 20030074833
    Abstract: Compounds which have a benzotriazole and a hindered amine moiety in the same molecule are typified by the formula A 1
    Type: Application
    Filed: April 2, 2001
    Publication date: April 24, 2003
    Inventors: Mervin G. Wood, Jacqueline Lau, Ramanathan Ravichandran, Andrea R. Smith, Joseph Suhadolnik, Peter Solera, Joseph S. Puglisi, Carmen Hendricks-Guy, Stephen D. Pastor, Luther A. R. Hall
  • Publication number: 20030004235
    Abstract: 2H-Benzotriazole UV absorbers substituted at the 3-position and/or the 5-position of the phenyl ring by a phenyl moiety which is substituted by a heteroatom are particularly photostable in automotive coatings, and are of low color and exhibit low volatility in thermoplastic compositions.
    Type: Application
    Filed: February 13, 2002
    Publication date: January 2, 2003
    Inventors: Mervin G. Wood, Stephen D. Pastor, Jacqueline Lau, Michael DiFazio, Joseph Suhadolnik
  • Patent number: 6489383
    Abstract: 2H-Benzotriazole UV absorbers substituted at the 3-position or at the 5-position of the phenyl ring by a 1,1-diphenylalkyl moiety, particularly a 1,1-diphenylethyl group, are particularly photostable in automotive coatings, and are of low color and exhibit low volatility in thermoplastic compositions.
    Type: Grant
    Filed: February 7, 2002
    Date of Patent: December 3, 2002
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Mervin G. Wood, Ramanathan Ravichandran, Joseph Suhadolnik, David Bramer, Jacqueline Lau, Anthony DeBellis
  • Publication number: 20020169239
    Abstract: 2H-Benzotriazole UV absorbers substituted at the 3-position or at the 5-position of the phenyl ring by a 1,1-diphenylalkyl moiety, particularly a 1,1-diphenylethyl group, are particularly photostable in automotive coatings, and are of low color and exhibit low volatility in thermoplastic compositions.
    Type: Application
    Filed: February 7, 2002
    Publication date: November 14, 2002
    Inventors: Mervin G. Wood, Ramanathan Ravichandran, Joseph Suhadolnik, David Bramer, Jacqueline Lau, Anthony DeBellis
  • Patent number: 6451887
    Abstract: 2H-Benzotriazole UV absorbers substituted at the 3-position and/or the 5-position of the phenyl ring by &agr;-cumyl moiety which is substituted by a heteroatom are particularly photostable in automotive coatings, and are of low color and exhibit low volatility in thermoplastic compositions.
    Type: Grant
    Filed: August 3, 2000
    Date of Patent: September 17, 2002
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Mervin G. Wood, Joseph Suhadolnik, Ramanathan Ravichandran, Jacqueline Lau, Carmen Hendricks-Guy, Christophe Bulliard
  • Patent number: 6392056
    Abstract: 2H-Benzotriazole UV absorbers substituted at the 3-position or at the 5-position of the phenyl ring by a 1,1-diphenylalkyl moiety, particularly a 1,1-diphenylethyl group, are particularly photostable in automotive coatings, and are of low color and exhibit low volatility in thermoplastic compositions.
    Type: Grant
    Filed: August 3, 2000
    Date of Patent: May 21, 2002
    Assignee: Ciba Specialty Chemical Corporation
    Inventors: Mervin G. Wood, Ramanathan Ravichandran, Joseph Suhadolnik, David Bramer, Jacqueline Lau, Anthony DeBellis
  • Publication number: 20020035175
    Abstract: Provided is a process for preparing 2H-benzotriazole UV absorbers containing a perfluoroalkyl moiety at the 5-position of the benzo ring, for example a trifluoromethyl group, which involves diazotizing the perfluoroalkyl substituted o-nitroaniline using concentrated sulfuric acid plus sodium nitrite or nitrosylsulfuric acid to form the corresponding monoazobenzene intermediate via the diazonium salt intermediate which is reduced to the corresponding 5-perfluoroalkyl substituted 2H-benzotriazole UV absorber compound by conventional reduction means. Also provided is a novel one-pot, multiphase reaction for the preparation of 2(2-nitrophenylazo) substituted phenols, which are precursors for 2H-benzotriazole UV absorbers.
    Type: Application
    Filed: May 31, 2001
    Publication date: March 21, 2002
    Inventors: Mervin G. Wood, Deborah DeHessa, Joseph Suhadolnik, Andrew B. Naughton, Jerome Sanders, Jacqueline Lau, Rong Xiong, Joseph Babiarz