Patents by Inventor Jae-Jeong Kim

Jae-Jeong Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150120940
    Abstract: Provided is an apparatus for determining whether to change resources using pattern information. The apparatus includes a reception unit which receives resource information which is information about an amount of resources used of a plurality of servers which exist in a data center which provides resources to a user, a basic data generation unit which generates basic data about predetermined items in preset time units using the resource information, a pattern information generation unit which generates pattern information using the basic data, and a resource change determination unit which determines whether to increase, maintain, or reduce the resources using the generated pattern information.
    Type: Application
    Filed: October 30, 2014
    Publication date: April 30, 2015
    Applicant: SAMSUNG SDS CO., LTD.
    Inventors: Sung Duck KIM, Gi Duk PARK, Byoung Soo KIM, Jae Jeong KIM
  • Publication number: 20150101422
    Abstract: The present invention relates to a sample analyzing chip. The chip can prevent upper and lower substrates of a channel from being attached to each other due to deflection on a micro channel and can solve the problem of the sample drying up within a measuring time of a target. Also, the chip can prevent bubbles from being generated in a central portion of the micro channel.
    Type: Application
    Filed: May 14, 2013
    Publication date: April 16, 2015
    Applicant: NANOENTEK, INC.
    Inventors: Dae Sung Hur, Jae Jeong Kim, Yu Rae Kim
  • Patent number: 8486163
    Abstract: A micro reforming reactor includes a first substrate with a micro channel having a width of less than 1,000 ?m bonded to a second substrate to form a micro tunnel. An adhesive layer is formed on the internal walls of the micro tunnel using a flow coating method. A catalyst may then be optionally formed on the adhesive coated internal walls of the micro tunnel, also using a flow coating method.
    Type: Grant
    Filed: October 19, 2006
    Date of Patent: July 16, 2013
    Assignees: Samsung SDI Co., Ltd., Seoul National University Industry Foundation
    Inventors: Ju-Yong Kim, Ho-Jin Kweon, Jae-Jeong Kim, Oh-Joong Kwon, Sun-Mi Hwang
  • Publication number: 20120329148
    Abstract: A corpuscle separation chip is presented, which is capable of separating plasma from blood using capillary forces without causing leakage of the blood in undesired directions. The corpuscle separation chip may include an upper board for securing a membrane such that one or more edges maintain non-contact, where a portion of a channel is formed in the upper board to provide a path causing plasma components separated by the membrane from blood to move in one direction; and a lower board in which another portion of the channel is formed, where the lower board is configured to join with the upper board to form the channel, and the lower board is configured to cause the plasma components to move along the channel due to capillary forces at a position corresponding to one side of a lower surface of the membrane.
    Type: Application
    Filed: March 10, 2011
    Publication date: December 27, 2012
    Inventors: Daesung Hur, Jong Hyun Oh, Jae Jeong Kim, Eun Hee Park, Ji Young Park
  • Publication number: 20120282625
    Abstract: Disclosed is a microfluidic device comprising a microchannel through which fluid can flow. Protrusions are formed on the bottom surface of the microchannel. The microfluidic device increases detection sensitivity by improving optical characteristics and enhances the reactivity of biochemical reaction by slowing down the velocity of fluid flowing inside the microchannel.
    Type: Application
    Filed: November 26, 2010
    Publication date: November 8, 2012
    Applicant: NANOENTEK, INC.
    Inventors: Dae Sung Hur, Jong Hyun Oh, Jae Jeong Kim, Eun Hee Park
  • Patent number: 7799677
    Abstract: A device comprises a multi-layered thin film having excellent adhesion due to the method of fabricating the same. More particularly, the device includes a multi-layered thin film consisting of a tantalum nitride layer, a tantalum layer formed on the tantalum nitride layer, and a gold thin film formed on the tantalum layer.
    Type: Grant
    Filed: April 14, 2009
    Date of Patent: September 21, 2010
    Assignees: Samsung SDI Co., Ltd., Seoul National University Industry Foundation
    Inventors: Ju-Yong Kim, Ho-Jin Kweon, Jae-Jeong Kim, Jin-Goo Ahn, Oh-Joong Kwon
  • Publication number: 20090200678
    Abstract: A device comprises a multi-layered thin film having excellent adhesion due to the method of fabricating the same. More particularly, the device includes a multi-layered thin film consisting of a tantalum nitride layer, a tantalum layer formed on the tantalum nitride layer, and a gold thin film formed on the tantalum layer.
    Type: Application
    Filed: April 14, 2009
    Publication date: August 13, 2009
    Inventors: Ju-Yong Kim, Ho-Jin Kweon, Jae-Jeong Kim, Jin-Goo Ahn, Oh-Joong Kwon
  • Patent number: 7545043
    Abstract: A device comprises a multi-layered thin film having excellent adhesion due to the method of fabricating the same. More particularly, the device includes a multi-layered thin film consisting of a tantalum nitride layer, a tantalum layer formed on the tantalum nitride layer, and a gold thin film formed on the tantalum layer.
    Type: Grant
    Filed: October 14, 2005
    Date of Patent: June 9, 2009
    Assignees: Samsung SDI Co., Ltd., Seoul National University Industry Foundation
    Inventors: Ju-Yong Kim, Ho-Jin Kweon, Jae-Jeong Kim, Jin-Goo Ahn, Oh-Joong Kwon
  • Patent number: 7407636
    Abstract: There is provided a reformer for a fuel cell system, the reformer comprising: a reforming unit having a reaction substrate in which a catalyst layer is formed in a plurality of flow channels for allowing fuel to flow and for generating hydrogen through a reformation reaction of the fuel using thermal energy. When viewing a cross-section perpendicular to the flow direction of the flow channels, the reaction substrate defines each flow channel by a bottom portion and a pair of wall portions extending from the sides of the bottom portion, and a joint between the bottom portion and the wall portion is formed in a rounded shape.
    Type: Grant
    Filed: May 7, 2005
    Date of Patent: August 5, 2008
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Ju-Yong Kim, Ho-Jin Kweon, Jae-Jeong Kim, Oh-Joong Kwon
  • Patent number: 7393644
    Abstract: A method for real-time detection of polymerase chain reaction (PCR) is provided. The method includes: manufacturing a reactor having a plurality of electrodes; immobilizing a PCR primer to surfaces of electrodes; injecting a mixture for a PCR into the reactor to perform the PCR on the surfaces of electrodes and measuring an impedance of the PCR product.
    Type: Grant
    Filed: February 2, 2005
    Date of Patent: July 1, 2008
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Young-sun Lee, Young-a Kim, Sang-hyo Kim, Jae-jeong Kim, Kak Namkoong, Hee-kyun Lim
  • Publication number: 20070087935
    Abstract: A micro reforming reactor includes a first substrate with a micro channel having a width of less than 1,000 ?m bonded to a second substrate to form a micro tunnel. An adhesive layer is formed on the internal walls of the micro tunnel using a flow coating method. A catalyst may then be optionally formed on the adhesive coated internal walls of the micro tunnel, also using a flow coating method.
    Type: Application
    Filed: October 19, 2006
    Publication date: April 19, 2007
    Inventors: Ju-Yong Kim, Ho-Jin Kweon, Jae-Jeong Kim, Oh-Joong Kwon, Sun-Mi Hwang
  • Publication number: 20060145349
    Abstract: A device comprises a multi-layered thin film having excellent adhesion due to the method of fabricating the same. More particularly, the device includes a multi-layered thin film consisting of a tantalum nitride layer, a tantalum layer formed on the tantalum nitride layer, and a gold thin film formed on the tantalum layer.
    Type: Application
    Filed: October 14, 2005
    Publication date: July 6, 2006
    Inventors: Ju-Yong Kim, Ho-Jin Kweon, Jae-Jeong Kim, Jin-Goo Ahn, Oh-Joong Kwon
  • Patent number: 7011981
    Abstract: A method for forming a thin film and a method for fabricating a liquid crystal display device using the same are provided. The method provides a process that is simplified. Uniform thin film characteristics can be obtained. The method for forming a thin film includes the steps of forming a diffusion barrier film on a substrate, forming a metal seed layer on the diffusion barrier film, removing a metal oxide film formed on a surface of the metal seed layer using an electric plating method, and depositing metal on the metal seed layer in which the metal oxide film is removed.
    Type: Grant
    Filed: February 5, 2004
    Date of Patent: March 14, 2006
    Assignee: LG.Philips LCD Co., Ltd.
    Inventors: Soo Kil Kim, Jong Uk Bae, Jae Jeong Kim
  • Publication number: 20050252081
    Abstract: There is provided a reformer for a fuel cell system, the reformer comprising: a reforming unit having a reaction substrate in which a catalyst layer is formed in a plurality of flow channels for allowing fuel to flow and for generating hydrogen through a reformation reaction of the fuel using thermal energy. When viewing a cross-section perpendicular to the flow direction of the flow channels, the reaction substrate defines each flow channel by a bottom portion and a pair of wall portions extending from the sides of the bottom portion, and a joint between the bottom portion and the wall portion is formed in a rounded shape.
    Type: Application
    Filed: May 7, 2005
    Publication date: November 17, 2005
    Inventors: Ju-Yong Kim, Ho-Jin Kweon, Jae-Jeong Kim, Oh-Joong Kwon
  • Publication number: 20050181405
    Abstract: A method for real-time detection of polymerase chain reaction (PCR) is provided. The method includes: manufacturing a reactor having a plurality of electrodes; immobilizing a PCR primer to surfaces of electrodes; injecting a mixture for a PCR into the reactor to perform the PCR on the surfaces of electrodes and measuring an impedance of the PCR product.
    Type: Application
    Filed: February 2, 2005
    Publication date: August 18, 2005
    Inventors: Young-sun Lee, Young-a Kim, Sang-hyo Kim, Jae-jeong Kim, Kak Namkoong, Hee-kyun Lim
  • Patent number: 6858479
    Abstract: A method for forming a low resistively copper conductor line includes forming a silver material layer on silicon material, and forming a copper material layer on the silver material layer using an electroplating process.
    Type: Grant
    Filed: December 20, 2002
    Date of Patent: February 22, 2005
    Assignee: LG.Philips LCD Co., Ltd.
    Inventors: Jae-Jeong Kim, Soo-Kil Kim, Yong-Shik Kim
  • Patent number: 6806189
    Abstract: A method of silver (Ag) electroless plating on an indium tin oxide (ITO) electrode comprises preparing a substrate on which the indium tin oxide (ITO) electrode is formed, depositing tin (Sn) on the indium tin oxide (ITO) electrode, depositing silver (Ag) on the indium tin oxide (ITO) electrode by dipping the indium tin oxide (ITO) electrode into an activation solution and plating silver (Ag) on the indium tin oxide (ITO) electrode by dipping the indium tin oxide (ITO) electrode into an electroless plating solution containing magnesium ions and silver ions.
    Type: Grant
    Filed: December 30, 2002
    Date of Patent: October 19, 2004
    Assignee: LG.Philips LCD Co., Ltd.
    Inventors: Jae-Jeong Kim, Seung-Hwan Cha
  • Patent number: 6797135
    Abstract: The present invention relates to a method of forming a conductive layer and an electroplating device, and in particular, to a method of forming a conductive layer that provides an electrically-conductive layer having both characteristics of increased adhesiveness to an electroplated body and increased uniformity. The electroplating apparatus and method can produce supersonic waves for electroplating. Thus, the electroplating device can include a wave generator. The electroplating device can further include a plating bath filled with an electrolyte solution that can propagate super sonic waves, a power supply, a plated body connected electrically to a first terminal of the power supply, and a plating body connected electrically to a second terminal of the power supply where the plating body provides ions the same as dissolved in the electrolyte solution to maintain a desired concentration of dissolved ions.
    Type: Grant
    Filed: March 6, 2002
    Date of Patent: September 28, 2004
    Assignee: Hyundai Microelectronics Co., Ltd.
    Inventors: Do-Heyoung Kim, Jae-Jeong Kim, Jae-Hee Ha
  • Patent number: D748106
    Type: Grant
    Filed: December 23, 2013
    Date of Patent: January 26, 2016
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: So-Young Yun, Ji-Yoon Yoon, Jae-Jeong Kim
  • Patent number: D748107
    Type: Grant
    Filed: December 23, 2013
    Date of Patent: January 26, 2016
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jae-Jeong Kim, So-Young Yun, Ji-Yoon Yoon