Abstract: Provided herein are methods and systems for preventing and/or suppressing fire in a rechargeable battery.

Abstract: A method of controlling a display device includes rendering a plurality of viewpoint images, generating a plurality of sub-images based on the plurality of viewpoint images and a plurality of mapping pattern images corresponding to the plurality of viewpoint images, generating a single light-field image based on the plurality of sub-images, and outputting the single light-field image.

Abstract: The present invention relates to a composition for etching, comprising a first inorganic acid, a first additive represented by Chemical Formula 1, and a solvent. The composition for etching is a high-selectivity composition that can selectively remove a nitride film while minimizing the etch rate of an oxide film, and which does not have problems such as particle generation, which adversely affect the device characteristics.

Abstract: Provided herein are methods and systems for preventing and/or suppressing fire in a rechargeable battery.

Abstract: The present invention relates to a composition for etching, comprising a first inorganic acid, a first additive represented by Chemical Formula 1, and a solvent. The composition for etching is a high-selectivity composition that can selectively remove a nitride film while minimizing the etch rate of an oxide film, and which does not have problems such as particle generation, which adversely affect the device characteristics.

Abstract: The present invention relates to a composition for etching, comprising a first inorganic acid, a first additive represented by Chemical Formula 1, and a solvent. The composition for etching is a high-selectivity composition that can selectively remove a nitride film while minimizing the etch rate of an oxide film, and which does not have problems such as particle generation, which adversely affect the device characteristics.

Abstract: A method of controlling a display device includes rendering a plurality of viewpoint images, generating a plurality of sub-images based on the plurality of viewpoint images and a plurality of mapping pattern images corresponding to the plurality of viewpoint images, generating a single light-field image based on the plurality of sub-images, and outputting the single light-field image.

Abstract: The present invention relates to a composition for etching, comprising a first inorganic acid, a first additive represented by Chemical Formula 1, and a solvent. The composition for etching is a high-selectivity composition that can selectively remove a nitride film while minimizing the etch rate of an oxide film, and which does not have problems such as particle generation, which adversely affect the device characteristics.

Abstract: A method of controlling a display device includes rendering a plurality of viewpoint images, generating a plurality of sub-images based on the plurality of viewpoint images and a plurality of mapping pattern images corresponding to the plurality of viewpoint images, generating a single light-field image based on the plurality of sub-images, and outputting the single light-field image.

Abstract: An apparatus for estimating a camera pose according to an embodiment of the present disclosure includes a similar image searcher, a clusterer, and an estimator. The similar image searcher searches for a plurality of images similar to an input image, from among a plurality of previously-stored images, based on the input image. The clusterer creates a cluster including at least some similar images meeting predetermined conditions, from among the plurality of similar images, based on viewpoint data tagged to each of the plurality of similar images. The estimator estimates a pose of a camera that has generated the input image, based on the cluster.

Abstract: The present invention relates to a composition for etching, comprising a first inorganic acid, a first additive represented by Chemical Formula 1, and a solvent. The composition for etching is a high-selectivity composition that can selectively remove a nitride film while minimizing the etch rate of an oxide film, and which does not have problems such as particle generation, which adversely affect the device characteristics.

Abstract: A reality space-based content authoring system according to an embodiment of the present disclosure includes an augmented reality server configured to provide augmented reality information including indoor and outdoor position information and simulation data of an augmented reality application user terminal necessary for simulation of content being authored and an operation of a distributed augmented reality application, a virtual reality server configured to provide reality space-based virtual reality information including geometric information and image information indicating a reality space to which the content is to be applied, and a content authoring device configured to provide a reality space-based virtual reality authoring environment when producing the content on the basis of the augmented reality information and the virtual reality information, and provide an augmented reality application and a virtual reality application based on the created content.

Abstract: The present disclosure relates to an apparatus and a method for analyzing a battery case, specifically, to the apparatus for analyzing the durability of various types of battery case, such as a pouch type or can type. The apparatus comprises a first plate which is in close contact with an outer surface of a first sheet, the first sheet forming one side of the battery case; a gas injection tube which is inserted into the battery case while penetrating through the first plate and extends along an inner surface of the first sheet; and a pressure gauge which is connected to the gas injection tube.

Abstract: A composition for etching and a method of manufacturing a semiconductor device, the method including an etching process of using the composition for etching, are provided. The composition for etching includes a first inorganic acid; any one first additive selected from the group consisting of phosphorous acid, an organic phosphite, a hypophosphite, and mixtures thereof; and a solvent. The composition for etching is a high-selectivity composition for etching that can selectively remove a nitride film while minimizing the etch rate for an oxide film and does not have a problem such as particle generation, which adversely affects device characteristics.

Abstract: An image processing system according to an embodiment includes a spatial map server that generates a spatial map by using a point cloud and viewpoint videos from first real space images obtained by scanning real space, a location recognition server that stores location recognition data extracted from the spatial map, and compares the location recognition data with a second real space image obtained through a device of an AR user to identify location information of the device of the AR user on the spatial map, and a communication server that stores and provides the location information of the device of the AR user on the spatial map and a location of a VR user on the spatial map, and displays at least one or more AR users and at least one VR user on the spatial map in synchronization with each other by using the location information and the location.

Abstract: A composition for etching and a method of manufacturing a semiconductor device, the method including an etching process of using the composition for etching, are provided. The composition for etching includes a first inorganic acid; any one first additive selected from the group consisting of phosphorous acid, an organic phosphite, a hypophosphite, and mixtures thereof, and a solvent. The composition for etching is a high-selectivity composition for etching that can selectively remove a nitride film while minimizing the etch rate for an oxide film and does not have a problem such as particle generation, which adversely affects device characteristics.

Abstract: The disclosure is related to a composition for etching, a method for manufacturing the composition, and a method for fabricating a semiconductor using the same. The composition may include a first inorganic acid, at least one of silane inorganic acid salts produced by reaction between a second inorganic acid and a silane compound, and a solvent. The second inorganic acid may be at least one selected from the group consisting of a sulfuric acid, a fuming sulfuric acid, a nitric acid, a phosphoric acid, and a combination thereof.

Abstract: The disclosure is related to a composition for etching, a method for manufacturing the composition, and a method for fabricating a semiconductor using the same. The composition may include a first inorganic acid, at least one of silane inorganic acid salts produced by reaction between a second inorganic acid and a silane compound, and a solvent. The second inorganic acid may be at least one selected from the group consisting of a sulfuric acid, a fuming sulfuric acid, a nitric acid, a phosphoric acid, and a combination thereof.

Abstract: The disclosure is related to a composition for etching, a method for manufacturing the composition, and a method for fabricating a semiconductor using the same. The composition may include a first inorganic acid, at least one of silane inorganic acid salts produced by reaction between a second inorganic acid and a silane compound, and a solvent. The second inorganic acid may be at least one selected from the group consisting of a sulfuric acid, a fuming sulfuric acid, a nitric acid, a phosphoric acid, and a combination thereof.

Abstract: A system for rendering 6 degree-of-freedom virtual reality according to an embodiment of the present disclosure includes a visibility test module performing a visibility test for determining whether a current point of interest where a main viewpoint is directed is visible for each of a plurality of reference viewpoints and generating visibility information by identifying the number of invisible fragments of each reference viewpoint according to the performance result, a reference viewpoint selection module selecting a final reference viewpoint for a rendering process for a current frame based on the visibility information for each of the plurality of reference viewpoints and a preset selection criterion, and a rendering process module performing an image-based rendering process by using a color image and a depth image corresponding to the final reference viewpoint.