Abstract: An organic light emitting diode display includes a substrate, an organic light emitting unit disposed on the substrate and including a laminate of a first electrode, an organic emission film, and a second electrode, a first inorganic film formed on the substrate to cover the organic light emitting unit, the first inorganic film including SnO2, and a second inorganic film formed on the first inorganic film, the second inorganic film including SnO2 at a top surface and including SnO, a proportion of the SnO increasing in a direction from the top surface of the second inorganic film toward the first inorganic film.

Abstract: A sputtering apparatus includes a sputtering unit, an unwinding unit, a winding unit, and a fixing frame. The sputtering unit forms a layer on a sheet. The unwinding unit continuously supplies the sheet to the sputtering unit. The winding unit continuously receives the sheet from the sputtering unit. The sputtering unit includes a first target, a second target, and a magnetic field generator. The second target is spaced apart from the first target in a first direction. The first target and the second target are facing each other. The magnetic field generator is disposed behind each of the first target and the second target. The fixing frame surrounds a space between the first target and the second target. The fixing frame rotates about an axis extending in the first direction.

Abstract: A vapor deposition apparatus that includes a first region having a first injecting unit for injecting a first raw material and a second region having a second injecting unit for injecting a second raw material, wherein the second injecting unit comprises a plasma generation unit, wherein the plasma generation unit comprises a plasma generator, a corresponding surface surrounding the plasma generator, and a plasma generation space formed between the plasma generator and the corresponding surface, and wherein distances between the plasma generator and the corresponding surface periodically vary along an outer circumference of the plasma generator. In the vapor deposition apparatus, the quality of thin film is increased by forming stable volume plasma through set positions where the plasma is generated in the plasma generation space.