Patents by Inventor James A. Willard

James A. Willard has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Slurry for mechanical polishing (CMP) of metals and use thereof
    Publication number: 20030073593
    Abstract: Slurry compositions comprising an oxidizing agent, optionally a copper corrosion inhibitor, abrasive particles; surface active agent, a service of chloride and a source of sulfate ions.
    Type: Application
    Filed: August 30, 2002
    Publication date: April 17, 2003
    Inventors: Michael Todd Brigham, Donald Francis Canaperi, Michael A. Cobb, William Cote, Kenneth M. Davis, Scott Alan Estes, Edward Jack Gordon, James Willard Hannah, Mahadevaiyer Krishnan, Michael F. Lofaro, Michael Joseph MacDonald, Dean Allen Schaffer, George James Slusser, James A. Tornello, Eric Jeffrey White
  • Method of drying substrates
    Patent number: 6508014
    Abstract: A method of removing water from the surface of a silicon wafer or other substrate subjected to wet processing which includes a step of water rinsing. In this method a silicon wafer whose surface includes liquid water is disposed in an atmosphere saturated with water vapor. The water vapor is removed from the surface of the silicon wafer by a stream of water-saturated gas. Upon removal of liquid water from the surface of the silicon wafer the water vapor in the water vapor saturated atmosphere is removed by evaporation.
    Type: Grant
    Filed: February 16, 2001
    Date of Patent: January 21, 2003
    Assignee: International Business Machines Corporation
    Inventors: Russell H. Arndt, Glenn Walton Gale, James Willard Hannah, Kenneth T. Settlemyer, Jr.
  • Method of drying substrates
    Publication number: 20020112369
    Abstract: A method of removing water from the surface of a silicon wafer or other substrate subjected to wet processing which includes a step of water rinsing. In this method a silicon wafer whose surface includes liquid water is disposed in an atmosphere saturated with water vapor. The water vapor is removed from the surface of the silicon wafer by a stream of water-saturated gas. Upon removal of liquid water from the surface of the silicon wafer the water vapor in the water vapor saturated atmosphere is removed by evaporation.
    Type: Application
    Filed: February 16, 2001
    Publication date: August 22, 2002
    Applicant: International Business Machines Corporation
    Inventors: Russell H. Arndt, Glenn Walton Gale, James Willard Hannah, Kenneth T. Settlemyer
  • Roller conveyor cleaning apparatus
    Patent number: 5893450
    Abstract: An apparatus for cleaning the rollers of a roller conveyor. The apparatus comprises a platform frictionally engaging a plurality of the rollers such that the apparatus is conveyed along the roller conveyor by the rotation of the rollers, and a first cleaning element secured to the platform, wherein the first cleaning element engages a portion of the surface of the rollers as the apparatus is conveyed along the roller conveyor.
    Type: Grant
    Filed: September 4, 1997
    Date of Patent: April 13, 1999
    Assignee: Micron Electronics, Inc.
    Inventor: James Willard Metivier
  • Method for cleaning the rollers of a roller conveyor
    Patent number: 5884751
    Abstract: A method for cleaning the rollers of a roller conveyor. The method comprises engaging a first cleaning element in contact with the rollers and conveying the first cleaning element along the roller conveyor such that the first cleaning element engages a portion of the surface of the rollers.
    Type: Grant
    Filed: September 4, 1997
    Date of Patent: March 23, 1999
    Assignee: Micron Electronics, Inc.
    Inventor: James Willard Metivier
  • Spring design for use in the core of a nuclear reactor
    Patent number: 5226633
    Abstract: A spring design particularly suitable for use in the core of a nuclear reactor includes one surface having a first material oriented in a longitudinal direction, and another surface having a second material oriented in a transverse direction. The respective surfaces exhibit different amounts of irraditation induced strain.
    Type: Grant
    Filed: May 13, 1988
    Date of Patent: July 13, 1993
    Assignee: The United States of America as represented by the United States Department of Energy
    Inventor: H. James Willard, Jr.
  • Billiard cue tip shaper, scuffer, trimmer and gauge
    Patent number: 4594782
    Abstract: A cue tip shaper, scuffer, and gauge with a built-in edge trimmer. The device has a carbide lined depression and outwardly extending lugs, also carbide covered. Relative rotation between the device and a cue tip shapes the tip, scuffs it to accept chalk and trims any material extending beyond the circumference of the stick. A gauge for the tip is provided in an edge of the device.
    Type: Grant
    Filed: August 9, 1985
    Date of Patent: June 17, 1986
    Inventor: James A. Willard