Abstract: Provided are a system, method, and computer program product for optimizing a manufacturing process. The method includes generating a time-sequenced data structure associated with a manufacturing process and transforming the time-sequenced data structure to a positionally-dimensioned data structure by identifying a zone for each parameter of a plurality of parameters, determining a time delay factor for each zone, and generating the positionally-dimensioned data structure using a data matrix transformation based on the time-sequenced data structure, each zone, and each time delay factor. The method also includes identifying a set of empty entries in the time-sequenced data structure or the positionally-dimensioned data structure and imputing data. The method further includes determining a new value for a process parameter value based on the positionally-dimensioned data structure and at least one algorithm and optimizing the manufacturing process based on the new value.

Abstract: The invention is directed to protective layers that protect functional layers applied over a substrate. The protective layer has a first protective film over at least a portion of the functional layer. The first protective film is titania, alumina, zinc oxide, tin oxide, zirconia, silica, or mixtures thereof. A second protective film over at least a portion of the first protective film. The second protective film contains titania and alumina and is an outermost film.

Abstract: A coated article includes a substrate, a functional layer over at least a portion of the substrate, and a protective coating over at least a portion of the functional layer, wherein an uppermost layer of the functional layer is a metal oxide layer, and wherein the protective coating comprises a metal nitride layer and a metal oxynitride layer that is disposed between and in contact with at least part of the metal nitride layer and the metal oxide layer of the functional layer.

Abstract: An architectural transparency includes a substrate; a first dielectric layer over at least a portion of the substrate, a first metallic layer over the first dielectric layer, a first primer layer over the first metallic layer, a second dielectric layer over the first primer layer, a second metallic layer over the second dielectric layer, a second primer layer over the second metallic layer, a third dielectric layer over the second primer layer, a third metallic layer over the third dielectric layer, a third primer layer over the third dielectric layer, and a fourth dielectric layer over the third primer layer. At least one of the metallic layers is a subcritical metallic layer.

Abstract: An architectural transparency includes a substrate; a first dielectric layer over at least a portion of the substrate, a first metallic layer over the first dielectric layer, a first primer layer over the first metallic layer, a second dielectric layer over the first primer layer, a second metallic layer over the second dielectric layer, a second primer layer over the second metallic layer, a third dielectric layer over the second primer layer, a third metallic layer over the third dielectric layer, a third primer layer over the third dielectric layer, and a fourth dielectric layer over the third primer layer. At least one of the metallic layers is a subcritical metallic layer.

Abstract: Provided are a system, method, and computer program product for optimizing a manufacturing process. The method includes generating a time-sequenced data structure associated with a manufacturing process and transforming the time-sequenced data structure to a positionally-dimensioned data structure by identifying a zone for each parameter of a plurality of parameters, determining a time delay factor for each zone, and generating the positionally-dimensioned data structure using a data matrix transformation based on the time-sequenced data structure, each zone, and each time delay factor. The method also includes identifying a set of empty entries in the time-sequenced data structure or the positionally-dimensioned data structure and imputing data. The method further includes determining a new value for a process parameter value based on the positionally-dimensioned data structure and at least one algorithm and optimizing the manufacturing process based on the new value.

Abstract: Provided are a system, method, and computer program product for optimizing a manufacturing process. The method includes receiving manufacturing data associated with a manufacturing process for manufacturing a product. The manufacturing data may include data from a plurality of data sources associated with a plurality of stages of the manufacturing process, and the manufacturing data may include values for a plurality of parameters including at least one process parameter value and at least one quality parameter value. The method includes generating a time-sequenced data structure including the manufacturing data and transforming the time-sequenced data structure to a positionally-dimensioned data structure based on timing data associated with the plurality of stages. The method includes determining a new value for the at least one process parameter value based on the positionally-dimensioned data structure and at least one algorithm and optimizing the manufacturing process based on the new value.

Abstract: An architectural transparency includes a substrate; a first dielectric layer over at least a portion of the substrate, a first metallic layer over the first dielectric layer, a first primer layer over the first metallic layer, a second dielectric layer over the first primer layer, a second metallic layer over the second dielectric layer, a second primer layer over the second metallic layer, a third dielectric layer over the second primer layer, a third metallic layer over the third dielectric layer, a third primer layer over the third dielectric layer, and a fourth dielectric layer over the third primer layer. At least one of the metallic layers is a subcritical metallic layer.

Abstract: An architectural transparency includes a substrate; a first dielectric layer over at least a portion of the substrate, a first metallic layer over the first dielectric layer, a first primer layer over the first metallic layer, a second dielectric layer over the first primer layer, a second metallic layer over the second dielectric layer, a second primer layer over the second metallic layer, a third dielectric layer over the second primer layer, a third metallic layer over the third dielectric layer, a third primer layer over the third dielectric layer, and a fourth dielectric layer over the third primer layer. At least one of the metallic layers is a subcritical metallic layer.

Abstract: Provided are a system, method, and computer program product for optimizing a manufacturing process. The method includes receiving manufacturing data associated with a manufacturing process for manufacturing a product. The manufacturing data may include data from a plurality of data sources associated with a plurality of stages of the manufacturing process, and the manufacturing data may include values for a plurality of parameters including at least one process parameter value and at least one quality parameter value. The method includes generating a time-sequenced data structure including the manufacturing data and transforming the time-sequenced data structure to a positionally-dimensioned data structure based on timing data associated with the plurality of stages. The method includes determining a new value for the at least one process parameter value based on the positionally-dimensioned data structure and at least one algorithm and optimizing the manufacturing process based on the new value.

Abstract: An architectural transparency includes a substrate; a first dielectric layer over at least a portion of the substrate, a first metallic layer over the first dielectric layer, a first primer layer over the first metallic layer, a second dielectric layer over the first primer layer, a second metallic layer over the second dielectric layer, a second primer layer over the second metallic layer, a third dielectric layer over the second primer layer, a third metallic layer over the third dielectric layer, a third primer layer over the third dielectric layer, and a fourth dielectric layer over the third primer layer. At least one of the metallic layers is a subcritical metallic layer.

Abstract: An architectural transparency includes a substrate; a first dielectric layer over at least a portion of the substrate, a first metallic layer over the first dielectric layer, a first primer layer over the first metallic layer, a second dielectric layer over the first primer layer, a second metallic layer over the second dielectric layer, a second primer layer over the second metallic layer, a third dielectric layer over the second primer layer, a third metallic layer over the third dielectric layer, a third primer layer over the third dielectric layer, and a fourth dielectric layer over the third primer layer. At least one of the metallic layers is a subcritical metallic layer.

Abstract: A coated article includes a substrate, a functional layer over at least a portion of the substrate, and a protective coating over at least a portion of the functional layer, wherein an uppermost layer of the functional layer is a metal oxide layer, and wherein the protective coating comprises a metal nitride layer and a metal oxynitride layer that is disposed between and in contact with at least part of the metal nitride layer and the metal oxide layer of the functional layer.

Abstract: A coated article includes a substrate, a functional layer over at least a portion of the substrate, and a protective coating over at least a portion of the functional layer, wherein an uppermost layer of the functional layer is a metal oxide layer, and wherein the protective coating comprises a metal nitride layer and a metal oxynitride layer that is disposed between and in contact with at least part of the metal nitride layer and the metal oxide layer of the functional layer.

Abstract: An architectural transparency includes a substrate; a first dielectric layer over at least a portion of the substrate, a first metallic layer over the first dielectric layer, a first primer layer over the first metallic layer, a second dielectric layer over the first primer layer, a second metallic layer over the second dielectric layer, a second primer layer over the second metallic layer, a third dielectric layer over the second primer layer, a third metallic layer over the third dielectric layer, a third primer layer over the third dielectric layer, and a fourth dielectric layer over the third primer layer. At least one of the metallic layers is a subcritical metallic layer.

Abstract: A coated article includes a substrate, a functional layer over at least a portion of the substrate, and a protective coating over at least a portion of the functional layer, wherein an uppermost layer of the functional layer is a metal oxide layer, and wherein the protective coating comprises a metal nitride layer and a metal oxynitride layer that is disposed between and in contact with at least part of the metal nitride layer and the metal oxide layer of the functional layer.

Abstract: An architectural transparency includes a substrate, a first dielectric layer formed over at least a portion of the substrate, a subcritical metallic layer formed over at least a portion of the first dielectric layer, a primer layer formed over the subcritical metallic layer and, a second dielectric layer formed over at least a portion of the primer layer. The primer layer contains an oxygen-capturing material that can be sacrificed during a deposition process or heating process to prevent degradation of the subcritical metallic layer.

Abstract: An architectural transparency includes a substrate, a first dielectric layer formed over at least a portion of the substrate, a subcritical metallic layer formed over at least a portion of the first dielectric layer, a primer layer formed over the subcritical metallic layer and, a second dielectric layer formed over at least a portion of the primer layer. The primer layer contains an oxygen-capturing material that can be sacrificed during a deposition process or heating process to prevent degradation of the subcritical metallic layer.

Abstract: A coated article includes an applied transparent electrically conductive oxide film of niobium doped titanium oxide. The article can be made by using a coating mixture having a niobium precursor and a titanium precursor. The coating mixture is directed toward a heated substrate to decompose the coating mixture and to deposit a transparent electrically conductive niobium doped titanium oxide film on the surface of the heated substrate. In another coating process, the mixed precursors are moved toward the substrate positioned in a plasma area between spaced electrodes to coat the surface of the substrate. Optionally, the substrate can be heated or maintained at room temperature. The deposited niobium doped titanium oxide film has a sheet resistance greater than 1.2 ohms/square and an index of refraction of 1.00 or greater. The chemical formula for the niobium doped titanium oxide is Nb:TiOx where X is in the range of 1.8-2.1.

Abstract: An architectural transparency includes a substrate, a first dielectric layer formed over at least a portion of the substrate, a continuous metallic layer formed over at least a portion of the first dielectric layer, a second dielectric layer formed over at least a portion of the first metallic layer, and a subcritical metallic layer formed over at least a portion of the second dielectric layer such that the subcritical metallic layer forms discontinuous metallic regions.