Patents by Inventor James Lupton Hedrick

James Lupton Hedrick has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7723438
    Abstract: A nanoparticle which includes a multi-armed core and surface decoration which is attached to the core is prepared. A multi-armed core is provided by any of a number of possible routes, exemplary preferred routes being living anionic polymerization that is initiated by a reactive, functionalized anionic initiator and ?-caprolactone polymerization of a bis-MPA dendrimer. The multi-armed core is preferably functionalized on some or all arms. A coupling reaction is then employed to bond surface decoration to one or more arms of the multi-armed core. The surface decoration is a small molecule or oligomer with a degree of polymerization less than 50, a preferred decoration being a PEG oligomer with degree of polymerization between 2 and 24. The nanoparticles (particle size?10 nm) are employed as sacrificial templating porogens to form porous dielectrics. The porogens are mixed with matrix precursors (e.g., methyl silsesquioxane resin), the matrix vitrifies, and the porogens are removed via burnout.
    Type: Grant
    Filed: April 28, 2005
    Date of Patent: May 25, 2010
    Assignee: International Business Machines Corporation
    Inventors: James Lupton Hedrick, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller
  • Publication number: 20100055307
    Abstract: A nanoporous material exhibiting a lamellar structure is disclosed. The material comprises three or more substantially parallel sheets of an organosilicate material, separated by highly porous spacer regions. The distance between the centers of the sheets lies between 1 nm and 50 nm. The highly porous spacer regions may be substantially free of condensed material. For the manufacture of such materials, a process is disclosed in which matrix non-amphiphilic polymeric material and templating polymeric material are dispersed in a solvent, where the templating polymeric material includes a polymeric amphiphilic material. The solvent with the polymeric materials is distributed onto a substrate. Organization is induced in the templating polymeric material. The solvent is removed, leaving the polymeric materials in place. The matrix polymeric material is cured, forming a lamellar structure.
    Type: Application
    Filed: December 18, 2008
    Publication date: March 4, 2010
    Applicant: International Business Machines Corporation
    Inventors: Jennifer Nam Cha, Geraud Jean-Michel Dubois, James Lupton Hedrick, Ho-Cheol Kim, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller, Willi Volksen
  • Publication number: 20090184445
    Abstract: A method. The method includes providing Au-doped Co nanoparticles. The nanoparticles include a combination of non-ferromagnetic nanoparticles and weakly ferromagnetic nanoparticles. The nanoparticles each have an exterior surface. The surfaces of the nanoparticles are functionalized with 7-(5-uracil-ylcarbamoyl)heptanoic acid. A polymer is provided having a general formula including a uracil group. A dispersion is formed by agitating a solution of the nanoparticles. The solution is spin cast into a film. The film is heated under vacuum at a first temperature, TFM, resulting in inducing ferromagnetism in the non-ferromagnetic nanoparticles and converting the non-ferromagnetic nanoparticles to ferromagnetic nanoparticles, and resulting in enhancing ferromagnetism in the weakly ferromagnetic nanoparticles. The nanoparticles are aligned such that magnetic easy axes of the nanoparticles are oriented by applying a magnetic field to the dispersion while at a second temperature less than TFM.
    Type: Application
    Filed: January 23, 2007
    Publication date: July 23, 2009
    Inventors: James Lupton Hedrick, Delia Jane Milliron, Alshakim Nelson, Russell Clayton Pratt
  • Patent number: 7558186
    Abstract: A composition of matter for the recording medium of nanometer scale thermo-mechanical information storage devices and a nanometer scale thermo-mechanical information storage device. The composition includes: one or more polyaryletherketone polymers, each of the one or more polyaryletherketone polymers having two terminal ends, each terminal end having two or more phenylethynyl moieties. The one or more polyaryletherketone polymers are thermally cured and the resulting cross-linked polyaryletherketone resin used as the recording layers in atomic force data storage devices.
    Type: Grant
    Filed: January 2, 2007
    Date of Patent: July 7, 2009
    Assignee: International Business Machines Corporation
    Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
  • Patent number: 7544800
    Abstract: A method is provided for carrying out depolymerization of a polymer containing electrophilic linkages in the presence of a catalyst and a nucleophilic reagent, wherein production of undesirable byproducts resulting from polymer degradation is minimized. The reaction can be carried out at a temperature of 80° C. or less, and generally involves the use of an organic, nonmetallic catalyst, thereby ensuring that the depolymerization product(s) are substantially free of metal contaminants. In an exemplary depolymerization method, the catalyst is a carbene compound such as an N-heterocyclic carbene, or is a precursor to a carbene compound. The method provides an important alternative to current recycling techniques such as those used in the degradation of polyesters, polyamides, and the like.
    Type: Grant
    Filed: August 18, 2005
    Date of Patent: June 9, 2009
    Assignees: International Business Machines Corporation, The Board of Trustees of the Leland Stanford University
    Inventors: James Lupton Hedrick, Gregory Walker Nyce, Robert M. Waymouth
  • Patent number: 7482389
    Abstract: A nanoporous material exhibiting a lamellar structure is disclosed. The material comprises three or more substantially parallel sheets of an organosilicate material, separated by highly porous spacer regions. The distance between the centers of the sheets lies between 1 nm and 50 nm. The highly porous spacer regions may be substantially free of condensed material. For the manufacture of such materials, a process is disclosed in which matrix non-amphiphilic polymeric material and templating polymeric material are dispersed in a solvent, where the templating polymeric material includes a polymeric amphiphilic material. The solvent with the polymeric materials is distributed onto a substrate. Organization is induced in the templating polymeric material. The solvent is removed, leaving the polymeric materials in place. The matrix polymeric material is cured, forming a lamellar structure.
    Type: Grant
    Filed: April 20, 2005
    Date of Patent: January 27, 2009
    Assignee: International Business Machines Corporation
    Inventors: Jennifer Nam Cha, Geraud Jean-Michel Dubois, James Lupton Hedrick, Ho-Cheol Kim, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller, Willi Volksen
  • Patent number: 7459183
    Abstract: A method of forming a structure. The method including: forming a precursor layer on a substarte, the precursor layer including a resin and, polymeric nano-particles dispersed in the resin, and a solvent, each the polymeric nano-particle comprising a multi-arm core polymer and pendent polymers attached to the milti-arm core polymer and pendent polymers attached to the multi-arm core polymer, the multi-arm core polymer immiscible with the resin and the pendent polymers miscuble with the resin; heating the precursor layer to cross-link at least about 90% of the resin thereby converting the pre-baked precursor layer to a dielectric layer; forming trenches in the dielectric layer and filling the trenches with an electrical conductor; heating the dielectric layer to thermally decompose at least acout 99.5% of the polymeric nano-particles into decomposition products and to drive the decomposition products out of the dielectric layer.
    Type: Grant
    Filed: July 27, 2005
    Date of Patent: December 2, 2008
    Assignee: International Business Machines Corporation
    Inventors: Geraud Jean-Michel Dubois, James Lupton Hedrick, Ho-Cheol Kim, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller, Muthumanickam Sankarapandian, Linda Karin Sundberg, Willi Volksen
  • Publication number: 20080219135
    Abstract: An approach is presented for designing a polymeric layer for nanometer scale thermo-mechanical storage devices. Cross-linked polyimide oligomers are used as the recording layers in atomic force data storage device, giving significantly improved performance when compared to previously reported cross-linked and linear polymers. The cross-linking of the polyimide oligomers may be tuned to match thermal and force parameters required in read-write-erase cycles. Additionally, the cross-linked polyimide oligomers are suitable for use in nano-scale imaging.
    Type: Application
    Filed: March 27, 2008
    Publication date: September 11, 2008
    Inventors: Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade, Johannes Windeln
  • Publication number: 20080220613
    Abstract: A method of protecting a polymeric layer from contamination by a photoresist layer. The method includes: (a) forming a polymeric layer over a substrate; (b) forming a non-photoactive protection layer over the polymeric layer; (c) forming a photoresist layer over the protection layer; (d) exposing the photoresist layer to actinic radiation and developing the photoresist layer to form a patterned photoresist layer, thereby exposing regions of the protection layer; (e) etching through the protection layer and the polymeric layer where the protection layer is not protected by the patterned photoresist layer; (f) removing the patterned photoresist layer in a first removal process; and (g) removing the protection layer in a second removal process different from the first removal process.
    Type: Application
    Filed: March 31, 2008
    Publication date: September 11, 2008
    Inventors: Ute Drechsler, Urs T. Duerig, Jane Elizabeth Frommer, Bernd W. Gotsmann, James Lupton Hedrick, Armin W. Knoll, Tobias Kraus, Robert Dennis Miller
  • Publication number: 20080220612
    Abstract: A method of protecting a polymeric layer from contamination by a photoresist layer. The method includes: (a) forming a polymeric layer over a substrate; (b) forming a non-photoactive protection layer over the polymeric layer; (c) forming a photoresist layer over the protection layer; (d) exposing the photoresist layer to actinic radiation and developing the photoresist layer to form a patterned photoresist layer, thereby exposing regions of the protection layer; (e) etching through the protection layer and the polymeric layer where the protection layer is not protected by the patterned photoresist layer; (f) removing the patterned photoresist layer in a first removal process; and (g) removing the protection layer in a second removal process different from the first removal process.
    Type: Application
    Filed: March 6, 2007
    Publication date: September 11, 2008
    Inventors: Ute Drechsler, Urs T. Duerig, Jane Elizabeth Frommer, Bernd W. Gotsmann, James Lupton Hedrick, Armin W. Knoll, Tobias Kraus, Robert Dennis Miller
  • Publication number: 20080213556
    Abstract: A material and an associated method of formation. A self-assembling block copolymer that includes a first block species and a second block species respectively characterized by a volume fraction of F1 and F2 with respect to the self-assembling block copolymer is provided. At least one crosslinkable polymer that is miscible with the second block species is provided. The self-assembling block copolymer and the at least one crosslinkable polymer are combined to form a mixture. The mixture having a volume fraction, F3, of the crosslinkable polymer, a volume fraction, F1A, of the first block species, and a volume fraction, F2A, of the second block species is formed. A material having a predefined morphology where the sum of F2A and F3 were preselected is formed.
    Type: Application
    Filed: April 2, 2008
    Publication date: September 4, 2008
    Inventors: Jennifer Nam Cha, James Lupton Hedrick, Ho-Cheol Kim, Robert Dennis Miller, Willi Volksen
  • Publication number: 20080205253
    Abstract: A composition of matter for the recording medium of nanometer scale thermo-mechanical information storage devices and a nanometer scale thermo-mechanical information storage device. The composition includes: one or more polyaryletherketone copolymers, each of the one or more polyaryletherketone copolymers comprising (a) a first monomer including an aryl ether ketone and (b) a second monomer including an aryl ether ketone and a first phenylethynyl moiety, each of the one or more polyaryletherketone copolymers having two terminal ends, each terminal end having a phenylethynyl moiety the same as or different from the first phenylethynyl moiety. The one or more polyaryletherketone copolymers are thermally cured and the resulting cross-linked polyaryletherketone resin used as the recording layer in an atomic force data storage device.
    Type: Application
    Filed: March 19, 2008
    Publication date: August 28, 2008
    Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
  • Publication number: 20080186612
    Abstract: A composition of matter for a recording medium in atomic force data storage devices. The composition includes one or more poly(aryl ether ketone) copolymers, each of the one or more poly(aryl ether ketone) copolymers including (a) a first monomer including an aryl ether ketone and (b) a second monomer including an aryl ether ketone and a hydrogen bonding cross-linking moiety, the moiety capable of forming two or more hydrogen bonds at room temperature, each of the one or more poly(aryl ether ketone) copolymers having two terminal ends, each terminal end having a phenylethynyl moiety. The covalent and hydrogen bonding cross-linking of the poly(aryl ether ketone) oligomers may be tuned to match thermal and force parameters required in read-write-erase cycles.
    Type: Application
    Filed: March 31, 2008
    Publication date: August 7, 2008
    Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt
  • Publication number: 20080175134
    Abstract: A composition of matter for the recording medium of nanometer scale thermo-mechanical information storage devices and a nanometer scale thermo-mechanical information storage device. The composition includes: one or more polyaryletherketone polymers, each of the one or more polyaryletherketone polymers having two terminal ends, each terminal end having two or more phenylethynyl moieties. The one or more polyaryletherketone polymers are thermally cured and the resulting cross-linked polyaryletherketone resin used as the recording layers in atomic force data storage devices.
    Type: Application
    Filed: March 27, 2008
    Publication date: July 24, 2008
    Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
  • Publication number: 20080175135
    Abstract: A composition of matter for a recording medium in atomic force data storage devices. The composition includes polyimide oligomers having covalently bonded monomers forming a backbone, the oligomer thermally stable to at least 400° C.; one or more covalent bonding cross-linking moieties incorporated into the polyimide oligomer; and one or more hydrogen bonding cross-linking moieties incorporated into the polyimide oligomer. The covalent and hydrogen bonding cross-linking of the polyimide oligomers may be tuned to match thermal and force parameters required in read-write-erase cycles.
    Type: Application
    Filed: March 27, 2008
    Publication date: July 24, 2008
    Inventors: Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsman, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
  • Publication number: 20080175139
    Abstract: A composition of matter for a recording medium in atomic force data storage devices. The composition includes one or more poly(aryl ether ketone) copolymers, each of the one or more poly(aryl ether ketone) copolymers including (a) a first monomer including an aryl ether ketone and (b) a second monomer including an aryl ether ketone and a hydrogen bonding cross-linking moiety, the moiety capable of forming two or more hydrogen bonds at room temperature, each of the one or more poly(aryl ether ketone) copolymers having two terminal ends, each terminal end having a phenylethynyl moiety. The covalent and hydrogen bonding cross-linking of the poly(aryl ether ketone) oligomers may be tuned to match thermal and force parameters required in read-write-erase cycles.
    Type: Application
    Filed: January 24, 2007
    Publication date: July 24, 2008
    Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt
  • Publication number: 20080171136
    Abstract: A composition of matter and a structure fabricated using the composition. The composition comprising: a resin; polymeric nano-particles dispersed in the resin, each of the polymeric nano-particle comprising a multi-arm core polymer and pendent polymers attached to the multi-arm core polymer, the multi-arm core polymer immiscible with the resin and the pendent polymers miscible with the resin; and a solvent, the solvent volatile at a first temperature, the resin cross-linkable at a second temperature, the polymeric nano-particle decomposable at a third temperature, the third temperature higher than the second temperature, the second temperature higher than the first temperature, wherein a thickness of a layer of the composition shrinks by less than about 3.5% between heating the layer from the second temperature to the third temperature.
    Type: Application
    Filed: March 24, 2008
    Publication date: July 17, 2008
    Inventors: Geraud Jean-Michel Dubois, James Lupton Hedrick, Ho-Cheol Kim, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller, Muthumanickam Sankarapandian, Linda Karin Sundberg, Willi Volksen
  • Publication number: 20080165663
    Abstract: An approach is presented for designing a polymeric layer for nanometer scale thermo-mechanical storage devices. Cross-linked polyaryletherketone polymers are used as the recording layers in atomic force data storage devices, giving significantly improved performance when compared to previously reported cross-linked and linear polymers. The cross-linking of the polyaryletherketone polymers may be tuned to match thermal and force parameters required in read-write-erase cycles.
    Type: Application
    Filed: March 25, 2008
    Publication date: July 10, 2008
    Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
  • Publication number: 20080161527
    Abstract: A composition of matter for the recording medium of nanometer scale thermo-mechanical information storage devices and a nanometer scale thermo-mechanical information storage device. The composition includes: one or more polyaryletherketone polymers, each of the one or more polyaryletherketone polymers having two terminal ends, each terminal end having two or more phenylethynyl moieties. The one or more polyaryletherketone polymers are thermally cured and the resulting cross-linked polyaryletherketone resin used as the recording layers in atomic force data storage devices.
    Type: Application
    Filed: January 2, 2007
    Publication date: July 3, 2008
    Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
  • Publication number: 20080159114
    Abstract: A composition of matter for the recording medium of nanometer scale thermo-mechanical information storage devices and a nanometer scale thermo-mechanical information storage device. The composition includes: one or more polyaryletherketone copolymers, each of the one or more polyaryletherketone copolymers comprising (a) a first monomer including an aryl ether ketone and (b) a second monomer including an aryl ether ketone and a first phenylethynyl moiety, each of the one or more polyaryletherketone copolymers having two terminal ends, each terminal end having a phenylethynyl moiety the same as or different from the first phenylethynyl moiety. The one or more polyaryletherketone copolymers are thermally cured and the resulting cross-linked polyaryletherketone resin used as the recording layer in an atomic force data storage device.
    Type: Application
    Filed: January 2, 2007
    Publication date: July 3, 2008
    Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade