Patents by Inventor James M. Hamilton

James M. Hamilton has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160281256
    Abstract: Methods, systems, and apparatuses for nanowire deposition are provided. A deposition system includes an enclosed flow channel, an inlet port, and an electrical signal source. The inlet port provides a suspension that includes nanowires into the channel. The electrical signal source is coupled to an electrode pair in the channel to generate an electric field to associate at least one nanowire from the suspension with the electrode pair. The deposition system may include various further features, including being configured to receive multiple solution types, having various electrode geometries, having a rotatable flow channel, having additional electrical conductors, and further aspects.
    Type: Application
    Filed: June 8, 2016
    Publication date: September 29, 2016
    Inventors: Erik FREER, James M. HAMILTON, David P. STUMBO, Kenji KOMIYA, Akihide SHIBATA
  • Patent number: 9388945
    Abstract: System, including apparatus and methods, for aspirating at least a portion of an emulsion from a well using a tip. In some embodiments, the tip may have a flat end and an inlet surrounded by the flat end. The well may have a floor with one or more surface features that prevent uninterrupted circumferential contact of the flat end of the tip with any region of the floor. In some embodiments, the tip may not have a flat end. In some embodiments, the well may have a port that guides the tip to the floor with the tip slanted with respect to the floor. Methods of making a device that includes the well are also disclosed.
    Type: Grant
    Filed: February 3, 2014
    Date of Patent: July 12, 2016
    Assignee: Bio-Rad Laboratories, Inc.
    Inventors: Adam Bemis, Thomas H. Cauley, III, Klint Rose, James M. Hamilton
  • Patent number: 9390951
    Abstract: Methods, systems, and apparatuses for nanowire deposition are provided. A deposition system includes an enclosed flow channel, an inlet port, and an electrical signal source. The inlet port provides a suspension that includes nanowires into the channel. The electrical signal source is coupled to an electrode pair in the channel to generate an electric field to associate at least one nanowire from the suspension with the electrode pair. The deposition system may include various further features, including being configured to receive multiple solution types, having various electrode geometries, having a rotatable flow channel, having additional electrical conductors, and further aspects.
    Type: Grant
    Filed: July 24, 2014
    Date of Patent: July 12, 2016
    Assignee: SHARP KABUSHIKI KAISHA
    Inventors: Erik Freer, James M. Hamilton, David P. Stumbo, Kenji Komiya, Akihide Shibata
  • Publication number: 20140331930
    Abstract: Methods, systems, and apparatuses for nanowire deposition are provided. A deposition system includes an enclosed flow channel, an inlet port, and an electrical signal source. The inlet port provides a suspension that includes nanowires into the channel. The electrical signal source is coupled to an electrode pair in the channel to generate an electric field to associate at least one nanowire from the suspension with the electrode pair. The deposition system may include various further features, including being configured to receive multiple solution types, having various electrode geometries, having a rotatable flow channel, having additional electrical conductors, and further aspects.
    Type: Application
    Filed: July 24, 2014
    Publication date: November 13, 2014
    Applicants: SHARP KABUSHIKI KAISHA, OneD Material LLC
    Inventors: Erik Freer, James M. Hamilton, David P. Stumbo, Kenji Komiya, Akihide Shibata
  • Publication number: 20140216579
    Abstract: System, including apparatus and methods, for aspirating at least a portion of an emulsion from a well using a tip. In some embodiments, the tip may have a flat end and an inlet surrounded by the flat end. The well may have a floor with one or more surface features that prevent uninterrupted circumferential contact of the flat end of the tip with any region of the floor. In some embodiments, the tip may not have a flat end. In some embodiments, the well may have a port that guides the tip to the floor with the tip slanted with respect to the floor. Methods of making a device that includes the well are also disclosed.
    Type: Application
    Filed: February 3, 2014
    Publication date: August 7, 2014
    Applicant: Bio-Rad Laboratories, Inc.
    Inventors: Adam Bemis, Thomas H. Cauley, III, Klint Rose, James M. Hamilton
  • Patent number: 8252164
    Abstract: The present invention provides methods and systems for nanowire alignment and deposition. Energizing (e.g., an alternating current electric field) is used to align and associate nanowires with electrodes. By modulating the energizing, the nanowires are coupled to the electrodes such that they remain in place during subsequent wash and drying steps. The invention also provides methods for transferring nanowires from one substrate to another in order to prepare various device substrates. The present invention also provides methods for monitoring and controlling the number of nanowires deposited at a particular electrode pair, as well as methods for manipulating nanowires in solution.
    Type: Grant
    Filed: May 23, 2011
    Date of Patent: August 28, 2012
    Assignees: Nanosys, Inc., Sharp Kabushiki Kaisha
    Inventors: Samuel Martin, Xiangfeng Duan, Katsumasa Fujii, James M. Hamilton, Hiroshi Iwata, Francisco Leon, Jeffrey Miller, Tetsu Negishi, Hiroshi Ohki, J. Wallace Parce, Cheri X. Y. Pereira, Paul John Schuele, Akihide Shibata, David P. Stumbo, Yasunobu Okada
  • Publication number: 20120135158
    Abstract: Methods, systems, and apparatuses for nanowire deposition are provided. A deposition system includes an enclosed flow channel, an inlet port, and an electrical signal source. The inlet port provides a suspension that includes nanowires into the channel. The electrical signal source is coupled to an electrode pair in the channel to generate an electric field to associate at least one nanowire from the suspension with the electrode pair. The deposition system may include various further features, including being configured to receive multiple solution types, having various electrode geometries, having a rotatable flow channel, having additional electrical conductors, and further aspects.
    Type: Application
    Filed: May 25, 2010
    Publication date: May 31, 2012
    Applicants: SHARP KABUSHIKI KAISHA, NANOSYS, INC.
    Inventors: Erik Freer, James M. Hamilton, David P. Stumbo, Kenji Komiya, Akihide Shibata
  • Publication number: 20110284380
    Abstract: The present invention provides methods and systems for nanowire alignment and deposition. Energizing (e.g., an alternating current electric field) is used to align and associate nanowires with electrodes. By modulating the energizing, the nanowires are coupled to the electrodes such that they remain in place during subsequent wash and drying steps. The invention also provides methods for transferring nanowires from one substrate to another in order to prepare various device substrates. The present invention also provides methods for monitoring and controlling the number of nanowires deposited at a particular electrode pair, as well as methods for manipulating nanowires in solution.
    Type: Application
    Filed: May 23, 2011
    Publication date: November 24, 2011
    Inventors: Samuel MARTIN, Xiangfeng Duan, Katsumasa Fujii, James M. Hamilton, Hiroshi Iwata, Francisco Leon, Jeffrey Miller, Tetsu Negishi, Hiroshi Ohki, J. Wallace Parce, Cheri X.Y. Pereira, Paul John Schuele, Akihide Shibata, David P. Stumbo, Yasunobu Okada
  • Publication number: 20110165337
    Abstract: Methods and systems for applying nanowires and electrical devices to surfaces are described. In a first aspect, at least one nanowire is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate the at least one nanowire with the electrodes. The electrode pair is aligned with a region of the destination surface. The at least one nanowire is deposited from the electrode pair to the region. In another aspect, a plurality of electrical devices is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate an electrical device of the plurality of electrical devices with the electrodes. The electrode pair is aligned with a region of the destination surface. The electrical device is deposited from the electrode pair to the region.
    Type: Application
    Filed: January 19, 2011
    Publication date: July 7, 2011
    Applicant: NANOSYS, INC.
    Inventors: J. Wallace Parce, James M. Hamilton, Samuel Martin, Erik Freer
  • Patent number: 7968474
    Abstract: The present invention provides methods and systems for nanowire alignment and deposition. Energizing (e.g., an alternating current electric field) is used to align and associate nanowires with electrodes. By modulating the energizing, the nanowires are coupled to the electrodes such that they remain in place during subsequent wash and drying steps. The invention also provides methods for transferring nanowires from one substrate to another in order to prepare various device substrates. The present invention also provides methods for monitoring and controlling the number of nanowires deposited at a particular electrode pair, as well as methods for manipulating nanowires in solution.
    Type: Grant
    Filed: November 9, 2007
    Date of Patent: June 28, 2011
    Assignees: Nanosys, Inc., Sharp Kabushiki Kaisha
    Inventors: Samuel Martin, Xiangfeng Duan, Katsumasa Fujii, James M. Hamilton, Hiroshi Iwata, Francisco Leon, Jeffrey Miller, Tetsu Negishi, Hiroshi Ohki, J. Wallace Parce, Cheri X. Y. Pereira, Paul John Schuele, Akihide Shibata, David P. Stumbo, Yasunobu Okada
  • Patent number: 7910064
    Abstract: This invention provides nanowire based molecular sensors and methods for detecting analytes in a microfluidic system. Methods for sensing analytes include detecting changed electrical parameters associated with contact of a nanowire with the analyte in a microfluidic system. Sensors of the invention include nanowires mounted in microchambers of a microfluidic system in electrical contact with the detector, whereby electrical parameter changes induced in the nanowire by the analyte can be monitored by the detector.
    Type: Grant
    Filed: April 6, 2006
    Date of Patent: March 22, 2011
    Assignee: Nanosys, Inc.
    Inventors: James M. Hamilton, Robert S. Dubrow, Calvin Y. H. Chow
  • Patent number: 7892610
    Abstract: Methods and systems for applying nanowires and electrical devices to surfaces are described. In a first aspect, at least one nanowire is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate the at least one nanowire with the electrodes. The electrode pair is aligned with a region of the destination surface. The at least one nanowire is deposited from the electrode pair to the region. In another aspect, a plurality of electrical devices is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate an electrical device of the plurality of electrical devices with the electrodes. The electrode pair is aligned with a region of the destination surface. The electrical device is deposited from the electrode pair to the region.
    Type: Grant
    Filed: May 2, 2008
    Date of Patent: February 22, 2011
    Assignee: Nanosys, Inc.
    Inventors: J. Wallace Parce, James M. Hamilton, Samuel Martin, Erik Freer
  • Patent number: 7741197
    Abstract: The present invention is directed to methods to harvest, integrate and exploit nanomaterials, and particularly elongated nanowire materials. The invention provides methods for harvesting nanowires that include selectively etching a sacrificial layer placed on a nanowire growth substrate to remove nanowires. The invention also provides methods for integrating nanowires into electronic devices that include placing an outer surface of a cylinder in contact with a fluid suspension of nanowires and rolling the nanowire coated cylinder to deposit nanowires onto a surface. Methods are also provided to deposit nanowires using an ink-jet printer or an aperture to align nanowires. Additional aspects of the invention provide methods for preventing gate shorts in nanowire based transistors. Additional methods for harvesting and integrating nanowires are provided.
    Type: Grant
    Filed: December 20, 2006
    Date of Patent: June 22, 2010
    Assignee: Nanosys, Inc.
    Inventors: Xiangfeng Duan, Paul Bernatis, Alice Fischer-Colbrie, James M. Hamilton, Francesco Lemmi, Yaoling Pan, J. Wallace Parce, Cheri X. Y. Pereira, David P. Stumbo
  • Patent number: 7651944
    Abstract: Methods of positioning and orienting nanostructures, and particularly nanowires, on surfaces for subsequent use or integration. The methods utilize mask based processes alone or in combination with flow based alignment of the nanostructures to provide oriented and positioned nanostructures on surfaces. Also provided are populations of positioned and/or oriented nanostructures, devices that include populations of positioned and/or oriented nanostructures, systems for positioning and/or orienting nanostructures, and related devices, systems and methods.
    Type: Grant
    Filed: August 5, 2008
    Date of Patent: January 26, 2010
    Assignee: Nanosys, Inc.
    Inventors: Xiangfeng Duan, R. Hugh Daniels, Chunming Niu, Vijendra Sahi, James M. Hamilton, Linda T. Romano
  • Publication number: 20090124025
    Abstract: This invention provides nanowire based molecular sensors and methods for detecting analytes in a microfluidic system. Methods for sensing analytes include detecting changed electrical parameters associated with contact of a nanowire with the analyte in a microfluidic system. Sensors of the invention include nanowires mounted in microchambers of a microfluidic system in electrical contact with the detector, whereby electrical parameter changes induced in the nanowire by the analyte can be monitored by the detector.
    Type: Application
    Filed: April 6, 2006
    Publication date: May 14, 2009
    Applicant: Nanosys, Inc.
    Inventors: James M. Hamilton, Robert S. Dubrow, Calvin Y.H. Chow
  • Publication number: 20080280069
    Abstract: Methods and systems for applying nanowires and electrical devices to surfaces are described. In a first aspect, at least one nanowire is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate the at least one nanowire with the electrodes. The electrode pair is aligned with a region of the destination surface. The at least one nanowire is deposited from the electrode pair to the region. In another aspect, a plurality of electrical devices is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate an electrical device of the plurality of electrical devices with the electrodes. The electrode pair is aligned with a region of the destination surface. The electrical device is deposited from the electrode pair to the region.
    Type: Application
    Filed: May 2, 2008
    Publication date: November 13, 2008
    Applicant: Nanosys, Inc.
    Inventors: J. Wallace Parce, James M. Hamilton, Samuel Martin, Erik Freer
  • Publication number: 20080224123
    Abstract: The present invention provides methods and systems for nanowire alignment and deposition. Energizing (e.g., an alternating current electric field) is used to align and associate nanowires with electrodes. By modulating the energizing, the nanowires are coupled to the electrodes such that they remain in place during subsequent wash and drying steps. The invention also provides methods for transferring nanowires from one substrate to another in order to prepare various device substrates. The present invention also provides methods for monitoring and controlling the number of nanowires deposited at a particular electrode pair, as well as methods for manipulating nanowires in solution.
    Type: Application
    Filed: November 9, 2007
    Publication date: September 18, 2008
    Inventors: Samuel Martin, Xiangfeng Duan, Katsumasa Fujii, James M. Hamilton, Hiroshi Iwata, Francisco Leon, Jeffrey Miller, Tetsu Negishi, Hiroshi Ohki, J. Wallace Parce, Cheri X.Y. Pereira, Paul John Schuele, Akihide Shibata, David P. Stumbo, Yasunobu Okada
  • Patent number: 7422980
    Abstract: Methods of positioning and orienting nanostructures, and particularly nanowires, on surfaces for subsequent use or integration. The methods utilize mask based processes alone or in combination with flow based alignment of the nanostructures to provide oriented and positioned nanostructures on surfaces. Also provided are populations of positioned and/or oriented nanostructures, devices that include populations of positioned and/or oriented nanostructures, systems for positioning and/or orienting nanostructures, and related devices, systems and methods.
    Type: Grant
    Filed: November 21, 2006
    Date of Patent: September 9, 2008
    Assignee: Nanosys, Inc.
    Inventors: Xiangfeng Duan, R. Hugh Daniels, Chunming Niu, Vijendra Sahi, James M. Hamilton, Linda T. Romano
  • Patent number: 7344961
    Abstract: The present invention is directed to methods to produce, process, and exploit nanomaterials, and particularly elongated nanowire materials. The invention provides a method for producing nanowires that includes providing a thin film of a catalyst material with varying thickness on a substrate, heating the substrate and thin film, such that the thin film disassociates at the relatively thinner regions and vapor depositing a semiconductor onto the substrate to produce nanowires. A method is also provided in which two or more thin films of different materials are overlayed over a substrate, selectively etching the first underlying thin film to create a plurality of islands of the second thin film that mask portions of the first thin film and expose other portions and growing nanowires on the first thin film. Additional methods for producing nanowires are provided.
    Type: Grant
    Filed: April 29, 2005
    Date of Patent: March 18, 2008
    Assignee: Nanosys, Inc.
    Inventors: Linda T. Romano, James M. Hamilton
  • Patent number: D943769
    Type: Grant
    Filed: March 23, 2020
    Date of Patent: February 15, 2022
    Assignee: CREATIVE MILLWORK OF OHIO, INC.
    Inventors: Joseph J. Lalli, James M. Hamilton