Patents by Inventor James M. Hamilton
James M. Hamilton has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20160281256Abstract: Methods, systems, and apparatuses for nanowire deposition are provided. A deposition system includes an enclosed flow channel, an inlet port, and an electrical signal source. The inlet port provides a suspension that includes nanowires into the channel. The electrical signal source is coupled to an electrode pair in the channel to generate an electric field to associate at least one nanowire from the suspension with the electrode pair. The deposition system may include various further features, including being configured to receive multiple solution types, having various electrode geometries, having a rotatable flow channel, having additional electrical conductors, and further aspects.Type: ApplicationFiled: June 8, 2016Publication date: September 29, 2016Inventors: Erik FREER, James M. HAMILTON, David P. STUMBO, Kenji KOMIYA, Akihide SHIBATA
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Patent number: 9388945Abstract: System, including apparatus and methods, for aspirating at least a portion of an emulsion from a well using a tip. In some embodiments, the tip may have a flat end and an inlet surrounded by the flat end. The well may have a floor with one or more surface features that prevent uninterrupted circumferential contact of the flat end of the tip with any region of the floor. In some embodiments, the tip may not have a flat end. In some embodiments, the well may have a port that guides the tip to the floor with the tip slanted with respect to the floor. Methods of making a device that includes the well are also disclosed.Type: GrantFiled: February 3, 2014Date of Patent: July 12, 2016Assignee: Bio-Rad Laboratories, Inc.Inventors: Adam Bemis, Thomas H. Cauley, III, Klint Rose, James M. Hamilton
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Patent number: 9390951Abstract: Methods, systems, and apparatuses for nanowire deposition are provided. A deposition system includes an enclosed flow channel, an inlet port, and an electrical signal source. The inlet port provides a suspension that includes nanowires into the channel. The electrical signal source is coupled to an electrode pair in the channel to generate an electric field to associate at least one nanowire from the suspension with the electrode pair. The deposition system may include various further features, including being configured to receive multiple solution types, having various electrode geometries, having a rotatable flow channel, having additional electrical conductors, and further aspects.Type: GrantFiled: July 24, 2014Date of Patent: July 12, 2016Assignee: SHARP KABUSHIKI KAISHAInventors: Erik Freer, James M. Hamilton, David P. Stumbo, Kenji Komiya, Akihide Shibata
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Publication number: 20140331930Abstract: Methods, systems, and apparatuses for nanowire deposition are provided. A deposition system includes an enclosed flow channel, an inlet port, and an electrical signal source. The inlet port provides a suspension that includes nanowires into the channel. The electrical signal source is coupled to an electrode pair in the channel to generate an electric field to associate at least one nanowire from the suspension with the electrode pair. The deposition system may include various further features, including being configured to receive multiple solution types, having various electrode geometries, having a rotatable flow channel, having additional electrical conductors, and further aspects.Type: ApplicationFiled: July 24, 2014Publication date: November 13, 2014Applicants: SHARP KABUSHIKI KAISHA, OneD Material LLCInventors: Erik Freer, James M. Hamilton, David P. Stumbo, Kenji Komiya, Akihide Shibata
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Publication number: 20140216579Abstract: System, including apparatus and methods, for aspirating at least a portion of an emulsion from a well using a tip. In some embodiments, the tip may have a flat end and an inlet surrounded by the flat end. The well may have a floor with one or more surface features that prevent uninterrupted circumferential contact of the flat end of the tip with any region of the floor. In some embodiments, the tip may not have a flat end. In some embodiments, the well may have a port that guides the tip to the floor with the tip slanted with respect to the floor. Methods of making a device that includes the well are also disclosed.Type: ApplicationFiled: February 3, 2014Publication date: August 7, 2014Applicant: Bio-Rad Laboratories, Inc.Inventors: Adam Bemis, Thomas H. Cauley, III, Klint Rose, James M. Hamilton
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Patent number: 8252164Abstract: The present invention provides methods and systems for nanowire alignment and deposition. Energizing (e.g., an alternating current electric field) is used to align and associate nanowires with electrodes. By modulating the energizing, the nanowires are coupled to the electrodes such that they remain in place during subsequent wash and drying steps. The invention also provides methods for transferring nanowires from one substrate to another in order to prepare various device substrates. The present invention also provides methods for monitoring and controlling the number of nanowires deposited at a particular electrode pair, as well as methods for manipulating nanowires in solution.Type: GrantFiled: May 23, 2011Date of Patent: August 28, 2012Assignees: Nanosys, Inc., Sharp Kabushiki KaishaInventors: Samuel Martin, Xiangfeng Duan, Katsumasa Fujii, James M. Hamilton, Hiroshi Iwata, Francisco Leon, Jeffrey Miller, Tetsu Negishi, Hiroshi Ohki, J. Wallace Parce, Cheri X. Y. Pereira, Paul John Schuele, Akihide Shibata, David P. Stumbo, Yasunobu Okada
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Publication number: 20120135158Abstract: Methods, systems, and apparatuses for nanowire deposition are provided. A deposition system includes an enclosed flow channel, an inlet port, and an electrical signal source. The inlet port provides a suspension that includes nanowires into the channel. The electrical signal source is coupled to an electrode pair in the channel to generate an electric field to associate at least one nanowire from the suspension with the electrode pair. The deposition system may include various further features, including being configured to receive multiple solution types, having various electrode geometries, having a rotatable flow channel, having additional electrical conductors, and further aspects.Type: ApplicationFiled: May 25, 2010Publication date: May 31, 2012Applicants: SHARP KABUSHIKI KAISHA, NANOSYS, INC.Inventors: Erik Freer, James M. Hamilton, David P. Stumbo, Kenji Komiya, Akihide Shibata
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Publication number: 20110284380Abstract: The present invention provides methods and systems for nanowire alignment and deposition. Energizing (e.g., an alternating current electric field) is used to align and associate nanowires with electrodes. By modulating the energizing, the nanowires are coupled to the electrodes such that they remain in place during subsequent wash and drying steps. The invention also provides methods for transferring nanowires from one substrate to another in order to prepare various device substrates. The present invention also provides methods for monitoring and controlling the number of nanowires deposited at a particular electrode pair, as well as methods for manipulating nanowires in solution.Type: ApplicationFiled: May 23, 2011Publication date: November 24, 2011Inventors: Samuel MARTIN, Xiangfeng Duan, Katsumasa Fujii, James M. Hamilton, Hiroshi Iwata, Francisco Leon, Jeffrey Miller, Tetsu Negishi, Hiroshi Ohki, J. Wallace Parce, Cheri X.Y. Pereira, Paul John Schuele, Akihide Shibata, David P. Stumbo, Yasunobu Okada
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Publication number: 20110165337Abstract: Methods and systems for applying nanowires and electrical devices to surfaces are described. In a first aspect, at least one nanowire is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate the at least one nanowire with the electrodes. The electrode pair is aligned with a region of the destination surface. The at least one nanowire is deposited from the electrode pair to the region. In another aspect, a plurality of electrical devices is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate an electrical device of the plurality of electrical devices with the electrodes. The electrode pair is aligned with a region of the destination surface. The electrical device is deposited from the electrode pair to the region.Type: ApplicationFiled: January 19, 2011Publication date: July 7, 2011Applicant: NANOSYS, INC.Inventors: J. Wallace Parce, James M. Hamilton, Samuel Martin, Erik Freer
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Patent number: 7968474Abstract: The present invention provides methods and systems for nanowire alignment and deposition. Energizing (e.g., an alternating current electric field) is used to align and associate nanowires with electrodes. By modulating the energizing, the nanowires are coupled to the electrodes such that they remain in place during subsequent wash and drying steps. The invention also provides methods for transferring nanowires from one substrate to another in order to prepare various device substrates. The present invention also provides methods for monitoring and controlling the number of nanowires deposited at a particular electrode pair, as well as methods for manipulating nanowires in solution.Type: GrantFiled: November 9, 2007Date of Patent: June 28, 2011Assignees: Nanosys, Inc., Sharp Kabushiki KaishaInventors: Samuel Martin, Xiangfeng Duan, Katsumasa Fujii, James M. Hamilton, Hiroshi Iwata, Francisco Leon, Jeffrey Miller, Tetsu Negishi, Hiroshi Ohki, J. Wallace Parce, Cheri X. Y. Pereira, Paul John Schuele, Akihide Shibata, David P. Stumbo, Yasunobu Okada
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Patent number: 7910064Abstract: This invention provides nanowire based molecular sensors and methods for detecting analytes in a microfluidic system. Methods for sensing analytes include detecting changed electrical parameters associated with contact of a nanowire with the analyte in a microfluidic system. Sensors of the invention include nanowires mounted in microchambers of a microfluidic system in electrical contact with the detector, whereby electrical parameter changes induced in the nanowire by the analyte can be monitored by the detector.Type: GrantFiled: April 6, 2006Date of Patent: March 22, 2011Assignee: Nanosys, Inc.Inventors: James M. Hamilton, Robert S. Dubrow, Calvin Y. H. Chow
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Patent number: 7892610Abstract: Methods and systems for applying nanowires and electrical devices to surfaces are described. In a first aspect, at least one nanowire is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate the at least one nanowire with the electrodes. The electrode pair is aligned with a region of the destination surface. The at least one nanowire is deposited from the electrode pair to the region. In another aspect, a plurality of electrical devices is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate an electrical device of the plurality of electrical devices with the electrodes. The electrode pair is aligned with a region of the destination surface. The electrical device is deposited from the electrode pair to the region.Type: GrantFiled: May 2, 2008Date of Patent: February 22, 2011Assignee: Nanosys, Inc.Inventors: J. Wallace Parce, James M. Hamilton, Samuel Martin, Erik Freer
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Patent number: 7741197Abstract: The present invention is directed to methods to harvest, integrate and exploit nanomaterials, and particularly elongated nanowire materials. The invention provides methods for harvesting nanowires that include selectively etching a sacrificial layer placed on a nanowire growth substrate to remove nanowires. The invention also provides methods for integrating nanowires into electronic devices that include placing an outer surface of a cylinder in contact with a fluid suspension of nanowires and rolling the nanowire coated cylinder to deposit nanowires onto a surface. Methods are also provided to deposit nanowires using an ink-jet printer or an aperture to align nanowires. Additional aspects of the invention provide methods for preventing gate shorts in nanowire based transistors. Additional methods for harvesting and integrating nanowires are provided.Type: GrantFiled: December 20, 2006Date of Patent: June 22, 2010Assignee: Nanosys, Inc.Inventors: Xiangfeng Duan, Paul Bernatis, Alice Fischer-Colbrie, James M. Hamilton, Francesco Lemmi, Yaoling Pan, J. Wallace Parce, Cheri X. Y. Pereira, David P. Stumbo
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Patent number: 7651944Abstract: Methods of positioning and orienting nanostructures, and particularly nanowires, on surfaces for subsequent use or integration. The methods utilize mask based processes alone or in combination with flow based alignment of the nanostructures to provide oriented and positioned nanostructures on surfaces. Also provided are populations of positioned and/or oriented nanostructures, devices that include populations of positioned and/or oriented nanostructures, systems for positioning and/or orienting nanostructures, and related devices, systems and methods.Type: GrantFiled: August 5, 2008Date of Patent: January 26, 2010Assignee: Nanosys, Inc.Inventors: Xiangfeng Duan, R. Hugh Daniels, Chunming Niu, Vijendra Sahi, James M. Hamilton, Linda T. Romano
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Publication number: 20090124025Abstract: This invention provides nanowire based molecular sensors and methods for detecting analytes in a microfluidic system. Methods for sensing analytes include detecting changed electrical parameters associated with contact of a nanowire with the analyte in a microfluidic system. Sensors of the invention include nanowires mounted in microchambers of a microfluidic system in electrical contact with the detector, whereby electrical parameter changes induced in the nanowire by the analyte can be monitored by the detector.Type: ApplicationFiled: April 6, 2006Publication date: May 14, 2009Applicant: Nanosys, Inc.Inventors: James M. Hamilton, Robert S. Dubrow, Calvin Y.H. Chow
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Publication number: 20080280069Abstract: Methods and systems for applying nanowires and electrical devices to surfaces are described. In a first aspect, at least one nanowire is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate the at least one nanowire with the electrodes. The electrode pair is aligned with a region of the destination surface. The at least one nanowire is deposited from the electrode pair to the region. In another aspect, a plurality of electrical devices is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate an electrical device of the plurality of electrical devices with the electrodes. The electrode pair is aligned with a region of the destination surface. The electrical device is deposited from the electrode pair to the region.Type: ApplicationFiled: May 2, 2008Publication date: November 13, 2008Applicant: Nanosys, Inc.Inventors: J. Wallace Parce, James M. Hamilton, Samuel Martin, Erik Freer
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Publication number: 20080224123Abstract: The present invention provides methods and systems for nanowire alignment and deposition. Energizing (e.g., an alternating current electric field) is used to align and associate nanowires with electrodes. By modulating the energizing, the nanowires are coupled to the electrodes such that they remain in place during subsequent wash and drying steps. The invention also provides methods for transferring nanowires from one substrate to another in order to prepare various device substrates. The present invention also provides methods for monitoring and controlling the number of nanowires deposited at a particular electrode pair, as well as methods for manipulating nanowires in solution.Type: ApplicationFiled: November 9, 2007Publication date: September 18, 2008Inventors: Samuel Martin, Xiangfeng Duan, Katsumasa Fujii, James M. Hamilton, Hiroshi Iwata, Francisco Leon, Jeffrey Miller, Tetsu Negishi, Hiroshi Ohki, J. Wallace Parce, Cheri X.Y. Pereira, Paul John Schuele, Akihide Shibata, David P. Stumbo, Yasunobu Okada
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Patent number: 7422980Abstract: Methods of positioning and orienting nanostructures, and particularly nanowires, on surfaces for subsequent use or integration. The methods utilize mask based processes alone or in combination with flow based alignment of the nanostructures to provide oriented and positioned nanostructures on surfaces. Also provided are populations of positioned and/or oriented nanostructures, devices that include populations of positioned and/or oriented nanostructures, systems for positioning and/or orienting nanostructures, and related devices, systems and methods.Type: GrantFiled: November 21, 2006Date of Patent: September 9, 2008Assignee: Nanosys, Inc.Inventors: Xiangfeng Duan, R. Hugh Daniels, Chunming Niu, Vijendra Sahi, James M. Hamilton, Linda T. Romano
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Patent number: 7344961Abstract: The present invention is directed to methods to produce, process, and exploit nanomaterials, and particularly elongated nanowire materials. The invention provides a method for producing nanowires that includes providing a thin film of a catalyst material with varying thickness on a substrate, heating the substrate and thin film, such that the thin film disassociates at the relatively thinner regions and vapor depositing a semiconductor onto the substrate to produce nanowires. A method is also provided in which two or more thin films of different materials are overlayed over a substrate, selectively etching the first underlying thin film to create a plurality of islands of the second thin film that mask portions of the first thin film and expose other portions and growing nanowires on the first thin film. Additional methods for producing nanowires are provided.Type: GrantFiled: April 29, 2005Date of Patent: March 18, 2008Assignee: Nanosys, Inc.Inventors: Linda T. Romano, James M. Hamilton
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Patent number: D943769Type: GrantFiled: March 23, 2020Date of Patent: February 15, 2022Assignee: CREATIVE MILLWORK OF OHIO, INC.Inventors: Joseph J. Lalli, James M. Hamilton