Abstract: An optical system includes multiple cubic crystalline optical elements and one or more polarization rotators in which the crystal lattices of the cubic crystalline optical elements are oriented with respect to each other to reduce the effects of intrinsic birefringence and produce a system with reduced retardance. The optical system may be a refractive or catadioptric system having a high numerical aperture and using light with a wavelength at or below 248 nanometers. The net retardance of the system is less than the sum of the retardance contributions of the respective optical elements. In one embodiment, all cubic crystalline optical elements are oriented with identical three dimensional cubic crystalline lattice directions, a 90° polarization rotator divides the system into front and rear groups such that the net retardance of the front group is balanced by the net retardance of the rear group.

Abstract: A wavelength selective optical switch particularly usable as a programmable N×M optical switch in a multi-wavelength communication system. The switch uses a grating that separates multi-channel optical signals into a plurality of optical channels, and combines a plurality of optical channels into multi-channel optical signals. Programmable mirrors switch each optical channel to any of a plurality of fibers coupled to the switch.

Abstract: An optical system includes multiple cubic crystalline optical elements and one or more uniaxial birefringent elements in which the crystal lattices of the cubic crystalline optical elements are oriented with respect to each other to reduce the effects of intrinsic birefringence and produce a system with reduced retardance. The net retardance of the system is reduced by the cancellation of retardance contributions from the multiple cubic crystalline optical elements and the uniaxial birefringent element. The optical system may be used in a photolithography tool to pattern substrates such as semiconductor substrates and thereby produce semiconductor devices.

Abstract: Optical relays having three or more reflector portions to allow efficient grazing angle reflections with a relatively high acceptance of light are described. Light collected by the relay can be delivered to a selected location for various applications, including semiconductor lithography. In some embodiments, the grazing angles are selected to utilize the high reflectivity of extreme ultraviolet light at low grazing angles. The three or more reflectors can be arranged with respect to a light source to provide such grazing angle reflections and high acceptance. Some collectors can have more than one shell to increase the acceptance. In some embodiments, some of the reflectors can be configured to shape the delivered light.

Abstract: An optical system includes at least one cubic crystalline optical element aligned along an optical axis, the at least one cubic crystalline optical element being birefringent and imparting retardance on a beam of light propagating through the optical system along the optical axis, and polarization rotation optics inserted along the optical axis and selected to rotate the polarization of the beam of light to at least partially reduce the retardance.

Abstract: One embodiment of the invention comprises a simplified light-weight head mounted displays comprising an off-axis combiner and a pair of plastic lenses. One of the lenses is a rotationally symmetric optical element and one of the lens is a non-rotationally symmetric optical element. This non-rotationally symmetric optical element comprises first and second lens surfaces that are tilted and decentered with respect to each other. One of these first and second lens surfaces may also include diffractive feature to provide a diffractive or holographic optical element for color correction.

Abstract: A wavelength selective optical switch particularly usable as a programmable N×M optical switch in a multi-wavelength communication system. The switch uses a grating that separates multi-channel optical signals into a plurality of optical channels, and combines a plurality of optical channels into multi-channel optical signals. Programmable mirrors switch each optical channel to any of a plurality of fibers coupled to the switch.

Abstract: Various embodiments provide projection optics comprise a plurality of mirrors that provide high demagnification of, for example, about one hundred times or more. The projection optics may be used for photolithography processes, such as extreme ultraviolet lithography processes, to pattern microstructures.

Abstract: Various embodiments involving structures and methods for illumination can be employed, for example, in projectors, head-mounted displays, helmet-mounted displays, back projection TVs, flat panel displays as well as other optical systems. Certain embodiments may include prism elements for illuminating, for example, a spatial light modulator. Light may be coupled to the prism in some cases using fiber optics or lightpipes. The optical system may also include a diffuser having scatter features arranged to scatter light appropriately to produce a desired luminance profile. Other embodiments are possible as well.

Abstract: A wavelength selective optical switch particularly usable as a programmable N×M optical switch in a multi-wavelength communication system. The switch uses a grating that separates multi-channel optical signals into a plurality of optical channels, and combines a plurality of optical channels into multi-channel optical signals. Programmable mirrors switch each optical channel to any of a plurality of fibers coupled to the switch.

Abstract: Various embodiments involving structures and methods for illumination can be employed, for example, in projectors, head-mounted displays, helmet-mounted displays, back projection TVs, flat panel displays as well as other optical systems. Certain embodiments may include prism elements for illuminating, for example, a spatial light modulator. Light may be coupled to the prism in some cases using fiber optics or lightpipes. The optical system may also include a diffuser having scatter features arranged to scatter light appropriately to produce a desired luminance profile. Other embodiments are possible as well.

Abstract: A multi-channel optical switching system particularly usable as a programmable optical add/drop multiplexer in a multi-wavelength communication system. The switching system uses a grating operating at Littrow that separates a multi-channel optical signal into a plurality of optical channels, and combines a plurality of optical channels into a multi-channel optical signal. The system also uses a plurality of optical ports optically coupled to the grating and a selecting device to select which optical channel is directed to which of the optical ports.

Abstract: Various embodiments involving structures and methods for illumination can be employed, for example, in projectors, head-mounted displays, helmet-mounted displays, back projection TVs, flat panel displays as well as other optical systems. Certain embodiments may include prism elements for illuminating, for example, a spatial light modulator. Light may be coupled to the prism in some cases using fiber optics or lightpipes. The optical system may also include a diffuser having scatter features arranged to scatter light appropriately to produce a desired luminance profile. Other embodiments are possible as well.

Abstract: A multi-channel optical switching system particularly usable as a programmable optical add/drop multiplexer (POADM) in a multi-wavelength communication system. The switching system uses a thin film optical demux/mux that separates a multi-channel optical signal into a plurality of optical channels, and combines a plurality of optical channels into a multi-channel optical signal. The system also uses a plurality of optical ports optically connected to the thin film optical demux/mux and a selecting device to select which optical channel is directed to which of the optical ports.

Abstract: A lithographic apparatus includes a projection system, which includes a plurality of cubic crystalline optical elements that each impart retardance to a beam of radiation. The optical elements are aligned along an optical axis of the projection system and include two adjacent crystalline optical elements having a common crystalline lattice direction oriented along the optical axis. A first of the two adjacent elements is rotated about the optical axis with respect to a second of the adjacent elements with a predetermined rotation angle. The crystalline optical elements are selected and positioned along the optical axis and the rotation angle is selected such that, for each of two substantially perpendicular polarization states of the beam of radiation having a radiation wavelength of about 193 nm, the patterned beam of radiation has less than about 0.012 waves RMS of wavefront aberration across an exit pupil of the projection system.

Abstract: An optical system includes multiple cubic crystalline optical elements and one or more uniaxial birefringent elements in which the crystal lattices of the cubic crystalline optical elements are oriented with respect to each other to reduce the effects of intrinsic birefringence and produce a system with reduced retardance. The net retardance of the system is reduced by the cancellation of retardance contributions from the multiple cubic crystalline optical elements and the uniaxial birefringent element. The optical system may be used in a photolithography tool to pattern substrates such as semiconductor substrates and thereby produce semiconductor devices.

Abstract: An optical system includes multiple cubic crystalline optical elements and one or more uniaxial birefringent elements in which the crystal lattices of the cubic crystalline optical elements are oriented with respect to each other to reduce the effects of intrinsic birefringence and produce a system with reduced retardance. The net retardance of the system is reduced by the cancellation of retardance contributions from the multiple cubic crystalline optical elements and the uniaxial birefringent element. The optical system may be used in a photolithography tool to pattern substrates such as semiconductor substrates and thereby produce semiconductor devices.

Abstract: A wavelength selective optical switch particularly usable as a programmable N×M optical switch in a multi-wavelength communication system. The switch uses a grating that separates multi-channel optical signals into a plurality of optical channels, and combines a plurality of optical channels into multi-channel optical signals. Programmable mirrors switch each optical channel to any of a plurality of fibers coupled to the switch.

Abstract: An illumination system and condenser for use in photolithography in the extreme ultraviolet wavelength region has a first non-imaging optic element collecting electromagnetic radiation from a source and creates a desired radiance distribution. A second non-imaging optic element receives the electromagnetic radiation from the first non-imaging optic element and redirects and images the electromagnetic radiation. The electromagnetic radiation from the second non-imaging optic element is suitable for being received by other conventional optical surfaces to provide a desired radiance distribution with a desired angular distribution and desired shape. Facets are used to provide the desired illumination over the desired illumination field. Reflective facets may be placed on the second non-imaging optic, which can reduce the number of mirrors and increase efficiency.

Abstract: A photolithography tool including an optical system for transmitting a beam of radiation toward a substrate is presented. The optical system includes a plurality of calcium fluoride lens elements, optically transmissive of the beam of radiation, each having respective optical axes and imparting a retardance to the beam. The plurality of calcium fluoride lens elements are aligned along an optical path for propagation of the beam of radiation therethrough. Each of the calcium fluoride lens elements includes a cubic crystalline calcium fluoride that is aligned with its [111] lattice direction, or a lattice direction optically equivalent to the [111] lattice direction, substantially parallel with its optical axis. A first calcium fluoride lens element of the plurality of calcium fluoride lens elements is rotated about its optical axis with respect to a second calcium fluoride lens element. The optical system has less than or about 0.015 waves RMS of wavefront aberration.