Patents by Inventor James Rand

James Rand has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11150866
    Abstract: Systems and methods for Contextual Audio Detection, wherein Contextual Audio Detection includes detecting specific sounds using Adjustable Parameters and using the output to control audio routing, input parameters, and other features.
    Type: Grant
    Filed: November 12, 2019
    Date of Patent: October 19, 2021
    Assignee: Synervoz Communications Inc.
    Inventors: James Rand, Nevo Segal
  • Publication number: 20200150919
    Abstract: Systems and methods for Contextual Audio Detection, wherein Contextual Audio Detection includes detecting specific sounds using Adjustable Parameters and using the output to control audio routing, input parameters, and other features.
    Type: Application
    Filed: November 12, 2019
    Publication date: May 14, 2020
    Inventors: James Rand, Nevo Segal
  • Publication number: 20150229269
    Abstract: Devices and processes are provided configured to test electrical and physical function of photovoltaic modules at the location where the photovoltaic modules are installed and without having to disconnect the photovoltaic modules from their mechanical support or electrical circuits.
    Type: Application
    Filed: February 6, 2015
    Publication date: August 13, 2015
    Inventors: James Rand, Mason Reed, Eric Daniels
  • Patent number: 8334194
    Abstract: Methods and apparatus for fabricating a semiconductor sheet are provided. In one aspect, a method for fabricating a semiconductor wafer includes applying a layer of semiconductor material across a portion of a setter material, introducing the setter material and the semiconductor material to a predetermined thermal gradient to form a melt, wherein the thermal gradient includes a predetermined nucleation and growth region, and forming at least one local cold spot in the nucleation and growth region to facilitate inducing crystal nucleation at the at least one desired location.
    Type: Grant
    Filed: February 6, 2008
    Date of Patent: December 18, 2012
    Assignee: Motech Americas, LLC
    Inventors: Ralf Jonczyk, James Rand
  • Publication number: 20090280336
    Abstract: A method of fabricating a sheet of semiconductor material is provided. The method includes forming a first layer of silicon powder that has a lower surface and an opposite upper surface. The method also includes depositing a second layer of silicon powder across the upper surface of the first layer, wherein the second layer of silicon powder has a lower surface and an opposite upper surface and has a lower melting point than the first layer of silicon powder. The method also includes heating at least one of the first and second layers of silicon powder to initiate a controlled melt of at least one of the first and second layers of silicon powder, and cooling at least one of the first and second layers of silicon powder to initiate crystallization of at least one of the first and second layers of silicon powder.
    Type: Application
    Filed: May 8, 2008
    Publication date: November 12, 2009
    Inventors: Ralf Jonczyk, James Rand
  • Publication number: 20090194849
    Abstract: Methods and apparatus for fabricating a semiconductor sheet are provided. In one aspect, a method for fabricating a semiconductor wafer includes applying a layer of semiconductor material across a portion of a setter material, introducing the setter material and the semiconductor material to a predetermined thermal gradient to form a melt, wherein the thermal gradient includes a predetermined nucleation and growth region, and forming at least one local cold spot in the nucleation and growth region to facilitate inducing crystal nucleation at the at least one desired location.
    Type: Application
    Filed: February 6, 2008
    Publication date: August 6, 2009
    Inventors: Ralf Jonczyk, James Rand
  • Publication number: 20080308970
    Abstract: A process for melting powders of a semiconductor material, such as silicon, to yield a high-purity solid product. The process generally entails introducing the powder into an elevated end of a tube inclined from horizontal and, while maintaining an inert atmosphere within the tube, rotating the tube so as to agitate and cause the powder therein to flow toward an oppositely-disposed lower end of the tube while heating the tube so that the powder melts as it flows toward the lower end of the tube. The molten material is then allowed to flow freely from the lower end of the tube and subsequently solidify to form a product.
    Type: Application
    Filed: June 15, 2007
    Publication date: December 18, 2008
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Ralf Jonczyk, James Rand, Victor Lienkong Lou
  • Publication number: 20070034251
    Abstract: There is provided a structure comprising semiconductor material, the structure having at least one zone of reduced oxygen concentration, such zone having an interstitial oxygen concentration of not greater than 3×1017 oxygen atoms/cm3, such zone extending at least 75 microns in depth from a first major surface. There is further provided a photovoltaic cell comprising at least one such structure.
    Type: Application
    Filed: July 26, 2004
    Publication date: February 15, 2007
    Applicant: GE Energy (USA) LLC
    Inventors: Ralf Jonczyk, Scott Kendall, James Rand
  • Publication number: 20060048698
    Abstract: There are provided methods of purifying a material, comprising melting solid material to form liquefied material, directionally solidifying a portion of the liquefied material; and removing a liquid remainder from the purified solidified material. Preferably, the purified solidified material is melted to form re-liquefied purified material, and re-liquefied purified material is removed. Preferably, the material is positioned in a container as it is being purified. The method is particularly useful for purifying elemental material, e.g., semiconductor material such as silicon and/or germanium, such as recycle scrap silicon and/or metallurgical grade silicon. There are also provided systems for carrying out such methods.
    Type: Application
    Filed: September 26, 2003
    Publication date: March 9, 2006
    Applicant: GE ENERGY (USA) LLC
    Inventors: Robert Hall, Scott Kendall, James Rand, Paul Sims
  • Publication number: 20050176218
    Abstract: There is provided a method of fabricating a wafer, comprising depositing semiconductor material into a recess in a setter, moving the setter through a heating/cooling region to subject the semiconductor material to a temperature profile, and removing a wafer from the recess. The size and shape of the wafer are substantially equal to the size of the wafer when it is used. As a result, the wafer can be fabricated in any desired shape and with any of a variety of surface structural features and/or internal structural features. The temperature profile can be closely controlled, enabling production of wafers having structural features not previously obtainable. There are also provided wafers formed by such methods and setters for use in such methods.
    Type: Application
    Filed: January 28, 2005
    Publication date: August 11, 2005
    Applicant: GE ENERGY (USA) LLC
    Inventors: Ralf Jonczyk, Scott Kendall, James Rand