Abstract: The present disclosure relates to apparatus and methods that manipulate the amplitude and phase of the voltage or current of an edge ring. The apparatus includes an electrostatic chuck having a chucking electrode embedded therein for chucking a substrate to the electrostatic chuck. The apparatus further includes a baseplate underneath the substrate to feed RF power to the substrate. The apparatus further includes an edge ring disposed over the electrostatic chuck. The apparatus further includes an edge ring electrode located underneath the edge ring. The apparatus further includes a radio frequency (RF) circuit including a first variable capacitor coupled to the edge ring electrode.

Abstract: A tool for a surface cleaning apparatus, including a floor head including a floor facing surface which defines an inlet for receiving dirt-laden air, which inlet is generally positioned in a first plane P; a passage for carrying dirt-laden air from the floor head to the apparatus; a connecting member for connecting the tool to a surface cleaning apparatus, wherein the floor head and connecting member are pivotally connected about an axis A; and a blocking device for inhibiting pivotal movement of the connecting member about axis A. The blocking device is moveable to a blocking condition in which pivotal movement of the connecting member downwardly outside of a pre-determined use condition is inhibited.

Abstract: Embodiments of the present disclosure generally relate to apparatus and methods for controlling an ion energy distribution during plasma processing. In an embodiment, the apparatus includes a substrate support that has a body having a substrate electrode for applying a substrate voltage to a substrate, and an edge ring electrode embedded for applying an edge ring voltage to an edge ring. The apparatus further includes a substrate voltage control circuit coupled to the substrate electrode, and an edge ring voltage control circuit coupled to the edge ring electrode. The substrate electrode, edge ring electrode, or both are coupled to a power module configured to actively control an energy distribution function width of ions reaching the substrate, edge ring, or both. Methods for controlling an energy distribution function width of ions during substrate processing are also described.

Abstract: Embodiments of the present disclosure generally relate to apparatus and methods for controlling an ion energy distribution during plasma processing. In an embodiment, the apparatus includes a substrate support that has a body having a substrate electrode for applying a substrate voltage to a substrate, and an edge ring electrode embedded for applying an edge ring voltage to an edge ring. The apparatus further includes a substrate voltage control circuit coupled to the substrate electrode, and an edge ring voltage control circuit coupled to the edge ring electrode. The substrate electrode, edge ring electrode, or both are coupled to a power module configured to actively control an energy distribution function width of ions reaching the substrate, edge ring, or both. Methods for controlling an energy distribution function width of ions during substrate processing are also described.

Abstract: A printer includes: a body defining a media enclosure configured to receive a media supply; an indicator assembly supported by an outer wall of the body, the indicator assembly including a plurality of substantially contiguous illumination surfaces illuminated by respective ones of a set of lights supported within the body; a controller supported by the body, the controller configured to: (i) obtain an operational status of the printer, (ii) retrieve, from a mapping repository, a set of notification control parameters corresponding to the operational status, and (iii) control the set of lights according to the notification control parameters.

Abstract: A metering unit for the controlled supply of a substance inside an aquarium tank comprises a containment box and a dosimetric pump which is actuated by an electric motor, both being associated with the containment box. The containment box has at least a first connection element and at least a second connection element which is suitable for being connected to a corresponding first connection element of an additional similar metering unit.

Abstract: A skimmer (1) for aquariums comprises a base (10) and a container (20) which is provided with at least two lateral connectors (21, 22) which comprise a main connector (22) and an auxiliary connector (21). The skimmer further comprises a cup (30), in which the foam is collected. The base comprises at least four openings, a first opening (11) and a second opening (12) opening inside the container (20) and being connected to a third opening (13) and a fourth opening (14), respectively, so that the skimmer can operate at least in two different configurations: a first single-pump configuration and a second double-pump configuration.

Abstract: The present disclosure relates to an aerosol delivery device filling system. The system includes multiple source containers each respectively including a differing aerosol precursor composition. The system further includes a mixing container configured to engage the source containers to receive and mix the aerosol precursor compositions to form a mixed aerosol precursor composition. An aerosol delivery device may engage the mixing container to receive at least a portion of the mixed aerosol precursor composition. A related method for customizing an aerosol precursor composition is also provided.

Abstract: The present disclosure relates to an apparatus and method that manipulates the voltage at an edge ring relative to a substrate located on a substrate support located within a processing chamber. The apparatus includes a substrate support assembly that has a body having a substrate electrode embedded therein for applying a voltage to a substrate. The body of the substrate support assembly additionally has an edge ring electrode embedded therein for applying a voltage to an edge ring. The apparatus further includes an edge ring voltage control circuit coupled to the edge ring electrode. A substrate voltage control circuit is coupled to the substrate electrode. The edge ring voltage control circuit and the substrate voltage control circuit are independently tunable to generate a difference in voltage between the edge ring voltage and the substrate voltage.

Abstract: A cyclonic separator device for removing dust or debris from dirt-laden air, the device having a separating chamber, an inlet, an outlet, and a shroud that is connected to the separating chamber at one end, and provides a plurality of openings for the passage of air to the outlet. The device further includes a dirt collection chamber in communication with the separating chamber. The separating chamber includes an airflow directing formation which is connected to an inner surface of a generally cylindrical portion and which extends inwardly towards a central axis of the generally cylindrical portion. The airflow directing formation provides a surface which follows a substantially helical path that extends away from the inlet as it extends circumferentially around the inner surface of the generally cylindrical portion.

Abstract: Embodiments of this disclosure describe an electrode biasing scheme that enables maintaining a nearly constant sheath voltage and thus creating a mono-energetic IEDF at the surface of the substrate that consequently enables a precise control over the shape of IEDF and the profile of the features formed in the surface of the substrate.

Abstract: Methods and apparatus for processing a substrate positioned on a substrate support assembly are provided. For example, a substrate support assembly includes an electrostatic chuck having one or more chucking electrodes embedded therein for chucking a substrate to a substrate support surface of the electrostatic chuck; an edge ring disposed on the electrostatic chuck and surrounding the substrate support strike; two or more radio frequency (RF) power sources coupled to the edge ring and at least one of a baseplate disposed beneath the electrostatic chuck or an electrode disposed in the electrostatic chuck; a matching network coupling the edge ring to the two or more RF power sources; and an RF circuit coupling the edge ring to the two or more RF power sources, the RF circuit configured to simultaneously tune at least one of an RF amplitude or an RF phase of respective signals of the two or more RF power sources.

Abstract: Embodiments described herein relate generally to plant extract compositions and methods to isolate cutin-derived monomers, oligomers, and mixtures thereof for application in agricultural coating formulations, and in particular, to methods of preparing plant extract compositions that include functionalized and non-functionalized fatty acids and fatty esters (as well as their oligomers and mixtures thereof), which are substantially free from accompanying plant-derived compounds (e.g., proteins, polysaccharides, phenols, lignans, aromatic acids, terpenoids, flavonoids, carotenoids, alkaloids, alcohols, alkanes, and aldehydes) and can be used in agricultural coating formulations.

Abstract: Embodiments of the disclosure provided herein include an apparatus and method for the plasma processing of a substrate in a processing chamber. More specifically, embodiments of this disclosure describe a biasing scheme that is configured to provide a radio frequency (RF) generated RF waveform from an RF generator to one or more electrodes within a processing chamber and a pulsed-voltage (PV) waveform delivered from one or more pulsed-voltage (PV) generators to the one or more electrodes within the processing chamber. The plasma process(es) disclosed herein can be used to control the shape of an ion energy distribution function (IEDF) and the interaction of the plasma with a surface of a substrate during plasma processing.

Abstract: Embodiments of the disclosure provided herein include an apparatus and method for the plasma processing of a substrate in a processing chamber. More specifically, embodiments of this disclosure describe a biasing scheme that is configured to provide a radio frequency (RF) generated RF waveform from an RF generator to one or more electrodes within a processing chamber and a pulsed-voltage (PV) waveform delivered from one or more pulsed-voltage (PV) generators to the one or more electrodes within the processing chamber. The plasma process(es) disclosed herein can be used to control the shape of an ion energy distribution function (IEDF) and the interaction of the plasma with a surface of a substrate during plasma processing.

Abstract: Embodiments of the disclosure provided herein include an apparatus and method for the plasma processing of a substrate in a processing chamber. More specifically, embodiments of this disclosure describe a biasing scheme that is configured to provide a radio frequency (RF) generated RF waveform from an RF generator to one or more electrodes within a processing chamber and a pulsed-voltage (PV) waveform delivered from one or more pulsed-voltage (PV) generators to the one or more electrodes within the processing chamber. The plasma process(es) disclosed herein can be used to control the shape of an ion energy distribution function (IEDF) and the interaction of the plasma with a surface of a substrate during plasma processing.

Abstract: Embodiments described herein provide methods and apparatus used to control a processing result profile proximate to a circumferential edge of a substrate during the plasma assisted processing thereof. In one embodiment a substrate support assembly features a first base plate and a second base plate circumscribing the first base plate. The first and second base plates each have one or more respective first and second cooling disposed therein. The substrate support assembly further features a substrate support disposed on and thermally coupled to the first base plate and a biasing ring disposed on and thermally coupled to the second base plate. Here, the substrate support and the biasing ring are each formed of a dielectric material. The substrate support assembly further includes an edge ring biasing electrode embedded the dielectric material of the biasing ring and an edge ring disposed on the biasing ring.

Abstract: Methods and systems for transforming bytecodes using virtual artifacts are disclosed. In one aspect, a method is provided that includes receiving a build request to convert source code into a first bytecode. A first virtual artifact may be identified within the source code and it may be determined that a local repository does not store the first virtual artifact. A real artifact that corresponds to the first virtual artifact may be retrieved from a centralized repository. A bytecode transformation may be applied to the real artifact to generate a second bytecode and the second bytecode may be added to the first bytecode.

Abstract: Systems and methods for fire suppression systems are disclosed. In one embodiment, the fire suppression system comprises a water supply system, a foam concentrate supply system, and a foam concentrate recovery system. The water supply system includes a water pump and a water supply line. The foam concentrate supply system includes a foam pump and a foam concentrate supply line, the foam concentrate supply line fluidly connected with the water supply system to facilitate mixing foam concentrate provided by the foam concentrate supply system with water provided by the water supply system. The foam concentrate recovery system includes a recovery pump fluidly connectable with the foam concentrate supply system to facilitate the extraction of foam concentrate from at least a portion of the foam concentrate supply system. The system and method can also include circulating foam concentrate to promote mixing and hinder the congealment of foam concentrate.

Abstract: Embodiments for the present application include methods and apparatus for operating a plasma enhanced substrate processing system using dual level pulsed radio frequency (RF) power. More specifically, embodiments of the present disclosure allow for frequency and power tuning in a process chamber using dual level pulsed power by using a tuning controller coupled to a matching network and/or a RF power generator. In one embodiment, a tuning system includes a tuning controller disposed in a tuning system, the tuning controller configured to tune dual level RF pulsing data from a RF power generator, wherein the tuning system is connectable to a plasma processing chamber, and a memory connecting to the tuning controller, wherein the tuning controller is configured to couple to a RF power generator and a matching network disposed in the plasma processing chamber.