Patents by Inventor James V. Crivello

James V. Crivello has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5387698
    Abstract: The invention provides a method for making a curable epoxysilicone composition through the hydrosilation reaction between an ethylenically unsaturated epoxide and an SiH-containing silicone to produce an epoxysilicone product, and catalyzed by a rhodium containing selective catalyst which does not promote the oxirane ring-opening reaction of either the ethylenically unsaturated epoxide starting material or the epoxysilicone product. The invention also provides for a curable epoxysilicone composition made by the above method for the catalyst, and two methods of making the catalyst.
    Type: Grant
    Filed: June 11, 1992
    Date of Patent: February 7, 1995
    Assignee: General Electric Company
    Inventors: James V. Crivello, Mingxin Fan
  • Patent number: 5362607
    Abstract: A method for preparing a positive photoresist substrate composite is provided which can be used in the presence or absence of atmospheric moisture. There is used a major amount of a commercially available resin, such as a novolak, a dissolution inhibitor with thermally labile t-butyl ether or ester groups, and an aryl onium salt.
    Type: Grant
    Filed: February 14, 1994
    Date of Patent: November 8, 1994
    Assignee: MicroSi, Inc.
    Inventors: James V. Crivello, Michael J. O'Brien, Julia L. Lee
  • Patent number: 5350604
    Abstract: A process for cationically polymerizing 1,3-diisopropenylbenzene to produce a polymer which is predominantly a polyindane is disclosed. The resulting polyindanes are novel compounds useful as low dielectric constant coatings. Compositions containing 1,3-diisopropenylbenzene and cationic photoinitiators, and optionally containing a polyindane useful for preparing coatings, are disclosed as are processes for coating substrates using the compositions.
    Type: Grant
    Filed: December 9, 1992
    Date of Patent: September 27, 1994
    Assignee: Rensselaer Polytechnic Institute
    Inventor: James V. Crivello
  • Patent number: 5346803
    Abstract: A photoresist composition comprises a polymer of the following formula (1): ##STR1## wherein R.sup.1 is a substituted or unsubstituted aromatic group or --(CH.sub.2).sub.p --SiR.sup.3 wherein R.sup.3 is a methyl or ethyl group and p is equal to 0 or 1, R.sup.2 is a hydrogen atom or methyl group, t-Bu is a tertiary-butyl group, and n/(m+n) is in the range of from 0.1 to 0.9.The polymer of formula (1) can form a positive working two-component photoresist composition with a photoacid generator. The polymer of formula (1) can also be used as an alkali soluble resin and in this regard, form a positive working three-component photoresist composition with a photoacid generator and a dissolution inhibitor having at least one group which is unstable to acid. Alternatively, the polymer of formula (1) can be used as a dissolution inhibitor and in this regard, form a positive working three-component photoresist composition with another alkali soluble resin and a photoacid generator.
    Type: Grant
    Filed: September 15, 1993
    Date of Patent: September 13, 1994
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: James V. Crivello, Sang-Yeon Shim
  • Patent number: 5318808
    Abstract: Compositions for photocurable coatings are disclosed. The compositions comprise (a) an epoxidized vegetable oil, (b) a low molecular weight epoxy resin, (c) a photoinitiator for cationic polymerization and (d) a wax. Processes for making and using the coatings are also disclosed as are containers coated according to the invention.
    Type: Grant
    Filed: September 25, 1992
    Date of Patent: June 7, 1994
    Assignee: Polyset Company, Inc.
    Inventors: James V. Crivello, Ramkrishna Ghoshal
  • Patent number: 5314929
    Abstract: The present invention relates to a rapidly curable, silicone-free release coating composition comprising (a) between about 50 and about 95 wt. % of a vinyl ether having the formula C.sub.n H.sub.2n+1 O--CH.dbd.CH.sub.2 wherein n has a value of from 8 to 20, optionally containing a cationically polymerizable comonomer; (b) between about 5 and about 50 wt. % of a multifunctional vinyl ether monomer and (c) between about 0.1 and about 10 wt. % of an onium salt photoinitiator.
    Type: Grant
    Filed: August 10, 1992
    Date of Patent: May 24, 1994
    Assignee: ISP Investments Inc.
    Inventors: James V. Crivello, James A. Dougherty
  • Patent number: 5310619
    Abstract: A positive photoresist composition is provided which can be used in the presence or absence of atmospheric moisture. There is used a major amount of a commercially available resin, such as a novolak, a dissolution inhibitor with thermally labile t-butyl ether or ester groups, and an aryl onium salt.
    Type: Grant
    Filed: May 13, 1992
    Date of Patent: May 10, 1994
    Assignee: MicroSi, Inc.
    Inventors: James V. Crivello, Michael J. O'Brien, Julia L. Lee
  • Patent number: 5274148
    Abstract: This invention relates to C.sub.14 to C.sub.20 alkoxy monophenyl sulfonium salt initiators having the formula ##STR1## wherein R is C.sub.14 to C.sub.20 alkyl; R.sub.1 and R.sub.2 are each independently C.sub.4 to C.sub.20 alkyl and X.sup.- is a non-basic, nonnucleophilic anion, which initiators are employed in the polymerization of mono- and poly- functional glycidyl ethers, alpha-olefin oxides and vinyl monomers or oligomers.
    Type: Grant
    Filed: August 10, 1992
    Date of Patent: December 28, 1993
    Assignee: ISP Investments, Inc.
    Inventors: James A. Dougherty, James V. Crivello
  • Patent number: 5272233
    Abstract: The present invention relates to a curable polyvinyl ether composition created using a novel catalyst system for the synthesis of polyethers from vinyl ether monomers or polymers. This catalyst system comprises a platinum complex catalyst and silicon hydride cocatalyst. The invention also relates to a method of producing polyethers from vinyl ether monomers or polymers using the above-mentioned catalyst system.
    Type: Grant
    Filed: July 17, 1992
    Date of Patent: December 21, 1993
    Assignee: General Electric Company
    Inventors: James V. Crivello, Mingxin Fan
  • Patent number: 5260399
    Abstract: The invention provides a method for making an epoxysilicone compound through the hydrosilation addition reaction between an ethylenically unsaturated epoxide and an SiH-containing silicon to produce an epoxysilicone product, and catalyzed by a regiospecific hydrosilation catalyst which does not also promote an oxirane ring-opening polymerization reaction in either the ethylenically unsaturated epoxide starting compound or in the epoxysilicone hydrosilation reaction product. The invention also provides a hydrosilation catalyst with the above catalytic properties as well as an epoxysilicone composition made by the above method.
    Type: Grant
    Filed: June 8, 1992
    Date of Patent: November 9, 1993
    Assignee: General Electric Company
    Inventors: James V. Crivello, Mingxin Fan
  • Patent number: 5260349
    Abstract: Deep section epoxy compositions are cured by irradiation with e-beam, x-ray,or .gamma.-ray radiation. Use of photoinitiators having metal halide anions makes monomers and oligomers especially susceptible of this invention's deep section curing technology.
    Type: Grant
    Filed: March 27, 1992
    Date of Patent: November 9, 1993
    Assignee: Polyset Corporation
    Inventor: James V. Crivello
  • Patent number: 5247044
    Abstract: The present invention is based on the discovery that various metal catalysts will catalyze the ring opening polymerization of epoxides to yield polyethers. The present invention therefore provides a method of making a polymeric product by ring-opening polymerization of heterocyclic epoxide monomer including the steps of preparing a mixture comprised of a catalyst; a Si--H containing compound; and at least one compound which is a heterocyclic epoxide containing monomer; and reacting the mixture at a temperature effective to promote ring-opening polymerization of the at least one compound to produce a polymeric product, preferably at room temperature.The present invention additionally provides for the silicone-polyether compositions created by this method.
    Type: Grant
    Filed: June 25, 1992
    Date of Patent: September 21, 1993
    Assignee: General Electric Company
    Inventors: James V. Crivello, Mingxin Fan
  • Patent number: 5223344
    Abstract: The present invention discloses the use of certain silicon hydrides having at least two hydrogen atoms attached to silicon in particular heat curable platinum catalyzed silicone coating formulations, which permits the use of a reduced level of inhibitor and improved cure performance.
    Type: Grant
    Filed: December 20, 1991
    Date of Patent: June 29, 1993
    Assignee: General Electric Company
    Inventors: Chris A. Sumpter, Larry N. Lewis, Judith Stein, James V. Crivello, Mingxin Fan
  • Patent number: 5189191
    Abstract: Bisphenols containing free-radical generating groups, such as bissilylpinacolate groups, are provided. These bisphenols can be used to make free-radical generating polycarbonate macroinitiators having thermally labile groups which can be heated with vinyl monomers, such as styrene to make polycarbonate block copolymers.
    Type: Grant
    Filed: May 15, 1992
    Date of Patent: February 23, 1993
    Assignee: General Electric Company
    Inventors: Gary W. Yeager, James V. Crivello
  • Patent number: 5169962
    Abstract: A method for making an epoxyfunctional organosilicon compound is provided, comprising the step of reacting at a temperature of from about 25.degree. to about 100.degree. C. a mixture comprising (A) an ethylenically unsaturated epoxide; (B) an organohydrogenpolysiloxane or organohydrogensilane; and (C) a rhodium complex catalyst selected from the group consisting of:(i) RhX.sub.3 (SR.sub.2).sub.3 ;(ii) RhX.sub.3 .multidot.xH.sub.2 O;(iii) [RhX(norbornadiene)].sub.2 ;(iv) RhX(CO)(R.sub.3 P).sub.3 ;(v) RhX(R.sub.3 P).sub.3 ; and(vi) [RhCl(cyclooctadiene)].sub.2 ;wherein X is a halogen atom, x is a number equal to 3 or 4, and R is an alkyl radical having from 1 to 8 inclusive carbon atoms, aryl, aralkyl, or alkaryl radical or the R.sub.3.sup.1 SiQ-- group in which Q represents a divalent aliphatic hydrocarbon radical having from 1 to 6 inclusive carbon atoms and R.sup.1 represents an alkyl radical having from 1 to 8 inclusive carbon atoms, aryl, aralkyl, or alkaryl radical or a (CH.sub.3).sub.3 Si-- radical.
    Type: Grant
    Filed: September 17, 1990
    Date of Patent: December 8, 1992
    Assignee: General Electric Company
    Inventors: James V. Crivello, Ming-Xin Fan
  • Patent number: 5140078
    Abstract: Bisphenols containing free-radical generating groups, such as bissilylpinacolate groups, are provided. These bisphenols can be used to make free-radical generating polycarbonate macroinitiators having thermally labile groups which can be heated with vinyl monomers, such as styrene to make polycarbonate block copolymers.
    Type: Grant
    Filed: September 9, 1991
    Date of Patent: August 18, 1992
    Assignee: General Electric Company
    Inventors: Gary W. Yeager, James V. Crivello
  • Patent number: 5128431
    Abstract: There is provided a curable composition, comprising:A. a heterocyclic compound selected from the group consisting of epoxy-functional silicones, epoxy-functional acrylic polymers, and monomers selected from the group consisting of tetrahydrofurans, oxetanes, lactones, spirocarbonates, spiroesters, cyclic sulfur and cyclic nitrogen compounds;B. an Si-H functional silicon compound; andC. a platinum catalyst.There is further provided a method for polymerizing a heterocyclic compound using a platinum catalyst.
    Type: Grant
    Filed: February 2, 1990
    Date of Patent: July 7, 1992
    Assignee: General Electric Company
    Inventors: Karen D. Riding, James V. Crivello, Julia L. Lee
  • Patent number: 5095053
    Abstract: A method for encapsulating microelectronic devices is provided using a heat curable epoxy composition having a monomeric or polymeric diaryliodonium hexafluoroantimonate salt. Curable compositions are also provided as well as encapsulated microelectronic devices.
    Type: Grant
    Filed: January 14, 1991
    Date of Patent: March 10, 1992
    Assignee: General Electric Company
    Inventors: Erik W. Walles, James V. Crivello, John H. Lupinski
  • Patent number: 5079378
    Abstract: A highcarbon-containing diaryliodonium initiator for cationic polymerization which possesses enhanced solubility characteristics over conventional diaryliodonium initiators. By the disclosed process, a novel photo/thermal initiator is obtained which is uniquely characterized by the concatenation of a long chain ester with an aryl group, resulting in a total number of carbon atoms in the entire moiety attached to the iodine atom in excess of 20.
    Type: Grant
    Filed: July 27, 1990
    Date of Patent: January 7, 1992
    Assignee: Polyset Corporation
    Inventor: James V. Crivello
  • Patent number: 5079310
    Abstract: Bisphenols containing free-radical generating groups, such as bissilylpinacolate groups, are provided. These bisphenols can be used to make free-radical generating polycarbonate macroinitiators having thermally labile groups which can be heated with vinyl monomers, such as styrene to make polycarbonate block copolymers.
    Type: Grant
    Filed: November 27, 1989
    Date of Patent: January 7, 1992
    Assignee: General Electric Company
    Inventors: Gary W. Yeager, James V. Crivello