Abstract: A gas detector and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/device package so that the package becomes a platform of the detector.

Abstract: A system delay factor associated with a segment file of a streaming media product is determined. A file transfer delay factor associated with the segment file of the streaming media product is also determined. A media delivery composite is determined for the segment file of the streaming media product based upon, at least in part, the system delay factor associated with the segment file and the file transfer delay factor associated with the segment file.

Abstract: A gas detector and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/device package so that the package becomes a platform of the detector.

Abstract: Chemical mechanical polishing (CMP) compositions and single CMP platen process for the removal of copper and barrier layer material from a microelectronic device substrate having same thereon. The process includes the in situ transformation of a Step I slurry formulation, which is used to selectively remove and planarize copper, into a Step II slurry formulation, which is used to selectively remove barrier layer material, on a single CMP platen pad.

Abstract: A gas detector and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/device package so that the package becomes a platform of the detector.

Abstract: A fuel cell, having improved sealing against leakage, includes a sealant disposed over the peripheral portions a membrane electrode assembly such that the cured sealant penetrates a gas diffusion layer of the membrane electrode assembly. The sealant is applied through liquid injection molding techniques to form cured sealant composition at the peripheral portions of the membrane electrode assembly. The sealant may be thermally cured at low temperatures, for example 130° C. or less, or may be cured at room temperature through the application of actinic radiation. The sealant may be a one-part or a two-part sealant. The sealant includes a polymerizable material, such as a polymerizable monomer, oligomer, telechelic polymer, functional polymer and combinations thereof functionalized with a group selected from epoxy, allyl, vinyl, (meth)acrylate, imide, amide, urethane and combinations thereof.

Abstract: A fuel cell, having improved sealing against leakage, includes a sealant disposed over the peripheral portions a membrane electrode assembly such that the cured sealant penetrates a gas diffusion layer of the membrane electrode assembly. The sealant is applied through liquid injection molding techniques to form cured sealant composition at the peripheral portions of the membrane electrode assembly. The sealant may be thermally cured at low temperatures, for example 130° C. or less, or may be cured at room temperature through the application of actinic radiation.

Abstract: A fuel cell, having improved sealing against leakage, includes a fuel cell component having a cured sealant, wherein the cured sealant includes a telechelic-functional polyisobutylene, an organhydrogenosilane crosslinker, a platinum catalyst and a photoinitiator. The fuel cell component may be a cathode flow field plate, an anode flow field plate, a resin frame, a gas diffusion layer, an anode catalyst layer, a cathode catalyst layer, a membrane electrolyte, a membrane-electrode-assembly frame, and combinations thereof.

Abstract: A method for forming a fuel cell component includes the steps of providing a two-part sealant having a first part comprising an initiator and a second part comprising a polymerizable material; applying the first part of the sealant to a substrate of a first fuel cell component; applying the second part of the sealant to a substrate of a second fuel cell component; juxtaposingly aligning the substrates of the first and second fuel cell components; and curing the sealant to bond the first and second fuel components to one and the other. The initiator may be an actinic radiation initiator, whereby the sealant is cured by actinic radiation. The polymerizable material may be a polymerizable monomer, oligomer, telechelic polymer, functional polymer and combinations thereof. Desirably, the functional group is epoxy, allyl, vinyl, acrylate, methacrylate, imide, amide, urethane and combinations thereof.

Abstract: A chemical mechanical polishing process including a single copper removal CMP slurry formulation for planarization of a microelectronic device structure preferably having copper deposited thereon. The process includes the bulk removal of a copper layer using a first CMP slurry formulation having oxidizing agent, passivating agent, abrasive and solvent, and the soft polishing and over-polishing of the microelectronic device structure using a formulation including the first CMP slurry formulation and at least one additional additive. The CMP process described herein provides a high copper removal rate, a comparatively low barrier material removal rate, appropriate material selectivity ranges to minimize copper dishing at the onset of barrier material exposure, and good planarization efficiency.

Abstract: A sensor with an attenuated drift characteristic, including a layer structure in which a sensing layer has a layer of diffusional barrier material on at least one of its faces. The sensor may for example be constituted as a hydrogen gas sensor including a palladium/yttrium layer structure formed on a micro-hotplate base, with a chromium barrier layer between the yttrium layer and the micro-hotplate, and with a tantalum barrier layer between the yttrium layer and an overlying palladium protective layer. The gas sensor is useful for detection of a target gas in environments susceptible to generation or incursion of such gas, and achieves substantial (e.g., >90%) reduction of signal drift from the gas sensor in extended operation, relative to a corresponding gas sensor lacking the diffusional barrier structure of the invention.

Abstract: One aspect of the disclosure is to provide a patient monitoring system including a radio frequency identification (RFID) tag. The system comprises a patient monitor capable of communicating with the RFID tag. The RFID tag may advantageously store information useful in hospital environments, triage or disaster environments, home care environments, or the like. In some embodiments, the RFID tags may be provided as parts of wrist bands, dog tags, disposable sensor components, sensors or the like that are left with a patient.

Abstract: A qualitative and quantitative EIA for detecting L. pneumophila in water samples is disclosed. Critical to the disclosed levels of sensitivity of these EIA's is the use of antigen-specific antibodies to the target L. pneumophila antigen that have been rendered antigen-specific by affinity purification on a chromatographic column, which antibodies and their purification are described in detail in parent application Ser. No. 09/139,720 filed Aug. 25, 1998.

Abstract: A packetized streaming media delivery network carries many “streams” of differing media content. They often are from multiple sources and of different media types. The invention consists of a scalable hardware and/or software computing element resolving the network traffic into its individual streams for focused, simultaneous, and continuous real-time monitoring and analysis. The monitoring and analysis consists of delay factor and media loss rate which measure the cumulative jitter of the streaming media within the delivery network and the condition of the media payload. These measurements form a powerful picture of network problem awareness and resolution. The delay factor objectively indicates the contribution of the network devices in the streams' path, allowing for both problem prediction and indication. In one example, tapping a packetized network at various locations allows for correlation of the same-stream performance at various network points to pinpoint the source(s) of the impairment(s).

Abstract: A gas detector and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/device package so that the package becomes a platform of the detector.

Abstract: A (MEMS)-based gas sensor assembly for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. Such gas sensor assembly in a preferred embodiment comprises a free-standing silicon carbide support structure having a layer of a gas sensing material, preferably nickel or nickel alloy, coated thereon. Such gas sensor assembly is preferably fabricated by micro-molding techniques employing sacrificial molds that are subsequently removable for forming structure layers.

Abstract: A multi-step method for depositing ruthenium thin films having high conductivity and superior adherence to the substrate is described. The method includes the deposition of a ruthenium nucleation layer followed by the deposition of a highly conductive ruthenium upper layer. Both layers are deposited using chemical vapor deposition (CVD) employing low deposition rates.

Abstract: A device that for repairing a nonmetallic electrical outlet box having one or more screw holes that are stripped, damaged or missing is described. The device provides a replacement screw tab with a screw hole, as well as side tabs that secure the device to a nonmetallic electrical outlet box.