Patents by Inventor Jan Verhoeven
Jan Verhoeven has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240100277Abstract: The invention relates to a system for detecting asynchronies between a ventilator and a living being connected to the ventilator, and to a corresponding, partly automatic control of a ventilator. The system for detecting asynchronies between a ventilator and a living being comprises at least one ventilator, the ventilator comprising at least a sensor unit, a processing unit, an arithmetical unit, a detection unit, a memory unit, a monitoring unit, a control unit and a fan-valve unit, and the detection unit detects asynchronies between the ventilator and the living being based on breathing parameters of the living being.Type: ApplicationFiled: November 19, 2021Publication date: March 28, 2024Inventors: Jan VERHOEVEN, Matthias SCHWAIBOLD
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Publication number: 20240011150Abstract: Methods and apparatus for forming a patterned layer of carbon are disclosed. In one arrangement, a selected portion of a surface of a solid structure is irradiated with extreme ultraviolet radiation in the presence of a carbon-containing precursor. The radiation interacts with the solid structure in the selected portion to cause formation of a layer of carbon in the selected portion from the carbon-containing precursor. The layer of carbon is formed in a pattern defined by the selected portion.Type: ApplicationFiled: September 26, 2023Publication date: January 11, 2024Applicant: ASML Netherlands B.V.Inventors: Sonia CASTELLANOS ORTEGA, Jan VERHOEVEN, Joost Wilhelmus Maria FRENKEN, Pavlo ANTONOV, Nicolaas TEN KATE, Olivier Christian Maurice LUGIER
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Publication number: 20230390509Abstract: System having at least one therapy device for performing a therapy and at least one hose system for the gas-conducting connection between the therapy device and a patient. The therapy device includes a source for gas for generating an overpressure and/or a drain for gas for generating a negative pressure to at least temporarily provide an overpressure and/or negative pressure to the hose system. The system furthermore comprises a control unit, a user interface, a memory, and a sensor, and the control unit includes at least one of the mechanisms therapy start mechanism, therapy reminder mechanism, therapy repetition mechanism, each of the mechanisms being based on user actions, patient data, and/or therapy data.Type: ApplicationFiled: May 30, 2023Publication date: December 7, 2023Inventors: Jan SCHATTNER, Jan VERHOEVEN, Christof GOEBEL
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Patent number: 11807937Abstract: Methods and apparatus for forming a patterned layer of carbon are disclosed. In one arrangement, a selected portion of a surface of a solid structure is irradiated with extreme ultraviolet radiation in the presence of a carbon-containing precursor. The radiation interacts with the solid structure in the selected portion to cause formation of a layer of carbon in the selected portion from the carbon-containing precursor. The layer of carbon is formed in a pattern defined by the selected portion.Type: GrantFiled: February 26, 2019Date of Patent: November 7, 2023Assignee: ASML Netherlands B.V.Inventors: Sonia Castellanos Ortega, Jan Verhoeven, Joost Wilhelmus Maria Frenken, Pavlo Antonov, Nicolaas Ten Kate, Olivier Christian Maurice Lugier
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Publication number: 20230248259Abstract: A breath analyzer for detecting breathing events of a person ventilated with a respiratory gas, comprising an electronic computing and storage unit configured to receive a signal corresponding to a ventilation pressure and/or a respiratory flow and/or a tidal volume of the respiratory gas delivered to the person and, during a predetermined analysis duration, to detect a curve of the signal by a curve analyzer. A ventilator for ventilating a person with a respiratory gas, which ventilator comprises the breath analyzer and a method for detecting breathing events of a person ventilated with a respiratory gas is also described.Type: ApplicationFiled: April 19, 2023Publication date: August 10, 2023Inventors: Jan Verhoeven, Benno Doemer, Matthias Schwaibold
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Patent number: 11660018Abstract: A breath analyzer for detecting breathing events of a person ventilated with a respiratory gas, comprising an electronic computing and storage unit configured to receive a signal corresponding to a ventilation pressure and/or a respiratory flow and/or a tidal volume of the respiratory gas delivered to the person and, during a predetermined analysis duration, to detect a curve of the signal by a curve analyzer. A ventilator for ventilating a person with a respiratory gas, which ventilator comprises the breath analyzer and a method for detecting breathing events of a person ventilated with a respiratory gas is also described.Type: GrantFiled: July 24, 2020Date of Patent: May 30, 2023Assignee: LOEWENSTEIN MEDICAL TECHNOLOGY S.A.Inventors: Jan Verhoeven, Benno Doemer, Matthias Schwaibold
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Publication number: 20220347411Abstract: Ventilation system (having a ventilator and having a diagnostic device, wherein the ventilator comprises a ventilation unit for generating a respiratory gas flow for ventilation and a detection unit (for detecting a ventilation signal characteristic for the respiratory gas flow over time. The diagnostic device comprises a sensor unit for detecting a diagnostic signal over time. The synchronization unit is operationally connected to the detection unit and the sensor unit and is suitable and configured for studying a time curve of the ventilation signal and a time curve of the diagnostic signal respectively for a signal change caused by the same event and bringing the curve of the ventilation signal and the curve of the diagnostic signal into chronological correspondence so that the event occurs simultaneously in both signal curves.Type: ApplicationFiled: April 28, 2022Publication date: November 3, 2022Inventors: Matthias SCHWAIBOLD, Jan VERHOEVEN, Jochen FURTHMUELLER
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Publication number: 20210251512Abstract: An evaluation system for a ventilator provided for machine ventilation of a patient, comprising an evaluation device which is suitable and configured for recording, over time, a respiration parameter detected by a sensor. The evaluation device is suitable and configured for determining, from a time profile of the respiration parameter, a characteristic number for a respiration stability of the patient, such that the characteristic number provides an assessment of the quality of the ventilation during a period of time.Type: ApplicationFiled: February 11, 2021Publication date: August 19, 2021Inventors: Jan VERHOEVEN, Benno DOEMER, Ruediger ALSHUT, Matthias SCHWAIBOLD
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Publication number: 20210032743Abstract: Methods and apparatus for forming a patterned layer of carbon are disclosed. In one arrangement, a selected portion of a surface of a solid structure is irradiated with extreme ultraviolet radiation in the presence of a carbon-containing precursor. The radiation interacts with the solid structure in the selected portion to cause formation of a layer of carbon in the selected portion from the carbon-containing precursor. The layer of carbon is formed in a pattern defined by the selected portion.Type: ApplicationFiled: February 26, 2019Publication date: February 4, 2021Applicant: ASML Netherlands B.V.Inventors: Sonia CASTELLANOS ORTEGA, Jan VERHOEVEN, Joost Wilhelmus Maria FRENKEN, Pavlo ANTONOV, Nicolaas TEN KATE, Olivier Christian Maurice LUGIER
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Publication number: 20210022642Abstract: A breath analyzer for detecting breathing events of a person ventilated with a respiratory gas, comprising an electronic computing and storage unit configured to receive a signal corresponding to a ventilation pressure and/or a respiratory flow and/or a tidal volume of the respiratory gas delivered to the person and, during a predetermined analysis duration, to detect a curve of the signal by a curve analyzer. A ventilator for ventilating a person with a respiratory gas, which ventilator comprises the breath analyzer and a method for detecting breathing events of a person ventilated with a respiratory gas is also described.Type: ApplicationFiled: July 24, 2020Publication date: January 28, 2021Inventors: Jan VERHOEVEN, Benno DOEMER, Matthias SCHWAIBOLD
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Patent number: 10719019Abstract: There is disclosed a substrate holder, a method of manufacturing a substrate holder, a lithographic apparatus comprising the substrate holder, and a method of manufacturing devices using the lithographic apparatus. In one arrangement, there is provided a substrate holder for use in a lithographic apparatus. The substrate holder supports a substrate. The substrate holder comprises a main body. The main body has a main body surface. A plurality of burls are provided projecting from the main body surface. Each burl has a burl side surface and a distal end surface. The distal end surface of each burl engages with the substrate. The distal end surfaces of the burls substantially conform to a support plane and support the substrate. A layer of carbon based material is provided in a plurality of separated regions of carbon based material.Type: GrantFiled: July 6, 2017Date of Patent: July 21, 2020Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Thomas Poiesz, Satish Achanta, Mehmet Ali Akbas, Pavlo Antonov, Jeroen Bouwknegt, Joost Wilhelmus Maria Frenken, Evelyn Wallis Pacitti, Nicolaas Ten Kate, Bruce Tirri, Jan Verhoeven
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Publication number: 20190332015Abstract: There is disclosed a substrate holder, a method of manufacturing a substrate holder, a lithographic apparatus comprising the substrate holder, and a method of manufacturing devices using the lithographic apparatus. In one arrangement, there is provided a substrate holder for use in a lithographic apparatus. The substrate holder supports a substrate. The substrate holder comprises a main body. The main body has a main body surface. A plurality of burls are provided projecting from the main body surface. Each burl has a burl side surface and a distal end surface. The distal end surface of each burl engages with the substrate. The distal end surfaces of the burls substantially conform to a support plane and support the substrate. A layer of carbon based material is provided in a plurality of separated regions of carbon based material.Type: ApplicationFiled: July 6, 2017Publication date: October 31, 2019Inventors: Thomas POIESZ, Satish ACHANTA, Mehmet Ali AKBAS, Pavlo ANTONOV, Jeroen BOUWKNEGT, Joost Wilhelmus Maria FRENKEN, Evelyn Wallis PACITTI, Nicolaas TEN KATE, Bruce TIRRI, Jan VERHOEVEN
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Publication number: 20180249719Abstract: A bake-off oven system and method for baking off food products are described. The method for baking off food products includes baking off pre-baked products to be baked such as bread. The food products to be baked off are held in an infeed unit and the baked-off food products are held in an outfeed unit. A lift system moves a bake-off compartment between compartments of an infeed unit and compartments of an outfeed unit.Type: ApplicationFiled: August 17, 2016Publication date: September 6, 2018Applicant: LEVENS COOKING & BAKING SYSTEMS B.V.Inventors: Johannes Jozephus Gerardus VAN LOON, Edwin Gert Jan VERHOEVEN
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Publication number: 20090141342Abstract: Multi-layer mirror for radiation with a wavelength in the wavelength range between 0.1 nm and 30 nm, comprising a stack of thin films substantially comprising scattering particles which scatter the radiation, which thin films are separated by separating layers with a thickness in the order of magnitude of the wavelength of the radiation, which separating layers substantially comprise non-scattering particles which do not scatter the radiation, wherein the separating layers are covered on at least one side in each case by an intermediate layer of a material which can be mixed with the material of the thin films and the material of the separating layers.Type: ApplicationFiled: December 15, 2005Publication date: June 4, 2009Applicant: STICHTING VOOR FUNDAMENTEEL ONDEROZOEK DERMATERIEInventors: Marcus Jozef Henricus Kessels, Jan Verhoeven
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Publication number: 20070281109Abstract: A multilayer system and its production. Multilayer systems, such as those used as mirrors in the extreme ultraviolet wavelength range, suffer contamination or oxidation during storage in air and in long-time operation, i.e. when exposed to EUV radiation in a vacuum environment with certain partial pressures of water or oxygen, which causes a serious reduction in reflectivity. The multilayer system according to the invention will have a long life with constantly high reflectivity. Their reflectivity can be enhanced by barrier layers. The multilayer systems according to the invention have protective layers comprising iridium. The multilayer systems according to the invention are produced by direct, ion-beam-supported growth of the respective layer. The multilayer systems according to the invention are not only resistant to contamination and oxidation, but can also be cleaned if necessary, without losing reflectivity.Type: ApplicationFiled: August 8, 2007Publication date: December 6, 2007Applicant: CARL ZEISS SMT AGInventors: Frederik Bijkerk, Eric Louis, Andrey Yakshin, Peter Gorts, Sebastian Oestreich, Lambertus Gerhardus Alink, Jan Verhoeven, Robbert van de Kruijs
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Patent number: 7261957Abstract: A multilayer system and its production. Multilayer systems, such as those used as mirrors in the extreme ultraviolet wavelength range, suffer contamination or oxidation during storage in air and in long-time operation, i.e. when exposed to EUV radiation in a vacuum environment with certain partial pressures of water or oxygen, which causes a serious reduction in reflectivity. The multilayer system according to the invention will have a long life with constantly high reflectivity. Their reflectivity can be enhanced by barrier layers. The multilayer systems according to the invention have protective layers comprising iridium. The multilayer systems according to the invention are produced by direct, ion-beam-supported growth of the respective layer. The multilayer systems according to the invention are not only resistant to contamination and oxidation, but can also be cleaned if necessary, without losing reflectivity.Type: GrantFiled: November 12, 2003Date of Patent: August 28, 2007Assignee: Carl Zeiss SMT AGInventors: Frederik Bijkerk, Eric Louis, Andrey E. Yakshin, Peter Cornelis Görts, Sebastian Oestreich, Lambertus Gerhardus Albertus Michael Alink, Jan Verhoeven, Robbert Wilhelmus Elisabeth van de Kruijs
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Publication number: 20040233519Abstract: Multi-layer mirror for radiation with a wavelength in the wavelength range between 0.1 nm and 30 nm (the so-called XUV range), comprising a stack of thin films substantially comprising scattering particles which scatter the radiation, which thin films are separated by separating layers with a thickness in the order of magnitude of the wavelength of the radiation, which separating layers substantially comprise non-scattering particles which do not scatter the radiation, wherein the non-scattering particles are substantially particles of lithium (Li), and method for manufacturing such a mirror.Type: ApplicationFiled: May 21, 2004Publication date: November 25, 2004Inventors: Frederik Bijkerk, Eric Louis, Marcus Josef Henricus Kessels, Jan Verhoeven, Markus Johannes Harmen Den Hartog
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Publication number: 20040121134Abstract: A multilayer system and its production. Multilayer systems, such as those used as mirrors in the extreme ultraviolet wavelength range, suffer contamination or oxidation during storage in air and in long-time operation, i.e. when exposed to EUV radiation in a vacuum environment with certain partial pressures of water or oxygen, which causes a serious reduction in reflectivity. The multilayer system according to the invention will have a long life with constantly high reflectivity. Their reflectivity can be enhanced by barrier layers. The multilayer systems according to the invention have protective layers comprising iridium. The multilayer systems according to the invention are produced by direct, ion-beam-supported growth of the respective layer. The multilayer systems according to the invention are not only resistant to contamination and oxidation, but can also be cleaned if necessary, without losing reflectivity.Type: ApplicationFiled: November 12, 2003Publication date: June 24, 2004Inventors: Frederik Bijkerk, Eric Louis, Andrey E. Yakshin, Peter Cormelis Gorts, Sebastian Oestreich, Lambertus Gerhardus Albertus Michael Alink, Ir. Jan Verhoeven, Robbert Wilhelmus Elisabeth van de Kruijs
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Patent number: 6410928Abstract: An EUV illumination system comprises an EUV radiation source unit (1) and at least one EUV radiation-reflecting mirror (10), which mirror comprises a multilayer structure of first layers (12) of a first material alternating with second layers (13) of a second material, and which radiation source unit comprises an electron source (2) for supplying an electron beam (EB) and a medium (3) which converts the electron beam into a beam of photons (IB). As the medium (3) comprises at least one material that is equal to one of the materials of the mirror multilayer structure, the photon beam (IB) has a relatively large intensity.Type: GrantFiled: December 14, 1999Date of Patent: June 25, 2002Assignee: Koninklijke Philips Electronics N.V.Inventors: Jan Verhoeven, Boris Lastdrager, Adriaan Tip, Dirk K. G. De Boer
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Patent number: 6280906Abstract: An EUV radiation source unit (10) for use in a lithographic projection apparatus to illuminate a mask pattern (22) which is to be projected on a substrate (W) comprises an electron source (12) and a medium in which the electrons of the source generate EUV Cherenkov radiation (PB). The wavelengths of the Cherenkov radiation and the multilayer structure of the mirrors (31-34) of the projection system (30) are adapted to each other, so that these mirrors show a maximum reflectivity. The medium forms part of the mask (MA) so that a mirror condenser system is no longer needed. In this way, an efficient transmission of radiation (PB) from the source to the substrate is obtained.Type: GrantFiled: November 15, 1999Date of Patent: August 28, 2001Assignee: U.S. Philips CorporationInventors: Josephus J. M. Braat, Jan Verhoeven