Patents by Inventor Jan Verhoeven

Jan Verhoeven has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6035711
    Abstract: The invention provides a device for determining the direction and speed of an air flow, comprising a chip which is provided with two mutually perpendicularly positioned pairs of measuring circuits placed at a distance opposite each other, optionally four heating elements in positions coinciding with the measuring circuits and a control circuit, which chip is fixed onto a substrate, characterized in that the mounting between chip and substrate is substantially homogeneous and preferably effected by gluing. The chip is for instance accommodated in a housing of conducting material. The device can contain in addition to the measuring chip a reference chip without heating elements which is embodied in substantially identical manner and which is shielded from the measuring chip by an insulator.
    Type: Grant
    Filed: April 27, 1998
    Date of Patent: March 14, 2000
    Assignee: Mierij Meteo B.V.
    Inventors: Johan Hendrik Huijsing, Arend Hagedoorn, Bastiaan Willem Van Oudheusden, Huibert Jan Verhoeven
  • Patent number: 5551587
    Abstract: A method of manufacturing multilayer mirrors for use in conjunction with X-rays. Customary multilayer mirrors are composed of discrete, thin layers which generally consist of alternating absorption and spacer layers. In order to counteract surface roughness of the thin layers, it is known to smoothen the layers by ion etching after deposition. A drawback thereof consists in that the material of one layer penetrates into the other layer, so that the location of the interface and the thickness of the layers of the multilayer mirror are no longer suitably defined. In accordance with the invention, a multilayer mirror is manufactured by stimulating the penetration of one of the materials into the layer with the other material, after which the original layer thickness of the first material is removed by etching.
    Type: Grant
    Filed: October 6, 1994
    Date of Patent: September 3, 1996
    Assignee: U.S. Philips Corporation
    Inventors: Anton Keppel, Rutger Schlatmann, Jan Verhoeven