Patents by Inventor Jason P. Rolland

Jason P. Rolland has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Immersion lithography methods using carbon dioxide
    Publication number: 20040180299
    Abstract: A substrate is patterned by performing immersion lithography on a photoresist layer on the substrate using carbon dioxide. The immersion layer may be provided and/or removed and/or the photoresist layer may be developed, dried and/or removed using carbon dioxide. The immersion layer can include liquid and/or solid immersion layers. The need for organic solvents in immersion lithography can thereby be reduced or eliminated.
    Type: Application
    Filed: March 11, 2003
    Publication date: September 16, 2004
    Inventors: Jason P. Rolland, Joseph M. DeSimone