Abstract: There is described herein a method of prognosing or classifying a subject with a Myeloproliferative Neoplasm (MPN) comprising: (a) determining the expression level of at least 10 genes in a test sample from the subject selected from the group consisting of SPP1, CEACAM6, GJA1, IGSF10, IGFBP2, COL4A5, LYVE1, MTIE, EMP1, XIST, DLK1, TPSAB1, TIMP3, CLC, MS4A1, ENKUR, ALOX12, KNDC1, HLA-DQB1, GAS2, CLEC2L, BEND2, CDH7, and NT5E; and (b) comparing expression of the at least 10 genes in the test sample with reference expression levels of the at least 10 genes from control samples from a reference cohort of patients; wherein a difference or similarity in the expression of the at least 10 genes in the test sample and the reference expression levels is used to prognose or classify the subject with MPN into a low risk group or a high risk group for worse survival.

Abstract: The present disclosure provides a chimeric antigen receptor (CAR) specific for albumin. The present disclosure also provides compositions comprising the CAR, polynucleotides encoding the CAR, vectors comprising a polynucleotide encoding the CAR, engineered cells comprising the CAR, and method using the same.

Abstract: Provided a chimeric anti-drug antibody receptor (CADAR) specific for anti-drug-antibody-based B cell receptor (BCR), the anti-drug antibody is induced by a therapeutic anti-TNF-alpha monoclonal antibody. Also provided compositions comprising the CADAR, polynucleotides encoding the CADAR, vectors comprising a polynucleotide encoding the CADAR, engineered cells comprising the CADAR, and method using the same.

Abstract: Provided is a chimeric alloantibody receptor (CALAR) specific for alloantibody-based B cell receptor (BCR), wherein the alloantibody is specific for an Rh factor. Also provided are compositions comprising the CALAR, polynucleotides encoding the CALAR, vectors comprising a polynucleotide encoding the CALAR, engineered cells comprising the CALAR, and method using the same.

Abstract: A game summary may be produced using an event log of in-game events and corresponding game content based on game data associated with a gameplay session(s). The event log may include metadata that indicates times of in-game events and associations between in-game events and game content items that capture the in-game events. A user may interact with in-game events with temporal context, allowing for more informed selections and a better understanding of the gameplay session. Using the event log, a game summary may provide such features as a timeline to convey relative timing of in-game events, a list of in-game events, a map of a virtual environment of the game that is temporally annotated based on in-game events, game status information, and statistical and performance information. A game summary may show trends over time and/or game sessions and convey information for selected sets of players, such as teams.

Abstract: A game summary may be produced using an event log of in-game events and corresponding game content based on game data associated with a gameplay session(s). The event log may include metadata that indicates times of in-game events and associations between in-game events and game content items that capture the in-game events. A user may interact with in-game events with temporal context, allowing for more informed selections and a better understanding of the gameplay session. Using the event log, a game summary may provide such features as a timeline to convey relative timing of in-game events, a list of in-game events, a map of a virtual environment of the game that is temporally annotated based on in-game events, game status information, and statistical and performance information. A game summary may show trends over time and/or game sessions and convey information for selected sets of players, such as teams.

Abstract: There is described herein a method of prognosing or classifying a subject with acute myeloid leukemia (AML) comprising: (a) determining the expression level of at least 3 genes in a test sample from the subject selected from the group consisting of DNMT3B, ZBTB46, NYNRIN, ARHGAP22, LAPTM4B, MMRN1, DPYSL3, KIAAQ125. CDK6, CPXM1, SOCS2, SMIM24, EMP1, NGFRAP1, CD34, AKR1C3, GPR56; and (b) comparing expression of the at least 3 genes in the test sample with reference expression levels of the at least 3 genes from control samples from a cohort of patients; wherein a difference or similarity in the expression of the at least 3 genes in the test sample and the reference expression levels is used to prognose or classify the subject with AML into a low risk group or a high risk group for worse survival.

Abstract: There is described herein a method of prognosing or classifying a subject with acute myeloid leukemia (AML) comprising: (a) determining the expression level of at least 3 genes in a test sample from the subject selected from the group consisting of DNMT3B, ZBTB46, NYNRIN, ARHGAP22, LAPTM4B, MMRN1, DPYSL3, KIAAQ125. CDK6, CPXM1, SOCS2, SMIM24, EMP1, NGFRAP1, CD34, AKR1C3, GPR56; and (b) comparing expression of the at least 3 genes in the test sample with reference expression levels of the at least 3 genes from control samples from a cohort of patients; wherein a difference or similarity in the expression of the at least 3 genes in the test sample and the reference expression levels is used to prognose or classify the subject with AML into a low risk group or a high risk group for worse survival.

Abstract: A composition and method for treating excess cyanide and hydrogen sulfide comprising administering a cobinamide. Further a method for determining extent of binding by an agent to an extracellular matrix.

Abstract: A semiconductor manufacturing line includes an inert environment selected from the group consisting essentially of an inert airtight wafer holder, an inert wafer transport channel, an inert production tool, an inert clean room, and combinations thereof.

Abstract: The present disclosure provides a bonding apparatus. The bonding apparatus includes a cleaning module designed for cleaning chips; and a chip-to-wafer bonding chamber configured to receive the chips from the cleaning module and designed for bonding the chips to a wafer.

Abstract: A first embodiment is a method for semiconductor process control comprising clustering processing tools of a processing stage into a tool cluster based on processing data and forming a prediction model for processing a semiconductor wafer based on the tool cluster. A second embodiment is a method for semiconductor process control comprising providing cluster routes between first stage tool clusters and second stage tool clusters, assigning a comparative optimization ranking to each cluster route, and scheduling processing of wafers. The comparative optimization ranking identifies comparatively which cluster routes provide for high wafer processing uniformity.

Abstract: A semiconductor manufacturing system, an interface system, a carrier, and a method for providing an ambient controlled environment is disclosed. The semiconductor manufacturing system comprises a plurality of process chambers; at least one interface system, wherein the interface system includes a first ambient control element; at least one carrier, wherein the carrier comprises a second ambient control element; and a control module coupled to the plurality of process chambers, the at least one interface system, and the at least one carrier.

Abstract: A PVD target structure for use in physical vapor deposition. The PVD target structure includes a consumable slab of source material and one or more detectors for indicating when the slab of source material is approaching or has been reduced to a given quantity representing a service lifetime endpoint of the target structure.

Abstract: A method to enable wafer result prediction includes collecting manufacturing data from various semiconductor manufacturing tools and metrology tools; choosing key parameters using an autokey method based on the manufacturing data; building a virtual metrology based on the key parameters; and predicting wafer results using the virtual metrology.

Abstract: Embodiments of the present invention relate to a method for a near non-adaptive virtual metrology for wafer processing control. In accordance with an embodiment of the present invention, a method for processing control comprises diagnosing a chamber of a processing tool that processes a wafer to identify a key chamber parameter, and controlling the chamber based on the key chamber parameter if the key chamber parameter can be controlled, or compensating a prediction model by changing to a secondary prediction model if the key chamber parameter cannot be sufficiently controlled.

Abstract: A system and method for controlling resistivity uniformity in a Copper trench structure by controlling the CMP process is provided. A preferred embodiment comprises a system and a method in which a plurality of CMP process recipes may be created comprising at least a slurry arm position. A set of metrological data for at least one layer of the semiconductor substrate may be estimated, and an optimum CMP process recipe may be selected based on the set of metrological data. The optimum CMP process recipe may be implemented on the semiconductor substrate.

Abstract: The present disclosure provides a bonding apparatus. The bonding apparatus includes a cleaning module designed for cleaning chips; and a chip-to-wafer bonding chamber configured to receive the chips from the cleaning module and designed for bonding the chips to a wafer.

Abstract: A method for forming a tube-based detector for signaling when a PVD target is reduced to a predetermined quantity of the PVD target material includes providing a mold member having an inner molding member and an outer molding member defining a space therebetween, melting a desired tube material, injecting the molten tube material into the space between the inner molding member and the outer molding member, cooling the molten tube material, removing the tube from the mold member after the molten tube material has cooled and solidified into a tube, embedding the tube in the physical vapor deposition target, wherein the tube forms an enclosure of the tube-based detector.

Abstract: A method for forming a tube-based detector for signaling when a PVD target is reduced to a predetermined quantity of the PVD target material includes providing a mold member having an inner molding member and an outer molding member defining a space therebetween, melting a desired tube material, injecting the molten tube material into the space between the inner molding member and the outer molding member, cooling the molten tube material, removing the tube from the mold member after the molten tube material has cooled and solidified into a tube, embedding the tube in the physical vapor deposition target, wherein the tube forms an enclosure of the tube-based detector.