Patents by Inventor Jeffrey Donald Gelorme

Jeffrey Donald Gelorme has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100212944
    Abstract: The present invention is directed to silane coupling agents for printed circuit boards, such as high-temperature printed circuit boards (PCBs), a process for synthesizing the silane coupling agent, and PCBs with such coupling agents. The silane coupling agent is defined by the following formula: wherein at least one R? is an allyl and the other one is hydrogen, an alkyl, a cycloalkyl, an aryl, a heteroaryl, a non-aromatic heterocyclic ring, or an allyl; and R1 is an alkyl, a cycloalkyl, an aryl, a heteroaryl, a non-aromatic heterocyclic ring, or an allyl.
    Type: Application
    Filed: January 26, 2010
    Publication date: August 26, 2010
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Jeffrey Donald Gelorme, Joseph Kuczynski
  • Patent number: 7467742
    Abstract: Electrically conducting adhesives having a broader selectable range of properties are provided by having random sizes of micrometer diameter range particles coated with a low melting temperature metal. The coated particles are suspended in a vehicle of a mixture of thermosetting resins together with a flux resin selected for viscosity and low shrinkage, for screen printability, for electrical and for mechanical properties over a broad range of specification conditions. The vehicle or resin system includes thermosetting cyclo-aliphatic epoxy, thermosetting phenoxy polymer and thermosetting mono-functional limonene oxide. The low temperature melting coating system for the particles includes In, Sn, and alloys such as In—Sn, Sn—Pb, Bi—Sn—In and InAg. The micrometer diameter range particles includes Cu, Ni, Co, Ag, Pd, Pt, polymer and ceramic.
    Type: Grant
    Filed: February 24, 2000
    Date of Patent: December 23, 2008
    Assignee: International Business Machines Corporation
    Inventors: Jeffrey Donald Gelorme, Sung Kwon Kang, Konstantinos Papathomas, Sampath Purushothaman
  • Patent number: 7166241
    Abstract: Disclosed is a novel composition of matter comprising a polyacid and a polymer containing repeating units which contain one or more basic atoms. The complex is water-soluble and electrically conductive. The complex is useful in providing organic discharge layers for use in electronic applications and fabrications.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: January 23, 2007
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Jeffrey Donald Gelorme, Thomas Harold Newman, Niranjan Mohanlal Patel, David Earle Seeger
  • Patent number: 7037638
    Abstract: A high sensitivity, organic solvent developable, high resolution photoresist composition for use in E-beam lithography is disclosed. The composition of the present invention comprises a high sensitivity, soluble, film forming photoresist composition of dendrimeric calix [4]arene derivatives and processes for forming lithographic patterns with a crosslinker selected from glycoluril derivatives capable of reacting with these dendrimer under acid catalysis, a photoacid generator and an organic solvent. The composition of the present invention is particularly useful for production of negative tone images of high resolution (less than 100 nanometers).
    Type: Grant
    Filed: October 10, 2000
    Date of Patent: May 2, 2006
    Assignee: International Business Machines Corporation
    Inventors: Ali Afzali-Ardakani, Tricia Lynn Breen, Jeffrey Donald Gelorme, David Brian Mitzi, Michael Joseph Rooks
  • Patent number: 7026643
    Abstract: The invention provides a device comprising an improved n-channel semiconducting film. This film consists of a perylene tetracaboxylic acid diimide compound and was deposited onto substrates by vacuum sublimation. Thin film transistor devices comprising such films as the semiconducting channel exhibit a field effect electron mobility greater than 0.01 cm2/Vs and an on/off ratio of 10000 and higher.
    Type: Grant
    Filed: December 11, 2001
    Date of Patent: April 11, 2006
    Assignee: International Business Machines Corporation
    Inventors: Christos Dimitrios Dimitrakopoulos, Jeffrey Donald Gelorme, Teresita Ordonez Graham, Laura Louise Kosbar, Patrick Roland Lucien Malenfant
  • Patent number: 6830708
    Abstract: Disclosed is a novel composition of matter comprising a polyacid and a polymer containing repeating units which contain one or more basic atoms. The complex is water-soluble and electrically conductive. The complex is useful in providing organic discharge layers for use in electronic applications and fabrications.
    Type: Grant
    Filed: August 2, 2001
    Date of Patent: December 14, 2004
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Jeffrey Donald Gelorme, Thomas Harold Newman, Niranjan Mohanlal Patel, David Earle Seeger
  • Patent number: 6746770
    Abstract: Electrically conductive and abrasion resistant polymeric compositions, methods of fabrication thereof and uses thereof are described. Admixtures of abrasion resistant materials and electrically conductive polymeric materials are formed. Many of these admixtures arc light transmitting and can be used as an abrasion resistant light transmitting electrostatic discharge layers. The light transmitting discharge layer is useful as a surface coating for visual displays such as CRT screens to avoid electrostatic accumulation of dust and scratching.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: June 8, 2004
    Assignee: Internatonal Business Machines Corporation
    Inventors: Ali Afzali-Ardakani, Marie Angelopoulos, Jack Alvin Dickerson, Thomas Baird Pillsbury, Karl Joseph Puttlitz, Jane Margaret Shaw, Jeffrey Donald Gelorme
  • Publication number: 20020164835
    Abstract: The invention provides a device comprising an improved n-channel semiconducting film. This film consists of a perylene tetracaboxylic acid diimide compound and was deposited onto substrates by vacuum sublimation. Thin film transistor devices comprising such films as the semiconducting channel exhibit a field effect electron mobility greater than 0.01 cm2/Vs and an on/off ratio of 10000 and higher.
    Type: Application
    Filed: December 11, 2001
    Publication date: November 7, 2002
    Inventors: Christos Dimitrios Dimitrakopoulos, Jeffrey Donald Gelorme, Teresita Ordonez Graham, Laura Louise Kosbar, Partick Roland Lucien Malenfant
  • Publication number: 20020014617
    Abstract: Disclosed is a novel composition of matter comprising a polyacid and a polymer containing repeating units which contain one or more basic atoms. The complex is water-soluble and electrically conductive. The complex is useful in providing organic discharge layers for use in electronic applications and fabrications.
    Type: Application
    Filed: August 2, 2001
    Publication date: February 7, 2002
    Inventors: Marie Angelopoulos, Jeffrey Donald Gelorme, Thomas Harold Newman, Niranjan Mohanlal Patel, David Earle Seeger
  • Patent number: 6339116
    Abstract: Biobased cross-linked compositions, methods of fabrication and structures, in particular biobased printed wiring boards using the compositions and methods of making the structures are described. Biobased materials such as lignin, crop oils, wood resins, tannins, and polysaccharides and combinations thereof are cross-linked, preferably using heat, a cross-linking agent, and an initiator. The materials fabricated have suitable properties for printed wiring boards which are made by impregnating a fiberglass or biobased cloth with an admixture of the biobased material, cross-linking agent and initiator which is processed by conventional methods to produce a printed wiring board.
    Type: Grant
    Filed: December 19, 1996
    Date of Patent: January 15, 2002
    Assignee: International Business Machines Corporation
    Inventors: Ali Afzali-Ardakani, Jeffrey Donald Gelorme, Laura Louise Kosbar
  • Patent number: 6319650
    Abstract: An improved, aqueous base developable, high resolution photoresist composition for use in deep UV and compatable with high base strength aqueous developers is disclosed. The composition of the present invention comprises of a phenolic functional methacrylate polymer resin, a crosslinker selected from glycoluril derivatives capable of reacting with there resins under acid catalysis, a photoacid generator and an organic solvent. The composition of the present invention is particularly useful for production of negative tone images of high resolution (less than 0.125 micrometer).
    Type: Grant
    Filed: February 25, 2000
    Date of Patent: November 20, 2001
    Assignee: International Business Machines Corporation
    Inventors: Jeffrey Donald Gelorme, Ali Afzali-Ardakani, Teresita Ordonez Graham, Laura Louise Kosbar
  • Patent number: 6238599
    Abstract: A structure and method of fabrication are described. The structure is a combination of a polymeric material and particles, e.g. Cu, having an electrically conductive coating, e.g. Sn. Heat is applied to fuse the coating of adjacent particles. The polymeric material is a thermoplastic phenoxy polymer or a styrene allyl alcohol resin. The structure is disposed between two electrically conductive surfaces, e.g. chip and substrate pads, to provide electrical interconnection and adhesion between their pads.
    Type: Grant
    Filed: June 18, 1997
    Date of Patent: May 29, 2001
    Assignee: International Business Machines Corporation
    Inventors: Jeffrey Donald Gelorme, Sung Kwon Kang, Sampath Purushothaman
  • Patent number: 6103145
    Abstract: Disclosed is a novel composition of matter comprising a polyacid and a polymer containing repeating units which contain one or more basic atoms. The complex is water-soluble and electrically conductive. The complex is useful in providing organic discharge layers for use in electronic applications and fabrications.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: August 15, 2000
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Jeffrey Donald Gelorme, Thomas Harold Newman, Niranjan Mohanlal Patel, David Earle Seeger
  • Patent number: 6017682
    Abstract: A solid state chain extension method provides for the formation of a solid state film comprised of a high molecular weight polymer by chain extending a deblocked Lewis base with Lewis acid oligomers while the reactants are in a solid state form. In one embodiment, a negative resist is prepared by selectively exposing regions of the solid state film. The Lewis base is deblocked at the exposed regions by a suitable deblocking means. The Lewis acid oligomers and the deblocked Lewis base chain extend at the exposed regions. Development of the film removes the non-polymerized reactants. Optionally, the Lewis acid oligomers, when radiation-cross-linking, are cross-linked with one another prior to deblocking the Lewis base to form a negative resist. The cross-linked oligomers polymerize with the subsequently deblocked base to provide a high molecular weight polymer film.
    Type: Grant
    Filed: November 26, 1997
    Date of Patent: January 25, 2000
    Assignee: Internatonal Business Machines Corporation
    Inventors: Marie Angelopoulos, Claudius Feger, Jeffrey Donald Gelorme, Jane Margaret Shaw
  • Patent number: 6013414
    Abstract: Photosensitive compositions containing a polyimide precursor and a complex cation of a polymerizable carboxylic acid functional compound with a tertiary amino functional group; and use thereof to provide a pattern.
    Type: Grant
    Filed: December 16, 1994
    Date of Patent: January 11, 2000
    Assignee: International Business Machines Corporation
    Inventors: Jeffrey Donald Gelorme, Martin Joseph Goldberg, Nancy Carolyn LaBianca, Jane Margaret Shaw
  • Patent number: 6010645
    Abstract: Disclosed is a novel composition of matter comprising a polyacid and a polymer containing repeating units which contain one or more basic atoms. The complex is water-soluble and electrically conductive. The complex is useful in providing organic discharge layers for use in electronic applications and fabrications.
    Type: Grant
    Filed: September 15, 1994
    Date of Patent: January 4, 2000
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Jeffrey Donald Gelorme, Thomas Harold Newman, Niranjan Mohanlal Patel, David Earle Seeger
  • Patent number: 6010832
    Abstract: Photosensitive compositions containing a polyimide precursor and a complex cation of a polymerizable carboxylic acid functional compound with a tertiary amino functional group; and use thereof to provide a pattern.
    Type: Grant
    Filed: May 16, 1995
    Date of Patent: January 4, 2000
    Assignee: International Business Machines Corporation
    Inventors: Jeffrey Donald Gelorme, Martin Joseph Goldberg, Nancy Carolyn LaBianca, Jane Margaret Shaw
  • Patent number: 5879859
    Abstract: Strippable photoimageable compositions are provided that include a cycloaliphatic diepoxide and a photoactive compound. The compositions are especially useful for patterning a substrate.
    Type: Grant
    Filed: July 16, 1997
    Date of Patent: March 9, 1999
    Assignee: International Business Machines Corporation
    Inventors: Stephen Leslie Buchwalter, Jeffrey Donald Gelorme, Nancy C. LaBianca, Jame M. Shaw
  • Patent number: 5859655
    Abstract: An inkjet printer head formed from a photoimageable organic material. This material provides for a spin-on epoxy based photoresist with image resolution and adhesion to hard to bond to metals such as gold or tantalum/gold surfaces that are commonly found in such printer applications. When cured, the material provides a permanent photoimageably defined pattern in thick films (>30) that has chemical (i.e high pH inks) and thermal resistance.
    Type: Grant
    Filed: July 16, 1996
    Date of Patent: January 12, 1999
    Assignee: International Business Machines Corporation
    Inventors: Jeffrey Donald Gelorme, Nancy C. LaBianca
  • Patent number: 5858943
    Abstract: Reworkable encapsulant formulations are being developed to allow recovery of part-good microelectronic assemblies. According to this invention, a gelled form of the solvent is useful for removing the reworkable encapsulant from a specific region of the assemblies without affecting components on the assembly which do not need to be reworked. This novel method eliminates expensive tooling that would otherwise be required to handle the solvent.
    Type: Grant
    Filed: July 14, 1997
    Date of Patent: January 12, 1999
    Assignee: International Business Machines Corporation
    Inventors: Stephen Leslie Buchwalter, Jeffrey Donald Gelorme, Nancy C. LaBianca