Abstract: A system is described for presenting information relating to lifting and moving a load object with a vehicle. Upon the lifting, a dimensioner determines a size and a shape of the load object, computes a corresponding spatial representation, and generates a corresponding video signal. During the moving, an imager observes a scene in front of the vehicle, relative to its forward motion direction, and generates a video signal corresponding to the observed scene. The imager has at least one element moveable vertically, relative to the lifting. A display renders a real time visual representation of the scene observed in front of the vehicle based on the corresponding video signal and superimposes a representation of the computed spatial representation of the load object.

Abstract: An air system (50) for an agricultural harvester (10) includes an air flow splitter component (52) configured to be coupled to the agricultural harvester (10). The air flow splitter component (52) has an inlet (56) configured to receive air and a plurality of air outlets (58) configured to distribute the air. The air system also includes a plurality of air flow paths (60). Each air flow path of the plurality of air flow paths extends from a respective one of the plurality of air outlets and is configured to extend to a corresponding drum (12) of the agricultural harvester. Additionally, each air flow path includes a discharge outlet (80) that is configured to be disposed between a bottom surface (81) of the corresponding drum (12) and a bottom disc (85) of a doffer (42) of the corresponding drum (12) while the air system (50) is coupled to the agricultural harvester.

Abstract: Provided herein are ALE methods of removing III-V materials such as gallium nitride (GaN) and related apparatus. In some embodiments, the methods involve exposing the III-V material to a chlorine-containing plasma without biasing the substrate to form a modified III-V surface layer; and applying a bias voltage to the substrate while exposing the modified III-V surface layer to a plasma to thereby remove the modified III-V surface layer. The disclosed methods are suitable for a wide range of applications, including etching processes for trenches and holes, fabrication of HEMTs, fabrication of LEDs, and improved selectivity in etching processes.

Abstract: The present teachings relate to a method and system for normalizing spectra across multiple instruments. In an embodiment of the present invention, the method comprises at least one reference instrument and a test instrument. Each instrument comprises at least one excitation filter and at least one emission filter arranged in pairs. Each instrument further comprises a pure dye plate comprising a plurality of wells. Each well contains a plurality of dyes where each dye comprises a fluorescent component. Fluorescent spectra are obtained from each instrument for each dye across multiple filter combinations to contribute to a pure dye matrix Mref for the reference instrument and pure dye matrix M for the test instrument. The pure dye spectra can then be multiplied by correction factors for each filter pair to result in corrected pure dye spectra, then normalized and the multicomponenting data can be extracted.

Abstract: Methods of etching and smoothening films by exposing to a halogen-containing plasma and an inert plasma within a bias window in cycles are provided. Methods are suitable for etching and smoothening films of various materials in the semiconductor industry and are also applicable to applications in optics and other industries.

Abstract: Provided herein are methods and related apparatus that facilitate patterning by performing highly non-conformal (directional) deposition on patterned structures. The methods involve depositing films on a patterned structure, such as a hard mask. The deposition may be both substrate-selective such that the films have high etch selectivity with respect to an underlying material to be etched and pattern-selective such that the films are directionally deposited to replicate the pattern of the patterned structure. In some embodiments, the deposition is performed in the same chamber as a subsequent etch is performed. In some embodiments, the deposition may be performed in a separate chamber (e.g., a PECVD deposition chamber) that is connected to the etch chamber by a vacuum transfer chamber. The deposition may be performed prior to or at selected intermittences during at etch process. In some embodiments, the deposition involves multiple cycles of a deposition and treatment process.

Abstract: A system is described for presenting information relating to lifting and moving a load object with a vehicle. Upon the lifting, a dimensioner determines a size and a shape of the load object, computes a corresponding spatial representation, and generates a corresponding video signal. During the moving, an imager observes a scene in front of the vehicle, relative to its forward motion direction, and generates a video signal corresponding to the observed scene. The imager has at least one element moveable vertically, relative to the lifting. A display renders a real time visual representation of the scene observed in front of the vehicle based on the corresponding video signal and superimposes a representation of the computed spatial representation of the load object.

Abstract: In one exemplary embodiment, a method for calibrating an instrument is provided. The instrument includes an optical system capable of imaging florescence emission from a plurality of reaction sites. The method includes performing a region-of-interest (ROI) calibration to determine reaction site positions in an image. The method further includes performing a pure dye calibration to determine the contribution of a fluorescent dye used in each reaction site by comparing a raw spectrum of the fluorescent dye to a pure spectrum calibration data of the fluorescent dye. The method further includes performing an instrument normalization calibration to determine a filter normalization factor. The method includes performing an RNase P validation to validate the instrument is capable of distinguishing between two different quantities of sample.

Abstract: Methods of etching and smoothening films by exposing to a halogen-containing plasma and an inert plasma within a bias window in cycles are provided. Methods are suitable for etching and smoothening films of various materials in the semiconductor industry and are also applicable to applications in optics and other industries.

Abstract: A system is described for presenting information relating to lifting and moving a load object with a vehicle. Upon the lifting, a dimensioner determines a size and a shape of the load object, computes a corresponding spatial representation, and generates a corresponding video signal. During the moving, an imager observes a scene in front of the vehicle, relative to its forward motion direction, and generates a video signal corresponding to the observed scene. The imager has at least one element moveable vertically, relative to the lifting. A display renders a real time visual representation of the scene observed in front of the vehicle based on the corresponding video signal and superimposes a representation of the computed spatial representation of the load object.

Abstract: In some aspects, a method for phase multiplexing includes receiving a plurality of phases, selecting one of the plurality of phases based on a select signal using a multiplexer, and outputting the selected one of the plurality of phases at an output of the multiplexer. The method also includes gating the output of the multiplexer during a glitch at the output of the multiplexer.

Abstract: A system and method are provided for distinguishing between a plurality of remote sites accessed through a network interconnection by a reference site based upon envelope characteristics of communication signals transmitted therebetween. Communications signals transmitted during an interconnected session established between one of the remote sites and the reference site are time-captured in a plurality of data segments. The time-captured segments are parsed to selectively generate for each the interconnected remote sites an envelope signal indicative of at least one resource allocation response thereof during the interconnection session, the envelope signal being defined by values of at least a first predetermined envelope parameter acquired from the time-captured segments. Based on the envelope signal, a characteristic signature is established for each interconnected remote site to be identified.

Abstract: A switched capacitor circuit includes a first capacitor coupled in series with a second capacitor in a first mode of operation across differential output terminals of a circuit. The first capacitor and the second capacitor are coupled in an anti-parallel layout in a second mode of operation. The switched capacitor circuit also includes a third capacitor coupled on a first side to a common node of the first capacitor and the second capacitor. The third capacitor is further coupled on a second side to a current source control voltage in the first mode of operation, and coupled between a bias reference voltage and a common mode reference voltage in the second mode of operation.

Abstract: A mass spectrometer includes: an ion source; an aperture; a flight region arranged between the ion source and aperture for separating ions according to their mass to charge ratio; and ion optics arranged and configured for causing ions to be reflected or deflected while they separate according to mass to charge ratio in the flight region and such that the ions are focussed to a geometrical focal point at the aperture so that the ions are transmitted through the aperture. The multi-reflecting or multi-deflecting ion optics provides a relatively long flight path for the ions, while naturally converging the ion beam to a focus. As this focus is arranged at the aperture, it enables the aperture to be made relatively small while still maintaining high ion transmission efficiency.

Abstract: A method for analyzing biological reaction systems is provided. The method includes receiving an image of a substrate including a plurality of reaction sites after a biological reaction has taken place. Next, the method includes removing a noise background from the first image. The method includes determining an initial position of each reaction site based on an intensity threshold to generate a initial position set, then refining the initial position set of each reaction site based on an expected pattern of locations of the plurality of reaction sites to generate a first refined position set. The method further includes determining a presence or absence of a fluorescent emission from each reaction site based on the first refined position set and the first image.

Abstract: A system and method are provided for discriminating and tracking a coherently structured feature dynamically defined in evolving manner within a migratory medium. A data set is captured for a plurality of physical points defined within a multi-dimensional physical space, in terms of a plurality of scalar parameter values. At least one pre-selected target feature type is established, as is a scalar field predefined by at least one of the scalar parameters. A sparse set of key points is selectively generated a within the scalar field. Each key point is associated with one of the physical points and descriptive information adaptively determined therefor from the data content within a neighborhood of the physical point coinciding therewith. At least one predetermined feature-based operation is executed responsive to the descriptive information of the key points as a surrogate for execution generally on the data set.

Abstract: Methods are provided for integrating atomic layer etch and atomic layer deposition by performing both processes in the same chamber or reactor. Methods involve sequentially alternating between atomic layer etch and atomic layer deposition processes to prevent feature degradation during etch, improve selectivity, and encapsulate sensitive layers of a semiconductor substrate.

Abstract: A voltage regulator includes a band limited reference voltage. The band limited reference voltage is generated from a supply voltage combined with a feedback path to provide a band reject power supply rejection ratio (PSRR). The voltage regulator also includes a feedforward path to extend the band reject PSRR.

Abstract: Methods of etching metal by depositing a material reactive with a metal to be etched and a halogen to form a volatile species and exposing the substrate to a halogen-containing gas and activation gas to etch the substrate are provided. Deposited materials may include silicon, germanium, titanium, carbon, tin, and combinations thereof. Methods are suitable for fabricating MRAM structures and may involve integrating ALD and ALE processes without breaking vacuum.