Abstract: A voltage regulator includes a band limited reference voltage. The band limited reference voltage is generated from a supply voltage combined with a feedback path to provide a band reject power supply rejection ratio (PSRR). The voltage regulator also includes a feedforward path to extend the band reject PSRR.

Abstract: Methods of etching metal by depositing a material reactive with a metal to be etched and a halogen to form a volatile species and exposing the substrate to a halogen-containing gas and activation gas to etch the substrate are provided. Deposited materials may include silicon, germanium, titanium, carbon, tin, and combinations thereof. Methods are suitable for fabricating MRAM structures and may involve integrating ALD and ALE processes without breaking vacuum.

Abstract: Systems and methods for volume dimensioning packages are provided. A method of operating a volume dimensioning system may include the receipt of image data of an area at least a first three-dimensional object to be dimensioned from a first point of view as captured using at least one image sensor. The system can determine from the received image data a number of features in three dimensions of the first three-dimensional object. Based at least on part on the determined features of the first three-dimensional object, the system can fit a first three-dimensional packaging wireframe model about the first three-dimensional object. The system can display of an image of the first three-dimensional packaging wireframe model fitted about an image of the first three-dimensional object on a display device.

Abstract: Vacuum-integrated photoresist-less methods and apparatuses for forming metal hardmasks can provide sub-30 nm patterning resolution. A metal-containing (e.g., metal salt or organometallic compound) film that is sensitive to a patterning agent is deposited on a semiconductor substrate. The metal-containing film is then patterned directly (i.e., without the use of a photoresist) by exposure to the patterning agent in a vacuum ambient to form the metal mask. For example, the metal-containing film is photosensitive and the patterning is conducted using sub-30 nm wavelength optical lithography, such as EUV lithography.

Abstract: A system and method for aiming and alignment of a shell firing weapon includes a portable aiming unit that may be located in close proximity to the weapon that includes a reference head for emitting and/or receiving at least one energy ray. The portable aiming unit can be aligned to a reference azimuth, either absolute or relative. A sighting unit is also included in the system and removably mounted to the weapon. The sighting unit includes a reference head that is complementary to the reference head of the portable aiming unit. The at least one energy ray established between the portable aiming unit and the sighting unit provides an accurate relative reference of directing the weapons fire and monitoring linear and angular displacement of the weapon as it is fired so that corrections can be made in aiming the weapon in response thereto.

Abstract: Each year in North America there are approximately 175,000 non-contact ACL injuries. One of the main causes of these injuries is the rotational and translational forces created when a player makes a sudden change in direction or stops. Every athlete subjects their lower extremities to various forces that are unique to his or her mass, speed, and strength. These forces are affected by composition of the playing field surface, shoe sole design and construction, and other factors. Using these and other factors, the level of force at which injury is inevitable (pre-injury force) is determined and an athletic shoe is created which will provide a mitigating deformation induced by a particular athlete's pre-determined, pre-injury force threshold. A mitigating deformation of as little as 2 degrees can significantly reduce injurious forces. After the athlete has progressed through that particular force-generating movement, the shoe's sole instantly returns to its original shape.

Abstract: A pallet car for conveying material to be processed is disclosed. The pallet car includes first and second sidewalls formed from sidewall members that each include a metal frame and a heat-resistant liner, such as formed from refractory. The refractory formed on the metal frame of the sidewall members provides insulation for the metal frame without the need for a hearth layer of pre-processed material in the material bed of the pallet car. The sidewall member including the refractory layer increases the effective volume of the pallet car, which increases the overall efficiency of the furnace and material processing procedure.

Abstract: A system and method are provided for discriminating the nature of traffic flowing through a computer network. Various types of traffic are distinguished. For example, traffic sourced by a software application that generates them may be distinguished. The problem of detecting malicious traffic either originating outside a target network, or inside a target network from a compromised computer is addressed, as is the problem of distinguishing malicious traffic from legitimate web surfing or other applications activity. Traffic distinctions are made based on signal envelope characteristics in such manner as to preserve robust performance even when the subject traffic is encrypted.

Abstract: The present teachings relate to a method and system for normalizing spectra across multiple instruments. In an embodiment of the present invention, the method comprises at least one reference instrument and a test instrument. Each instrument comprises at least one excitation filter and at least one emission filter arranged in pairs. Each instrument further comprises a pure dye plate comprising a plurality of wells. Each well contains a plurality of dyes where each dye comprises a fluorescent component. Fluorescent spectra are obtained from each instrument for each dye across multiple filter combinations to contribute to a pure dye matrix Mref for the reference instrument and pure dye matrix M for the test instrument. The pure dye spectra can then be multiplied by correction factors for each filter pair to result in corrected pure dye spectra, then normalized and the multicomponenting data can be extracted.

Abstract: Methods of etching metal by depositing a material reactive with a metal to be etched and a halogen to form a volatile species and exposing the substrate to a halogen-containing gas and activation gas to etch the substrate are provided. Deposited materials may include silicon, germanium, titanium, carbon, tin, and combinations thereof. Methods are suitable for fabricating MRAM structures and may involve integrating ALD and ALE processes without breaking vacuum.

Abstract: A system and method for indicating an alert associated with a mobile device are provided. The system includes a device detector to detect whether the mobile device is in a state of wireless charging; an exit signal receiver to detect an event associated with an exit; a device determiner to determine, after the event is detected, whether the mobile device is in an area associated with the wireless charging; and a vehicle notifier to transmit an alert based the determination by the device determiner. Also provided is a method for augmenting a wireless charging system with a notification system.

Abstract: Methods are provided for integrating atomic layer etch and atomic layer deposition by performing both processes in the same chamber or reactor. Methods involve sequentially alternating between atomic layer etch and atomic layer deposition processes to prevent feature degradation during etch, improve selectivity, and encapsulate sensitive layers of a semiconductor substrate.

Abstract: Vacuum-integrated photoresist-less methods and apparatuses for forming metal hardmasks can provide sub-30 nm patterning resolution. A metal-containing (e.g., metal salt or organometallic compound) film that is sensitive to a patterning agent is deposited on a semiconductor substrate. The metal-containing film is then patterned directly (i.e., without the use of a photoresist) by exposure to the patterning agent in a vacuum ambient to form the metal mask. For example, the metal-containing film is photosensitive and the patterning is conducted using sub-30 nm wavelength optical lithography, such as EUV lithography.

Abstract: Systems and methods for volume dimensioning packages are provided. A method of operating a volume dimensioning system may include the receipt of image data of an area at least a first three-dimensional object to be dimensioned from a first point of view as captured using at least one image sensor. The system can determine from the received image data a number of features in three dimensions of the first three-dimensional object. Based at least on part on the determined features of the first three-dimensional object, the system can fit a first three-dimensional packaging wireframe model about the first three-dimensional object. The system can display of an image of the first three-dimensional packaging wireframe model fitted about an image of the first three-dimensional object on a display device.

Abstract: A résumé tool used to build a résumé includes a résumé customization tool that adds and removes items to a selected résumé. The résumé customization tool includes for each résumé a list of included items, a list of items or grouping of items omitted from the résumé, a hide selection that moves an item or grouping of items from the list of included items to the list of items omitted from the résumé, and a selection that moves an item from the list of items omitted from the résumé to the list of included items.

Abstract: Systems and methods for volume dimensioning packages are provided. A method of operating a volume dimensioning system may include the receipt of image data of an area at least a first three-dimensional object to be dimensioned from a first point of view as captured using at least one image sensor. The system can determine from the received image data a number of features in three dimensions of the first three-dimensional object. Based at least on part on the determined features of the first three-dimensional object, the system can fit a first three-dimensional packaging wireframe model about the first three-dimensional object. The system can display of an image of the first three-dimensional packaging wireframe model fitted about an image of the first three-dimensional object on a display device.

Abstract: A system and method for integrating a wireless charging device with a display is provided herein. The system includes an information receiver to receive information from the wireless charging device; an information processor to process the information, and the processed information being about a wireless charging device or an electronic device on the wireless charging device; and an information communicator to communicate the processed information to a display coupled to the system.

Abstract: A system is described for presenting information relating to lifting and moving a load object with a vehicle. Upon the lifting, a dimensioner determines a size and a shape of the load object, computes a corresponding spatial representation, and generates a corresponding video signal. During the moving, an imager observes a scene in front of the vehicle, relative to its forward motion direction, and generates a video signal corresponding to the observed scene. The imager has at least one element moveable vertically, relative to the lifting. A display renders a real time visual representation of the scene observed in front of the vehicle based on the corresponding video signal and superimposes a representation of the computed spatial representation of the load object.

Abstract: The disclosure concerns a camera mouth mount including a mouth piece coupled to a camera mount and configured for holding the camera mount with the mouth of a user. The mouth piece includes a pair of opposing bite supports extending from a proximal end to a distal end, the bite supports being connected at a junction disposed at the distal end. The camera mount is coupled to the junction of the bite supports. Various embodiments are described wherein a mouth piece is coupled to a camera mount. The camera mouth piece is used to hold a camera in ones mouth for the purpose of obtaining media while performing an activity such as surfing or another action sport.

Abstract: Provided herein are methods and related apparatus that facilitate patterning by performing highly non-conformal (directional) deposition on patterned structures. The methods involve depositing films on a patterned structure, such as a hard mask. The deposition may be both substrate-selective such that the films have high etch selectivity with respect to an underlying material to be etched and pattern-selective such that the films are directionally deposited to replicate the pattern of the patterned structure. In some embodiments, the deposition is performed in the same chamber as a subsequent etch is performed. In some embodiments, the deposition may be performed in a separate chamber (e.g., a PECVD deposition chamber) that is connected to the etch chamber by a vacuum transfer chamber. The deposition may be performed prior to or at selected intermittences during at etch process. In some embodiments, the deposition involves multiple cycles of a deposition and treatment process.