Abstract: A method of monitoring, in real time, the depth to which a process sample is etched by an etching procedure involving investigating a sample substrate that has a patterned surface which, when electromagnetic radiation in an appropriate wavelength range is caused to reflect from, demonstrates lateral interference effects, such that when a frequency transform is applied to spectroscopic reflection data, three distinguishable peaks occur, at least for some range of pattern depth in the sample surface.

Abstract: A spectroscopic system for adjusting spacing between an adjacent source/detector as a unit, and a sample, and a reflecting means for directing an incident beam which reflects from said sample back onto said sample and then into the detector along a locus which is in a plane of incidence that is offset from that of the incident beam, or directly from the reflecting means into the detector, including means for reducing reflections of a beam of electromagnetic from the back of a sample, including methodology of use.

Abstract: A reflectometer, ellipsometer, polarimeter or the like system with aperture, focusing means, sample and optionally detector planes oriented so that the Scheimpflug condition is substantially met on incident and/or, optionally, reflection sides of a sample. In addition beneficial aperture hole aspect ratio and aperture plane orientation is described.

Abstract: An electromagnetic beam chromatic shifting and directing means for use in reflectively directing a spectroscopic beam of electromagnetic radiation while simultaneously de-emphasizing intensity in a first range of wavelengths, (eg. the Visible wavelengths), and simultaneously relatively emphasizing intensity in another wavelength range, (eg. UV wavelengths).

Abstract: A sample investigation system (ES) in functional combination with an alignment system (AS), and methodology of enabling very fast, (eg. seconds), sample height, angle-of-incidence and plane-of-incidence adjustments, with application in mapping ellipsometer or the like systems.

Abstract: A spectroscopic ellipsometer system comprising a plurality of individual sources which are sequentially energized to provide a sequence of beams, each of different polarization state but directed along a common locus toward a sample. The preferred spectroscopic ellipsometer system has no parts which move during data collection, and it provides a progressive plurality of sequentially discrete, rather than continuously varying, polarization states.

Abstract: A method of determining a starting value for thickness of the most influential layer in a mathematical model of a sample for use in a data fitting routine, supplemented by the use of ordinary or B-spline polynomials to represent at least one of the real and imaginary parts of optical constants in the mathematical model.

Abstract: A spectroscopic ellipsometer or polarimeter system having a source of a polychromatic beam of electromagnetic radiation, a polarizer, a stage for supporting a material system, an analyzer, a dispersive optics and a detector system which comprises a multiplicity of detector elements, there being apertures before the stage for supporting a material system, and thereafter, the system further having at least one multi-element lens and optionally being present in an environmental control chamber.

Abstract: Spectroscopic ellipsometer systems which include polarizer and analyzer elements which remain fixed in position during data acquisition while at least one continuously rotating or step-wise rotatable compensator imposes a continuously variable or plurality of sequentially discrete polarization states on a beam of electromagnetic radiation, including a system of mirrors and refractive elements for correcting aberation while directing a beam of electromagnetic radiation to a spot on a sample at a multiple different angles-of-incidence.

Abstract: Disclosed is application of oblique angle of incidence, reflection and/or transmission mode spectroscopic ellipsometry PSI and/or DELTA, (including combinations thereof and/or mathematical equivalents), vs. wavelength data over an intermediate wavelength band range around a pass or reject band, to monitor and/or control fabrication of multiple layer high/low refractive index band-pass, band-reject and varied attenuation vs. wavelength thin film interference filters, either alone or in combination with transmissive non-ellipsometric electromagnetic beam turning point vs. layer data obtained at an essentially normal angle of incidence.

Abstract: Low aberration relay systems modified to perform as spatial filters in rotating compensator ellipsometer, polarimeter and the like systems.

Abstract: Quasi-achromatic multi-element lens(es) which are precisely mounted with respect to one another in a tubular mounting fixture, and the application thereof in focusing, (and optionally re-colliminating), a spectroscopic electromagnetic beam into a very small, chromatically relatively undispersed, area spot on a material system.

Abstract: Disclosed are spectroscopic ellipsometer systems which include polarizer and analyzer elements which remain fixed in position during data acquisition, and at least one continuously rotating or step-wise rotatable compensator which transmits an electromagnetic beam therethrough and imposes a continuously variable or plurality of sequentially discrete polarization states on a beam of electromagnetic radiation; and at least one multiple element lens which also transmits the electromagnetic beam therethrough.

Abstract: An electromagnetic beam chromatic shifting and directing means for use in reflectively directing a spectroscopic beam of electromagnetic radiation while de-emphasizing visual wavelength intensity and simultaneously emphasizing both IR and UV wavelength intensities, applied in ellipsometer or polarimeter and the like systems.

Abstract: Disclosed are spectroscopic ellipsometer and combined spectroscopic reflectometer/ellipsometer systems. The spectroscopic ellipsometer system portion includes polarizer and analyzer elements which remain fixed in position during data acquisition, and a step-wise rotatable compensator electromagnetic beam transmitting means, which serves to enable imposing a plurality of sequentially discrete, rather than continuously varying, polarization states on said beam of electromagnetic radiation. Further disclosed is a calibration procedure for said spectroscopic ellipsometer system portion of the invention which involves the gathering of, for each of a plurality of ellipsometrically distinct sample systems, spectroscopic data at a sequential plurality of discrete electromagnetic radiation beam polarization states, combined with providing of a mathematical model of the spectroscopic ellipsometer system and application of a mathematical regression procedure.

Abstract: A spectroscopic ellipsometer system comprising a plurality of individual sources which are sequentially energized to provide a sequence of beams, each of different polarization state but directed along a common locus toward a sample. The prefered spectroscopic ellipsometer system has no parts which move during data collection, and it provides a progressive plurality of sequentially discrete, rather than continuously varying, polarization states.

Abstract: Disclosed is application of oblique angle of incidence, reflection and/or transmission mode spectroscopic ellipsometry PSI and/or DELTA, (including combinations thereof and/or mathematical equivalents), vs. wavelength data to monitor and/or control fabrication of multiple layer high/low refractive index band-pass, band-reject and varied attenuation vs. wavelength filters, either alone or in combination with transmissive non-ellipsometric electromagnetic beam turning point vs. layer data obtained at an essentially normal angle of incidence.

Abstract: Application of selected wavelength range, oblique angle of incidence, reflection mode, spectroscopic ellipsometry DELTA data to monitor and/or control fabrication of multiple layer High/Low Refractive Index Narrow Bandpass Optical Filters, either alone or in combination with transmissive or reflective non-ellipsometric data obtained at an essentially normal angle of incidence.

Abstract: Disclosed is a rotating compensator sample system investigation system which includes a source of a beam of electromagnetic radiation, a polarizer, a stage for supporting a sample system, a beam splitting analyzer, and at least two detector systems which are positioned each to intercept a different of the at least two electromagnetic beams which emerge from the beam splitting analyzer. Also disclosed is a regression based approach to calibration which simultaneously extracts a sample system PSI and DELTA.