Patents by Inventor Jeffrey W. Elam

Jeffrey W. Elam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12270101
    Abstract: A process for forming a lithium-metal-oxygen film on a lithium SSE. A metal-ligand complex is exposed to the SSE such as for 30-600 seconds in a chemical vapor transfer reactor at a temperature of 200-350° C.
    Type: Grant
    Filed: March 19, 2021
    Date of Patent: April 8, 2025
    Assignees: UCHICAGO ARGONNE, LLC, NORTHWESTERN UNIVERSITY
    Inventors: Donghyeon Kang, Jeffrey W. Elam, Joseph A. Libera, Yujia Liang, HackSung Kim, Anil U. Mane
  • Publication number: 20250112266
    Abstract: A method for modifying argyrodite-type material. The argyrodite-type material is exposed to a fluorine precursor. The argyrodite-type material may have a carbonate coating that has formed, such as due to exposure to air, with such carbonate coating at least partially removed by exposure to the fluorine precursor. The argyrodite-type material may further be doped by fluorine after exposure to the precursor. Further, the argyrodite-type material may have a capping layer formed thereon.
    Type: Application
    Filed: September 29, 2023
    Publication date: April 3, 2025
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Anil U. Mane, Zachary David Hood, Jeffrey W. Elam
  • Patent number: 12266752
    Abstract: A method for coating of lithium ion electrode materials via atomic layer deposition. The coated materials may be integrated in part as a dopant in the electrode itself via heat treatment forming a doped lithium electrode.
    Type: Grant
    Filed: April 22, 2020
    Date of Patent: April 1, 2025
    Assignee: UCHICAGO ARGONNE, LLC
    Inventors: Anil U. Mane, Jason R. Croy, Jeffrey W. Elam, Arturo Gutierrez, Jihyeon Gim, Devika Choudhury, Eungje Lee, Hakim Iddir
  • Publication number: 20250011226
    Abstract: A functionalized glass device, such as a microchannel plate, includes a glass substrate having a chemistry including an ionic species that may diffuse toward a surface, and a functional layer supported by the glass substrate and having a functional characteristic that may be undesirably altered by introduction of the ionic species during operation of the device. An ion barrier layer is disposed between the surface of the glass substrate and the functional layer, the ion barrier layer being substantially of a metal oxide material effective to limit the diffusion of the ionic species into the functional layer.
    Type: Application
    Filed: July 3, 2024
    Publication date: January 9, 2025
    Inventors: Anil U. Mane, Jeffrey W. Elam, Michael J. Minot, Stephen M. Clarke, Cole J. Hamel, Derrick O. Mensah, Mark A. Popecki, Melvin Aviles, Michael E. Stochaj, Stefan Cwik
  • Patent number: 12163221
    Abstract: A system and method for continuous atomic layer deposition. The system and method includes a housing, a moving bed which passes through the housing, a plurality of precursor gases and associated input ports and the amount of precursor gases, position of the input ports, and relative velocity of the moving bed and carrier gases enabling exhaustion of the precursor gases at available reaction sites.
    Type: Grant
    Filed: February 7, 2017
    Date of Patent: December 10, 2024
    Assignee: UCHICAGO ARGONNE, LLC
    Inventors: Jeffrey W. Elam, Angel Yanguas-Gil, Joseph A. Libera
  • Publication number: 20240290965
    Abstract: A discharged electrochemical cell as described herein comprises an electrochemically reactive metal-containing cathode (e.g., Li, Na, Mg, or Zn; preferably Li) and a layered anode with an electrolyte therebetween. The layered anode comprises a conductive substrate and a reactive film of a metal, a semimetal, a metal oxide, or a semimetal oxide on the surface of the substrate. The reactive film is capable of reversibly alloying with, reversibly forming a mixed phase with, or reversibly reacting with, metal from cathode during charging of cell, and releasing the metal back to the cathode during discharge of the cell.
    Type: Application
    Filed: February 8, 2024
    Publication date: August 29, 2024
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Michael J. Counihan, Sanja Tepavcevic, Pallab Barai, Venkat Srinivasan, Anil U. Mane, Rajesh Pathak, Jeffrey W. Elam
  • Patent number: 12065738
    Abstract: A method of making thin films of sodium fluorides and their derivatives by atomic layer deposition (“ALD”). A sodium precursor is exposed to a substrate in an ALD reactor. The sodium precursor is purged, leaving the substrate with a sodium intermediate bound thereon. A fluorine precursor is exposed to the bound sodium intermediate in the ALD reactor. The fluorine precursor is purged and a sodium fluoride film is formed on the substrate.
    Type: Grant
    Filed: October 22, 2021
    Date of Patent: August 20, 2024
    Assignees: UCHICAGO ARGONNE, LLC, BOISE STATE UNIVERSITY
    Inventors: Anil U. Mane, Jeffrey W. Elam, Donghyeon Kang, Sara Kuraitis, Elton Graugnard
  • Publication number: 20240266527
    Abstract: A coated cathode material including high-nickel lithium cathode and a method of producing the same by atomic layer deposition.
    Type: Application
    Filed: February 6, 2023
    Publication date: August 8, 2024
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Jihyeon Gim, Anil U. Mane, Jinhyup Han, Seoung-Bum Son, Pragathi Darapaneni, Eungje Lee, Khalil Amine, Jeffrey W. Elam, Jason R. Croy, Rajesh Pathak
  • Patent number: 12027711
    Abstract: An efficient, stable catalyst material having a thin film catalyst supported on a support of metal carbide, nitride, oxide, carbonitride, oxycarbonitride core. The thin film catalyst comprises a catalytic metal selected from the group consisting of platinum-group metals, platinum-group metal oxides, transition metals, transition metal oxides, and combinations thereof. The thin film catalyst is covalently bonded to the support.
    Type: Grant
    Filed: October 9, 2018
    Date of Patent: July 2, 2024
    Assignee: UChicago Argonne, LLC
    Inventors: Alizera Pezhman Shirvanian, Deborah J. Myers, Jeffrey W. Elam
  • Patent number: 12006570
    Abstract: A temporal Atomic Layer Deposition system and method utilizing precursor pulses applied to a moving substrate. The precursor pulses are self-exhausting.
    Type: Grant
    Filed: August 20, 2018
    Date of Patent: June 11, 2024
    Assignee: UCHICAGO ARGONNE, LLC
    Inventors: Jeffrey W. Elam, Joseph A. Libera, Angel Yanguas-Gil
  • Publication number: 20240110285
    Abstract: A calorimetry sensor having a porous substrate and a temperature sensitive resistive coating. The calorimetry sensor has a known temperature coefficient of resistance. A process utilizes the known temperature coefficient of resistance and monitors changes in resistance of the calorimetry sensor to determine changes in temperature (heat) within an environment, such as during reactions within an ALD reactor.
    Type: Application
    Filed: September 29, 2022
    Publication date: April 4, 2024
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Anil U. Mane, Jeffrey W. Elam
  • Patent number: 11946139
    Abstract: A lithium boron coating and a method of producing the same. Atomic layer deposition deposits lithium and boron to form a lithium borate layer. The lithium borate maybe deposited as a solid electrolyte.
    Type: Grant
    Filed: September 30, 2020
    Date of Patent: April 2, 2024
    Assignee: UCHICAGO ARGONNE, LLC
    Inventors: Anil U. Mane, Devika Choudhury, Jeffrey W. Elam
  • Patent number: 11896935
    Abstract: Polymeric membranes are modified via SIS to promote membrane resilience, prolong membrane lifetime, and mitigate fouling. Modified membranes include an inorganic material within an outer portion of the modified membrane and a polymeric core that remains unmodified by the inorganic material. The polymer may be removed leaving an inorganic material patterned from an initial unmodified polymeric membrane.
    Type: Grant
    Filed: August 17, 2017
    Date of Patent: February 13, 2024
    Assignees: UCHICAGO ARGONNE, LLC, UNIVERSITY OF CHICAGO
    Inventors: Seth B. Darling, Jeffrey W. Elam, Ruben Waldman
  • Patent number: 11901169
    Abstract: A secondary electron emissive layer resistant to infiltration and fouling. A barrier layer is formed by atomic layer deposition. The barrier layer may be an emissive layer and/or an interlayer. The barrier layer may form an interlayer that is a part of an electron amplifier positioned between an emissive layer and a resistive layer. The barrier layer is resistive to fluorine migration from either the emissive layer or the resistive layer.
    Type: Grant
    Filed: February 14, 2022
    Date of Patent: February 13, 2024
    Assignees: UCHICAGO ARGONNE, LLC, INCOM, INC.
    Inventors: Jeffrey W. Elam, Anil U. Mane, Mark Popecki, Michael Minot
  • Patent number: 11862783
    Abstract: The fabrication of robust interfaces between transition metal oxides and non-aqueous electrolytes is one of the great challenges of lithium ion batteries. Atomic layer deposition (ALD) of aluminum tungsten fluoride (AlWxFy) improves the electrochemical stability of LiCoO2. AlWxFy thin films were deposited by combining trimethylaluminum and tungsten hexafluoride. in-situ quartz crystal microbalance and transmission electron microscopy studies show that the films grow in a layer-by-layer fashion and are amorphous nature. Ultrathin AlWxFy coatings (<10 ?) on LiCoO2 significantly enhance stability relative to bare LiCoO2 when cycled to 4.4 V. The coated LiCoO2 exhibited superior rate capability (up to 400 mA/g) and discharge capacities at a current of 400 mA/g were 51% and 92% of the first cycle capacities for the bare and AlWxFy coated materials.
    Type: Grant
    Filed: August 17, 2021
    Date of Patent: January 2, 2024
    Assignee: UCHICAGO ARGONNE, LLC
    Inventors: Anil U. Mane, Jeffrey W. Elam, Joong Sun Park, Jason R. Croy
  • Patent number: 11858826
    Abstract: Further described herein are extensions to the basic concept of LHs as electrode materials, include both new materials for use with LHs and higher order poly-layer hydroxides (PLHs) as well as methods for synthesizing improved LH material such as with conductive supports or through the use of cross-linking. Finally, also described herein are embodiments enabling the use of LHs as flow electrodes as well as the use of 2-d LH materials for surface redox reactions.
    Type: Grant
    Filed: May 29, 2019
    Date of Patent: January 2, 2024
    Assignee: UChicago Argonne, LLC
    Inventors: Matthias J. Young, Jeffrey W. Elam
  • Patent number: 11851757
    Abstract: Coated nanofibers and methods for forming the same. A magnetic nanofiber is formed and a barrier coating is deposited on the magnetic nanofiber by atomic layer deposition (“ALD”) process. The coated nanofiber may include a reduced magnetic nanostructure and a barrier coating comprising a first oxide coating on the nanofiber, the coating being non-reactive with the magnetic polymer nanofiber, the barrier coating have a thickness of 2 nm to 12 nm.
    Type: Grant
    Filed: January 30, 2020
    Date of Patent: December 26, 2023
    Assignee: UCHICAGO ARGONNE, LLC
    Inventors: Anil U. Mane, Yuepeng Zhang, Devika Choudhury, Jeffrey W. Elam, Kaizhong Gao, John N. Hryn
  • Patent number: 11846021
    Abstract: The sequential infiltration synthesis (SIS) and Atomic Layer Deposition (ALD) of metal and/or metal oxides on personal medical equipment (PPE). The deposited metal and/or metal oxides imbues antimicrobial properties to the PPE.
    Type: Grant
    Filed: September 30, 2020
    Date of Patent: December 19, 2023
    Assignee: UCHICAGO ARGONNE, LLC
    Inventors: Anil U. Mane, Jeffrey W. Elam, Seth B. Darling, Nestor J. Zaluzec, Alex B. Martinson
  • Patent number: 11831021
    Abstract: A hybrid protective coating includes an inorganic component and an organic component such that the inorganic component includes at least one of a metal oxide, a metal fluoride, or combination thereof, and the organic component includes at least one metalcone.
    Type: Grant
    Filed: January 13, 2020
    Date of Patent: November 28, 2023
    Assignee: UCHICAGO ARGONNE, LLC
    Inventors: Jeffrey W. Elam, Lin Chen
  • Patent number: 11773488
    Abstract: ALD and p-CVD methods to generate MgB2 and MgB2-containing films in the growth temperature range of 250-300° C. The thermal ALD and p-CVD methods shown herein ensure that the high-temperature-induced roughening, which causes high surface resistances in MgB2 coatings grown by the mentioned conventional techniques, is avoided. The MgB2 and MgB2-containing films exhibit superconductive properties at above 20° K.
    Type: Grant
    Filed: May 30, 2019
    Date of Patent: October 3, 2023
    Assignee: UChicago Argonne, LLC
    Inventors: David Joseph Mandia, Angel Yanguas-Gil, Devika Choudhury, Aliraeza Nassiri, Anil U. Mane, Jeffrey W. Elam