Patents by Inventor Jeffrey W. Elam

Jeffrey W. Elam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11648546
    Abstract: Zeolites are industrially important materials possessing high Bronsted acidity and shape-selectivity. However, their inherently small pores restrict application for catalytic conversion of bulky molecules. A method of synthesis of ‘artificial’ zeolites. The artificial zeolites have well-tailored Bronsted and Lewis acid sites prepared on mesostructured silica to circumvent this limitation. This novel approach utilizes atomic layer deposition to tailor both porosity and acid speciation, providing exquisite control over catalytic behavior and enabling systematic studies.
    Type: Grant
    Filed: January 29, 2015
    Date of Patent: May 16, 2023
    Assignee: UChicago Argonne, LLC
    Inventors: Jeffrey W. Elam, Christian P. Canlas
  • Publication number: 20230126417
    Abstract: A method of making thin films of sodium fluorides and their derivatives by atomic layer deposition (“ALD”). A sodium precursor is exposed to a substrate in an ALD reactor. The sodium precursor is purged, leaving the substrate with a sodium intermediate bound thereon. A fluorine precursor is exposed to the bound sodium intermediate in the ALD reactor. The fluorine precursor is purged and a sodium fluoride film is formed on the substrate.
    Type: Application
    Filed: October 22, 2021
    Publication date: April 27, 2023
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Anil U. Mane, Jeffrey W. Elam, Donghyeon Kang, Sara Kuraitis, Elton Graugnard
  • Patent number: 11623903
    Abstract: Provided herein is an alkane dehydrogenation catalyst, a method of manufacturing an alkane dehydrogenation catalyst, and a method of converting alkanes to alkenes.
    Type: Grant
    Filed: March 10, 2021
    Date of Patent: April 11, 2023
    Assignees: UCHICAGO ARGONNE, LLC, FORGE NANO
    Inventors: Christopher L. Marshall, Zheng Lu, Jeffrey W. Elam, Christopher Nicholas, Paul T. Barger, Martha Leigh Abrams, Arrelaine Dameron, Ryon W. Tracy
  • Patent number: 11590456
    Abstract: Atomic layer deposition is utilized to deposit a coating on a membrane. The coated membrane exhibits a tightly bound hydration layer upon exposure to water. The resultant coated membrane is oleophobic.
    Type: Grant
    Filed: May 31, 2018
    Date of Patent: February 28, 2023
    Assignees: UChicago Argonne, LLC, The University of Chicago
    Inventors: Hao-Cheng Yang, Seth B. Darling, Jeffrey W. Elam, Lin Chen, Ruben Waldman
  • Patent number: 11548798
    Abstract: A foam electrode comprising surface treatment by the steps of: 1) impregnating soft compressible polymeric foams with a conductive coating via sequential infiltration synthesis and 2) functionalizing the chemically altered voids with an ultrathin redox coating to enhance capacitive deionization (CDI). The redox coating will allow treated foam to absorb ions under the application of a bias, and mechanical compression/decompression. The CDI apparatus uses the void volume of the foam in the uncompressed state to flow liquids through it while the compressed state is used to enhance desalination by limiting the diffusion pathways for the ions to find an adsorption surface.
    Type: Grant
    Filed: April 23, 2019
    Date of Patent: January 10, 2023
    Assignee: UChicago Argonne, LLC
    Inventors: Matthias John Young, Edward F. Barry, Jeffrey W. Elam
  • Publication number: 20220298626
    Abstract: A process for forming a lithium-metal-oxygen film on a lithium SSE. A metal-ligand complex is exposed to the SSE such as for 30-600 seconds in a chemical vapor transfer reactor at a temperature of 200-350° C.
    Type: Application
    Filed: March 19, 2021
    Publication date: September 22, 2022
    Inventors: Donghyeon KANG, Jeffrey W. ELAM, Joseph A. LIBERA, Yujia LIANG, HackSung KIM, Anil U. MANE
  • Patent number: 11447862
    Abstract: Transition metal dichalcogenides (TMDs) are deposited as thin layers on a substrate. The TMDs may be grown on oxide substrates and may have a tunable TMD-oxide interface.
    Type: Grant
    Filed: March 6, 2019
    Date of Patent: September 20, 2022
    Assignees: UChicago Argonne, LLC, Boise State University
    Inventors: Anil U. Mane, Jeffrey W. Elam, Steven Letourneau, Elton Graugnard
  • Publication number: 20220293900
    Abstract: A process for forming a fluoride-based coating on an electrode material that is at least partially covered with a surface carbonate, includes disposing the electrode material in a reactor. The electrode material is exposed to a vapor of a fluoride-based precursor material such that the fluoride-based precursor material dopes the surface carbonate so as to form a layer of a fluoride coating on the electrode material.
    Type: Application
    Filed: May 18, 2021
    Publication date: September 15, 2022
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Anil U. Mane, Jeffrey W. Elam, Pragathi Darapaneni
  • Patent number: 11435114
    Abstract: Selective receiver coatings provide high performance for concentrated solar power applications. The solar selective coating provides high solar absorptivity (90% or greater) with low IR emissivity (0.1 or less) while maintaining stability at temperatures greater than 700° C. The coating comprises a composite of a mesoporous photonic matrix with a conformal optical coating. One example composite coating includes a mesoporous photonic coating comprising a plurality of particles having sizes between 100 nm and 2000 nm, and a conformal optical coating formed by Atomic Layer Deposition (ALD) that infiltrates the mesoporous structure of the photonic coating and comprises metal nanoparticles and an amorphous dielectric matrix.
    Type: Grant
    Filed: February 6, 2016
    Date of Patent: September 6, 2022
    Assignee: UChicago Argonne, LLC
    Inventors: Jeffrey W. Elam, Anil U. Mane, Angel Yanguas-Gil, Joseph A. Libera
  • Patent number: 11414749
    Abstract: A process for forming a lithium-metal-carbon film on a lithium metal structure. A metal-ligand complex is exposed to the metal ligand, such as for 5-30 seconds in a chemical vapor transfer reactor at a temperature of 100-180° C.
    Type: Grant
    Filed: March 19, 2021
    Date of Patent: August 16, 2022
    Assignee: UChicago Argonne, LLC
    Inventors: Donghyeon Kang, Jeffrey W. Elam, Anil U. Mane
  • Patent number: 11414756
    Abstract: Time projection chambers are useful for high energy particle physics, nuclear physics, and astronomy. To enhance the particle detection efficiency and performance of the projection chambers functional bilayer thin film coatings based on the atomic layer deposition method are utilized. Coating material selection is based on Auger neutralization process ion induced electron emission from metallic surfaces (e.g., Mo or W) combined with a high secondary electron emission coefficient. Application of high secondary electron emission materials (e.g., MgO and CaF2) enhances the multiplication of these emitted electrons from ion induction processes. Therefore, using suitable bilayer coatings the overall TPC signal detection efficiency can be increased.
    Type: Grant
    Filed: September 30, 2020
    Date of Patent: August 16, 2022
    Assignee: UChicago Argonne, LLC
    Inventors: Jeffrey W. Elam, Anil U. Mane, Stephen Magill
  • Patent number: 11401385
    Abstract: A method of preparing tunable inorganic patterned nanofeatures by infiltration of a block copolymer scaffold having a plurality of self-assembled periodic polymer microdomains. The method may be used sequential infiltration synthesis (SIS), related to atomic layer deposition (ALD). The method includes selecting a metal precursor that is configured to selectively react with the copolymer unit defining the microdomain but is substantially non-reactive with another polymer unit of the copolymer. A tunable inorganic features is selectively formed on the microdomain to form a hybrid organic/inorganic composite material of the metal precursor and a co-reactant. The organic component may be optionally removed to obtain an inorganic feature s with patterned nanostructures defined by the configuration of the microdomain.
    Type: Grant
    Filed: December 19, 2019
    Date of Patent: August 2, 2022
    Assignee: UChicago Argonne, LLC
    Inventors: Seth B. Darling, Jeffrey W. Elam, Yu-Chih Tseng, Qing Peng
  • Patent number: 11393681
    Abstract: Transition metal dichalcogenides (TMDs) are deposited by atomic layer deposition as thin layers on a substrate. The TMDs may be grown on oxide substrates and may have a tunable TMD-oxide interface. The TMD may be etched using an atomic layer etching technique.
    Type: Grant
    Filed: March 6, 2019
    Date of Patent: July 19, 2022
    Assignee: UChicago Argonne, LLC
    Inventors: Anil U. Mane, Jeffrey W. Elam
  • Patent number: 11359840
    Abstract: Chinese ink is applied on various materials and stabilized by atomic layer deposition to fabricate solar steam generation devices. The encapsulated ink has excellent photothermal properties and evaporation efficiency under simulated sunlight, holding great promise in solar evaporation device applications.
    Type: Grant
    Filed: August 2, 2018
    Date of Patent: June 14, 2022
    Assignee: UChicago Argonne, LLC
    Inventors: Hao-Cheng Yang, Seth B. Darling, Yunsong Xie, Zhaowei Chen, Jeffrey W. Elam
  • Patent number: 11351478
    Abstract: A method of fabricating an coating includes providing a coating comprising a base material. The base material is coated with an inorganic material using at least one of an atomic layer deposition (ALD), a molecular layer deposition (MLD), or sequential infiltration synthesis (SIS) process. The SIS process includes at least one cycle of exposing the coating to a first metal precursor for a first predetermined time and a first partial pressure. The first metal precursor infiltrates at least a portion of the base material and binds with the base material. The coating is exposed to a second co-reactant precursor for a second predetermined time and a second partial pressure. The second co-reactant precursor reacts with the first metal precursor, thereby forming the inorganic material on the base material. The inorganic material infiltrating at least the portion of the base material. The inorganic material is functionalized with a material.
    Type: Grant
    Filed: September 6, 2018
    Date of Patent: June 7, 2022
    Assignee: UChicago Argonne, LLC
    Inventors: Seth B. Darling, Jeffrey W. Elam
  • Patent number: 11326255
    Abstract: A system and method for improved atomic layer deposition. The system includes a top showerhead plate, a substrate and a bottom showerhead plate. The substrate includes a porous microchannel plate and a substrate holder is positioned in the system to insure flow-through of the gas precursor.
    Type: Grant
    Filed: February 7, 2014
    Date of Patent: May 10, 2022
    Assignee: UChicago Argonne, LLC
    Inventors: Anil U. Mane, Joseph Libera, Jeffrey W. Elam
  • Publication number: 20220098730
    Abstract: The sequential infiltration synthesis (SIS) and Atomic Layer Deposition (ALD) of metal and/or metal oxides on personal medical equipment (PPE). The deposited metal and/or metal oxides imbues antimicrobial properties to the PPE.
    Type: Application
    Filed: September 30, 2020
    Publication date: March 31, 2022
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Anil U. Mane, Jeffrey W. Elam, Seth B. Darling, Nestor J. Zaluzec, Alex B. Martinson
  • Publication number: 20220098736
    Abstract: A lithium boron coating and a method of producing the same. Atomic layer deposition deposits lithium and boron to form a lithium borate layer. The lithium borate maybe deposited as a solid electrolyte.
    Type: Application
    Filed: September 30, 2020
    Publication date: March 31, 2022
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Anil U. Mane, Devika Choudhury, Jeffrey W. Elam
  • Publication number: 20220098734
    Abstract: A secondary electron emissive coating. The coating is formed by atomic layer deposition of CaF2 on a substrate by ALD half cycle exposure of an alkaline metal amidinate and ALD half cycle exposure of a fluorinated compound, where the deposition occurs at a reaction temperature greater than a highest sublimation temperature of the first metal precursor and the second metal precursor and less than 50° C. above the highest sublimation temperature.
    Type: Application
    Filed: September 30, 2020
    Publication date: March 31, 2022
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Jeffrey W. Elam, Anil U. Mane
  • Publication number: 20220085348
    Abstract: The fabrication of robust interfaces between transition metal oxides and non-aqueous electrolytes is one of the great challenges of lithium ion batteries. Atomic layer deposition (ALD) of aluminum tungsten fluoride (AlWxFy) improves the electrochemical stability of LiCoO2. AlWxFy thin films were deposited by combining trimethylaluminum and tungsten hexafluoride. in-situ quartz crystal microbalance and transmission electron microscopy studies show that the films grow in a layer-by-layer fashion and are amorphous nature. Ultrathin AlWxFy coatings (<10 ?) on LiCoO2 significantly enhance stability relative to bare LiCoO2 when cycled to 4.4 V. The coated LiCoO2 exhibited superior rate capability (up to 400 mA/g) and discharge capacities at a current of 400 mA/g were 51% and 92% of the first cycle capacities for the bare and AlWxFy coated materials.
    Type: Application
    Filed: August 17, 2021
    Publication date: March 17, 2022
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Anil U. Mane, Jeffrey W. Elam, Joong Sun Park, Jason R. Croy