Patents by Inventor Jeffrey W. Elam

Jeffrey W. Elam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210238769
    Abstract: Coated nanofibers and methods for forming the same. A magnetic nanofiber is formed and a barrier coating is deposited on the magnetic nanofiber by atomic layer deposition (“ALD”) process. The coated nanofiber may include a reduced magnetic nanostructure and a barrier coating comprising a first oxide coating on the nanofiber, the coating being non-reactive with the magnetic polymer nanofiber, the barrier coating have a thickness of 2 nm to 12 nm.
    Type: Application
    Filed: January 30, 2020
    Publication date: August 5, 2021
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Anil U. Mane, Yuepeng Zhang, Devika Choudhury, Jeffrey W. Elam, Kaizhong Gao, John N. Hryn
  • Patent number: 11065334
    Abstract: A method comprises providing a plurality of nanostructures comprising a base material. The plurality of nanostructures are exposed to a first material at a first deposition temperature. The plurality of nanoparticles are exposed to a second material at a second deposition temperature, and exposed to a Boron-10 (10B) containing material at a third deposition temperature so as to form a 10B-metal oxide based composite nanostructure.
    Type: Grant
    Filed: November 13, 2018
    Date of Patent: July 20, 2021
    Assignee: UChicago Argonne, LLC
    Inventors: Anil U. Mane, Jeffrey W. Elam
  • Publication number: 20210098262
    Abstract: A method of etching an organic or hybrid inorganic/organic material. The method etches molecular layer deposition coatings. An etching cycle comprises a first half reaction exposing the coating to a precursor. A second half reaction exposes a second precursor, removing or etching a portion of the coating.
    Type: Application
    Filed: September 30, 2019
    Publication date: April 1, 2021
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Matthias John Young, Steven Payonk Letourneau, Devika Choudhury, Jeffrey W. Elam, Angel Yanguas-Gil, Anil U. Mane
  • Patent number: 10954139
    Abstract: A method of fabricating an oleophilic foam includes providing a foam comprising a base material. The base material is coated with an inorganic material using at least one of an atomic layer deposition (ALD), a molecular layer deposition (MLD) or sequential infiltration synthesis (SIS) process. The SIS process includes at least one cycle of exposing the foam to a first metal precursor for a first predetermined time and a first partial pressure. The first metal precursor infiltrates at least a portion of the base material and binds with the base material. The foam is exposed to a second co-reactant precursor for a second predetermined time and a second partial pressure. The second co-reactant precursor reacts with the first metal precursor, thereby forming the inorganic material on the base material. The inorganic material infiltrating at least the portion of the base material. The inorganic material is functionalized with an oleophilic material.
    Type: Grant
    Filed: October 11, 2019
    Date of Patent: March 23, 2021
    Assignee: UChicago Argonne, LLC
    Inventors: Seth B. Darling, Jeffrey W. Elam, Anil U. Mane
  • Patent number: 10870917
    Abstract: A method of fabricating an foam includes providing a foam comprising a base material. The base material is coated with an inorganic material using at least one of an atomic layer deposition (ALD), a molecular layer deposition (MLD), or sequential infiltration synthesis (SIS) process. The SIS process includes at least one cycle of exposing the foam to a first metal precursor for a first predetermined time and a first partial pressure. The first metal precursor infiltrates at least a portion of the base material and binds with the base material. The foam is exposed to a second co-reactant precursor for a second predetermined time and a second partial pressure. The second co-reactant precursor reacts with the first metal precursor, thereby forming the inorganic material on the base material. The inorganic material infiltrating at least the portion of the base material. The inorganic material is functionalized with a material.
    Type: Grant
    Filed: July 7, 2017
    Date of Patent: December 22, 2020
    Assignee: UChicago Argonne, LLC
    Inventors: Seth B. Darling, Jeffrey W. Elam, Anil U. Mane, Seth W. Snyder
  • Patent number: 10867768
    Abstract: An enhanced electron amplifier structure includes a microporous substrate having a front surface and a rear surface, the microporous substrate including at least one channel extending substantially through the substrate between the front surface and the rear surface, an ion diffusion layer formed on a surface of the channel, the ion diffusion layer comprising a metal oxide, a resistive coating layer formed on the first ion diffusion layer, an emissive coating layer formed on the resistive coating layer, and an optional ion feedback layer formed on the front surface of the structure. The emissive coating produces a secondary electron emission responsive to an interaction with a particle received by the channel. The ion diffusion layer, the resistive coating layer, the emissive coating layer, and the ion feedback layer are independently deposited via chemical vapor deposition or atomic layer deposition.
    Type: Grant
    Filed: August 30, 2017
    Date of Patent: December 15, 2020
    Assignee: UChicago Argonne, LLC
    Inventors: Anil U. Mane, Jeffrey W. Elam
  • Publication number: 20200378003
    Abstract: ALD and p-CVD methods to generate MgB2 and MgB2-containing films in the growth temperature range of 250-300° C. The thermal ALD and p-CVD methods shown herein ensure that the high-temperature-induced roughening, which causes high surface resistances in MgB2 coatings grown by the mentioned conventional techniques, is avoided. The MgB2 and MgB2-containing films exhibit superconductive properties at above 20° K.
    Type: Application
    Filed: May 30, 2019
    Publication date: December 3, 2020
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: David Joseph Mandia, Angel Yanguas-Gil, Devika Choudhury, Aliraeza Nassiri, Anil U. Mane, Jeffrey W. Elam
  • Publication number: 20200377388
    Abstract: Further described herein are extensions to the basic concept of LHs as electrode materials, include both new materials for use with LHs and higher order poly-layer hydroxides (PLHs) as well as methods for synthesizing improved LH material such as with conductive supports or through the use of cross-linking. Finally, also described herein are embodiments enabling the use of LHs as flow electrodes as well as the use of 2-d LH materials for surface redox reactions.
    Type: Application
    Filed: May 29, 2019
    Publication date: December 3, 2020
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Matthias J. Young, Jeffrey W. Elam
  • Publication number: 20200339446
    Abstract: A foam electrode comprising surface treatment by the steps of: 1) impregnating soft compressible polymeric foams with a conductive coating via sequential infiltration synthesis and 2) functionalizing the chemically altered voids with an ultrathin redox coating to enhance capacitive deionization (CDI). The redox coating will allow treated foam to absorb ions under the application of a bias, and mechanical compression/decompression. The CDI apparatus uses the void volume of the foam in the uncompressed state to flow liquids through it while the compressed state is used to enhance desalination by limiting the diffusion pathways for the ions to find an adsorption surface.
    Type: Application
    Filed: April 23, 2019
    Publication date: October 29, 2020
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Matthias John Young, Edward F. Barry, Jeffrey W. Elam
  • Publication number: 20200340119
    Abstract: An ultra-thin film transition metal dichalcogenide (“TMD”) supported on a support. The TMD is formed from a metal grown by atomic layer deposition (“ALD”) on a substrate. The metal is sulphurized to produce a TMD ultra-thin layer.
    Type: Application
    Filed: April 23, 2019
    Publication date: October 29, 2020
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Anil U. Mane, Devika Choudhury, Jeffrey W. Elam, Steven Payonk Letourneau
  • Patent number: 10796874
    Abstract: The invention provides a gain device having a plurality of channels having a polygonal shape with four or more sides. The invention also provides a method for producing microchannel plates (MCPs) having the steps of providing a pre-polymer; and directing a laser over the pre-polymer into a pre-determined pattern. Also provided is method for efficiently 3D printing an object.
    Type: Grant
    Filed: June 21, 2019
    Date of Patent: October 6, 2020
    Assignee: UCHICAGO ARGONNE, LLC
    Inventors: Robert G. Wagner, Michael J. Pellin, Howard Nicholson, Lei Xia, Jingbo Wang, Junqi Xie, Anil U. Mane, Jeffrey W. Elam
  • Publication number: 20200161660
    Abstract: A hybrid protective coating includes an inorganic component and an organic component such that the inorganic component includes at least one of a metal oxide, a metal fluoride, or combination thereof, and the organic component includes at least one metalcone.
    Type: Application
    Filed: January 13, 2020
    Publication date: May 21, 2020
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Jeffrey W. Elam, Lin Chen
  • Publication number: 20200147218
    Abstract: A method comprises providing a plurality of nanostructures comprising a base material. The plurality of nanostructures are exposed to a first material at a first deposition temperature. The plurality of nanoparticles are exposed to a second material at a second deposition temperature, and exposed to a Boron-10 (10B) containing material at a third deposition temperature so as to form a 10B-metal oxide based composite nanostructure.
    Type: Application
    Filed: November 13, 2018
    Publication date: May 14, 2020
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Anil U. Mane, Jeffrey W. Elam
  • Publication number: 20200140622
    Abstract: A method of preparing tunable inorganic patterned nanofeatures by infiltration of a block copolymer scaffold having a plurality of self-assembled periodic polymer microdomains. The method may be used sequential infiltration synthesis (SIS), related to atomic layer deposition (ALD). The method includes selecting a metal precursor that is configured to selectively react with the copolymer unit defining the microdomain but is substantially non-reactive with another polymer unit of the copolymer. A tunable inorganic features is selectively formed on the microdomain to form a hybrid organic/inorganic composite material of the metal precursor and a co-reactant. The organic component may be optionally removed to obtain an inorganic feature s with patterned nanostructures defined by the configuration of the microdomain.
    Type: Application
    Filed: December 19, 2019
    Publication date: May 7, 2020
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Seth B. Darling, Jeffrey W. Elam, Yu-Chih Tseng, Qing Peng
  • Publication number: 20200078705
    Abstract: A method of fabricating an coating includes providing a coating comprising a base material. The base material is coated with an inorganic material using at least one of an atomic layer deposition (ALD), a molecular layer deposition (MLD), or sequential infiltration synthesis (SIS) process. The SIS process includes at least one cycle of exposing the coating to a first metal precursor for a first predetermined time and a first partial pressure. The first metal precursor infiltrates at least a portion of the base material and binds with the base material. The coating is exposed to a second co-reactant precursor for a second predetermined time and a second partial pressure. The second co-reactant precursor reacts with the first metal precursor, thereby forming the inorganic material on the base material. The inorganic material infiltrating at least the portion of the base material. The inorganic material is functionalized with a material.
    Type: Application
    Filed: September 6, 2018
    Publication date: March 12, 2020
    Applicant: UCHICAGO ARGONNE LLC
    Inventors: Seth B. Darling, Jeffrey W. Elam
  • Patent number: 10577466
    Abstract: A method of preparing tunable inorganic patterned nanofeatures by infiltration of a block copolymer scaffold having a plurality of self-assembled periodic polymer microdomains. The method may be used sequential infiltration synthesis (SIS), related to atomic layer deposition (ALD). The method includes selecting a metal precursor that is configured to selectively react with the copolymer unit defining the microdomain but is substantially non-reactive with another polymer unit of the copolymer. A tunable inorganic features is selectively formed on the microdomain to form a hybrid organic/inorganic composite material of the metal precursor and a co-reactant. The organic component may be optionally removed to obtain an inorganic feature s with patterned nanostructures defined by the configuration of the microdomain.
    Type: Grant
    Filed: October 24, 2016
    Date of Patent: March 3, 2020
    Assignee: UChicago Argonne, LLC
    Inventors: Seth B. Darling, Jeffrey W. Elam, Yu-Chih Tseng, Qing Peng
  • Patent number: 10571803
    Abstract: Simplified methods of multiple-patterning photolithography using sequential infiltration synthesis to modify the photoresist such that it withstands plasma etching better than unmodified resist and replaces one or more hard masks and/or a freezing step in MPL processes including litho-etch-litho-etch photolithography or litho-freeze-litho-etch photolithography.
    Type: Grant
    Filed: June 12, 2017
    Date of Patent: February 25, 2020
    Assignee: UChicago Argonne, LLC
    Inventors: Seth B. Darling, Jeffrey W. Elam, Yu-Chih Tseng
  • Publication number: 20200039845
    Abstract: A method of fabricating an oleophilic foam includes providing a foam comprising a base material. The base material is coated with an inorganic material using at least one of an atomic layer deposition (ALD), a molecular layer deposition (MLD) or sequential infiltration synthesis (SIS) process. The SIS process includes at least one cycle of exposing the foam to a first metal precursor for a first predetermined time and a first partial pressure. The first metal precursor infiltrates at least a portion of the base material and binds with the base material. The foam is exposed to a second co-reactant precursor for a second predetermined time and a second partial pressure. The second co-reactant precursor reacts with the first metal precursor, thereby forming the inorganic material on the base material. The inorganic material infiltrating at least the portion of the base material. The inorganic material is functionalized with an oleophilic material.
    Type: Application
    Filed: October 11, 2019
    Publication date: February 6, 2020
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Seth B. Darling, Jeffrey W. Elam, Anil U. Mane
  • Publication number: 20200041169
    Abstract: Chinese ink is applied on various materials and stabilized by atomic layer deposition to fabricate solar steam generation devices. The encapsulated ink has excellent photothermal properties and evaporation efficiency under simulated sunlight, holding great promise in solar evaporation device applications.
    Type: Application
    Filed: August 2, 2018
    Publication date: February 6, 2020
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Hao-Cheng Yang, Seth B. Darling, Yunsong Xie, Zhaowei Chen, Jeffrey W. Elam
  • Patent number: 10550010
    Abstract: A method of fabricating an oleophilic foam includes providing a foam comprising a base material. The base material is coated with an inorganic material using at least one of an atomic layer deposition (ALD), a molecular layer deposition (MLD) or sequential infiltration synthesis (SIS) process. The SIS process includes at least one cycle of exposing the foam to a first metal precursor for a first predetermined time and a first partial pressure. The first metal precursor infiltrates at least a portion of the base material and binds with the base material. The foam is exposed to a second co-reactant precursor for a second predetermined time and a second partial pressure. The second co-reactant precursor reacts with the first metal precursor, thereby forming the inorganic material on the base material. The inorganic material infiltrating at least the portion of the base material. The inorganic material is functionalized with an oleophilic material.
    Type: Grant
    Filed: December 11, 2015
    Date of Patent: February 4, 2020
    Assignee: UChicago Argonne, LLC
    Inventors: Seth B. Darling, Jeffrey W. Elam, Anil U. Mane