Patents by Inventor Jeffrey W. Elam
Jeffrey W. Elam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20210238769Abstract: Coated nanofibers and methods for forming the same. A magnetic nanofiber is formed and a barrier coating is deposited on the magnetic nanofiber by atomic layer deposition (“ALD”) process. The coated nanofiber may include a reduced magnetic nanostructure and a barrier coating comprising a first oxide coating on the nanofiber, the coating being non-reactive with the magnetic polymer nanofiber, the barrier coating have a thickness of 2 nm to 12 nm.Type: ApplicationFiled: January 30, 2020Publication date: August 5, 2021Applicant: UCHICAGO ARGONNE, LLCInventors: Anil U. Mane, Yuepeng Zhang, Devika Choudhury, Jeffrey W. Elam, Kaizhong Gao, John N. Hryn
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Patent number: 11065334Abstract: A method comprises providing a plurality of nanostructures comprising a base material. The plurality of nanostructures are exposed to a first material at a first deposition temperature. The plurality of nanoparticles are exposed to a second material at a second deposition temperature, and exposed to a Boron-10 (10B) containing material at a third deposition temperature so as to form a 10B-metal oxide based composite nanostructure.Type: GrantFiled: November 13, 2018Date of Patent: July 20, 2021Assignee: UChicago Argonne, LLCInventors: Anil U. Mane, Jeffrey W. Elam
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Publication number: 20210098262Abstract: A method of etching an organic or hybrid inorganic/organic material. The method etches molecular layer deposition coatings. An etching cycle comprises a first half reaction exposing the coating to a precursor. A second half reaction exposes a second precursor, removing or etching a portion of the coating.Type: ApplicationFiled: September 30, 2019Publication date: April 1, 2021Applicant: UCHICAGO ARGONNE, LLCInventors: Matthias John Young, Steven Payonk Letourneau, Devika Choudhury, Jeffrey W. Elam, Angel Yanguas-Gil, Anil U. Mane
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Patent number: 10954139Abstract: A method of fabricating an oleophilic foam includes providing a foam comprising a base material. The base material is coated with an inorganic material using at least one of an atomic layer deposition (ALD), a molecular layer deposition (MLD) or sequential infiltration synthesis (SIS) process. The SIS process includes at least one cycle of exposing the foam to a first metal precursor for a first predetermined time and a first partial pressure. The first metal precursor infiltrates at least a portion of the base material and binds with the base material. The foam is exposed to a second co-reactant precursor for a second predetermined time and a second partial pressure. The second co-reactant precursor reacts with the first metal precursor, thereby forming the inorganic material on the base material. The inorganic material infiltrating at least the portion of the base material. The inorganic material is functionalized with an oleophilic material.Type: GrantFiled: October 11, 2019Date of Patent: March 23, 2021Assignee: UChicago Argonne, LLCInventors: Seth B. Darling, Jeffrey W. Elam, Anil U. Mane
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Patent number: 10870917Abstract: A method of fabricating an foam includes providing a foam comprising a base material. The base material is coated with an inorganic material using at least one of an atomic layer deposition (ALD), a molecular layer deposition (MLD), or sequential infiltration synthesis (SIS) process. The SIS process includes at least one cycle of exposing the foam to a first metal precursor for a first predetermined time and a first partial pressure. The first metal precursor infiltrates at least a portion of the base material and binds with the base material. The foam is exposed to a second co-reactant precursor for a second predetermined time and a second partial pressure. The second co-reactant precursor reacts with the first metal precursor, thereby forming the inorganic material on the base material. The inorganic material infiltrating at least the portion of the base material. The inorganic material is functionalized with a material.Type: GrantFiled: July 7, 2017Date of Patent: December 22, 2020Assignee: UChicago Argonne, LLCInventors: Seth B. Darling, Jeffrey W. Elam, Anil U. Mane, Seth W. Snyder
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Patent number: 10867768Abstract: An enhanced electron amplifier structure includes a microporous substrate having a front surface and a rear surface, the microporous substrate including at least one channel extending substantially through the substrate between the front surface and the rear surface, an ion diffusion layer formed on a surface of the channel, the ion diffusion layer comprising a metal oxide, a resistive coating layer formed on the first ion diffusion layer, an emissive coating layer formed on the resistive coating layer, and an optional ion feedback layer formed on the front surface of the structure. The emissive coating produces a secondary electron emission responsive to an interaction with a particle received by the channel. The ion diffusion layer, the resistive coating layer, the emissive coating layer, and the ion feedback layer are independently deposited via chemical vapor deposition or atomic layer deposition.Type: GrantFiled: August 30, 2017Date of Patent: December 15, 2020Assignee: UChicago Argonne, LLCInventors: Anil U. Mane, Jeffrey W. Elam
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Publication number: 20200378003Abstract: ALD and p-CVD methods to generate MgB2 and MgB2-containing films in the growth temperature range of 250-300° C. The thermal ALD and p-CVD methods shown herein ensure that the high-temperature-induced roughening, which causes high surface resistances in MgB2 coatings grown by the mentioned conventional techniques, is avoided. The MgB2 and MgB2-containing films exhibit superconductive properties at above 20° K.Type: ApplicationFiled: May 30, 2019Publication date: December 3, 2020Applicant: UCHICAGO ARGONNE, LLCInventors: David Joseph Mandia, Angel Yanguas-Gil, Devika Choudhury, Aliraeza Nassiri, Anil U. Mane, Jeffrey W. Elam
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Publication number: 20200377388Abstract: Further described herein are extensions to the basic concept of LHs as electrode materials, include both new materials for use with LHs and higher order poly-layer hydroxides (PLHs) as well as methods for synthesizing improved LH material such as with conductive supports or through the use of cross-linking. Finally, also described herein are embodiments enabling the use of LHs as flow electrodes as well as the use of 2-d LH materials for surface redox reactions.Type: ApplicationFiled: May 29, 2019Publication date: December 3, 2020Applicant: UCHICAGO ARGONNE, LLCInventors: Matthias J. Young, Jeffrey W. Elam
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Publication number: 20200339446Abstract: A foam electrode comprising surface treatment by the steps of: 1) impregnating soft compressible polymeric foams with a conductive coating via sequential infiltration synthesis and 2) functionalizing the chemically altered voids with an ultrathin redox coating to enhance capacitive deionization (CDI). The redox coating will allow treated foam to absorb ions under the application of a bias, and mechanical compression/decompression. The CDI apparatus uses the void volume of the foam in the uncompressed state to flow liquids through it while the compressed state is used to enhance desalination by limiting the diffusion pathways for the ions to find an adsorption surface.Type: ApplicationFiled: April 23, 2019Publication date: October 29, 2020Applicant: UCHICAGO ARGONNE, LLCInventors: Matthias John Young, Edward F. Barry, Jeffrey W. Elam
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Publication number: 20200340119Abstract: An ultra-thin film transition metal dichalcogenide (“TMD”) supported on a support. The TMD is formed from a metal grown by atomic layer deposition (“ALD”) on a substrate. The metal is sulphurized to produce a TMD ultra-thin layer.Type: ApplicationFiled: April 23, 2019Publication date: October 29, 2020Applicant: UCHICAGO ARGONNE, LLCInventors: Anil U. Mane, Devika Choudhury, Jeffrey W. Elam, Steven Payonk Letourneau
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Patent number: 10796874Abstract: The invention provides a gain device having a plurality of channels having a polygonal shape with four or more sides. The invention also provides a method for producing microchannel plates (MCPs) having the steps of providing a pre-polymer; and directing a laser over the pre-polymer into a pre-determined pattern. Also provided is method for efficiently 3D printing an object.Type: GrantFiled: June 21, 2019Date of Patent: October 6, 2020Assignee: UCHICAGO ARGONNE, LLCInventors: Robert G. Wagner, Michael J. Pellin, Howard Nicholson, Lei Xia, Jingbo Wang, Junqi Xie, Anil U. Mane, Jeffrey W. Elam
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Publication number: 20200161660Abstract: A hybrid protective coating includes an inorganic component and an organic component such that the inorganic component includes at least one of a metal oxide, a metal fluoride, or combination thereof, and the organic component includes at least one metalcone.Type: ApplicationFiled: January 13, 2020Publication date: May 21, 2020Applicant: UCHICAGO ARGONNE, LLCInventors: Jeffrey W. Elam, Lin Chen
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Publication number: 20200147218Abstract: A method comprises providing a plurality of nanostructures comprising a base material. The plurality of nanostructures are exposed to a first material at a first deposition temperature. The plurality of nanoparticles are exposed to a second material at a second deposition temperature, and exposed to a Boron-10 (10B) containing material at a third deposition temperature so as to form a 10B-metal oxide based composite nanostructure.Type: ApplicationFiled: November 13, 2018Publication date: May 14, 2020Applicant: UCHICAGO ARGONNE, LLCInventors: Anil U. Mane, Jeffrey W. Elam
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Publication number: 20200140622Abstract: A method of preparing tunable inorganic patterned nanofeatures by infiltration of a block copolymer scaffold having a plurality of self-assembled periodic polymer microdomains. The method may be used sequential infiltration synthesis (SIS), related to atomic layer deposition (ALD). The method includes selecting a metal precursor that is configured to selectively react with the copolymer unit defining the microdomain but is substantially non-reactive with another polymer unit of the copolymer. A tunable inorganic features is selectively formed on the microdomain to form a hybrid organic/inorganic composite material of the metal precursor and a co-reactant. The organic component may be optionally removed to obtain an inorganic feature s with patterned nanostructures defined by the configuration of the microdomain.Type: ApplicationFiled: December 19, 2019Publication date: May 7, 2020Applicant: UCHICAGO ARGONNE, LLCInventors: Seth B. Darling, Jeffrey W. Elam, Yu-Chih Tseng, Qing Peng
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Publication number: 20200078705Abstract: A method of fabricating an coating includes providing a coating comprising a base material. The base material is coated with an inorganic material using at least one of an atomic layer deposition (ALD), a molecular layer deposition (MLD), or sequential infiltration synthesis (SIS) process. The SIS process includes at least one cycle of exposing the coating to a first metal precursor for a first predetermined time and a first partial pressure. The first metal precursor infiltrates at least a portion of the base material and binds with the base material. The coating is exposed to a second co-reactant precursor for a second predetermined time and a second partial pressure. The second co-reactant precursor reacts with the first metal precursor, thereby forming the inorganic material on the base material. The inorganic material infiltrating at least the portion of the base material. The inorganic material is functionalized with a material.Type: ApplicationFiled: September 6, 2018Publication date: March 12, 2020Applicant: UCHICAGO ARGONNE LLCInventors: Seth B. Darling, Jeffrey W. Elam
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Patent number: 10577466Abstract: A method of preparing tunable inorganic patterned nanofeatures by infiltration of a block copolymer scaffold having a plurality of self-assembled periodic polymer microdomains. The method may be used sequential infiltration synthesis (SIS), related to atomic layer deposition (ALD). The method includes selecting a metal precursor that is configured to selectively react with the copolymer unit defining the microdomain but is substantially non-reactive with another polymer unit of the copolymer. A tunable inorganic features is selectively formed on the microdomain to form a hybrid organic/inorganic composite material of the metal precursor and a co-reactant. The organic component may be optionally removed to obtain an inorganic feature s with patterned nanostructures defined by the configuration of the microdomain.Type: GrantFiled: October 24, 2016Date of Patent: March 3, 2020Assignee: UChicago Argonne, LLCInventors: Seth B. Darling, Jeffrey W. Elam, Yu-Chih Tseng, Qing Peng
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Patent number: 10571803Abstract: Simplified methods of multiple-patterning photolithography using sequential infiltration synthesis to modify the photoresist such that it withstands plasma etching better than unmodified resist and replaces one or more hard masks and/or a freezing step in MPL processes including litho-etch-litho-etch photolithography or litho-freeze-litho-etch photolithography.Type: GrantFiled: June 12, 2017Date of Patent: February 25, 2020Assignee: UChicago Argonne, LLCInventors: Seth B. Darling, Jeffrey W. Elam, Yu-Chih Tseng
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Publication number: 20200039845Abstract: A method of fabricating an oleophilic foam includes providing a foam comprising a base material. The base material is coated with an inorganic material using at least one of an atomic layer deposition (ALD), a molecular layer deposition (MLD) or sequential infiltration synthesis (SIS) process. The SIS process includes at least one cycle of exposing the foam to a first metal precursor for a first predetermined time and a first partial pressure. The first metal precursor infiltrates at least a portion of the base material and binds with the base material. The foam is exposed to a second co-reactant precursor for a second predetermined time and a second partial pressure. The second co-reactant precursor reacts with the first metal precursor, thereby forming the inorganic material on the base material. The inorganic material infiltrating at least the portion of the base material. The inorganic material is functionalized with an oleophilic material.Type: ApplicationFiled: October 11, 2019Publication date: February 6, 2020Applicant: UCHICAGO ARGONNE, LLCInventors: Seth B. Darling, Jeffrey W. Elam, Anil U. Mane
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Publication number: 20200041169Abstract: Chinese ink is applied on various materials and stabilized by atomic layer deposition to fabricate solar steam generation devices. The encapsulated ink has excellent photothermal properties and evaporation efficiency under simulated sunlight, holding great promise in solar evaporation device applications.Type: ApplicationFiled: August 2, 2018Publication date: February 6, 2020Applicant: UCHICAGO ARGONNE, LLCInventors: Hao-Cheng Yang, Seth B. Darling, Yunsong Xie, Zhaowei Chen, Jeffrey W. Elam
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Patent number: 10550010Abstract: A method of fabricating an oleophilic foam includes providing a foam comprising a base material. The base material is coated with an inorganic material using at least one of an atomic layer deposition (ALD), a molecular layer deposition (MLD) or sequential infiltration synthesis (SIS) process. The SIS process includes at least one cycle of exposing the foam to a first metal precursor for a first predetermined time and a first partial pressure. The first metal precursor infiltrates at least a portion of the base material and binds with the base material. The foam is exposed to a second co-reactant precursor for a second predetermined time and a second partial pressure. The second co-reactant precursor reacts with the first metal precursor, thereby forming the inorganic material on the base material. The inorganic material infiltrating at least the portion of the base material. The inorganic material is functionalized with an oleophilic material.Type: GrantFiled: December 11, 2015Date of Patent: February 4, 2020Assignee: UChicago Argonne, LLCInventors: Seth B. Darling, Jeffrey W. Elam, Anil U. Mane