Patents by Inventor Jen-Cheng Liu

Jen-Cheng Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250149509
    Abstract: In some embodiments, the present disclosure relates to a 3D integrated circuit (IC) stack that includes a first IC die bonded to a second IC die. The first IC die includes a first semiconductor substrate, a first interconnect structure arranged on a frontside of the first semiconductor substrate, and a first bonding structure arranged over the first interconnect structure. The second IC die includes a second semiconductor substrate, a second interconnect structure arranged on a frontside of the second semiconductor substrate, and a second bonding structure arranged on a backside of the second semiconductor substrate. The first bonding structure faces the second bonding structure. Further, the 3D IC stack includes a first backside contact that extends from the second bonding structure to the backside of the second semiconductor substrate and is thermally coupled to at least one of the first or second interconnect structures.
    Type: Application
    Filed: January 3, 2025
    Publication date: May 8, 2025
    Inventors: Min-Feng Kao, Dun-Nian Yaung, Hsing-Chih Lin, Jen-Cheng Liu, Yi-Shin Chu, Ping-Tzu Chen, Che-Wei Chen
  • Publication number: 20250149407
    Abstract: Various embodiments of the present application are directed towards an integrated circuit (IC) in which a shield structure blocks the migration of charge to a semiconductor device from proximate a through substrate via (TSV). In some embodiments, the IC comprises a substrate, an interconnect structure, the semiconductor device, the TSV, and the shield structure. The interconnect structure is on a frontside of the substrate and comprises a wire. The semiconductor device is on the frontside of the substrate, between the substrate and the interconnect structure. The TSV extends completely through the substrate, from a backside of the substrate to the wire, and comprises metal. The shield structure comprises a PN junction extending completely through the substrate and directly between the semiconductor device and the TSV.
    Type: Application
    Filed: January 9, 2025
    Publication date: May 8, 2025
    Inventors: Min-Feng Kao, Dun-Nian Yaung, Hsing-Chih Lin, Jen-Cheng Liu, Wei-Tao Tsai
  • Patent number: 12295163
    Abstract: Threshold voltage (Vt) tuning layers may be sensitive to etching by reactants used to deposit overlying gate material, such as metal nitride. Methods for depositing Vt tuning layers are provided. In some embodiments Vt tuning layers may comprise a Vt tuning material in a neutral matrix. In some embodiments, processes for reducing or eliminating the etching of Vt tuning layers by halide reactants are described. In some embodiments a Vt tuning layer, such as a metal oxide layer, is treated by a nitridation process following deposition and prior to subsequent deposition of a metal nitride capping layer. In some embodiments an etch-protective layer, such as a NbO layer, is deposited over a Vt tuning layer prior to deposition of an overlying metal nitride layer.
    Type: Grant
    Filed: April 22, 2022
    Date of Patent: May 6, 2025
    Assignee: ASM IP Holding B.V.
    Inventors: Fu Tang, Eric James Shero, Gejian Zhao, Eric Jen Cheng Liu
  • Publication number: 20250143000
    Abstract: An image sensor includes a substrate including a first surface and a second surface opposite to the first surface; a plurality of pixel sensors disposed in the substrate, a sensor isolation feature disposed in the substrate defining an active region, and a dielectric layer between the sensor isolation feature and the substrate, wherein the sensor isolation feature comprises a conductive material.
    Type: Application
    Filed: December 30, 2024
    Publication date: May 1, 2025
    Inventors: MIN-FENG KAO, DUN-NIAN YAUNG, JEN-CHENG LIU, HSING-CHIH LIN, CHE-WEI CHEN
  • Publication number: 20250142232
    Abstract: Various embodiments of the present disclosure are directed to a stacked complementary metal-oxide semiconductor (CMOS) image sensor. A first integrated circuit (IC) chip and a second IC chip are vertically stacked. A pixel sensor spans the first and second IC chips. The pixel sensor comprises a first transfer transistor and a photodetector that are at the first IC chip, and further comprises a source-follower transistor, a transistor capacitor, and a second transfer transistor that are at the second IC chip. The transistor capacitor and the second transfer transistor are electrically coupled in series from a source/drain region of the first transfer transistor to a gate electrode of the source-follower transistor.
    Type: Application
    Filed: January 8, 2024
    Publication date: May 1, 2025
    Inventors: Chih-Kuan Yu, Feng-Chi Hung, Wen-I Hsu, Bing Cheng You, Jen-Cheng Liu, Dun-Nian Yaung
  • Publication number: 20250143001
    Abstract: The present disclosure relates to a multi-dimensional image sensor integrated chip (IC) structure. The multi-dimensional image sensor IC structure includes a plurality of image sensing elements disposed within a plurality of pixel regions arranged in a pixel array of a first integrated chip (IC) tier. The plurality of pixel regions include a plurality of active pixel regions and one or more dummy pixel regions. A plurality of pixel support devices are disposed on a second substrate within a second IC tier that is bonded to the first IC tier. A plurality of logic devices are disposed within a third IC tier that is bonded to the second IC tier. A through substrate via (TSV) extends vertically through the second substrate laterally outside of the plurality of pixel support devices and directly below the pixel array.
    Type: Application
    Filed: January 2, 2024
    Publication date: May 1, 2025
    Inventors: Hsin-Hung Chen, Wen-I Hsu, Feng-Chi Hung, Jen-Cheng Liu, Dun-Nian Yaung
  • Publication number: 20250133856
    Abstract: Various embodiments of the present disclosure are directed towards an image sensor including a first integrated circuit (IC) die stacked with a second IC die. The first IC die includes a plurality of photodetectors disposed within a first substrate. The second IC die includes a plurality of pixel transistors and a semiconductor capacitor disposed on a second substrate. The semiconductor capacitor includes a first capacitor electrode, a capacitor dielectric layer, and a doped capacitor region. The first capacitor electrode overlies the second substrate and comprises a protrusion disposed in the second substrate. The capacitor dielectric layer is disposed between the first capacitor electrode and the second substrate. The doped capacitor region is disposed within the second substrate and underlies the first capacitor electrode. The plurality of photodetectors, the plurality of pixel transistors, and the semiconductor capacitor define a pixel.
    Type: Application
    Filed: October 19, 2023
    Publication date: April 24, 2025
    Inventors: Shen-Hui Hong, Chun-Chieh Chuang, Feng-Chi Hung, Jen-Cheng Liu
  • Patent number: 12283564
    Abstract: A semiconductor structure and a manufacturing method thereof are provided. A semiconductor structure includes top, bottom, and middle tiers. The bottom tier includes a first interconnect structure overlying a first semiconductor substrate, and a first front-side bonding structure overlying the first interconnect structure. The middle tier interposed between and electrically coupled to the top and bottom tiers includes a second interconnect structure overlying a second semiconductor substrate, a second front-side bonding structure interposed between the top tier and the second interconnect structure, and a back-side bonding structure interposed between the second semiconductor substrate and the first front-side bonding structure.
    Type: Grant
    Filed: July 14, 2023
    Date of Patent: April 22, 2025
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Min-Feng Kao, Dun-Nian Yaung, Jen-Cheng Liu, Hsing-Chih Lin, Zheng-Xun Li
  • Publication number: 20250126912
    Abstract: A semiconductor image-sensing structure includes a reflective grid and a reflective shield disposed over a substrate. The reflective grid is disposed in a first region, and the reflective shield is disposed in a second region separated from the first region. A thickness of the reflective shield is greater than a thickness of the reflective grid.
    Type: Application
    Filed: December 26, 2024
    Publication date: April 17, 2025
    Inventors: MING-HSIEN YANG, WEN-I HSU, KUAN-FU LU, FENG-CHI HUNG, JEN-CHENG LIU, DUN-NIAN YAUNG, CHUN-HAO CHOU, KUO-CHENG LEE
  • Publication number: 20250126915
    Abstract: A p-type doping region around an isolation structure provides additional electrical isolation between pixel sensors of a pixel array. As a result, current leakage from a floating node of one pixel sensor into another is reduced. Therefore, dark current is reduced, and performance of the pixel array is improved. Additionally, pixel noise caused by electrons trapped in the isolation structure may be reduced.
    Type: Application
    Filed: October 13, 2023
    Publication date: April 17, 2025
    Inventors: Chih-Kuan YU, Wen-I HSU, Feng-Chi HUNG, Hsin-Hung CHEN, Jen-Cheng LIU, Dun-Nian YAUNG
  • Publication number: 20250126812
    Abstract: Some embodiments relate to a method that includes depositing a first layer of hard mask material over a layer of dielectric material; etching the first layer of the hard mask material, the etched first layer of hard mask material including an etched portion having a first lateral dimension; depositing a second layer of the hard mask material over the first layer of the hard mask material; etching at least a portion of the second layer of the hard mask material, while allowing a remaining portion of the hard mask material, to expose a portion of the layer of the dielectric material that has a second lateral dimension less than the first lateral dimension; and etching a trench into the layer of the dielectric material at the exposed portion of the layer of the dielectric material.
    Type: Application
    Filed: October 17, 2023
    Publication date: April 17, 2025
    Inventors: Meng-Hsien Lin, Jaio-Wei Wang, Ko Chun Liu, Hsing-Chih Lin, Jen-Cheng Liu, Dun-Nian Yaung
  • Patent number: 12278250
    Abstract: A semiconductor device includes a substrate having a front side and a back side opposite to each other. A plurality of photodetectors is disposed in the substrate within a pixel region. An isolation structure is disposed within the pixel region and between the photodetectors. The isolation structure includes a back side isolation structure extending from the back side of the substrate to a position in the substrate. A conductive plug structure is disposed in the substrate within a periphery region. A conductive cap is disposed on the back side of the substrate and extends from the pixel region to the periphery region and electrically connects the back side isolation structure to the conductive plug structure. A conductive contact lands on the conductive plug structure, and is electrically connected to the back side isolation structure through the conductive plug structure and the conductive cap.
    Type: Grant
    Filed: May 17, 2021
    Date of Patent: April 15, 2025
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Min-Feng Kao, Dun-Nian Yaung, Jen-Cheng Liu, Hsing-Chih Lin, Feng-Chi Hung, Shyh-Fann Ting
  • Publication number: 20250105098
    Abstract: The present disclosure, in some embodiments, relates to an integrated chip structure. The integrated chip structure includes a first via disposed on a first side of a substrate. A second via is disposed on the first side of the substrate and is laterally separated from the first via. An interconnect wire vertically contacts the second via. A through-substrate via (TSV) extends through the substrate to physically contact one or more of the second via and the interconnect wire. The first via has a first width and the second via has a second width. The second width is between approximately 2,000% and approximately 5,000% larger than the first width.
    Type: Application
    Filed: December 9, 2024
    Publication date: March 27, 2025
    Inventors: Min-Feng Kao, Dun-Nian Yaung, Hsing-Chih Lin, Jen-Cheng Liu, Yi-Shin Chu, Ping-Tzu Chen
  • Publication number: 20250105012
    Abstract: Aspects of the disclosure relate to the field of semiconductor devices, including methods and systems for manufacturing semiconductor devices. More particularly, semiconductor structures comprise a dipole layer, which can be formed from a metal and carbon containing layer. Further described are related methods, deposition systems, and devices.
    Type: Application
    Filed: September 25, 2024
    Publication date: March 27, 2025
    Inventors: Charles Dezelah, Giueseppe Alessio Verni, Petro Deminskyi, Balaji Kannan, Eric Jen cheng Liu, Fu Tang, Michael Givens, Eric James Shero
  • Patent number: 12255219
    Abstract: Some embodiments are directed towards an image sensor device. A photodetector is disposed in a semiconductor substrate, and a transfer transistor is disposed over photodetector. The transfer transistor includes a transfer gate having a lateral portion extending over a frontside of the semiconductor substrate and a vertical portion extending to a first depth below the frontside of the semiconductor substrate. A gate dielectric separates the lateral portion and the vertical portion from the semiconductor substrate. A backside trench isolation structure extends from a backside of the semiconductor substrate to a second depth below the frontside of the semiconductor substrate. The backside trench isolation structure laterally surrounds the photodetector, and the second depth is less than the first depth such that a lowermost portion of the vertical portion of the transfer transistor has a vertical overlap with an uppermost portion of the backside trench isolation structure.
    Type: Grant
    Filed: July 20, 2023
    Date of Patent: March 18, 2025
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Feng-Chi Hung, Dun-Nian Yaung, Jen-Cheng Liu, Wei Chuang Wu, Yen-Yu Chen, Chih-Kuan Yu
  • Publication number: 20250072148
    Abstract: In some embodiments, the present disclosure relates to an image sensor including a substrate having a first side and a second side opposite the first side; a photodetector region within the substrate; a gate structure on the first side of the substrate over the photodetector region; a deep trench isolation (DTI) structure surrounding the photodetector region and extending from the first side of the substrate to the second side; a doped floating node region within the substrate at the first side and disposed between the gate structure and the DTI structure; and a floating node on the first side of the substrate, contacting a top surface of the DTI structure and overlying the doped floating node region.
    Type: Application
    Filed: August 23, 2023
    Publication date: February 27, 2025
    Inventors: Yen-Ting Chiang, Yen-Yu Chen, Tzu-Jui Wang, Jen-Cheng Liu, Dun-Nian Yaung
  • Patent number: 12230554
    Abstract: Various embodiments of the present application are directed towards an integrated circuit (IC) in which a shield structure blocks the migration of charge to a semiconductor device from proximate a through substrate via (TSV). In some embodiments, the IC comprises a substrate, an interconnect structure, the semiconductor device, the TSV, and the shield structure. The interconnect structure is on a frontside of the substrate and comprises a wire. The semiconductor device is on the frontside of the substrate, between the substrate and the interconnect structure. The TSV extends completely through the substrate, from a backside of the substrate to the wire, and comprises metal. The shield structure comprises a PN junction extending completely through the substrate and directly between the semiconductor device and the TSV.
    Type: Grant
    Filed: July 27, 2023
    Date of Patent: February 18, 2025
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Min-Feng Kao, Dun-Nian Yaung, Hsing-Chih Lin, Jen-Cheng Liu, Wei-Tao Tsai
  • Publication number: 20250056851
    Abstract: A semiconductor device includes a first channel region, a second channel region, and a first insulating fin, the first insulating fin being interposed between the first channel region and the second channel region. The first insulating fin includes a lower portion and an upper portion. The lower portion includes a fill material. The upper portion includes a first dielectric layer on the lower portion, the first dielectric layer being a first dielectric material, a first capping layer on the first dielectric layer, the first capping layer being a second dielectric material, the second dielectric material being different than the first dielectric material, and a second dielectric layer on the first capping layer, the second dielectric layer being the first dielectric material.
    Type: Application
    Filed: October 28, 2024
    Publication date: February 13, 2025
    Inventors: Jen-Hong Chang, Yi-Hsiu Liu, You-Ting Lin, Chih-Chung Chang, Kuo-Yi Chao, Jiun-Ming Kuo, Yuan-Ching Peng, Sung-En Lin, Chia-Cheng Chao, Chung-Ting Ko
  • Patent number: 12224298
    Abstract: Various embodiments of the present disclosure are directed towards an integrated circuit (IC) chip in which a bond pad structure extends to a columnar structure with a high via density. For example, an interconnect structure is on a frontside of a substrate and comprises a first bond wire, a second bond wire, and bond vias forming the columnar structure. The bond vias extend from the first bond wire to the second bond wire. The bond pad structure is inset into a backside of the substrate, opposite the frontside, and extends to the first bond wire. A projection of the first or second bond wire onto a plane parallel to a top surface of the substrate has a first area, and a projection of the bond vias onto the plane has a second area that is 10% or more of the first area, such that via density is high.
    Type: Grant
    Filed: August 2, 2021
    Date of Patent: February 11, 2025
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yu-Hsien Li, Yen-Ting Chiang, Shyh-Fann Ting, Jen-Cheng Liu, Dun-Nian Yaung
  • Publication number: 20250048658
    Abstract: In some embodiments, the present disclosure relates to an integrated device, including a substrate; an interconnect structure disposed over the substrate, the interconnect structure including an dielectric; a first bottom electrode structure disposed in the dielectric, the first bottom electrode structure having a first width as measured between outer sidewalls of the first bottom electrode structure and a first depth as measured from an upper surface of the dielectric; and a second bottom electrode structure disposed in the dielectric and spaced apart from the first bottom electrode structure, the second bottom electrode structure having a second width as measured between outer sidewalls of the second bottom electrode structure and a second depth as measured from the upper surface of the dielectric; where the first width is greater than the second width and the first depth is greater than the second depth.
    Type: Application
    Filed: July 31, 2023
    Publication date: February 6, 2025
    Inventors: Meng-Hsien Lin, Hsing-Chih Lin, Wei-Chih Weng, Kuan-Hua Lin, Jen-Cheng Liu, Dun-Nian Yaung